ALD Model 503 Manual _Final
Contents
1. Pressures Name value Setpoint 1 Setpoint 2 A in ui Ki igital Controls g ier ppm s a Name Yalue Setpoint a 7 f 3 00E 0 Auto Scale Clear History l L x 7 00E 0 IN See Analog Contrals Geer fy Name vale Setpoint a i MFC 0 117 seem 0 100 1 5 00E 0 ry 4 00E 0 RI ji i H 3 00E 0 i D Devies KEEN 2 00E 0 Name Value A Es ees SS 5 l h 1 00E 0 l aean 0 00E 0 i j 7 i r 7 r Linear Log l x 06 00 00 PM 06 00 01 PM 06 00 02PM 06 00 03PM 06 00 04 PM 06 00 05PM 06 00 06 PM 06 00 07PM 06 00 08 PM e be 8 0 S d S 00 Device Control Recipe Control a l Analog Controls l i i si s2 53 S4 554 36 24 58 Er s10 ag KT ia EE d Chamber e EE edit chamber wees gebiet Current Date Mon Feb 27 2012 4 07 14 PM keng el et icFP Idle Trend Charts TGsder5 Robo Control Software is written in LabView and its functionality can range from complete manual operation of each component to full recipe automation The software can be customized to accommodate a variety of devices contact SVT Associates for details The above image is a picture of the unpopulated software main page prior to integration with the ALD Model 503 system Details of the software can be found in the Robo Co2. A rs A e J J D ALD Model 503 ALL IViVUu eC I UY THIS DOCUMENT CONTAINS PROPRIETARY INFORMATION OF SVT ASSOCIATES INC AND SHALL NOT BE USED DISCLOSED OR REPRODUCED IN WHOLE OR IN PART WITHOUT THE PRIOR WRITTEN CONSENT OF SVT ASSOCIATES INC Engines for Thin Film Innovation PROPRIETARY INFORMATION LLL Table of Contents General Health and Safety Concems 4 A RE RE 5 EEN 5 Precursor Bubbler Handling BE 5 e Reeg CR T De CIPON OE CC T CONS OIE Ee 8 Beie lier EC HUD EE 8 Pneumatic Distiputon Manifold E 8 WS nee EE 8 Power Outlets and Electrical Feedihbroughs cece cece esse eeseeesseeseeeseeseeeeeeeseeeseesaess 9 Water Flow INGICALONS sesine e ERE EREET EEEE ER EAEE Nea EE eiei 9 RF Pa SMa FOW e e 9 Electronics ue 6 E ein rei Ee te ee Fowo ema te ue FS UO fe le LEE Electronics Enclos re F srce D E EEE EE EEEren ETS G AOD WC E ONT e ln EE Gas STI e PON GE fie INN P O E me g cole O10 En un Lee Inner Chamber Wall Heaters cccccccccecceecseeeeeeceeceeeeneceeeseeceecseececseeceeesnetseesgeteeseecseeseeeeegeeneeeanss Outer Chamber Wall Water Cooling cccccccccccceeeceeeeeeeeeeeeeeeeeeeeeeeseeeeeeeseeeseeeseeeseeseeeeeeesseeseeegeess VAIS WV VS cg acter crete ec ecsae ngs ted styarnnn sara nae die nore nnccaegn eae eect aee fill Lef EE EE Stil DING d te e sotsescenistoeeatencansae cen E A sie E EEE PUMO FS OAC E Chamber aa haces E e E
3. Emergency stop button There is a manual stop button In case of an emergency push the emergency stop button All ALD valves MFCs and the throttle valve will shut down and the growth chamber is sealed to prevent any possible precursor vapor leaking outside The emergency stop button also turns off the pump and turns off all of the heaters Continuously exhausted gas enclosure There is an exhaust port for the gas enclosure All precursor bubblers are located inside of the gas enclosure The exhaust can be connected to a separate vent line to contain the vapor from leaking outside in case of precursor bubbler leakage Make sure the doors on the enclosure are properly closed at all the times to maximize the exhaust flow Gas enclosure door interlock The gas enclosure is outfitted with a door interlock When the gas enclosure door is opened the interlock seals the gas isolation valves to disable the flow of precursor gases This prevents you from exposure to dangerous gases if there is a leak It is strongly recommended that you install a separate gas sensor alarm system working for a specific vapor material For example if you work with chlorinated gases such as SiCl an HCI sensor should be installed inside the gas enclosure or near the growth chamber to reduce risk of exposure Precursor Bubbler Handling Concerning precursor bubblers you are ultimately responsible for your own safety Due to the variety of gases the ALD Model 503
4. w A ITRF Outer Chamber Rack ror Trays Inner Chamber Wall Hedter Elements SAAT 7620 Executive Drive Eden Prairie MN 55344 3677 USA SVT Associates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Reserved ALD Model 503 Version 1 0 4 14 Page 32 of 34 Engines for Thin Film Innovation OO gt 0 _ 7620 Executive Drive Eden Prairie MN 55344 3677 USA Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com ALD Model 503 Version 1 0 4 14 Warranty and Limitations of Remedies SVT Associates warrants that all equipment manufactured by it shall be free from defects in materials and workmanship under normal use and service for a period of twelve 12 months from the date of shipment from SVT Associates manufacturing facility This warranty is subject to SVT Associates equipment being installed maintained and operated in accordance with the operating and maintenance instructions accompanying each item manufactured by SVT Associates Warranty shall be void if SVT Associates equipment is modified by the CUSTOMER or used in other than the recommended manner or applications Purchased equipment incorporated into any item supplied by SVT Associates will be covered by said manufacturer s warranty SVT Associates warrants that at the time of delivery any other products processed or manufactured a
5. This section is intended to give a brief overview of each of the components that make up SVT Associates ALD Model 503 system Its intent is to familiarize you with the terms and locations of each of the components referred to in the rest of this manual The main parts are identified below Enclosure Electronics Enclosure Console I vg Gi 4 SAAT SVT Associates Proprietary Information 2014 SVT Associates Inc All Rights Reserved Page 7 of 34 Engines for Thin Film Innovation PROPRIETARY INFORMATION Console The Console houses various control electronics process gas delivery system and pumping hardware In addition the Console provides a physical support structure for the ALD Chamber Gas Enclosure and Electronics Enclosure Communications Hub This communications hub is the USB to serial interface from the computer to serial devices This hub supplements the main control electronics found in the electronics enclosure Pneumatic Distribution Manifold Converts the control signal from the main control electronics into control over valve state Provides air actuation to all pneumatic valves on the system vo AA AA ri Leveling Pads The leveling pads can be raised off the floor to facilitate movement of the enclosure using the chamber wheels The leveling pads can also be lowered to the floor to lift the wheels from the ground and ensure that the system re
6. Maintenance Ge ee ES crcccasiccncsiesonnavatercens onenryindenacatieside duns disedsintecsiiotes dodkaavdens deciatsdletecsetetaecurtdaceeniceeasdeweene 28 Mechanical Pump GatetviMamtenance 28 KEE EE 28 SNE tele e De Tee EE 29 Emergency Shutdown Procedure s nennnnsenonnsrnseronesrrorrrninrrrresrrorrnnennrorrnnrnrrnnennrnnrrnrrrnnrnnrnrrnnrnrrnnenh 29 Complete System Shutdown for NON EMergen cles c cccceecceecceecce cece eeceeeseeeseeeeeeeseeseeeseeeseeegaess 29 ALD System Shutdown for Extended Period Of Tume 29 Appendix System Diagrams onnannnennnnnnnnnnrnnnrnorrsnrrrrnnrsnrsrrsnrnrrnnrsnrnrrsnrnrrrnrsnrorrnnrrrenrnrrnrrnnen rrenen renni 30 Process Gas and PUMPING Diagram E 30 ALD Inside Chamber Detailed Dagram cess esse eeeeeeseeeseeeseessneeseeeaeetneeaes 31 ALD Chamber Exploded View ccccccccecceccneeteeeseeceeeeneceeeseeteecseesecseeceeessecseessetseeseeseeeseecseeseeteetanes 32 Warranty and Limitations Of Hemedes renni 33 Kufa a le EE 33 Returning Equipment for Repair or Servicing cccccecceccseeceeeceeceeeeseceeeseeeeeeeeeceeeseeseeesseteeseetseeseeeaeeges 34 SAAT PROPRIETARY INFORMATION SS EE SVT Associates Proprietary Information 2014 SVT Associates Inc All Rights Reserved Page 3 of 34 Engines for Thin Film Innovation ee _ LL 7620 Executive Drive Eden Prairie MN 55344 3677 USA Phone 952 934 2100 Fax 952 934 2737 Email sales svta com
7. SAAT 7620 Executive Drive Eden Prairie MN 55344 3677 USA SVT Associates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Reserved ALD Model 503 Version 1 0 4 14 Page 10 of 34 Engines for Thin Film Innovation PROPRIETARY INFORMATION Chamber Growth Chamber JA The Growth Chamber is where samples become coated by ALD The outer chamber contains an inner chamber which can be heated to temperatures that are suitable for deposition Inside of the inner chamber are racks for loading samples for deposition A more detailed diagram of the growth chamber can be found in the Appendix at the end of this manual Gas Delivery Port 1 When viewed from the front you can see the high conductance gas inlet port on the left side of the chamber Precursor and carrier gas is delivered to the chamber through this port Pumping Port 2 The high conductance pumping port is located on the right side of the chamber opposite the gas delivery port for optimum process uniformity This port connects to both the regular pumping path and the balance pumping path The balance pumping path allows manual adjustment of a small continuous flow for ALD soak mode _ Outer Chamber Inner and Outer Chambers The chamber consists of an inner chamber that is completely enclosed by an outer chamber The inner Ul d rn E chamber is sealed wit
8. 4 a eo e T UJ ee ALD r Engines for Thin Film Innovation PROPRIETARY INFORMATION LLL Standard Operating Procedure Running an Automated Recipe The ALD Model 503 system comes pre programmed with template recipes for the automated atomic layer deposition Al O3 and TiO To run one of these template recipes you need to load a recipe and then executes the recipe Note These recipes are intended only to demonstrate functionality of the system You should determine your own best recipe parameters for your application 1 To load a recipe in the left pane of the main Robo window select the Recipe Control tab This tab shows a listing of all of the currently loaded recipe steps Click the Load Recipe button 2 The recipe selection pop up window appears As shown to the right ensure 6 em i e Date modified that the current path is Sb atan O AaS A ROK ie Recent Places kitt repx 11 13 20125 46PM_RCPX File Ce C repl repx 11 14 2012 4 01PM RCPX File C Program Files x86 SVT S Statice WESTER Associates Robo Control Recipes nd Diera ne set a E Libraries If it is some other location change the JN directory to Network C Program Files x86 SVT Associates Robo Control Recipes All of the pre programmed recipes are listed in this directory as RCPX files Select the desired recipe and click Load SAAT 7620 Executive Dr
9. into the ALD System ALD Model 503 normally remains pumped down with the temperature of its inner chamber walls above 100 C These conditions are considered the standby conditions Maintaining high internal temperature prevents water vapor adsorption on interior ALD surfaces and reduces the time required to fully evacuate the chamber If the Robo software is not running you can click on the Robo icon on the desktop to start the program You will enter login information and then after a short loading screen the Robo window will open To insert samples into the ALD system you must vent load and pump down the system To do this you interact with the indicators on the Ul as shown on the computer monitor RED indicators are OFF GREEN indicators are ON Vent the Chamber 1 In the right pane of the main Robo window ensure that the Chamber tab is active The chamber view displays the indicators required for normal ALD operation You can toggle the indicators by holding the left lt Shift gt key and then clicking on the indicator using the left mouse button 2 In the left pane of the main Robo window ensure that the Device Control tab is active 3 Turn off all gas flowing into the chamber This is done by setting all MFC mass flow controller Setpoint entries to 0 After confirming that the setpoint is changed to zero wait until the MFC Value entries reach 0 sccm 4 Turn on Bal in order to equalize the inner cha
10. into the chamber through viewports in the outer chamber lid and inner chamber lid This allows you to confirm that a centrally located sample has not shifted position Engines for Thin Film Innovation PROPRIETARY INFORMATION Pumping System The Pumping System is designed to provide uniform efficient and reliable process pumping The Pumping System is partially housed within the Console A diagram of the complete gas path is located at the end of the manual Pumping Manifold 1 Provides high conductance process pumping and flexibility to incorporate various options For example a residual gas analyzer or RGA may be connected to the front facing CF port 2 Pump Isolation Valve 2 The pneumatically actuated pump isolation valve is controlled through the ROBO software In case of emergency the pump isolation valve seals the chamber by working together with the gas source isolation valve located in the gas enclosure Chamber Pressure Gauge 3 Baratron Pressure Gauge has an operating range of 10 mTorr to 10 Torr and is used to read the pressure of the Inner Chamber i m tat b BEEE Exhaust Manifold Heater 4 The gray insulation covering the pumping manifold 1 obscures an exhaust heater that is used to prevent deposition of excess process gas Also covered by the gray insulation is a thermocouple to provide closed loop temperature control SAAT 7620 Executive Drive Eden Pr
11. system can accommodate you need to develop your own safety procedures for connecting and disconnecting precursor bubblers The following paragraphs describe a brief introduction to common concerns for some precursor materials The sources of the precursor chemicals are generically referred to as bubblers A bubbler passes a carrier gas through a liquid chemical to pick up the chemical Alternatively for high vapor pressure materials it is not necessary to pass the carrier gas through the liquid but simply have a cylinder of the material at a controlled temperature which feeds directly into the ALD valve called direct vapor drawing Know the nature of the precursors with which you are working and read the Safety Data Sheet SDS that is available from the chemical supplier These documents are internationally required by the United Nations Globally Harmonized System of Classification and Labelling of Chemicals GHS Many ALD precursors are flammable corrosive or toxic For example TMA is pyrophoric it burns upon exposure to air It is thus crucial to handle the precursor bubblers safely which includes knowing how to connect and disconnect a bubbler to the ALD valve and how to store a bubbler if it is not in use When connecting a filled bubbler to an ALD valve make sure to wear a proper mask or respirator Double check to ensure the manual on off valve on the bubbler is closed tightly before loosening the VCR fitting SAAT SVT A
12. Exhaust Fan Runs continuously and ensures that dangerous gas does not accumulate inside the console Some precursors can be damaged at elevated ambient temperatures The exhaust fan assists in removing heat from the gas enclosure Gas Enclosure Exhaust Connection A convenient connection is provided on the side of the console to connect to a facility ventilation system Connection is for a 4 inch inside diameter hose A minimum capacity of 100 CFM is recommended for the facility ventilation system Gas Enclosure Door Interlock When properly implemented in Robo software if the gas enclosure door is not closed the interlock can seal the gas isolation valves to prevent the ALD system from operating Engines for Thin Film Innovation SS LLL Precursor Heaters and Thermocouples Customer supplied precursor heaters and thermocouples are used to heat the precursor bubblers in order to raise the vapor pressure Robo ALD control software supports feedback control for precursor heaters For feedback control the heaters and thermocouples must meet the following specifications e Heater rated at 240 Volts 40 watts e Thermocouple Type K ungrounded with subminiature connector To attach precursor heaters place the thermocouple so the end of probe is near the center of the heater Note Heaters not included Position sealed precursor container centered on the heater Fasten the heater on the precursor contain
13. Exnausi Manifold RE VON CAO WE EAT NARS EE AC INIT FIO DEE GS ENOS eE E R E R Gan Man E ie E E RE 7620 Executive Drive Eden Prairie MN 55344 3677 USA SVT Associates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Reserved ALD Model 503 Version 1 0 4 14 Page 2 of 34 Engines for Thin Film Innovation 7620 Executive Drive Eden Prairie MN 55344 3677 USA Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com ALD Model 503 Version 1 0 4 14 ee ag EEN Ee E 15 Gas Mass FIOW lte E 15 E Ee Een 15 E ER En Tele ETH USE E NEE 16 Gas Enclosure Exhaust COMME CUON ME 16 Gas Enclosure Door ln tte er EE 16 Precursor Heaters and Thermocouples ccc ccc ccccecseeceeceeeeece eee eeeeeseeeeeseeseeceeeeceeeesseeseeaeeseeseeseeees 17 Before Deposition Preparing the ALD cctvossasscossdanstivwasdennsasnashnganssiciensinvesanessneanastadeenawesesnnnaueedanasnnsiailetah 19 TUDOM yo un D 19 FICAU UD TMS BUD el EC 19 Select an ALD Mode of Operation EE 19 SECU EE Eer 20 ROCHE Precautii S sree EEE EREA 21 VENDE CHINDO ae E E E EE AA E 22 leet ten nn E 23 Pump down and Heater Hamp up 24 Standard Operating Procedure Running an Automated Hecpne 25 Standard Operating Procedure Unloading Samples ccccc cece ceceseeeeeeeeeeeeeeeeeeeseeeseeeseeeseeeseeeseeeseeeas 26 Additional Software Intormaton 27
14. airie MN 55344 3677 USA SVT Associates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Reserved ALD Model 503 Version 1 0 4 14 Page 13 of 34 Hot Trap 5 Contained within the console is the hot trap The hot trap features fixed power control with reference thermocouple temperature indication The hot trap breaks down harmful materials that are used or created in the growth chamber The hot trap must be operating at rated temperature whenever precursors are pulsed into the system Failure to properly operate the hot trap could cause damage to the pumping system and void warranty Particulate Filter 6 The particulate filter is located after the hot trap and before the Vacuum pump The particulate filter captures any particulates created in the Process Chamber or Hot Trap and prevents the oil from backstreaming from the vacuum pump Vacuum Pump Oxygen service rotary vane vacuum pump is provided with exhaust and oil filtration upgrade SVT Associates recommends the vacuum pump exhaust should be connected to your facilities ventilation system P A e T gd P ef SES EN E Le em Sen y y C J IECH e m re INF TT WJ zf Tei LJ WY Ui Ke Gas Manifold and Heater 1 The gas manifold has connections for up to four ALD valves The gas manifold includes a heater element and thermocouple to
15. e This is then repeated for the other precursor SAAT PROPRIETARY INFORMATION SVT Associates Proprietary Information 2014 SVT Associates Inc All Rights Reserved Page 19 of 34 Engines for Thin Film Innovation PROPRIETARY INFORMATION Set up a Recipe To use Robo software to program a recipe see the SVT Associates Robo Control User s Manual Key growth parameters include precursor pulse time pulse strength and purge time for each precursor Carrier gas and sealing gas flow rates are also important There are parameter tradeoffs in an ALD process Longer precursor pulse times can assure that the surface to be coated is saturated with the precursor but precursor consumption will go up and cycle time is prolonged Higher carrier gas flow rates help purge the excess precursor faster but may increase base pressure in the chamber thus reducing precursor pulse strength The ALD Model 503 has an internal deposition chamber within the vacuum chamber A flow of inert gas from the top of the chamber into the outer chamber space is used as a sealing gas in the thermal mode to help seal the internal lid and suppress precursor from leaking out of the internal chamber The following parameters are nominal values for thermal AlzO3 deposition in soak mode for reference sjeuajey jobse L lou 1 8sind VNL s wi L YeOS lount ng s WI 8SINd OCH lount nd MO 4 SECH Jaded wos MO seg do buljeas Iy 110 Builpee
16. er so the leads are positioned out from the bottom of the precursor container Follow appropriate safety procedures when mounting the precursor container The precursor bubbler can be mounted by connecting to the VCR seals in the gas enclosure Then connect the heater and thermocouple leads 7620 Executive Drive Eden Prairie MN 55344 3677 USA Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com ALD Model 503 Version 1 0 4 14 PROPRIETARY INFORMATION Mee lf SAAT SVT Associates Proprietary Information 2014 SVT Associates Inc All Rights Reserved Page 17 of 34 Engines for Thin Film Innovation 7620 Executive Drive Eden Prairie MN 55344 3677 USA Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com ALD Model 503 Version 1 0 4 14 Background ALD System Operation Atomic Layer Deposition ALD is a vapor phase technique that deposits thin films sequentially atomic layer by layer ALD has been well described in the literature It is based on sequential reactions of vapor phase chemicals with the surface of the substrate The reactions are self limiting The surface is first saturated with one chemical precursor and the excess pumped away It is then exposed to a second chemical precursor and the excess is pumped away The technique provides excellent coverage of topographical features For more information on ALD see review articles in the following l
17. erved ALD Model 503 Version 1 0 4 14 Page 28 of 34 Engines for Thin Film Innovation PROPRIETARY INFORMATION ej LLLLL Shutdown Procedures Emergency Shutdown Procedure In an emergency situation such as system malfunction power shut down or system vent failure Stop the program if you are in the middle of the growth Manually shut down shutoff valves of all bubblers in use Zero all MFCs and switch off all master pneumatic valves to prevent any gas from getting into the chamber and close the gas cylinder Shut down the pump manifold heater exhaust heater and inner chamber wall heater Close the automatic throttle valve to isolate from the pump and shut down the pump itself manually Identify the reason of the failure or malfunction and correct it before restarting the system Complete System Shutdown for Non Emergencies Confirm that the manual precursor isolation valves are closed Close manual gate valve between chamber and loadlock Set all MFC flows to 0 sccm Close Process gas isolation valves Shut off all heaters inner chamber wall heater pump manifold heaters exhaust heater hot trap and precursor heaters Close load lock roughing valve Close chamber pumping gate valve Turn off the turbo pump leave the Turbo backing pump run until the turbo stops spinning Turn off the load lock rough pump Power down Eurotherms Turn off the water Close air supply to system Close Robo program Shut off computer Re
18. es If the exhaust line is heated and there is not any filter or trap installed down the exhaust line most are dumped in the pump A hot trap or filter is needed which becomes the secondary defense line A hot trap is capable of decomposing or neutralizing excessive metal organic precursor vapor into less volatile products and hydrocarbon gas which do not harm the pump and reduce hazard 3 A chemical corrosive resistant pump use of Fomblin oil is recommended Fomblin is ideal but expensive However it is a trade off for the oil price and pump repair cost If ordinary mechanical oil is used frequent replacement is necessary once a month or even more frequent if in heavy use or very aggressive chemicals are used Some other types of pump oil that are resistant to O2 H20 and metal organics such as AJ Elite Z synthetic vacuum pump fluid from A amp J Vacuum can last longer than the ordinary one Chamber Cleaning After many depositions are performed in the ALD system deposits build up on the internal surfaces Depending on the materials deposited thermal cycling of the system can eventually cause cracking and flaking of the deposit If flakes are visible clean the chamber with a lint free cloth using the appropriate solvents SAAT 7620 Executive Drive Eden Prairie MN 55344 3677 USA SVT Associates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Res
19. es that the valve is opened in that step H20 ALD valve for H2O precursor source TMA ALD valve for TMA precursor source P5 P8 ALD valves for spare precursor sources CG Carrier Gas on off valve for MFC control PV Pump Valve on off to evacuate the chamber Recipe Precautions Always make sure the Hot Trap is in operation and at desired temperature before starting a recipe Make certain all utilities such as exhaust abatement and cooling water etc are in operation before starting a recipe Do not heat the ALD system to temperatures above those recommended by the manufacturer Note the maximum temperature settings for different parts ALD pulse valves are rated to 200 C and should not be heated above that temperature The sample heating maximum temperature is 500 C while outer chamber wall heaters should not be set gt 150 200 C because of the o ring The precursor delivery lines and exhaust lines should not be heated above 200 C Temperature of the precursors should not exceed safety or decomposition temperature of the chemical used The maximum temperature for the precursor heater jacket is 200 C SAAT 7620 Executive Drive Eden Prairie MN 55344 3677 USA SVT Associates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Reserved ALD Model 503 Version 1 0 4 14 Page 21 of 34 Standard Operating Procedure Loading Samples
20. g precursor chemicals arrive on the surface in the ALD chamber at the same time and not sequentially To avoid undesired spurious CVD reactions it is Critical that the purging steps be complete sufficient time and all excess precursor be pumped away before pulsing of the second precursor Only one of the precursors should be exposed to the substrate at a time CVD reactions in the ALD system will produce non uniform and excessive deposits SAAT PROPRIETARY INFORMATION ej EE SVT Associates Proprietary Information 2014 SVT Associates Inc All Rights Reserved Page 18 of 34 Engines for Thin Film Innovation OO gt 0 _ 7620 Executive Drive Eden Prairie MN 55344 3677 USA Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com ALD Model 503 Version 1 0 4 14 Before Deposition Preparing the ALD Turn on the System Power up the system pumps and computer start the Robo Control software program and turn on the system electronics Prior to any use of chemical precursors the Hot Trap should be on and operating Leave the Hot Trap on during the use of precursors Prior to flowing process gas make sure the system has been properly outgassed e Run the in vacuum heaters at gt 100 C to outgas all internal surfaces e The precursor bubblers should be installed and any headspace between the manual shutoff valves and the ALD valves evacuated Check and make sure the cooling water line o
21. h an inner chamber lid This K Z enables a sealing gas flow to better confine process 3 V fh gases to the inner chamber In the pumping system a balance valve and needle valve connects the two 9 ov SS chambers allowing you to adjust the pressure inner Chamber Wall differential _ Inner Chamber Rack For Trays SAAT 7620 Executive Drive Eden Prairie MN 55344 3677 USA SVT Associates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Reserved ALD Model 503 Version 1 0 4 14 Page 11 of 34 Inner Chamber Wall Heaters Heater elements mounted under the heat shield deliver heat to the inner chamber wall Heaters are also located in the front lid and in the rear of the outer chamber The hot inner chamber wall radiatively heats the sample trays Thermocouples mounted to the inner chamber wall and inner tray provide feedback for closed loop temperature control When opened you can see the exposed heater elements on the front lid Outer Chamber Wall Water Cooling The outer chamber wall is capable of being water cooled in order to minimize process sensitivity to changes in ambient temperature Additionally the water cooled outer chamber wall can be used as a safety feature to minimize the temperature of the exposed outer chamber even while the inner chamber is kept above 100 C Chamber Viewports You can look directly
22. he bubbler immediately with a VCR cap and gasket When a filled precursor bubbler is taken out of use it is the best to put it back in the original package and store in a safe properly vented area or chemical hood area Make sure the on off valve is tightly sealed and the VCR cap is tightened SAAT PROPRIETARY INFORMATION SVT Associates Proprietary Information 2014 SVT Associates Inc All Rights Reserved Page 6 of 34 Engines for Thin Film Innovation TT ____ 7620 Executive Drive Eden Prairie MN 55344 3677 USA Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com ALD Model 503 Version 1 0 4 14 System Description PROPRIETARY INFORMATION SVT Associates ALD Model 503 is a versatile research deposition tool for thermal ALD With up to four precursor lines and a hot wall deposition chamber a wide range of applications may be performed from a single system The system is integrated with our RoboALD automation software which increases process reproducibility Specifications Outer Chamber Volume 92 5 L inner Chamber e nn sssssssaosar e E E R 100 5 L Chamber Base Dreseure cccccceceseesceesceesecesecerecerevsreeereenreverevereeas lt 5 0E Torr Process Gas Manifold Heating to 200 C Pumping Manifold Heating fo 150 C PIOU Wap MICAUNG Oise senchsssecateseicesqutieccedenacsGhingcaceqsgauat raana 400 C sample IC AUN We E 500 C Description of Parts
23. he sole responsibility of the CUSTOMER G Goods being returned for other than warranty repair shall be subject to a restocking charge of twenty 20 percent of the original sales price of the returned item Returning Equipment for Repair or Servicing Before shipping equipment for repair or servicing obtain a Return Authorization Number assigned by SVT Associates Liability Disclaimer SVT Associates Inc takes steps to assure that its published specifications and manuals are correct however errors do occur SVT Associates Inc reserves the right to correct any such errors and disclaims liability resulting therefrom No Liability for Consequential Damage In no event shall SVT Associates Inc or anyone else involved in the creation production or delivery of the accompanying product including hardware and software be liable for any damages whatsoever including without limitation damages for loss of business profits business interruption loss of business information or other pecuniary loss arising out of the use of or the results of use of or inability to use such product even if SVT Associates Inc has been advised of the possibility of such damages SAAT PROPRIETARY INFORMATION SS EE SVT Associates Proprietary Information 2014 SVT Associates Inc All Rights Reserved Page 34 of 34
24. ing of atomic layer deposition recipe the system is normally evacuated of process gas and remains under vacuum If desired you can choose to purge the chamber by flowing inert carrier gas From these conditions you can unload samples by repeating the same procedure as described above in Standard Operating Procedure Loading Samples into the ALD Specifically the chamber is again vented opened and finally pumped down again The differences for unloading include that samples are now retrieved from the trays and lower temperature set points for the wall and precursor heaters may be desired Empty trays should remain inside of the ALD system to prevent adsorption of moisture At the end of unloading the chamber should be evacuated to minimize exposure of the gas lines and vacuum lines to oxygen This limits corrosion of the system You should set the inner wall temperature to gt 100 C to ensure that water vapor does not adsorb on the ALD chamber walls between uses e cn i oO E a T Engines for Thin Film Innovation PROPRIETARY INFORMATION LL Additional Software Information Robo Control File Setup Chamber wiew Log File Interlocks Eurotherms Pending Eurotherm Commands 0 Eurotherms Pressure Analog Controls Name Temperature Working SP Setpoint Ramp Rate Power Power RR Mode LA sE Sg CH Cjmin fsec Aor M ca ty wg
25. is clean and the O ring sits in its groove C EY 8 y A j ee AN V A UJ W V __ MA T AER Pump down and Heater Ramp up 16 Close the ALD front door Tighten the two large hand knobs on the top right and bottom right of the ALD front door Continue alternately tightening the large hand knobs until the ALD front door is sealed 17 Turn on PV to begin pumping down the chamber It is normal for the pump to generate a loud noise as it begins evacuating the chamber 18 After the chamber has pumped down to its base pressure then use the Thermocouple Control window to enter an Inner Wall temperature setpoint The setpoints are the topmost fields shown here labeled as Set Temp 9 Set Ternp 9 Dk U asd Click to Control 19 19 After entering the setpoint click the Click to Control button below the Inner Wall cluster to begin controlling the temperature The button will turn green and its text will change to Controlling The Inner Wall will heat up and radiatively heat the samples located on the Inner Trays Depending on the temperature setpoint and volume of samples 60 minutes may be required to reach the desired setpoint Optional Precursor temperatures can be set using the Thermocouple Control window by entering the desired temperature in the Set Temp field and then clicking Click to Control emm e EE A Gw Wa d A WA a d A A Os gt j Acel L
26. iterature Atomic Layer Deposition An Overview by Steven M George Chem Rev 2010 110 111 131 As an example of a thermal ALD process AlO can be deposited using precursors of trimethylaluminum TMA and water Alternative recipes and recipes for other materials can be found in the literature The substrate is introduced into the deposition chamber then evacuated The surface of the substrate is initially hydroxylated from exposure to the atmosphere One cycle of the deposition sequence can be described as following two half reaction cycles 1 TMA pulse is admitted into the chamber and allowed to react with hydroxyl groups on the surface This reaction proceeds until the surface reaction reaches completion The unreacted TMA is pumped away with the help of an inert carrier gas such as Nitrogen or Argon A water pulse H2O is admitted into the chamber The H2O reacts with the surface removing the CH3 groups CH methane is formed as a gaseous byproduct creating Al O Al bridges and passivating the surface with Al OH once again on the surface The unreacted H2O and gaseous byproduct CH are pumped away with the help of the inert carrier gas These 4 steps of the cycle can be set up in a recipe as a loop Each cycle produces up to 1 1 A 0 11 nm of AlpO3 depending on temperature The ALD process is distinct from Chemical Vapor Deposition CVD in that the reactions occur sequentially CVD mode reactions occur when both reactin
27. ithin the ALD chamber enclosures or console Users must not modify or remove any portion of the ALD chamber enclosures console and or the power lines Mechanical Lid Pinch Point Hazard The ALD lid is heavy in order to mechanically seal the ALD chamber Users must take care while closing or opening the ALD to avoid pinching fingers hands or any other foreign materials between the lid and main chamber temperature however interior components are capable of reaching high temperatures Users must exercise caution when opening the chamber enclosures or console Certain components inside may have hot surfaces which can present a burn hazard V Thermal Burn Hazard The exterior of the ALD is designed to remain near room SAAT PROPRIETARY INFORMATION SVT Associates Proprietary Information 2014 SVT Associates Inc All Rights Reserved Page 4 of 34 Engines for Thin Film Innovation PROPRIETARY INFORMATION ee LLLL ALD System Safety Safety Features ALD Model 503 has a variety of safety features to handle possible emergency situations 1 Growth chamber interlock If the growth chamber has any leaks or the pressure rises above a set level say 5 Torr in the middle of the growth process the controller and the pneumatic valve software can automatically shut down and isolate all ALD valves and MFCs This prevents precursor vapor or byproducts from leaking into or out from the growth chamber if the system is vented
28. ive Eden Prairie MN 55344 3677 USA SVT Associates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Reserved ALD Model 503 Version 1 0 4 14 Page 25 of 34 3 At this point the recipe selection pop up window closes the steps in the recipe are displayed in the Recipe Control pane and a second pop up window shows that the recipe is being sent to the ALD control electronics After the recipe is transmitted the second pop up window automatically closes If desired the recipe steps can now be modified to adjust the process parameters PF Power JIB W I Kie Trend Charts E rend Chats chamber Ae umbe aT current Date Fre Feb 21 2014 10102 PM 4 When the recipe is suitable the user executes the recipe by clicking the Run button at the top of the Recipe Control pane 5 The recipe will execute step by step Users can monitor progress of the recipe because the active step is highlighted and all prior steps list a 0 entry in the right most column It is recommended to check the MFC gas flows while running the recipe in order to confirm that the gas cylinders have not run out of carrier gas nm N m em Zen m J mm Lef en E LA LA em p A Te P Le em J C bn TO Hie OOted Lef Ir 1d ISMN RaNnIITQA ay NIA Ga Standard Operating Procedure Unloading Samples We After complet
29. mains stationary SAAT 7620 Executive Drive Eden Prairie MN 55344 3677 USA SVT Associates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Reserved ALD Model 503 Version 1 0 4 14 Page 8 of 34 Power Outlets and Electrical Feedthroughs Located at the back of the console is a small panel of four electrical power outlets The standard 3 terminal outlets are intended to facilitate addition of aftermarket ALD components such as a residual gas analyzer As shown to the right the electrical outlets are located below electrical feedthroughs which route wires into the electronics enclosure Water Flow Indicators The outer chamber wall is capable of water cooling You can monitor water flow through the system by checking the set of three water flow indicators located just behind the console door Shutoff valves are included to allow manual shutoff of water flow RF Plasma Power Supply The RF Plasma Power Supply can be mounted on the left panel of the console The power supply is controlled remotely by using the Robo Control software however the front panel of the power supply can supplement the information available to you Note This component ts optional Engines for Thin Film Innovation PROPRIETARY INFORMATION Electronics Enclosure The electronics enclosure is unlocked and can be opened by unlocking the two black tu
30. mber and outer chamber pressures using the balance valve 5 Turn off PV PV stands for Pump Valve and turning off PV halts pumpdown of the chamber SAAT D 6 Completely loosen the two large hand knobs on the top right and bottom right of the ALD front door 7 Turn on Vent to begin flowing gas into the chamber The Inner Pressure indicator should steadily rise towards 60000 and the pressure meter on the front of the ALD enclosure should approach 60 Torr 8 Eventually the ALD system will reach atmospheric pressure and the front door will open slightly After this occurs fully open the outer front door Open the Chamber 9 When the inner front panel door has cooled to user preference loosen all of the retaining nuts that hold the inner front panel 10 Then wait until the inner front panel is safe to touch Remove the inner front panel using the two handles Set the inner front panel onto a safe clean surface 11 Turn off Vent to halt gas flow into the chamber 12 Remove trays place samples into the trays and place trays back onto the rails in the inner chamber 13 Use the handles to place the inner front panel back onto the retaining bolts Turn the panel slightly into place 14 Tighten all of the retaining nuts until the inner front panel is flush with the inner chamber and firmly in place 15 Check the O ring on the inside of the ALD front door Ensure that the O ring surface
31. move main power to the system ALD System Shutdown for Extended Period of Time Certain ALD precursors can degrade with repeated heat and cool cycles If precursors must be cooled or are accidentally cooled as a result of a power failure we recommend the precursors remain at room temperature until needed to run process Follow the Complete System Shutdown procedure listed above 7620 Executive Drive Eden Prairie MN 55344 3677 USA SAAT SVT Associates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Reserved ALD Model 503 Version 1 0 4 14 Page 29 of 34 PROPRIETARY INFORMATION Engines for Thin Film Innovation Appendix System Diagrams Process Gas and Pumping Diagram REVISIONS DESCRIPTION APPROVED Outer Chamber Outer Chamber Inner Vacuum Gauge Chamber Inner Chamber Vacuum Gouge Console Y Compressed Air Vacuum Argon uter Chamber 3 ge SS GA e eech Supplied By Q Nitrogen Chamber Vent SVT ASSOCIA X PRONUCT DEVELOPMENT Mi AS ES XX 20 005 7620 Executive Drive Eden Fraire MN ge n pm ME PROCESS GAS AND PUMPIN MACHINED SURFACE wy er d MAI IC a CIT 4 A A D REWOVE AL is WA AREA f ary SHARP EDGES a A Ch IARGE DWG NO REV AG eget gil Sates A t Ze SAA T ALD SVT Associates Proprietary Information 7620 Executive Drive Eden Prairie MN 55344 3677 USA 2014 SVT A
32. nd sold by it hereunder are free of defects in material and workmanship and conform to COMPANY specifications No warranty is provided by SVT Associates for products sold hereunder which are not manufactured or processed by SVT Associates but the manufacturer s warranty for such products if any shall be assigned to the CUSTOMER without recourse to SVT Associates The foregoing warranties are in lieu of and exclude all other warranties not expressly set forth herein whether expressed or implied by law or otherwise including without limitation any warranty of merchantability or fitness for a particular purpose In no event will SVT Associates be liable for any consequential damages IN THE EVENT OF SVT ASSOCIATES LIABLITY WHETHER BASED ON CONTRACT TORT INCLUDING BUT NOT LIMITED TO NEGLIGENCE AND STRICT LIABLITY OR OTHERWISE THE CUSTOMER S SOLE AND EXCLUSIVE REMEDY WILL BE LIMITED SVT ASSOCIATES HAS THE FOLLOWING OPTIONS TO REPAIR OR REPLACEMENT F O B SVT ASSOCIATES MANUFACTURING PLANT BY THE COMPANY OF ANY NON CONFORMING ITEM FOR WHICH CLAIM IS MADE BY THE CUSTOMER OR TO REPAYMENT OF THE PORTION OF THE PURCHASE PRICE PAID BY THE CUSTOMER ATTRIBUTABLE TO THE NON CONFORMING ITEM SVT ASSOCIATES WILL NOT BE LIABLE FOR ANY OTHER DAMAGES WHETHER DIRECT INCIDENTAL CONSEQUENTIAL OR OTHERWISE Return Policy Any request by the CUSTOMER for return of standard products other than for warranty claims under warranty hereof for all or any part of pu
33. ntrol User s Manual SAAT 7620 Executive Drive Eden Prairie MN 55344 3677 USA SVT Associates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Reserved ALD Model 503 Version 1 0 4 14 Page 27 of 34 Engines for Thin Film Innovation PROPRIETARY INFORMATION AO gt gt 0 0CcCcaoa Maintenance Procedures Mechanical Pump Safety Maintenance 1 In principle the ALD process should work in a slightly over saturated exposure condition and almost 100 of the precursors are consumed and very little excessive vapor going into the exhaust and the pump The saturation condition for an ALD system has to be experimentally determined However if precursor vapor pulses are oversaturated too much or too excessively or there is not sufficient purge a severe CVD reaction can happen which generates a lot of powders or particles inside the growth chamber down the exhaust and even into the pump It is thus strongly recommended that you use recipes approved by SVT Associates or minimize precursor use to avoid exhaust problems This is the fundamental the most important root protection for the pump 2 In practice it is hard to identify exact saturation conditions or it takes many test runs Condensation of excessive precursors particles or other by products could still be built up gradually along the exhaust line or even precursor delivery lin
34. provide closed loop temperature control to 200 C To better control the temperature of the gas manifold it is wrapped in gray insulation ALD Valves 2 As shown in 2 four fast acting ALD valves are included in SVT Associates ALD Model 503 ALD valves can be baked up to 200 C Carrier Gas Lines 3 Common carrier gas lines provide continuous flow of carrier gas through all ALD valves Continuous flow of carrier gas improves the efficiency of purging precursor gases Gas Mass Flow Controllers 4 Process gas is delivered to the chamber using mass flow controllers 4 The mass flow controllers measure gas flow and also self adjust to deliver a predetermined gas flow set point You specify the set point by using the Robo software Gas Isolation Valves 5 The process gas isolation valves 5 are used as part of the emergency shutdown to isolate the chamber from flowing precursor gas The Gas Enclosure houses the high conductance Process Gas Delivery System The Process Gas Delivery System is designed to provide uniform precursor coverage The gas enclosure lid has an interlock that seals the gas isolation valves to disable flow of precursor gases when the gas enclosure is open The gas enclosure can be opened by unlocking the two black turnkeys using a coin then the lid can be opened at the right side using its hinge on the left em BAY A A i Kl N V A UJ i V DAX 8 AER T Gas Enclosure
35. rchase order accepted by SVT Associates shall be subject to the following conditions A The CUSTOMER must make notification to SVT Associates within thirty 30 days of original shipping date B A RETURN GOODS AUTHORIZATION number must be assigned to and accompany all goods or materials being returned by the CUSTOMER to SVT Associates SVT Associates must assign said number prior to any and all returns Goods not accompanied by a RETURN GOODS AUTHORIZATION number will be refused by SVT Associates and returned at the CUSTOMER S expense C CUSTOMER shall prepay shipping charges for products being returned to SVT Associates SAAT PROPRIETARY INFORMATION SVT Associates Proprietary Information 2014 SVT Associates Inc All Rights Reserved Page 33 of 34 Engines for Thin Film Innovation 7620 Executive Drive Eden Prairie MN 55344 3677 USA Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com ALD Model 503 Version 1 0 4 14 D Products being returned to SVT Associates should be properly crated for shipment and the CUSTOMER shall bear the risk of loss until delivered to SVT Associates E Products being returned to SVT Associates must be returned in the condition originally received by the CUSTOMER and free from damage use or modification which would render the product unusable for resale by SVT Associates F All applicable taxes duties insurance and shipping charges shall be t
36. rings for the Growth Chamber is sealing Make sure the carrier gases are ready Heat up the Bubblers Depending on precursor volatility a bubbler sometimes has to be heated to certain temperatures to get sufficient vapor pressure 1 Torr Example Hf precursors that require bubbler heating include TDMAH TEMAH and TDEAH You should monitor the key properties such as working temperature decomposition temperatures and maximal ALD growth temperature of the precursor used Parameter recommendations may be found in the literature Make sure the thermocouple of a bubbler heater has good thermal contact with the bubbler and has good measurement stability and accuracy so that the temperature readings are real Ensure the working temperature never goes beyond the decomposition temperature In addition when heated it is recommended that you keep the precursor constantly at or slightly below the working temperature as this minimizes the thermal cycling of a precursor to avoid degradation select an ALD Mode of Operation The ALD Model 503 can be operated by using thermal ALD in one of two modes of operation 1 Regular or Dynamic mode with continuously flowing carrier gas and pulsing precursor chemicals while continuously pumping 2 Soak Mode for very high aspect ratio structures Soak mode involves pulsing a precursor with the exhaust valve closed to allow sufficient exposure and saturation of all the surfaces and then opening the valve to pump purg
37. rnkeys using a coin and then the lid swings up from the bottom using the hinge at the top The electronics enclosure lid does not have an interlock Electronics Enclosure Control Electronics 1 The electronics enclosure houses control hardware for the ALD system This hardware includes a National Instrument Compact Fieldpoint connected to several more specialized analog and digital modules Power Electronics 2 The electronics enclosure also houses the electronics to deliver electrical power to run the control electronics heaters and valves for the ALD system Feedthroughs 3 Cables and wires are fed from the console into the electronics enclosure through these feedthroughs D zm mm mm om wm mm mm zen Jan we A wm wn Electronics Enclosure Fan 4 The electronics enclosure fan is designed to prevent overheating of electronics by continuously introduce room temperature air AS shown here the intake port is on the bottom surface of the box located to the right of the power electronics D ei a Ka P a gn Kai Var em Emergency Stop Switch In the event of an emergency you may quickly shut down the ALD system by using the emergency stop switch As discussed previously in the safety section of this manual the Emergency Off Switch halts flow of process gas and quickly shuts down many parts of the ALD system to allow you to safely deal with the emergency and return the ALD system to operation
38. ssociates Inc All Rights Reserved Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com Inc ALD Model 503 Version 1 0 4 14 Page 30 of 34 Engines for Thin Film Innovation PROPRIETARY INFORMATION ALD Inside Chamber Detailed Diagram Gas Inlet Ports G Inner Chamber 500 mm Dia x 900 mm REMOVE ALL BURRS AND BREAK SMARP EDGES 0 010 MAX SVT ASSOCIATES TO IN WAITING 7620 Executive Drive Eden Prairie MN 55344 3677 USA Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com ALD Model 503 Version 1 0 4 14 DESCRIPTION OH Rack a Insulators Wem R E V ISIO N S APPROVED Hecter Elements gt Mounting Rack Pumping Electrode Thermocouple Feedthru SVT ASSOCIATES PRODUCT DEVELOPMENT DIVISION 7620 Executive Drive Eden Prairie MN mE BACK ISOLATION INNER CHAMBER DWG NO weHt SHEET 1 OF SAAT SVT Associates Proprietary Information 2014 SVT Associates Inc All Rights Reserved Page 31 of 34 Engines for Thin Film Innovation PROPRIETARY INFORMATION ALD Chamber Exploded View APPROVED ay S Wer Chamber Exploded View SHEET 1 OF ive Eden Prairie MN REVISIONS ecutive SVT ASSOCIATES PRODUCT DEVELOPMENT DIVISION ive Dri iri DESCRIPTION 7620 Ex Heater Elements Front and Rear Inner Chamber Inner Chamber Lid A 40 030 XX 40 010 XXX 0 005 MACHINED SURFACE POSTON
39. ssociates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Reserved 7620 Executive Drive Eden Prairie MN 55344 3677 USA ALD Model 503 Version 1 0 4 14 Page 5 of 34 Engines for Thin Film Innovation LL LL 7620 Executive Drive Eden Prairie MN 55344 3677 USA Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com ALD Model 503 Version 1 0 4 14 Loosen the VCR sealing cap in a chemical hood with proper vent system Ideally there should be a gas sensor nearby to check whether the bubbler is leaking Transfer the bubbler to the ALD gas enclosure connect to the ALD fitting and tighten the connection Make sure the line between the ALD valve and the bubbler is purged by opening the ALD valve for a short period of time before you open the manual on off switch assuming the system is under vacuum If the base pressure is not recovered and is higher than the original point there could be leakage from the bubbler connecting area When disconnecting a filled bubbler from an ALD valve make sure to wear proper mask or respirator clear the ALD area of irrelevant personnel double check to make sure the manual on off valve on the bubbler is closed tightly before loosening the VCR fitting purge the line between ALD valve and the bubbler to remove any residual precursor in the line loosen the connecting fitting and cap t
40. www svta com ALD Model 503 Version 1 0 4 14 General Health and Safety Concerns Normal operation of the Atomic Layer Deposition ALD tool is not dangerous and allows user to conduct deposition onto substrates in a safe and reliable manner To ensure that the ALD and its components remain under safe operating conditions the original ALD components should not be modified in any way Unsafe operation of the ALD may expose users to the potential hazards listed below Dangerous Gases Hazard The ALD operates by using pyrophoric and potentially dangerous precursor and process gases such as trimethylaluminium TMA The user must follow safe loading and unloading procedures to prevent self injury or damage to the ALD Low Ventilation Space Asphyxiation Hazard The ALD performs the venting process by flowing chemically inert and nontoxic nitrogen gas into a properly purged chamber While the system is designed to prevent delivery of excess nitrogen to the chamber in the event of valve failure then a continuously running stream of nitrogen can displace oxygen from the ALD operation area If sufficient oxygen is displaced then users may become asphyxiated or suffocated Ensure that the ALD is operated only in lab spaces with adequate ventilation and correctly configured exhaust lines f Electrical Power Shock or Burn Hazard The ALD uses high D C and 60Hz A C electrical power which poses a shock and or burn hazard if users contact powered leads w
41. y ebney Jaquieyy Jon 1101 Buipeay eBneyd jeu1 u Do dwa L YIMIH Do dwa Jejqqng All manifolds including precursor delivery lines and exhaust line should be heated to gt 100 C The outer chamber wall temperature should also be gt 100 C These exposure conditions for Al2O0 coating including pulse time pulse strength pressure and purge time for TMA experimentally determined and meet saturation conditions You may use them as a reference Adjustments of the recipe parameters are necessary depending on growth temperatures and individual systems SAAT 7620 Executive Drive Eden Prairie MN 55344 3677 USA SVT Associates Proprietary Information Phone 952 934 2100 Fax 952 934 2737 Email sales svta com www svta com 2014 SVT Associates Inc All Rights Reserved ALD Model 503 Version 1 0 4 14 Page 20 of 34 Engines for Thin Film Innovation PROPRIETARY INFORMATION Se LL es fe E Total Recipe Time TimeRemaining Total Steps Steps Remaining Iterations Remaining 02 18 46 00 00 39 49 60 CS ES E Description Begin Loop for 40 iterations H20 Carrier Gas sealing gas for 1 00 sec sealing gas for 3 00 sec Carrier Gas sealing gas PV for 100 00 sec TMA Carrier Gas sealing gas for 1 00 sec sealing gas for 3 00 sec End of Loop A sample recipe for soak mode ALD of Al2O3 in RoboALD program format As shown above the X symbol in a checkbox indicat
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