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xT Nova NanoLab User`s Manual - Michigan Center for Materials

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1. Rotation artes ie Ene TE PUE Dr pP Awe Pao eee eee 4 48 Dele CLOESu aside ode d ecd bob end Vien Sete M acr qb M ausos 4 48 VILI PNE c P 4 48 Navidation P IPOs eed ient iam UNE RE E ERR RAO 4 49 OVEN A m deles alae etras setate tene tns eA OD d 4 49 win u P C Vw 4 49 D tectols vade tek IE A SAA eee SES 4 50 vnu MP O A a S aa a 4 50 Patt rmino Ladera wna Ende ROLE ALES UM DE be ed fna 4 51 A et teed a a Gee ace Ste a eee dne 4 51 A eui t bE LS WS Led Saput es 4 52 Omar BG a canes ener isd Ante eee a nie Te eed eae 4 52 EA AA oa d OE e ee ee ee 4 53 End Point Monitor EPM o ooooooooooooo ooo eee eee 4 53 Processi Paneis ind oikg Didi A Bust tee ee 4 55 Measurement Annotation 0 0 0 00 00 ccc ccc eee eee 4 55 Digital 7O0ie ii deii ee aree een eae eee ees 4 56 Enhanced AAA 4 57 Detector Pace uus posa he ie A ES oe ee aes ea 4 59 Detector Scala pla he ea Se 4 59 Charge Neutralizer scx A ae BSS 4 59 Sample Preparacion Pape caidas reed 4 60 Rate ernan a AA dd 4 60 PEO CSS acordo ros ira da brad 4 61 Sii A d Ka tudo ee E E ers See ei rine E deta Te Petts 4 61 Gas ID echon e 6 4 E sa tano A eee Sess 4 61 Alonen Pace ed quio GE d aa tke eda A haat 4 63 AN OMMEMS os eor ESA we E 4 63 TSE HORS par obe T RUP Gaon rons iros 4 63 INDUSEE Ds ate A E Mata ta beg 4 63 Alignment allocation bs a URDU 4 63 Sr Ar 4 64 Status Module riera RR ks bok ee Hed Sw Pak SERE aS 4 64 Entero Commands
2. 0 000000 eae 8 29 Auto SKV SUD aii A eet ER Es 8 29 Other Patterning Options 0 0 0 00 cece eee 8 30 Milling the Sample 4 aia tede des 8 31 Viewing the Cross Sections epi a ii ee eee S 8 32 Exitino the PLOT is A a ew a ok MR 8 32 TrOubleshOOtUn voiture he ee bel He ede eee vedo qu 8 33 Auto TEM Wizard Software 0 0 00000 8 34 IMtrOdUCON cet AS ae Rees eee ake ek ee CER 8 34 Paes s caesa b Ate oe ae nae aide eed d dade 8 35 Auto EVE TCT rra oen e ped Cosi De ona eee ween 8 35 IV IMT OS A O EEE eae 8 35 EL Image Recoon Oese riea aa EE AO Ed qa tres es 8 38 Sample Definition Process citan DR RUSO E opus 8 39 Eucentric Hero DE dae rtc Oeo e Gosia Rer d ded uA 8 40 Ronnie Auto TEM ia a a ed ida 8 40 Membrane SCD ride ERE EROR CSS Gees id 8 40 Sample MINO ad ace dose e 8 45 Running the Data File from RunScript oo oooooooooooo 8 45 Running the Data File from AutoFIB o oo oooooooooo o 8 47 Sample Wiles cerrada ida dto 8 49 SCPE Variables nea ete e d e pt as V guy ane wu eo eee ees 8 51 A A A A Shen ete a 8 55 TroubleshoOHBl9 prioras iaaa do E Ste inset 8 58 Selective Etch SO Ware 24 402 td ote dye atada 8 60 How Selective Etch works llle 8 60 Ssample HolderS cria adobo dsd eee ae 8 61 Sample Vise on dba a 8 61 Chapter 9 ALIGNMENTS ON MiS AOS A Ata 9 1 General description and structure 0 0 0 0 cc eee 9 Electron Column Alignment
3. 4022 262 61641 WORKING WITH NOVA NANOLAB Taking a Photo Taking a Photo Scan Beam Patterning Stage Tools Y Pause FE Snapshot Fhoto F2 Vicdeoscope F3 Reduced Area re Full Frame Ctrl M Spot Line External Beam Blank Ctrl B Slow Scan Ctri 5shife Fast Scan Ctri 5hift Slower Scan Sinise Faster Scan Cole Mains Lock v Live Average 6 frames Integrate 1 frame 3 Scan Rotation Shift F12 Preferences Col a Photo Setup This facility like Snapshot can also be preset in Preferences Scanning Slower scan rates will be most generally used with this image capture method To Set up Photo for and E beams Make the destination of the to be saved files available to the Save routine in the File menu by opening a folder and saving a test file to it Open the Preferences for Scanning Select the Photo scan preset from the dropdown list at the top of property editor Make adjustment to the Property Editors Select a suitable long dwell time from the Scan Selection in Scan Preferences by dragging the Photo camera icon to the required value or by selecting from the DWELL TIME property editor of the Scan Presets e Select a high pixel resolution from the RESOLUTION property editor of the Scan Presets e Select the ACTION property for either Save or Save As Save Prompts the Save dialog and displays the next increment with the last set
4. gt Preferences v Live Average 4 frames Cm i np eo Shitt F 12 Colo Integrate 256 frames Humber of Frames e Live V Average 4 frames Integrate 256 frames Number of Frames USER INTERFACE Scan Menu Line When Line is selected from the Scan menu the image freezes and a green horizontal line displays on the screen The beam scans along this line using the line time defined for the selected scan speed When you choose Line the cursor changes to an arrow Move the cursor to the desired vertical position and click the left mouse button External External is a switch to activate external control of the scanning system such as beam control from an EDX X ray system Slow Scan Clicking on Slow Scan will bring the scanning condition to the preset value held in the Preferences Scan dialog Fast Scan Clicking on Fast Scan will bring the scanning condition to the preset value held in the Preferences Scan dialog Slower Scan Clicking on Slower Scan will bring the scanning condition to the next slower scan value held in the Preferences Scan list dialog This can be also achieved by pressing Crtl Faster Scan Clicking on Faster Scan will bring the scanning condition to the next faster scan value held in the Preferences Scan list dialog This can be also achieved by pressing Crtl Mains Lock Clicking On Mains Lock will synchronize the mains frequency to
5. 4022 262 61641 HARD amp SOFTWARE OPTIONS Script Variables TABLE 8 20 RECIPE FILE PARAMETERS Variable Name Boda dH Value Purpose confirmcutout RunScript only If confirmcutout 1 then a confirmation from user is requested to do a cutout in step 5 If confirmcutout 0 no user confirmation is requested if matching succeeds Normally confirmcutout 0 in RunScript In AutoFIB mode a confirmation is never asked This value also appears in each data lt n gt ini If docutout 1 then attempt the cutout step 5 if the thickness range is correct docutout If docutout 0 the wizard stops at the cutout step 5 and exits go to next sample if AutoFIB This value also appears in each data lt n gt ini Default target thickness see TABLE 1 Location Parameters targetthickness This value also appears in each data lt n gt ini Minimum allowed targetthickness in edit dialogs Maximum allowed targetthickness in edit dialogs usestagerotn Default stage rotation usage see TABLE 1 Location Parameters This value also appears in each data lt n gt ini Initially 0 it is set to 1 once the cutout step has been done This value also appears in each data lt n gt ini startatcutout If startatcutout 1 the cutout step 5 1s done next 1 e the sample already has the correct width This value also appears in each data lt n gt ini Rethin 1 means starting partway through bypass deposition step 1 and r
6. Clicking on the Window name in the Menu bar with the left mouse Window Help button opens the Window menu This can also be achieved by Center Cross Shift FS pressing the AIt W keys Alignment Rectangle Shift F6 CCD 5 mm Marker Center Cross CCD Axis Marker Clicking on Center Cross places a cross in the center of either the Crosshair Cursor single screen or each quad depending on the display mode selected Redo digital zoom 1x This can also be achieved by pressing Shift F5 keys This function is used in the Adjustment procedures to aid centering of features singlefQuad Image Mode F5 Alignment rectangle Clicking on Alignment rectangle places a staggered rectangle in the center of either the single screen or each quad depending on the display mode selected This can also be achieved by pressing Shift F6 keys This function is used in the Adjustment procedures to aid controlling illumination CCD 5 mm Marker This places a short horizontal lines with arrow onto the optical beam quad This is to indicate the 15 mm FWD position in relation to the Z distance of the sample The position of this marker can be changed by double clicking with the left mouse button on the desired position CCD Axis marker Displays x y and z axis in the CCD quad CrossHair cursor Clicking on Crosshair cursor changes the mouse cursor into a crosshair cursor The crosshair cursor is useful for aligning patterns or feature
7. Scan Rotation ei o Detectors Contrast Brightness Status specimen Current 39 15 nay lon Beam Current 214 nA Rotation The SCAN ROTATION adjuster is a Preset continuous control adjuster to give access to set rotation angles as well as a variable angle values Detectors Contrast Use this adjuster to control the contrast of the active detector Brightness Use this adjuster to control the brightness of the active detector The end arrows give a finer control The mini sliders below the main sliders give a linear control while the large slider gives logaritmic control Status The Status area is used for the feedback of parameter conditions as the system is being operated These parameters may change due to the application being monitored at any time It is found at the base of all pages m 4022 262 61641 Navigation Page Stage t Bulk Flip Tilt Correction Actual Sata x 0347 mm al ml 13 2735 mm 4 p g 4959 mm 4 m 20 vw il d 136 1 d Iv Compucentric Rotation Last Position 200 ag sird 2 Detectors Contrast status Qe amp USER INTERFACE Navigation Page Overview The Navigation Page is divided into modules Stage Detectors e Status The Navigation Page is a User level page It contains the essential components for navigation Stage The Stage page 1s divided into three tabs 1 the Bulk stage 2 the flipstage Stra
8. remaining pattern time in a progress window 5 58 4022 262 61641 WORKING WITH NOVA NANOLAB Patterning Milling Order of Patterns Patterns are normally milled in the order they are created on the screen The order can be changed by focusing on the pattern you wish to change to a particular position in the order and click on the single arrow in either direction to come to the order number required To place a pattern at number one position click on the left double arrow while focus 1s on the pattern This will bring it to number one position For the last position click on the right double arrow in the same manner and the pattern will be made the last in order The remaining patterns mill in the order in which they were created You can also reorder the entire set by clicking on the patterns in the order you want them to mill FIGURE 6 34 REORDERING PATTERNS 4 Rectangle 1 Rectangle 1 Rectangle 2 Rectangle 2 Lina 3 Circle 3 Circle 4 Linel 4 Rectangle PATTERNS ARE IN CURRENT ORDER PATTERNS ARE REORDERED BY CLICKING ON THE ARROW BUTTONS WHILE FOCUSSING ON A PATTERN Numbers display in the upper left corner of the rectangular patterns left side for lines and center for circles to indicate the current pattern order 4022 262 61641 E WORKING WITH NOVA NANOLAB Application Files Application Files Application files are files that are used with gas types for particular patterning and each one can assign
9. Click with the left mouse button on the first point somewhere along the feature The coordinates are updated in the dialog Now drag the line out from the first point to the second point using the mouse The second coordinates update continuously till released by clicking again Click on FINISH to end the selection and for the program to orientate the feature to the selected horizontal or vertical Click on CANCEL to the function xT Align Feature Feature Position Align Feature PI X 18588 mm Y 24 725 mm Horizontal C Vertical P2 X 19094 mm Y 24 662 mm Move points by dragging them Cancel en 4022 262 52351 Stage Tools Window Help xT Align Feature Compucentric Rotation Define User Units Lleer Units Beam Shift Reset Zero Beam Shift Home Stage Home Apertures Home Stage Without Rotation Center Position Touch Alarm Enabled Dlink 2 te FWE Link 2 te AWE Enable Tilt map Tilt 0 Tilt 52 Sample Navigation Preferences Fl Shift F3 Ctr Shalit eS Ctri E Ctrl I Colo STAGES How to make Stage Movements Compucentric Rotation Clicking on COMPUCENTRIC ROTATION in the Stage menu places a green circle in the active quad At a point on the perimeter of the green circle is a green triangle which denotes by its position the angle orientation of the sample relative to its original position when placed on the stage To start with this will be at 12 o clock By kee
10. Clicking on SCAN ROTATION in the Scan menu places a large green circle in the active Quad with a small circle in the top right corner At a point on the perimeter of the large green circle is a green triangle which denotes by its position the angle orientation of the sample relative to its original position when placed on the stage To start with this will be at 12 o clock By keeping the left mouse button down on the green triangle it can be moved around the circle to choose a new orientation of the scan the small circle follows suit The computer software continuously updates the position orientation of the scan This creates a different orientation on the viewing screen but retains the scanning direction on the specimen The read out positions displayed at the bottom of the Quad provide information on the ACTUAL ROTATION original position in degrees the TARGET ROTATION the selected position in degrees and the ROTATION CHANGE the difference in degrees of rotation FIGURE 6 18 SCAN ROTATION Scan Potation Scan Potation 90 Actual Potation 0 Target Rotation 90 Potation Change 90 Clicking on or close to the numbered angles around the perimeter of the circle will cause the beam to drive to that angle and the green triangle will update on screen on both circles The smaller circle in the top right of the Quad remains on screen when Scan Rotation is switched off if the angle is greater than 0 degrees to
11. Determines whether the stage rotation value 1s saved in the data file Set to 1 to save this value Set to 0 if rotation is not necessary for sample placement In some cases backlash in the stage can cause small positioning errors when the rotation value 1s saved The thickness of the deposition layer in um Depositing a Grounding Layer Next the AutoTEM M Wizard deposits a very thin platinum grounding layer over the area of interest This layer can improve image recognition in areas where there are topographical and material differences across the width of the membrane 4022 262 61641 843 HARD amp SOFTWARE OPTIONS Sample Definition Process lembrane Definition Succeeded The script file for this sample is datal ini twill mill the sample when run with RunScript or from amp utaFIB using script data998 sct AutaFIB and data998 sct can also be used to run multiple samples Choose Next sample with Same or New recipe Run sample now or End setup New Run Now End FIGURE 8 20 GROUNDING LAYERS Grounding layer Completing the Membrane Setup When you have completed the setup for each individual membrane the system displays the Membrane Definition Succeeded dialog box Press SAME to continue the setup process and define another membrane with the same recipe Press NEW to continue the setup process and define another membrane with another recipe Press RUN NOW to start milling the membrane immedi
12. Tips for X and Y Corrective Movement Source tilt Alignments may require some corrective movements in X anY direction at the same time This 1s simplified by X and Y being represented as a 2D Graphical adjuster When the 2D box is clicked on and the left hand mouse button 1s held in a cross hair shows on the screen with a small 4 ended arrow cursor located in the center By moving the mouse the cross hairs move and therefore affect the image as required Due to the fact that the probe rotation correction is switched off automatically in some alignment procedures the X and Y movements may not always appear to be in the same directions NOTE Do not use Beam Shift at any time during the adjustment procedures other than where specified as this may be set to zero value at each section and extra movement can offset the zero condition All movement of the specimen can be made using the stage either mechanical or motor driven where appropriate How all software alignments are described At the beginning of each alignment with the exception of the Aperture Alignments there are the following e An Outline of the Function What it does Field Functions A description of the field functions found on the pages The Procedure in Steps A step by step procedure for correcting alignment NOTE Text found in the Text areas of the alignment program may differ slightly from that found in the following written procedures The wr
13. n ACTUAL mode it is enabled only when a POSITION is selected in the LOCATION list Pressing the UPDATE button will store the coordinates under the currently selected position overwriting the old position without asking for confirmation Remove The REMOVE button deletes the currently selected item in the LOCATION list tis enabled when a position is selected in the Location List but only if this position is not LAST POSITION Compucentric Rotation If compucentric rotation is ticked the stage will operate to the computer defined centre of rotation and not the physical rotation centre 618 4022 262 52351 STAGES How to make Stage Movements How to make Stage Movements Wheel Up amp Down T Wheel Press gt Track The Track function allows continuous directional movement of the stage with variable speed The speed range 1s coupled to the magnification and selectable within certain limits Select the Track function by pressing on the Mouse Wheel while in an active Quad 1 3 or on full screen A Yellow enhanced Dot and Arrow appear onscreen The Dot will occur where the mouse command cursor was when the wheel was pressed and the Arrow will denote the direction to move The speed will depend on the distance the Arrow is separated from the Dot The direction can be changed by moving the mouse in a circular motion to obtain the correct traverse The movement axis center will depend on the initial posi
14. Clicking on the DETAIL tab will display the characteristics of the active Gas Injector The characteristics can be changed by entering the details to configure the injector m 4022 262 61641 Alignments Page Alignments h Emitter startup 10 Source Tiltand Shift 11 Automated Source Alignment 13 Stigmator Alignment 17 Stage Rotation Centre 3 Auto Zero detectors q4 UHR Lens Alignment 4 UHR Stgmator Alignment 43 UHR Image Shift Correction 45 HA Image Shift Correction 100 s acuum Start IGF s 10 lon Column Alignment 593 Supervisor lon Beam 254 Supervisor GIS USER INTERFACE Alignments Page The Alignments Page is divided into modules e Alignment e Instructions No Step e Status not seen here The Alignments Page is used to align the columns and determine fine tuning for the electromagnetic system The software stores column parameters such as Gun Tilt X Y Gun Shift X Y and other data that ensures minimum image shift when focusing and stigmating images When you click on the list box arrow various available adjustments are displayed Alignments Displays the list of Alignments available to the Supervisor Instructions Displays key procedural information for the alignment Step in operation No Step Steps range from 0 and indicate the actual step position during a alignment procedure Alignment allocation The Alignments are not in procedural order
15. Mode Secondary Electrons y Sri 240 D ESESENSNENNNNDS Blas 25 Hu Un El Gain 1 78 Adjuster Grid Bias CDEM Option The Continuous Dynode Electron Multiplier CDEM is a charged particle detector mounted near the end of the 10n column The CDEM and pre amplifier collect and convert secondary electrons or ions to form a imaging signal FIGURE 6 13 CDEM DETECTION CHOICE Detector Settings Detector COEM y Mode Secondary Electrons y EH secondary lans Custom Blas El Gain CDEM Custom settings Clicking on Custom mode will display the sliders for adjusting Grid Bias and Electrical Gain to vary the custom mode of the detector The Electron beam and lon beam modes have their separate Detector modules distiguished by the beam indicator for Electron or Ion All changes made can be visualised in live time except while Patterning the detector responds immediately Changing aperture or spotsize using the menus or custom controls affects the contrast of the secondary particle detectors Contrast 1s reduced automatically when you change the aperture to a larger beam current TABLE 6 3 CDEM DETECTOR SETUP GUIDELINES Sec lons Sec Electrons Corresponding Voltage Range Voltage Range Hardware 0 to 150 V 0 to 4250 V Front End 0 to 2500 V 0 to 150 V Front end voltage Custom effect on Beam Shift Large changes to the custom conditions on biased detectors such as the TLD ETD
16. avi Name of the tif files contains generic filename quad name numeric seed and number of the image in the series For example myvideo Quad2 003 00123 tif The series number has always 5 digits filled by zeros on the left the first Tif file has number 00001 File name Enter here a generic file name valid for the next video recording A suitable file name must be entered here if this field is not filled the Movie dialogue can not be closed Save in Enter a suitable path to the directory If this field is not filled the Movie dialogue can not be closed If the path is long and cannot be read in the field space the Tool tip can be used to give full information Numeric Seed Enter any number to 999 which is converted to the three digit form with zeros on the left if necessary Video file size This value specifies the maximal size of video file in MB Enter a size value lower than 2000 MB After reaching this size the video is saved and a recording is started If this field is not filled the Movie dialogue can not be closed A dialogue warning appears if there is a Out of Memory condition with the Hard drive File type List box with types of supported digital movie formats Only compressed formats are used Record databar This checkbox allows the databar to be included in the video when checked The databar in the video is updated every second 4022 262 61641 545 WORKING WITH NOVA NANOLAB Movie Procedure
17. nun AL dialog box displays dedicated to the subject chosen Record Movie Import k Export Stage Fositions FIGURE 6 31 EXPORT SAVE AS DIALOG Patterns Print Ctrl F End Point Monitor Graphs Log OFF Factory Anmotatians 3 Exit Measurements save in E OEREN eE My Pictures nave as type Stage Fasitions stg Cancel Z Enter the file name to be exported locate the destination and click on the SAVE button The file will be exported and all dialogs disappear 4022 262 61641 E WORKING WITH NOVA NANOLAB Patterning Patterning Patterning is the process of milling depositing or etching a pattern into the sample surface with the beam During patterning the selected beam unblanks automatically and uses digital beam placement to vector scan over a pattern While patterning can be done with either beam the electron beam is generally used for imaging and sometimes for deposition with patterns The ion beam is used to cut cross sections and tracks drill vias and deposit new material In general patterns need to be cut as quickly as possible while maintaining sufficient edge resolution and preventing potentially damaging charge buildup During deposition the beam is unblanked and a Gas Injection Valve is opened to begin deposition Multiple Gas Injection Systems GIS may be installed on your system You select between milling Pt deposition Enhanced Etch etc by selecting an application file for
18. Action Press the Start button Alignments 39 Auto Zero detectors d Finish Instructions 2 Click on the detector AutoZero button for the appropriate detector Repeat for each detector Click on the Finish button Auto zero procedures Press Autozero to start the auto zero algorithm for the desired detector step 1 of 1 STEM AutoZero AutoZero COEM AutoZero AutoZero Cancel m 4022 262 61641 ALIGNMENTS 5 Emitter Startup 5 Emitter Startup Alignments FEI Trained Supervisor SEM Alignments This alignment should only be operated by a FEI trained Supervisor Instructions This alignnment starts the Alignment 5 Emitter Startup allows the Electron Source to be e Q switched On or Off In the case of restarting the Electron Source after an emergency shutdown this function first provides starting of the IGP Ion Getter Pump to pump the Electron Source vacuum if necessary 5 Emitter Startup Procedure The 5 Emitter Startup procedure starts here TABLE 9 33 5 NO STEP Alignments 5 Emitter Startup Press the Start button Order Action Instructions Press the IGF On button to start the pumps Wait until the Wacuum status is OK Press the Mext button to continue with Emitter startup or Cancel ta quit TABLE 9 34 5 STEP 1 OF 2 Order Action step 1 of 2 2 If the IGP On button 1s not accessible click on the Next button If it is accessi
19. Add new user x Username Password Confirm password Group Full name Description Ann A ans nvohiensasse J Password never expires Accountis disabled Remove Del click to remove an existing user The user must be J highlighted first Are You sure to delete user supervisor re i A If an FEI Microscope User has user data the account administator is warned that user data will be removed also If any additional user is to be removed that additional user s data is removed without warnings A Are you sure to delete user hugo Liserdata wil be removed xp Set password click to make a password for the user The user must first be highlighted in the tree MEE d A An FEI Account Administrator can change the password for any New password user from a lower level account The password has to be confirmed Confirm password twice Cancel X Set user group click to set the group for the user The user must first be highlighted in the tree When confirmed the user is moved to selected group When moving a user from the FEI Microscope Users group to the FEI Non active Users group his user data will be removed A warning is displayed in this case Username supervisor FEI Supervisor Users Setgroup m 4022 262 61641 FEI User Management Account properties x Username hugo FEI Microscope Users Full
20. Directory Contains Ao log imadgeD00 bmp imadge001 bmp iImaqel02 bmp c Local Disk Y 3 Program files 3 FE Se Images Image prefix image canal 4022 262 61641 s A procedure for using Auto S amp V is provided below All steps are optional Preparing the xT Dual Beam System Per normal xT operation load the sample navigate to the feature of interest and center it in the field of view Set the sample to eucentric height tilt the stage to the desired setting usually 52 and ensure that the ion and electron beams are coincident Ensure that image shift between ion column aperture settings 1s minimized Optimize electron beam imaging conditions such as accelerating voltage detector selection contrast brightness focus and stigmation If you use Mode 2 UHR you may need to re establish beam coincidence due to electron beam shift between search Mode 1 SRH and ultrahigh resolution Mode 2 UHR Mode 2 UHR is recommended for normal Auto S amp V operation Adjust the magnification for each beam Set the ion beam magnification so that all patterns are within the field of view Set the electron beam magnification so that the entire slice area is within the field of view if otage Tilt Auto S amp V is designed to run with the stage tilt at 52 but you can also run it at other stage tilt settings for example with pretilted samples Before running Auto S amp V set the stage tilt to the desir
21. In Quad 3 Mix 3 the Source 3 controls are disabled mI 4022 262 61641 Detector Page Detector settings Detector ETD y Mode EESTI Grid Voltage Default Grid Voltage Charge neutralizer Beam on Filament current Grid voltage Beam energy JB ew EN H Beam current USER INTERFACE Detector Page The Detector Page is divided into modules Detector settings Charge Neutralizer Detector settings The Detector Page is a User level page It contains essential components for selecting a detector change its settings and also contains an option function for controlling the charge neutralizer The selectable detectors for Electron beam and Ion beam operation are listed in the Detector list box Clicking on the list box arrow will show the available detectors for either the Electron beam or the Ion beam It also will activate the mode selection for imaging Depending on the beam mode in operation only the relevant detectors and mode will appear in the list The default setting for both Electron beam and ion beam is the ETD detector Customizing settings Customizing a detector can be done by selecting from the drop down list All the default operating modes are with the selected detector and mode The customized value will be reset when another detector mode is selected It is possible to mix 1st and 2nd and 3rd Quad detector signal in 3rd or qth Quad by choosing Mix in the Detector m
22. Movie Procedure Start Pause and Stop The RED dot is the start command button that starts the recording of three videos one for each of the three image quads at the same moment If a quad is paused when starting the video only the first image with a time stamp is stored When the quad is paused during the video recording storing of the video frames is interrupted but the video streams keep synchronization for the next unpausing After reaching the maximal file size the video is paused saved and a new video is started with the same name and incremented numeric seed When the Red dot representing Start is pressed it turns to a Black square representing Stop When pressed the Black square then stops the recording of the video of all three quads and closes the files Recording a Movie The following procedure describes how to set up and record a movie TABLE 6 17 SET UP AND RECORDING A MOVIE Action Select Preferences at the base of the Scan menu Click on the Movie tab In the Timer section check the AVI check box and select from the Delay time combo box the desired time Select the TIF function by checking the TIF check box 1f required and select from the TIF combo box the desired time In the File section fill in the File name and give the Save in directory path Fill in the Numeric seed value and the Video file size Select the File type and choose whether the Databar need be recorded with the Record
23. Or weet Ree AAS eke eek ae ee IBS Bie ke 9 13 dA ES 2 OR S A dao Mapes an artes torte te at nee plains an tod A tetas ats 9 14 ASTEROIDES Re wees 9 14 dd ol page OP ae O RP ae acer ge ace Re a OT uU eee meee aoe 9 15 A STEP SORS diss ote e ett S x CE MUS 9 15 A SS SIE Ed e Ei ae vae eedem dde 9 16 SO No enu 9 16 AZT SUEY ORO ed id a hie ed E dade aaa Meee ae 9 17 EL dS LEPS3 andd OF O48 sedent ice tapenade her oo og o arn 9 17 ADS EP OP es tts atest ale eet ay alae hoe Se eee ae ee ea uud 9 18 42 STEPS QE Ou weoets Xa up VIS NS ake ERA e epic det d quee 9 18 AS INOS TERY a a uS Le ba dd ane 9 19 E sae ESSE ATDRAASAISSQEXODASILEOSSE VEM 9 19 ASS EZ ORO 5 dos Met dicii depono bate des ln OR eU dc 9 20 AS OLE SD TO I caste PE ub dq ass S Esa ii ees 9 20 2 NISI FOR Dm 9 2 dos DEDE aene a o Ge Racca dene eke eed eee ee hee aay oes 9 2 AS NOS EV is 9 22 A A rrr 9 22 ASS LER SD NO Soden ee di akong Hate weeks eae eee edad 9 23 ZNO S EE OO bort ave dedo qu uc itat we Pile deste uu usd stunt 9 26 DANO SPER sc aul race a v S ca teens 9 27 S4 LEP VOR 2 a4 caow bated pm oe fetes e vede db Ee qui or Bae ico 9 27 SOLE JOR Janta a oat rra Oe 9 28 FELD NAME AND STATUS uS ieren eo dedos EN 9 28 Io INOHST erea acu aee ire Canes nate were ate goa es der 9 29 Io EP WOR rv TED 9 29 AA A betta rau waver arate are fut 9 30 NOSTE P tarea e oe Eds e LA ae 9 31 E A obeiced ae erhet ceed eae ERM 9 3 A A PDT 9 32 Dy STEPS O
24. The beam axis and the feature of interest should intersect at eucentric height Notice how the sample is not at eucentric height when it is below the eucentric point You could focus on the feature but as seen in b the feature would move during tilt Feature moves into eucentric height and into focus e A LX d 4 O a 2 DIL Z adjustment Adjusting the Z axis when the stage is tilted moves the feature of interest back into the field of view It normally also brings the feature into focus provided that the beams are focused to the eucentric point Beam Eucentric height Tilt Stage 15 When the sample is not at eucentric height tilting the stage moves the feature of interest out of the beam Beam Feature is at eucentric height Now whether the sample is at any tilt angle the feature of interest always stays at the focal point of the beam 4022 262 52351 69 STAGES Finding the Eucentric Height Finding Eucentric Height For many samples other than wafers or for greatest accuracy use the following manual procedure to obtain eucentric height Eucentric height requires an E Beam working distance of approximately 5 mm TABLE 6 1 FINDING EUCENTRIC HEIGHT MANUALLY Action On the Stage menu select ZERO BEAM SHIFT If the small yellow cross 1s not already displayed in the center of the screen press Shift F5 to display it Make SEM image live Set stage tilt to 0 Focus using MUI or rig
25. application layer controls the column detector s stage EDX and vacuum functions This layer also provides management of image capture storage and data output devices A Manual User Interface MUI offers additional flexibility for controlling magnification beam shift focus contrast and brightness and stigmation Computerized Stage A computer controlled 5 axis stage offers fast repeatable and precise sample manipulation Two versions are available e 200 50 x 50 mm e 600 150 x 150 mm Optical Camera A low magnification optical image obtained with the Optical Camera assists in overall spatial orientation on highly repetitive or extremely irregular samples It also aids in positioning gas injectors on packaged IC parts or other non uniform samples Supervisor and User Log on The SUPERVISOR and all USER level accounts run under the same Windows 2000 account and are the only types of account available to the customer under normal circumstances Refer to Chapter 3 for Start up and Log on Log off a 4022 262 52351 NanoLab Options SYSTEM OVERVIEW NanoLab Options A range of hardware and software are available as options for xT Nova NanoLab workstations This range will be extended when new items become available Some of the options are Gas injectors Detectors CDEM STEM 1 FIB Software Options AutoFIB Auto Slice amp View AutoTEM Sample holders UMB Universal Mounting Base sample holder
26. for large adjustments single step increments end arrow fine step increments These adjusters always have a label in the upper left and right corners for readout information High voltage io y soy Preset Continuous Control Adjusters This special control is used for values that have both a continuous range and a list of presets such as E column HV It is used on the cid Beam Control page The button on the left side of the adjuster 500 kv toggles between modes 10 00 Es 20 00 k 30 00 ki e High voltage High oltage 5 00 ki Two Dimensional X Y Controls These two dimensional continuous controls are represented by an X Y box The position of the crosshair is related to the actual settings source tilt Source tilt the full range of the parameters being represented by the perimeter of the box Click and hold down the left mouse button in the grid to display a D crosshair in the image area The cursor changes to a 4 axis cross and can be moved in four directions that correspond to the X Y screen Ticked Unticked values To fix the values release the mouse button and the position of the crosshair updates The sensitivity of the X Y control can depend on the magnification chosen At higher magnification you may click z rae on the center square with the right mouse button to open a dialog ens Alignment source Tilt showing a choice of Coarse Fine Zero Clear Memory and Auto Alignment Zero will bring the 2D
27. highlighted Click on FLOW and the GIS will open In normal operation the GIS will be opened automatically when the patterning is started if an application file with a gas type 1s chosen The GIS is now in operation and is either depositing or etching depending on the GAS TYPE chosen from the Pattern PROPERTY EDITOR m 4022 262 61641 WORKING WITH NOVA NANOLAB The End Point Monitor EPM The End Point Monitor EPM End point Monitor Graphs Options Scaling 1542 8 pA End Point Monitor Graphs Options Scaling Active Lived w Activel ved Mo woosoo0so DashDot Name Line Color Line Type Visible Cua Tian Add To History End point Monitor Graphs Options scaling X units im Method Autozoom X axis Min Max log pp 5903 Y axis M log jo 28359 The EPM The End Point Monitor gives visual feedback as to the progress of a milling process This device can be activated to start when patterning starts stop when patterning is paused and restart when patterning is continued Graphs The GRAPHS tab illustrates in live time the cutting depth progress monitored by specimen current This means the milling progress can be observed as a colored graphical display Options The OPTIONS tab allows selection of any number of milling processes being monitored to be graphically displayed FIGURE 6 37 EPM OPTIONS End point Monitor Graphs Options S
28. showeditfirst Used during setup If showeditfirst 1 the edit dialog is shown before graphics of the sample Normally showeditfirst 0 cutbottom l If cutbottom 1 the bottom of the U will be milled in the cutout step 5 cutleftside l If cutleftside 1 the left side of the U will be milled in the cutout step 5 cutrightside 1 If cutrightside 1 the right side of the U will be milled in the cutout step 5 The width of the legs of the U cut in step 5 The distance of the tips of the U to the surface in step 5 1 4022 262 61641 HARD amp SOFTWARE OPTIONS Initial Use Initial Use Before using AutoTEM Wizard for the first time follow these steps NOTE FEI Customer Service ordinarily performs this procedure during installation Start RunScript Load the workspace file TemCalibrate wsp With buttons 1 6 various calibration routines can be run These are e 1 setconfiguration psc In this script the following parameters can be viewed or set dualbeam 0 FIB 1 dualbeam ioncolumn 0 prelens 1 magnum 2 sidewinder deltac not used value 0 beamcheck not used value 1 usemillcheck not used value 0 donotmatch 0 off default 1 active for simulator use The values can be written to registry automatically Press Play to view edit the parameters e 2 setcalibration psc In this script the following calibration parameters can be viewed edited detscaler contrast brightness correc
29. still running but the ion source and both HT s will be turned off 2 Select tilt 0 Ctrl E from the Stage menu 3 Remove your sample if needed by the Load Lock standby sto p IH Serer state STOPPED xX Console devices Da Motion Imaging a Sta Ap Sry Stop Ul x Click Stop Ul to stop the xT Microscope User Interface Double Click the Blue progress bar Click Stop to stop the server Wait until the xT microscope server stops then click the Standby button on the front panel of the system standby start Ul stop LIT Advanced gt gt gt E On standby A O mr A Do you really want the system in Standby mode Vacuum and FES source remains On Select YES in the dialog box the system will go to m mw the Standby mode When Standby mode is selected in order to recover from a failure it is better at that moment to restart the Microscope PC before restarting the microscope 4022 262 61641 EJ SYSTEM OPERATION Startup After Standby Startup After Standby Startup It is assumed here that all external supplies are present The startup procedure is fully automatic TABLE 3 4 STARTUP AFTER STANDBY Action Press the Power ON Standby button on the front control panel of the microscope 5 XT microscope Server x Server state STARTING xX 2 Console devices i 3 n AMA Motion Imagin a iii BEN Stendby Lil State Open the microscope
30. will give the fixed drop down menu for MAGNIFICATION ZOOM By clicking on the item labelled MAGNIFICATION the magnification factor of the MAP area can be selected from a further drop down menu FIGURE 6 12 MAP MAGNIFICATION ZOOM Add current stage position Update to current stage position Remowe selected position Magnification Center view v Auto center an target Zero radarview The resulting multiple value is seen in the bottom right hand corner of the map area Scroll bars are present to move over the whole map area in zoomed condition Coordinates area Coordinates area displays a numerical layout for X Y Z R and T Position can be selected in a similar LOCATION list LAST POSITION 1s always present in the LOCATION list X Y Z R T Five editable text boxes are available for X Y Z R and T these are separately editable or can be filled from the selection made at the LOCATION list When any of the editable boxes are written to the tick box to the left of the parameter automatically checks to show that the value entered is a target value This functions irrespective of coordinate status Actual Target Relative Actual Mode This mode is used by the LAST POSITION which is displayed in the edit boxes The ADD UPDATE and REMOVE buttons are active The GOTO button is inactive Target Mode This mode becomes active when any stored POSITION is clicked on in the LOCATION list The GOTO button also becomes acti
31. 1 R le 1 in di l aeli When pressed in displays a black staggered line Basic Advanced surrounding the icon and hides the present selected pattern Application al al o Patterning Sequence Y size 14 81 pm l Tere 1 00pm Serial mills each pattern at a time in sequential DwellTime 1 00ps order EEGDENEEUDU eo aE pa Parallel mills all patterns at the same time Rel Int Diam 2 0 Je T pma mm When pressed in displays a black staggered line TotalTime surrounding the icon Progress a Total Time Overall Progress Bitmap Pattern SE EE From the patterning page a pattern is available that allows you to import Select All bitmaps as a pattern A bitmap file must be saved as a 24 bits bitmap Each pixels consists of a red green and blue component RGB The Red component is currently not used The Green component determines if the beam is blanked Any other value then 0 will unblank the beam The Blue determines the dwell time per pixel If blue 1s set 4022 262 61641 WORKING WITH NOVA NANOLAB Patterning to 0 the dwell time of a pixel will be 100 ns If blue is set to 255 the maximum UI dwell time is used The dwell time for the pixels in between these values is linearly interpolated based on the blue component value between the 100ns and the maximum UI value and than rounded to the value from a fixed dwell time table with 124 entries When drawing a bitmap it is recommended to use black 0 0 0 for
32. 150 mm T 10 to 60 R 360 continuous Stage door NOTE By default negative tilt is disabled by software interlock as this may cause a conflict with insertion of gas injectors To override the software interlock contact your service engineer Using Z height adjustment To set the specimen height and at the same time prevent any possibility that the specimen should touch the lens pole if the Z is increased can be done as follows e Load a specimen onto the specimen holder Adjust the Z so that the specimen is approximately 5 mm below the lens Close the chamber and pump down When the beam is switched on focus the sample and click on the i Z lt gt FWD button icon on the Tool bar The FWD will be eel recognized by the system as the value of Z in the Coordinates tab of Stage in the Navigation page Now the Z can be changed by the software interface control For safety move the stage very cautiously when approaching less than 2 mm from the lens 4022 262 52351 LA STAGES NanoLab 600 Stage Using Clamp The CLAMP function on the Stage menu provides an extra software controlled lock Use this lock when imaging at high magnifications gt 10 000 X Standard Sample Holders The NanoLab 600 stage has 2 standard holders and an interface piece for clamp holders such as the UMB Holder option The 200 and 600 stages have eucentricity and therefore need to have a Z prime position at a set he
33. 3 Position X 0 045425 m Position Y 0 006554 m Alignments 17 Stage Rotation Centre TABLE 9 43 17 STEP 3 OF 3 Previous Instructions Action Wait for the Stage movement to finish Wait for the stage movement to finish Click on Finish to save the procedure and exit or Cancel to leave the Alignment procedure and return to original settings Click on Finish to save the setting or Cancel to return to the original setting Step 3 of 3 Stage Tools Window Help xT Align Feature To make use of this feature during normal operation go to the Stage Compucentric Rotation FE menu and select Compucentric Rotation or press F12 932 4022 262 61641 ALIGNMENTS on Column Alignment Overview lon Column Alignment Overview Supervisors only This section describes procedures for Ion column electronic alignment for Supervisors only These alignment functions are displayed in the Supervisor Alignment Page Alignment 210 253 and 254 During electronic alignment image motion is minimized and beam stigmation and focus are adjusted for each of the ion beam apertures Additionally image shift is corrected as necessary When all alignments are done properly the image will stay in focus in the all ion beam currents if a sample is at the eucentric height and the feature should stay exactly under the central cross after each beam current change Before to start the alignment the sample should be at
34. 31 PRESETS PREFERENCES vj D teo e neces e ee YR Ge eek 4 32 SCANNING EREFERENCES cidade So IR PS NIE wit a De itn e 4 33 ARCHIVE OPTION FOR SNAPSHOT AND PHOTO 4 34 GENERAL PREFERENCES bees hc foe abate quies nent onus Maui AS 4 35 THE MOVIE TAB DIALOGUE 1 2h br PEORES 4 36 THE SENSITIVITY TAB DIALOGUE sirvent reurs ve is 4 36 THE TOBAR lt a tado ada aa aaa aaa Ree 4 37 TEDATA BAR sarrerei erea ennie id aaa wis Te 4 4 COEUNINICON JEQCGUO S uoti EA bara ett e storey Ae 4 44 PATTERN SELECTION CONTROLS 0 002 Re 4 51 PATTERN PROPERTIES CONTRO bs o tessa chine oie eR es 4 52 GAS INJECTOR OVERVIEW DETAILS sees 4 53 Vs AS O oC d Dao Suk ai oir hd Brean 4 54 EPM SCALING canst ot a ee vet se Rea ER Bed 4 54 MEASUREMENT FUNCTION ACTIVE RR RR 4 55 ANNOTATION FUNCTION ACTIVE 0 0 cece eee eens 4 56 ENHANCED IMAGE MIX FUNCTIONS 020005 4 57 PATTERN SELECTION CONTROLS 00 e eee eee 4 60 PATTERN PROPERTIES CONTROL essere 4 61 GAS INJECTOR OVERVIEW DETAILS eeeeeeeeene 4 61 WORKING WITH NOVA NANOLAB 5 STARTUP XTSPLASH SCREEN iio a a 5 2 RELATIONSHIP OF THE TWO COLUMNS 2 5 6 REQUIRED MATERIALS 000 is deg eee op eve Ge ipis 5 10 CLAMP THE ROW HOLDER ON THE TABLE 5 10 TEM SAMPLE TEM SAMPLE MOUNTED eese 5 11 USE OF THE HAND CEAM versatil Oats 5 11 SAVIPLE VESE 2612
35. 5x Selecting a different magnification results in a change of magnification on the screen during live imaging 4022 262 61641 ES WORKING WITH NOVA NANOLAB Working with magnification Using the Mouse Wheel Alternatively the mouse wheel can be used for changing magnification Moving the wheel up decreases the magnification and moving the wheel down increases the magnification Coarse and fine control can be operated with Ctrl or Shift keys from the keyboard TABLE 6 14 USING MOUSE WHEEL MAGNIFICATION Key Function Wheel up Ctrl Decreases magnification Coarse control Wheel up Shift Decreases magnification Fine control Wheel down Ctrl Increases magnification Coarse control Wheel down Shift Increases magnification Fine control Magnification Normalised The Star key on the Keypad can be use to round off the magnification value before storing the image in case the value is odd e g 10 063x would become 10 000 The condition also takes into account the image size by zooming and the micron bar scaling Em 4022 262 61641 WORKING WITH NOVA NANOLAB Choosing a Final Lens Mode Choosing a Final Lens Mode The following 3 Final Lens modes are used by the E column final lens to be optimized for different tasks Use the Tool Bar buttons or the SEM Mode in the Beam Menu to switch between modes Mode 1 This is the default survey mode This mode is essentially for navigating and reviewing sites at lower magnificatio
36. 61641 WORKING WITH NOVA NANOLAB Application Files The parameters above are used for non gas assisted milling In this case and if the overlap 1s positive the mill time can be calculated based on the volume per dose parameter and beam current volume cubicmucro ns cubicmicro ns Volumeperdoass charge nanocoulom b beam current X time Therefore TE cubicmicro ns mul time beam current X olumeperdoase For example create a filled box pattern 5 um x 5 um x 2 uum as X Y and Z values the desired volume of material to be milled 50 cubic um and choose 500 pA 0 5 nA which is 0 5 nanocoulombs per second Therefore nud fime a s c 660 0 sec Js min O sec C3 naasocioumbs per second FU fa If you change the Z depth from 2 to 4 microns the desired volume would be twice larger and the milling time displays 22 min 13 sec Doubling the beam current cuts milling time in half The gas assisted application file For the Platinum Application file the following patterning properties are defined TABLE 6 22 SILICON APPLICATION FILE GAS Properties Pt Dep Description Dwell Time The time the beam spends on a single pixel per pass Sets the beam diameter overlap Volume per Describes the amount of volume of material Dose removed per charge This used to be called sputter rate in previous dualbeam tools Refresh Is used to add additional waiting time be
37. Administration Install directory CAProgram Fileselhexe Active configuration Feimticrascope y Autorun Ll Feimticrascope y DISPLAY AUTORUN 5 ADVANCED E Unknown UI a PAGE e CoCreated Created E e Connected Started initialized E HalOmniprobe l HalLoadLock M Follow Active 2 HalLoadLockRegulator 2 HalRetractableDetector MalConsole EP Mdlvacuum 4 4022 262 61641 EJ SYSTEM OPERATION Log On Log Off Launch Ul Level When the Server is fully launched the Start UI button becomes active Click on the Start UI button and a Splash screen appears during the UI loading This 1s then replaced by the UI FIGURE 3 2 SPLASH SCREEN FOR NOVA NANOLAB Minimized Server dialog The start up dialog can be minimized once the UI 1s established by clicking with the right mouse button in the top bar of the dialog this opens a further dialog that offers the chance to minimize the server to the top bar of the UI FIGURE 3 3 MINIMIZED SERVER DIALOG Ch EN ser Stop Hide Stopul x NOTE The stage will need to be homed before full operation of the Ul is possible A dialog will display in the screen center for this purpose after the Log on dialog has closed If it is not homed at the first displayed dialog it can be homed by selecting Home Stage from the Stage Menu later E 4022 262 61641 SYSTEM OPERATION Leaving the System Overnight Leaving the System Overnight Overnight and we
38. Apply Cancel l E Finish This concludes Define User Units There are a number of choices on the Define User Unit start dialog These are listed here to explain their functionality DEFINE NEW USER UNITS as explained in this chapter REDEFINE USER UNITS for changing updating User Units REDEFINE USER UNITS WITH SHIFT for changing updating with Beam Shift SHOW HOW USER UNITS ARE NOW DEFINED Displays the current details m 4022 262 52351 STAGES How to make Stage Movements Stage Tools Window Help User Units xT Align Feature Compucentric Rotation To activate USER UNITS as the basis of the stage coordination system piz click on USER UNITS in the Stage menu A tick mark will appear next Define User Units Lleer Units to the label The stage coordinate system will revert to the last defined user unit configuration for 1 2 or 3 Point Alignment From this point Beam Shift Reset Zero Beam Shift Units to perform specific movements Home Stage Home Apertures Home stage Without Rotation Center Position Touch Alarm Enabled Shift F3 Ctr Dlink 2 to FWE Link 2 te AWE Enable Tilt map Shalit Ss Tilt 0 Tit 52 Ctri E Ctrl I Sample Navigation Using 1 2 or 3 Point Alignments Preferences Use Major Use Change in Scale Change in Orientation Ctl o types TABLE 6 6 ALIGNMENT TYPE DIFFERENCES 1 Point Al
39. Beam Cross section face Cross section face Onscreen views Not visible Completely visible Not to Scale 4022 262 61641 sm WORKING WITH NOVA NANOLAB Viewing the Cross Section The following figure shows the onscreen view with the stage at 0 tilt with both the electron and ion beam imaging views FIGURE 6 43 CROSS SECTION VIEWING AT 0 TILT Electron column lon column A Shallow end Cross section face 4 0 stage tilt Viewing with Beam Viewing with E Beam Cross section face Cross section face Not O Not visible Mee Sn MENS visible Tilted View into shallow end of cross section Not to Scale sm 4022 262 61641 WORKING WITH NOVA NANOLAB Viewing the Cross Section The following figure shows the onscreen views with the stage still at 0 tilt but with both stage and scan rotation at 180 FIGURE 6 44 VIEWING AT 0 TILT ROTATED 180 Electron column lon column ie oe 7 Y Cross section face 0 stage tilt 180 rotation scan rotation 180 Viewing with I Beam Viewing with E Beam Tilted view into cross section Cross section face N Onscreen views Not visible Not to Scale Completely visible 4022 262 61641 s WORKING WITH NOVA NANOLAB Using the Measurement functions Using the Measurement functions Measurement Annotation The MEASUREMENT functions found on the Measurement and Annotations page give the user many capabilities to measur
40. Beam Restart Average Filter when beam shift change Both Beam Display beam icon in databar Tes gt Cid m mma cmm 2x nma km mn mm Rm wm wk Mz Cancel Apply Description and possible Values are Pause Icon Behaviour Stop at end of frame Stop immediately The scanning will stop immediately after pressing the Pause icon or after finishing the frame Movie User Message Timeout Don t display 1 second 2 seconds 5 seconds 30 seconds specifies how long the information about the currently playing movie remains on screen Toolbar Combobox Style Reduced Standard specifies the type of combo boxes in the toolbar Toolbar Spinner Style Left Right Up Down specifies the type of Dwell time spinner in the toolbar e E Magnification Before pump don t change Set to 100x set to 200x The magnification of the electron beam will be set to a predefined magnification before pump down e I Magnification Before pump don t change Set to 100x set to 200x The magnification of the ion beam will be set to a predefined magnification before pump down e CCD automatic switch off timeout None 1 minute 10 minutes 30 minutes The CCD Camera will switch off after timeout Pause E Beam quads when E Beam HV Off No Yes When the Electron beam High voltage 1s switched off scanning will be paused 4022 262 61641 LJ USER INTERFACE Setting Preferences Pause I Beam quads when I Beam HV off No Yes When the Ion
41. Click on APPLY to suspend the closing of the Preferences dialog but save the settings 1f one needs to move to other Tabbed dialogs to change further settings When finished click on the OK button The Items chosen from the Preferences Tab dialog for the working DataBar will remain with the operating system until changed 432 4022 262 61641 USER INTERFACE Setting Preferences Units Tab The Units Tab displays the capability to change the units for pressure temperature and measure The xT system will from time to time need to display values of PRESSURE Units of Pascal Torr or Bar can be selected to suit By clicking on the list arrow a selection can be made for the respective unit of pressure The UNITS OF MEASURE can be selected from the list by clicking on the list arrow and choosing the unit The list contains meter and millimetre FIGURE 4 12 UNITS PREFERENCES Databar Units Presets Scanning General Movie Sensitivity Units of Measure milimeter mrm Pressure Cancel Apply Click on the OK button to bring the new settings into operation or CANCEL to return to the original setting Either of these will close the Preferences dialog Click on APPLY to suspend the closing of the Preferences dialog but save the settings if one needs to move to other Tabbed dialogs to change further settings When finished click on the OK button The Items chosen from the Preferences Tab dialog Units will remain
42. Cm Faster Scan Citrix Mains Lock v Live Average 32 frames Integrate 1 frame Scan Rotation Shitt F 12 Ctm o Preferences Tools Window Help Image Registration Auto contrast Brightness ES Amo Focus dl Ano Lens Stigmator Alignment Display Saturation Shitt F 11 Lab Motes FE Movie Creator Application Status Preferences Col a WORKING WITH NOVA NANOLAB Optimizing the Image Using Reduced area for Focus When Reduced area is chosen the small green area frame appears in the middle of the screen This can be used as a Focus aid as the scan speed is faster in the smaller area It can be activated from the SCAN menu the REDUCED AREA button on the Tool bar or by F7 The first time after defaulting of the program it will appear in the center of the Quad or Screen after setting to preference it will pop up where it last resided Moving the Reduced Area Click and hold the left mouse button in the selected area The cursor changes to a 4 ended arrow This will take time depending on the actual scan speed Now drag the selected area to the desired position and release the mouse button Changing the Size of the Reduced Area Click and hold the left mouse button at the edge of the selected area The cursor changes to a 2 ended arrow either horizontal or vertical Now drag the selected area out or in to the desired size and release the mouse button Making a new Reduced Area Place the cu
43. Detection Type Mode Default range Thru the Lens Mode 1 20r3 S 150 V Mode 1 or 3 Detector S 50 V Mode 2 j Mode 2 B 150 V C 0V D 150 V Secondary S 150 to 300 V Electron Detector Continuous Secondary ion Bias Grid 300 to 300 Dynode Front End Voltage 300 Electron Secondary to 2500 Multiplier electron Optional Scanning Transmitted segment A Transmission Electrons segment B Electron Mode 1 20r3 segment A plus B Detector Optional segment A minus B 4022 262 61641 WORKING WITH NOVA NANOLAB Detectors for Nova NanoLab Changing Detectors or Custom mode All detectors when active show live time operation except while Patterning is in operation Therefore when changing detectors or changing conditions such as on the Detector Page for the Custom modes the active detector s will show the changes in live time Beam indicators On the Detector Page a similar dialog module will appear for each detector At the time the dialog opens a beam indicator icon will be present in the dialog to show the beam in use These change in the Detector Page module automatically as different Quads are chosen to display different detector images FIGURE 6 8 BEAM INDICATORS ELECTRON BEAM On hold changes when Patterning During the patterning process the Detector Menu is still in use but setting changes will not become active until Patterning has stopped or been interrupted The Custom
44. Down Battam Label Add Bitmap Hv HF 400 um Label USER INTERFACE Help Functions Help Functions IP 1 0 12 Fa IP 2 0 39 UPA IGP 3 0 51 UPA Specimen Chamber 18 89 mPa Hep Bhe Online Documentation Fl About aL E A Tool Tips The first line help is integrated in the software as Tool Tips These are activated when the cursor 1s left over a item on the user interface for 2 seconds A short explanation of the item will appear until the cursor 1s moved away from the item On Line Documentation The On Line Documentation function can be switched on by the F1 key on the keyboard or from the Help menu The Help dialog area is defaulted to the bottom right Quad at startup and can be expanded to all Quads for more detailed help including diagrams and images It can also be dragged to any position on the available screen The help box function remembers the position and size that the user last defined until defaulted on startup Hyperlinked Help The opened Help pages have hyperlinks to subjects such as operation procedures Tips and other useful information FIGURE 4 2 ON LINE DOCUMENTATION ale gt I d md IE Aja gt 4 g BOABE gt pil 4 49 06 e DIBmce E B T 1400 E Pe iei EPA iP d i lully rirvigabus vemia e Me aren D arel Hats navikai arr wr rem uraxamp ETC re Release Notes Sa lect ihia Rem for acta io the
45. F12 or on the Uplink 2 to Fup Stage Page Coordinates Tab Link 2 to FNE Soie Y Enable Z Tit map Define User Units Tit 5 Clicking Define User Units on activates a series of dialogs that guide Tit 52 m the user to determine User Unit values for X and Y movements of the tage These are used in relative movements associated with stage sample Navigation mapping of regular features in particular in IC applications Preferences Ctmi o Offset Alignment Offset Alignment is a shortcut that allows you to move to new points relative to the existing alignment but at a new location for example stepping between identical points on different dies quickly User Units Clicking on User Units organises the stage software to recognise the defined user units rather than the default metric measurements The X and Y coordinates now operate in User Units and 1s shown in the Location module by the UU symbol Beam Shift Reset Use this function to begin the Beam Shift Reset procedure to zero beam shift and move the feature to the center of the field of view with the stage Zero Beam Shift When beam shift has reached maximum limits choose Zero Beam Shift to restore X and Y beam shifts to zero values The computer beeps when maximum limits are reached m 4022 262 61641 Stage Tools Window Help xT Align Feature Compucentric Rotation Define User Units User Units Beam Shift Reset Zero Beam Shift Home Stage Home Apertures H
46. Full manual alignment of the column 10 44 42 43 and 45 should have been performed before alignment 11 can be used 29 Auto Zero detectors This alignment has to be performed after a power disconnection of the STEM and CDEM amplifier 4 4022 262 61641 ALIGNMENTS Electron Column Alignment Overview FEI Trained Supervisors FEI Service After Emergency shutdown only a FEI trained Supervisor should start the Electron source with 5 Emitter Startup otherwise FEI Service should be informed of the condition TABLE 9 2 E COLUMN ALIGNMENT ALLOCATION Procedures in order Function FEI TRAINED SUPERVISOR or FEI SERVICE 5 Emitter Startup Enables electron gun switching on off and to change gun emission mode In the case of an emergency shut down it also makes it possible to restart the IGPs For FEI trained Supervisor or FEI Service use only Users all For local correction in Mode 1 2 and 3 the following two fine controls are available to all and not subject to the restrictions above TABLE 9 3 E COLUMN ALIGNMENT ALLOCATION Procedures in order Function USER 13 Stigmator Alignment This alignment eliminates image shift during normal stigmator correction in both Modes 1 2 and 3 17 Stage Rotation Center Corrects the center of rotation at any point on the specimen by computer correction of the X Y offset from the stage mechanical center 4022 262 61641 LI ALIGNMENTS Electron Column Alignment Overview
47. Images Saving Opening An image can be saved and opened see further in TIF 8 16 and 24 bit colordepth JPG or BMP formats Overlayed graphics can be written into the image either in greyscale 8 or 16 bit or in color 24 bit Open Fie Edit Detectors Scan E Pre select the quad for the image to open in and then select the image from the Open function Clicking on Open with the left mouse P ERE button opens a dialog for opening an image to a particular quad The TN dialog displays by default the last used location of saved files associated to the imaging function e g image file location used by Record Movie Snapshot or Photo After image selection is made clicking on the Import open button will open the image to the quad that has been selected Export Images can be opened in any combination of quads Print Ctri P OPEN DIALOG i 21x Exit Look in test Eger Edy C 3D42D7AD Voll TS tif El TE tif Bi XT Test tif Save as type t Image files tif y Cancel E m 4022 262 61641 WORKING WITH NOVA NANOLAB Movie multiple image capture Movie multiple image capture File Edit Detectors Scan E Image capture with Movie Open Save Col s Save AS This feature provides the of making digital video files AVI for dynamic experiments performed within the microscope Up to 3 quads can be recorded at the same time with synchronized Record Movie start and the possibilit
48. Patterning button is active it changes to the Pause symbol in black When the Start Pause Resume Patterning button is active it changes to the Resume symbol in black and depressed The Reset Icon button is gray when non active and black when active NOTE While E beam Snapshot is running pressing Stop Will pause the pattern so that it is in Resume mode and therefore the pattern can be continued when Snapshot has finish Record Movie The RED dot is the start command button that starts the recording of three videos one for each of the three image quads at the same moment If a quad is paused when starting the video only the first image with a time stamp 1s stored When the red dot representing Start is pressed it turns to a RED box representing Stop A RED dot and timer appears on each quad The timer starts and updates as the recording proceeds to the timing set in the Movie 01 47 26 Preferences Tab The Recordings will automatically stop at the time entered in the Movie Preferences Tab otherwise when pressed the Ne RED square then stops the recording of the video of all three quads Recording Movie And Save TIFFs andcloses the files The two red bars indicate that the record is running but the data from this quad is will not be stored automatically m 4022 262 61641 USER INTERFACE The Data Bar The Data Bar Data Bar The Data Bar displays Instrument Image and labelling information presented by prese
49. Print Ctrl P under Archive Option but the image capture routine increments the Log Off Factory label and therefore adds to the listed images instead of overwriting the Exit last image The image is given the last known label including a number that is incremental with successive images i e Label 001 tif Label 002 tif etc Save As Clicking on Save As with the left mouse button opens a dialog for saving an image which provides an opportunity to change the file name and location The Save As method is also employed in the Snapshot Photo function under Archive Option but the image capture routine prompts the Save As dialog FIGURE 6 23 SAVE AS DIALOG Save in c4 Nova Images S Es quad limage_004 Es quadlimage_005 Es quad limage_006 Es quadlimage_007 File name quad imaqe O08 Save as type tifimage files tit Cancel Iv Save image with Databar M Save image with overlayed graphics The dialogue displays by default the location last used to save or open files from xTUI and the name last used in the current Quad You can choose different location and or base of name select different image format Save as type and also choose whether to Save the image with without Databar and with without overlayed graphics by checking unchecking appropriate check box The settings is remebered per Quad and used for the subsequent Save actions 4022 262 61641 EI WORKING WITH NOVA NANOLAB Single
50. Scan Menu The Beam Menu The Patterning Menu The Stage Menu The Tools Menu The Window Menu The Help Menu Preferences opens in 4th Quad for presetting of operating conditions 4 5 DataBar Units Presets Scanning Beam Detector Movie Sensitivity The Tool Bar contains all iconised button functions The Data Bar contains all data information entered by preference for storage printout of the image 6 Pages and Modules contains all pages made up of one or more modules Beam Control Page Navigation Page Patterning Page Processing Page Alignments Page Hardware Interface Elements not shown here Mouse Keyboard Mui option 4022 262 61641 LI USER INTERFACE The Title Bar The Title Bar The Title Bar displays the logged on user name that was entered to log on Windows 2000 level FIGURE 4 4 THE TITLE BAR uf xT microscope Control The Menu Bar The Menu Bar displays pulldown menus across the top of the screen below the Title Bar FIGURE 4 5 THE MENU BAR File Edit Detectors Scan Beam Patterning Stage Tools Window Help Menu Bar Functions The following menus are available TABLE 4 1 MENUS Menu Item Use Administrative functions Edit Pattern s such as delete or select all List of detectors Scan Scan condition functions for Electron and Ion beams Choice of Beam conditions Electron Ion and Light and controls ip Abe aici Select pulldown
51. TWO COLUMNS X lon column N A Electron column BSc NN A EM 5 16 5 mm Not to Scale 56 4022 262 61641 WORKING WITH NOVA NANOLAB Ending Your Session Ending Your Session Vacuum When you are done with your session log out leaving the system Nm ready for the next operator sus TABLE 5 4 ENDING YOUR SESSION Column Action Click off the BEAM ON buttons for the electron and ion beams id 30 00 kW If the system will not be used any more that a day click the SLEEP button to turn off the ion column SOURCE The buttons should turn gray while the Wake up button becomes active Tuning Lens Alignment Source Tilt For Supervisors only Go to the Navigation page unlock or lock any stage conditions depending whether the stage is to move on vent or not Vent the chamber via the VENT button on the Beam Control page and remove your Magnification oP sample The Vent cycle includes an automatic safety Couple Magnifications positioning of the stage unless the stage is locked Pump Magnification 169 x the system down by clicking on the PUMP button on the Beam Control page Beam Log Off the xT User Interface by selecting Log Off from Stigrnator the File Menu Rotation Scan Rotation ei 00 Detectors Contrast Brightness Status specimen Current 39 15 nay lon Beam Current 214 nA 4022 262 61641 EA WO
52. There is no need to tighten the thumbwheel screw too hard It is only used to make sure the row holder is held against the bottom of the slot so the pin lifts the leaf spring finger far enough to allow sample loading 3 Locate the TEM sample or grid to be loaded and put it on the mounting base using either mechanical or vacuum tweezers NOTE On either side of the central dark loading region the slot edge of the mounting base is cut away to allow tweezer access from the side 4 Manoeuvre the sample under the clamping spring of the center position of the row holder 5 Gently release the clamping screw The specimen is now clamped by the row holder itself FIGURE 5 5 TEM SAMPLE TEM SAMPLE MOUNTED 6 Remove the row holder from the mounting base by grasping both ends with the hand clamp or a gloved hand and lifting FIGURE 5 6 USE OF THE HAND CLAMP 4022 262 61641 EI WORKING WITH NOVA NANOLAB TEM Grid sample handling option 7 Using either the hand clamp provided or a gloved hand place the row holder into the Sample Vise Sample Vise On a Nova NanoLab use the Sample Vise to hold the sample mounts FIGURE 6 SAMPLE VISE The Vise fits directly onto the rotation table of the NanoLab stage 512 4022 262 61641 WORKING WITH NOVA NANOLAB Obtaining an Image Obtaining an Image How an Image is Produced All scanning beam microscopes produce images with the same fundamental technique the primary beam is sc
53. Use this function with almost focused image to obtain the most accurate Magnification HFW and Working Distance readouts Lens Alignment This is dedicated to the electron column Lens Alignment toggles lens alignment mode on the Beam Page for the objective lens fine alignment The scanning condition changes to a fast scan and the lens modulator turns on a green target cross appears in the center of all SEM image Quads Pressing and holding the left mouse button activates a quad arrow ended cursor Dragging the mouse aligns the beam with respect to the objective lens with the purpose of reducing the movement swing This in turn eliminates or reduces the movement during focusing Preferences Clicking on Preferences opens the preferences dialog at the Beam Tab mn 4022 262 61641 Patterning Menu Patterning Stage Tools Window Start Patterning Reset Battering ext Patient Next Line Sleep After Patterning Shift F ShifcHN USER INTERFACE Patterning Menu This is the menu for executing Patterning otart Pause Resume Patterning This item in the Patterning Menu has three functions and changes according to the function operating at the present time It also follows the trend of the Tool Bar buttons for patterning Click on Start Patterning to begin patterning with the pattern selected on the Patterning Page Click on Pause Patterning to temporarily stop patterning and Resume Patterning to continue Reset P
54. Vacuum Startup IGP s 100 Vacuum Startup IGP s Alignments Alignment Field Functions This procedure is to start or stop the IGP s for the Electron column and the Ion column related to the system Startup after shutdown or due to a power failure Try to Start or to Stop IGP s of the columns TABLE 9 45 100 FIELD FUNCTIONS STEP 0 to 1 Shutdown the FEG source Press Start button NETOS Function Instructions Follow the text to complete the step Step Displays the present control area number and the total number of areas Ion and ALL IGP s On This button starts both Electron Electron and Ion IGP s Column Alignments 100 Vacuum Start GP s Instructions Electron IGP s On Off These 2 buttons start or stop the Column Electron column IGP s Ion Column IGP On Off These 2 buttons start or stop the Ion column IGP Feg Source Emitter Off Clicking on this button switches the Electron column source Off Cancel Click on Cancel to leave the alignment and return to original settings Finish Click on Finish to save the new setting Vacuum start or Stop IGP s stopping ISP s can cause the FEG source to be switched off otop FEG source before IGP s are stoppped Cancel to exit step 1 of 1 lan and Electron Calumn ela PA 100 Vacuum Start IGP s procedure IGPs Off lon Column TABLE 9 46 100 NO STEP TO 1 OF 1 IGP Off Order Action Press the Start button Ta
55. WITH NOVA NANOLAB 5 XE STARTUP CONDITIONS IE ew ae yaa ee s 5 3 STRATA SETUP CONDITION Scotia 5 4 BEGINNING YOUR SESSION a ice SERRA RR aa oes 5 5 ENDING YOUR SESSION bese aha up Rumes etes nu Eds 5 7 EXCHANGING A SAMPLE haere et Gad s ee 5 9 OBTAINING AN IMAGE sessionis die be aga 5 14 DETECTOR MO DES nz ex shee ente ede P end ha etes 5 15 CDEM DETECTOR SETUP GUIDELINES 5 19 STEM DETECTOR POSITIONS techo Eher ii aa ra dae 5 2 Ce D OPERATION criado UE Tani RETE OES HOS MOG usus 5 24 CORRECTING Ge D uiu sakura votis X dl anes Bok we aoe 5 25 CORRECTING FOCUS WITH THE MOUSE esee 5 26 EL MOUSE CORRECTED ASTIGMATISM 2220048 5 28 STIGMATING WITH THE MUI 0 0 0 ee 5 29 DEFAULT FACTORY APERTURE SIZES 2 5 54 hd ate es 5 3 ALIGNING THE FINAL LENS APERTURE esee 5 32 GENERAL OPTIMAL I BEAM CURRENTS 5 33 SPECIFIC OPTIMAL I BEAM CURRENTS 02 5 33 USING MOUSE WHEEL MAGNIFICATION 5 36 USING SNAPSHOT FOR IMAGE CAPTURE 5 39 USING PHOTO FOR IMAGE CAPTURE eene 5 40 SET UP AND RECORDING A MOVIE eeeee RR 5 46 IMAGE PRINTING PROCEDURE eene 5 52 PATTERN TOOL BUNC TIONS 9533 6a Q3 Ru seer aoe ee ee eae 5 55 COLOR SETTING Scans uate it ac sott 5 56 SILICON APPLICATION FILE NON GAS 200000 5 6
56. XML files can be edited in Windows Notepad Make a copy of the Si XML file The required parameters can be modified to user requirements When the actual milling depth is different from the desired milling depth the volume per dose should be modified to a value that matches the required depth In case of the Si xml mill on GaAs the depth can be measured to define a new volume per dose value m 4022 262 61641 WORKING WITH NOVA NANOLAB Application Files In the XML file the volume per dose variable can be found at VolumePerDose xmlns dt urn schemas microsoft com datatypes dt dt r8 gt 0 15e lt VolumePerDose gt The 0 15e variable for Si can be changed to 0 6le for GaAs For easy recognition the comment lines can be changed lt Application file for milling silicon Si without any gas gt e If etching or deposition application files are changed it is recommended to make a copy of the original gas injector application file e Dependant on use of the etch deposition application file one can choose to edit beam type dwell time volume per dose refresh time blur or interaction diameter A list of common volume per dose values or sputter rates for various materials can be found in Table 5 29 These are all values for 30 kV A total list of patterning file properties can be found in the following Tables TABLE 6 24 PATTERNING FILE BASIC PROPERTIES Properties Description Application Name
57. a given pattern You must define a pattern before an application file can be selected A given application file will automatically select the appropriate GIS check box calculate the proper dose and set the dwell and overlap appropriate to the beam chemistry The GIS check boxes can be selected manually but note that overlap and dwell should be set carefully with particular gasses in mind to avoid disappointing results Serial milling or deposition will always begin with the first pattern defined in the current image window and continue through patterns 2 3 etc In Serial mode a series of patterns could even be a combination of some to be milled and some to be deposited but in general this is not recommended 554 4022 262 61641 WORKING WITH NOVA NANOLAB Patterning Patterning Tools At the top of the Patterning Page is a selection of tools for creating moving sizing and deleting patterns TABLE 6 19 PATTERN TOOL FUNCTIONS Icon Button Function Pattern Selector Click on arrow to activate the dropdown list When selection is made the blank area displays the relative Icon as follows Rectangle Cleaning Cross Section Regular Cross Section Circle Line Bitmap import or Stream File Gray background Inactive Yellow background Active Trash Can Delete When pressed in displays a black staggered line surrounding the icon and deletes the present selected pattern Pattern Hide function
58. amp V then STOP PATTERNING in xT Indicates the step being executed Coating Rough Cut or Slice Processing slice Indicates the current slice and the total number of slices in the Auto S amp V ume Hg ps operation Length y E um Thickness z am Current Process Indicates the process being executed Current ap 300 y nA Milling SEM imaging Shows Refresh Slice Rough cut Coating Application pt Indicates the milling progress show Retresh with slice 4022 262 61641 HARD amp SOFTWARE OPTIONS User Interface TABLE 8 16 AUTO S amp V USER INTERFACE Interface Item Description Common Options Application Displays a dropdown menu for selecting an application The list contains an entry for every application available on the system If NONE is selected as the application for any particular step the application skips that step NONE is the last option in the Application dropdown menu The factory default application selections are NONE for the Rough Cut and Coating Si for the Slice tab Auto S amp V performs only the slice step with these settings Width x Specifies the pattern width horizontal on the image for the selected process step Length y Specifies the overall pattern length vertical on the image for the selected process step Depth z Specifies the pattern depth for the selected process step Current ap Displays a dropdown menu for selecting the ion be
59. and the CDEM could cause beam shift which in turn will affect the coincidence of the two beams Therefore it 1s not advisable to change custom conditions during a patterning session If coincidence is affected then re calibration will be necessary before starting to pattern 4022 262 61641 EJ WORKING WITH NOVA NANOLAB Optional Imaging Detectors STEM 1 Option The STEM 1 detector is a two segment solid state device mounted underneath a Grid holder assembly Since the STEM 1 Detector is mounted on the stage it can be used at any available working distance preferably close to the lens for high resolution or at the eucentric position for simultaneous use of EDX The mounting pin below the detector locates into the standard conical single stub mount provided with each stage The locking screw should be tightened to stop unnecessary rotation of the detector The plug located at the end of the cable from the detector is connected to the solid state amplifier usually on the back right port The STEM holder has 8 positions for sample grids Two of these positions are specifically for Darkfield observation and are marked accordingly 1D 5D For Darkfield observation the chosen sample grids should be loaded in these 2 positions when loading the entire holder prior to closing the specimen chamber The two detector segments left A and right B can be switched independently enabling the possibility of Brightfield contrast mode positions
60. box 5 l 10 If the delay time is shorter than what the system can achieve for the current setting the recording runs as fast as possible If both AVI and TIF are recorded the Tif delay must be longer than or equal to the AVI delay If this is not true the system reduces the movie delay timing after pressing OK or Apply At all times one of these checkboxes remains checked If the TIF checkbox is unchecked the delay box for TIF is disabled Equally if the AVI checkbox is unchecked the delay box for AVI is disabled Information field This read only area is found below the AVI and TIF combo boxes and contains additional information for the user about the number of frames per time unit seconds minutes and further movie data stored to the completed files This data is calculated from the image resolution valid when the preference dialogue was opened m 4022 262 61641 WORKING WITH NOVA NANOLAB Movie multiple image capture File All parameters in this section can not be changed for the currently running video Changes made are only valid for the next video recording Digital video can be stored in avi files from the quads 1 to 3 The video name contains generic filename quad name and a numeric seed For example myvideo Quad1 001 avi The filename and the numeric seed are set by the user The numeric seed is automatically incremented after the recording has stopped Optionally the tif files can be stored besides the
61. control to the center v Coarse Modulate Fine Magnificati Zero Coupl Md i Clear Memory Magnificatic Ri gt Auto Alignment m 4022 262 61641 Text Boxes FEI User Management Set password x Progress dialogs USER INTERFACE Software Interface Elements Type information in a text box This direct keyboard input is used to xcci es EE Nc e produce text such as filenames passwords user labels in the data bar Newpassword and specified values of certain parameters Confirm password Progress dialogs indicate progress of a procedure over time by means of a progress bar xTm Autofunction Information y x Busy performing Auto Focus Tabbed Dialogs Cancel Tabbed dialogs form either across the operating page or in a Quad lower right These can be alternately opened by clicking on the label along the top of the dialog area Preferences and other conditions can be changed and stored in these dialogs FIGURE 4 1 PREFERENCES TABS xTm Preferences NA Diat bar Units Presets Scanning General Mowie Sensitivity Available Detector Mode Detector Type Filter Frame Time Magnification scan Rotation Zoom Factor Databar Preview 26 2006 gwell 2 45 40 Phi 300 ns 4022 262 61641 selected Dwell Time High voltage Horiz Field Width Working Distance Label Micronbar 5 00 Ev 1 28 mm Top Move lp Move
62. cross with the Cancel Click on Cancel to leave the alignment and return to original settings stage select a high voltage Press the Next button selected Aperture 1 15 1 Cancel 4022 262 61641 9 35 ALIGNMENTS 270 lon Column Alignment 210 Field Functions Step 2 Alignments The Ion Column Alignment control area shows the following functions 210 len Column Alignment Previous TABLE 9 48 210 FIELD FUNCTIONS STEP 2 Instructions Field Name Function Displays the present control area number and the total number of areas 2D Control BSHIFT BUTTON Buttons Click on BeamShift and use the 2D control to align the beam shift STIG BUTTON For each aperture index selected in menu bar Focus alignment Adjust Focus with L Slider not with Mouse n Stigmator Alignment Adjust stigmator with Stigmatar Correction Aperture Alignment Turn on L1 wobble with convenient wobble amplitude Minimize wnhhla hw anartiira rimari ant BShift stig NN uad stigsin stiglas AperPos Wob ampl 1000 L1 Wobble Click on Stigmator and use the 2D control to align the stigmator QUAD BUTTON Click on Quad and use the 2D control to align mid column steering Wob ampl 50 zwaw e T Wobblestigsin WobblestigLos cavae Load L1 Corr O M y ML L2 Corr E MN NL Contrast 100 00 STIGSIN BUTTON Click on StigSin and use the 2D control to align the stigm
63. databar check box Choose Apply to change temporary to the new values or OK for permanent fixing of the values entered or Cancel to return to the original values at opening of Preferences Choose which quads will NOT be active during recording by clicking on the quads in turn and pressing the Pause button on the button bar This applies only to quads 1 3 m 4022 262 61641 WORKING WITH NOVA NANOLAB Movie Procedure TABLE 6 17 SET UP AND RECORDING A MOVIE File Edit Detectors Scan E Een Step Action Save Ctri 5 rey Set up the imaging in the live quad and press the RED Record Movie dot on the button bar or Record Movie in the File Import i menu The first frame with a time stamp of all quads is Export recorded Next the recording starts and the duration is O LLLA AO M dependant on the set up in the Preferences When the ias am video 1s started and the scan resolution is higher Log Off Factory than 1024 the following dialogue occurs Exit Tm Incorrect video resolution Please select a resolution that is compatible with video recording Resolution 812x422 812x422 1024 x 294 ance Choose either of the resolution values and click on OK The Movie continues to record at the selected resolution The Movie will stop when the Black square button is pressed on the button bar The stop command stops recording of the video of up to all three quads and closes the files Quad Indicators A Red dot i
64. direction By tuning the aperture you can minimize this movement When corrected switch off the Lens Alignment There should be no image shift when the focus control is used 4022 262 61641 LI ALIGNMENTS E Column Alignment Procedures E Column Alignment Procedures Alignments 4 5 Emitter Startup 10 Source Tilt and Shift 11 Automated Source Alignment 13 Stigmator Alignment 17 Stage Rotation Centre 3 Auto Zero detectors q4 UHR Lens Alignment 42 UHR Stgmator Alignment 43 UHR Image Shift Correction 45 HA Image Shift Correction 100 acuum Start IGF s 10 lon Column Alignment 53 Supervisor lon Beam 254 Supervisor GIS Before you align the Electron column be sure that the final lens aperture is correctly aligned All alignment procedures should be operated in a fast mode of scan and with an average of 4 or 8 Supervisor SEM Alignments Use the Alignment control area to align the column and determine fine tuning for the electromagnetic system The software stores column parameters such as Source Tilt X Y Source Shift X Y and other data that ensures minimum image shift when focusing and stigmating images When you click on the list box arrow various available alignments are displayed TABLE 9 7 SUPERVISOR E COLUMN ALIGNMENTS Adjustment Function 10 Source Tilt and Shift Performs main column alignment for Spot sizes for each kV
65. dose aes uL ek d etai a 6 14 MAD Id IO ast acea eee eene oda he Sane de iUo um uses V Ses ana dnd 6 15 Coordimates dica suite abito D ua nto a de rd na dodo os dod 6 16 Editing d coordina eese paana 42s e RU Eo Ss aed e qi nipltatiq e Perses 6 17 How to make Stage Movements llle 6 19 AN A EEE E ENEE E eee Gee ata LTD E TEET C dau isi dra E 6 19 Gel ertt A tut Lett ot ot otek ot 6 20 Stage Frame SA oce Sue LEE A RR Da WERE 6 20 lA Mon PCA Whe ER ESSI DERE be eae ee PIE E ees 6 21 Compucentric Rotation 0 0 00 eee eee ees 6 23 Denne Voer D DIS ario acaricia ar Dae Shea es ied afa ee 6 24 iuc aU PET 6 27 Stage Related FPunc ons usi s ER EE RR EAE 6 28 De allt ROO eadar A ILU ELIT 6 28 Chapter 7 MAINTENANCE 7 1 E Column Aperture maintenance 0 000 eee eee eens 7 2 E Strip Aperture Modules coria eer HS 7 2 Tapane MAM CMAN iras aud iol a eh es 7 4 Specimen Holders i oe oe ieee Be A RENE eR as 7 4 ES ls oie dA Ceo eechedeuas A A 7 4 7T 939croll Pump CHECK ia oe los Rome ok ee dtm WA LSS 7 5 7 4 List of Applied Cleaners uve ert mes das daa 7 5 Chapter 8 HARD amp SOFTWARE OPTIONS AUOD EB SOEUR c i BE id 4 2 Dar deett a ect edt RC b t D pl hte da tt 8 2 Installing AUtoEI B e UON ER eR ei a 8 3 Autor IB litis Dal oi coe DE sapo Ve vb d dbi ms 8 3 AUtOEIB MoS ernn ete d e n uot ebd ae boo 8 4 Tale Nen anoo O aded edita aras duds unto ae RU aca 8 4 4022 262 52351 4022 262 52351 q Play Me erra
66. dropdown arrow to the right of the text box and the list of currents will be available Click on the required current and it will appear in the text box The dropdown list will automatically close This can be done while the beam for the column is on in which case the change will be immediate For the Electron beam deciding which beam current 1s correct for a particular magnification can be determined when you achieve good focus and astigmatism correction easily at the chosen magnification Choosing the correct beam current for Ion beam use is determined by the application EJ 4022 262 61641 WORKING WITH NOVA NANOLAB Selecting Beam Conditions E Beam Aperture Strip The E Beam Aperture strip contains five sized heated apertures with steps between each hole in the X direction The following table gives the factory default five aperture sizes and their suggested uses TABLE 6 10 DEFAULT FACTORY APERTURE SIZES Aperture Use 100um Preset 1 High beam current applications 50um Preset 2 X ray dot maps 40 um Preset 3 X ray mapping of low Z elements at low kV 30 um Preset 4 For general use and high resolution imaging 30um Preset 5 For general use and high resolution imaging Aperture Loading Guidelines The aperture holder rod is heated while in operation to keep the apertures in a clean state In addition the aperture strip is mounted within a module that can be attached to the rod by a single screw The aperture strip an
67. menu item indicates that the function is selected for the active Quad As soon as this Quad is paused the Sample Navigation indicator appears in the upper right corner of the Quad The indicator is green as long as the paused image can be used to navigate the live images otherwise turns read e g when the stage rotation or tilt changes See Chapter 5 for a detailed description NOTE To make sure this function working properly the stage rotation value for captured image and corresponding live images are the same Preferences Clicking on Preferences opens the preferences dialog m 4022 262 61641 USER INTERFACE Stage Menu 4022 262 61641 mI USER INTERFACE Tools Menu Tools Menu Tools Window Help D Image Registration ALG Contrast Bianitness FS ALO Focus gel ALG Lens X Sstigmator Alianment Display Saturation Shitt F 11 Lab Hotes FE Movie Creator Application Status Preferences Col a Image Registration x Select paint 1 in the reference image Overlay Show Bue Threshold 1100 MW Show Edges Only Register Unido Close Clicking on the Tools label in the Menu bar with the left mouse button opens the Tools menu This can also be achieved by pressing the Alt o keys Image Registration With user specified alignment points the user can transform one image spatially to correspond to another image then mill on that new image as if it were an i
68. menus from the menu bar by using either the left mouse button or ALT letter from the keyboard n 4022 262 61641 USER INTERFACE File Menu File Menu Clicking on the File name in the Menu bar with the left mouse button le Edit Detect gt E l REO cae Scale opens the File menu This can also be achieved by pressing the Alt F da keys Save Ctri 5 Save AS Open Record Movie Clicking on Open with the left mouse button opens a dialog for Import 4 opening an image in the selected quad or a full screen Images can be Export opened in TIF 8 16 and 24 bit col or depth JPG and Bitmap O formats Print Ctrl F Log Off Factory Save Exit Clicking on Save with the left mouse button saves the image with an incremental label at a predetermined location This 1s also used when a restored image has been updated in any way such as a LUT change and is necessary to overwrite the original This can also be achieved by pressing the Crtl S keys Save As Clicking on Save As with the left mouse button opens a dialog for saving an image This provides an opportunity to change the label and save the same file a new file with a different label Record Movie Clicking on Record Movie starts the recording of three videos one for each of the three image quads at the same moment If a quad is paused when starting the video only the first image with a time stamp 1s stored The red dot icon on the Tool Bar represents the s
69. name Description F User must change password atnext lagen M User cannot change password Password never expires Accountis disabled F Accountis lockout Conca Uiserdata Help Topy Cobo Paste Ctri v Remove Help Legend About FEI User Management Legend Members ofthis group cannot log on Group can be accessed Group cannot be accessed Member of group which cannot log on Standard user Logged on user User cannot be accessed Cyan background user has no userdata Red cross user account is disabled or locked a B e 08 eh About FEI User Management FEI User Management Version 1 0 Copyright FEI Company C 2002 Running on Local machine Domain server Domain WORKING WITH NOVA NANOLAB FEI User Management Software Properties Alt Enter click to see and change the properties for that user The user must first be highlighted in the tree The Userdata menu contains the following items Copy Ctrl C click to copy user data from a user of the same or a lower level group Paste Ctrl V click to paste user data into your own account or into the accounts of a lower group level It is not possible to copy user data inside the FEI Supervisors User group Remove click to delete user data from a selected account of equal or lower group level The Help Menu contains the following items Legend clicking provides an explanat
70. of the loadlock FIGURE 6 7 RELATION BETWEEN VIEWED IMAGE AND STAGE Monitor A Loadlock or System Wafer Handler Front of When you move the stage in the Y up direction on the monitor it is physically moving toward you This drawing is also an indication of reference for the wafer map 4022 262 61641 WORKING WITH NOVA NANOLAB Obtaining an Image Sac ent Column p Lens Alignment source Tilt ae MA hModulator Crossover Magnification Couple Magnifications Magnification H E mH Beam Stigmator Beam Shitt BH Rotation Scan Rotation ae ei o Detectors Contrast Brightness Status specimen Current 0 34 nA lon Beam Current 2 41 pA Set up for Imaging The following assumes that the source is already on and is set to operate when the BEAM ON button is pressed Use the following procedure to obtain an image of the specimen with either beam TABLE 6 1 OBTAINING AN IMAGE Action On the Beam Control page for the active beam click on the BEAM ON button found in the COLUMN module to ramp up the high voltage Focus the cursor on Quad 1 2 or 3 and click UNPAUSE on the tool bar to release the chosen Quad An image will appear in the focused Quad 1 2 or 3 Focus the image with the mouse or MUI Click on AUTO CONTRAST AND BRIGHTNESS in the Tools menu or control the CONTRAST and BRIGHTNESS from
71. of the original AC cord Each power cable is labelled with a destination and origin and are colour coded according to Table 1 2 TABLE 1 2 AC CABLE CODING North American International Color Color Meaning Solid Green Green with Yellow Ground Stripe Miscellaneous Cables Check cables periodically for possible wear cracks or breaks If any defects are found contact service personnel Main Power The system main power should only be plugged into the approved power receptacle as identified by system documentation Ground Earth Some components must be grounded to operate safely Do not defeat grounding or use an ungrounded power source In the event of loss of a protective ground connection all accessible conductive parts including knobs and controls that may appear as insulating can render an electric shock Cover Panels Do not operate or plug in any electrical unit without the protective covers or panels installed Only qualified persons aware of the electrical hazards should perform maintenance or service operations 4022 262 52351 EI SAFETY amp HANDLING Emergency Button Fuses Only trained service personnel should replace fuses Replace fuses only with fuses of the same type voltage rating and current rating Emergency Button Emergency Off EMO Switches In an emergency press one of the large yellow and red EMO switches to turn off all hazardous system voltages The dry pump shuts down and the
72. onscreen This will only be possible in the Quad or the Single screen whichever is active Draw a suitable pattern size with the draw cursor in the Quad or Single screen Use the PATTERN CONTROL CURSOR to move and resize the pattern by dragging it with the mouse When clicking on a new image window in Quad mode with the cursor that creates patterns a slight mouse movement might produce a small unwanted pattern If you create a small pattern accidentally delete it by clicking on the DELETE button while the pattern is active FIGURE 6 52 PATTERN SELECTION Rectangle Cleaning Cross Section 4 Regular Cross Section Circle Line Polygon Bitrnap Stream File Editing Patterns Once a pattern has been drawn it can be modified The following pages tell you how to control patterns by e Focus On Moving Resizing 4022 262 61641 EJ WORKING WITH NOVA NANOLAB Patterning Focus On Patterns A Focused On pattern is denoted by the addition of resizing handles to the pattern outline FIGURE 6 33 RESIZING HANDLES PATTERNING CURSORS Arrow Move Resize cursor cursor cursor Resizing h e N Handles The default Appears over Appears over cursor used an object to object handles for selecting move the object can be horizontal patterns vertical or diagonal Moving Patterns Make sure the cursor is inside the boundary of the pattern and hold the left mouse button while dragging the pattern Resizing Pa
73. or 10 minute interval logging frequency for adding milling updates to the log files Verbose Logs AutoFIB activity and data Short Logs AutoFIB activity for example emission current adjustments and error messages Displays the logged data onscreen does not save data in a log file Screen Only Specifies a specific log file name See File and Screen Only File and Screen Only During operation the AutoFIB activity displays onscreen Optionally also save the information to a log file The log files contain information about the progress of the script and can be used for troubleshooting or record keeping The file contains the date and time of AutoScript activity with new information logged after the existing data The screen log is limited to 30 kB After it reaches this size earlier log entries are progressively deleted as more data is added first in first out 4022 262 61641 LI HARD 8 SOFTWARE OPTIONS AutoFIB Menus To save data in a file select Logging gt File A dialog box similar to the Save As dialog box displays The file name becomes part of the menu item such as File omn63 log Data from different sessions can be appended to the same file the previously stored information is not overwritten Log files are text files that may be viewed with Microsoft Notepad or a word processing program Note that some editors such as Notepad can handle only certain file sizes If the file is
74. p Increase the magnification to 20 000x and realign If Lens Alignment source Tilt necessary repeat at 40 000x At higher magnification the image may move very slightly in a certain direction ne MN Adjust the position using two mechanical aperture knobs so that the center of the rotation is over the cross hModulator Crossover E 4022 262 61641 WORKING WITH NOVA NANOLAB Selecting Beam Conditions TABLE 6 11 ALIGNING THE FINAL LENS APERTURE Step Action 7 When corrected switch off the Modulator There should be no image shift when the focus control is used in either Mode 1 or Mode 2 Finally open the Beam menu and click on the same aperture value from the SEM Aperture sub menu l Beam Apertures In general use a smaller aperture for high resolution and a larger one for large scale or faster milling Optimal Beam Currents Use the following suggestions for choosing optimal I Beam currents TABLE 6 12 GENERAL OPTIMAL I BEAM CURRENTS Beam Current Best Use 1 10 pA High resolution 30 50 pA Standard imaging gt 100 pA Milling For more specific applications see the table below TABLE 6 13 SPECIFIC OPTIMAL I BEAM CURRENTS Beam Current Best Use 1 pA Very high resolution imaging High aspect ratio holes High resolution imaging Pt via filling 10 pA Quick imaging Fast Pt via filling 30 50 pA Navigation imaging Milling submicron holes Final milling on cross sections 100 pA Milling m
75. please refer to the Alignment Chapter for correct order of use Alignments allocated to Users e 13 Stigmator alignment 17 Stage rotation centre Alignments allocated to Supervisors the User alignments are available plus e 5 Emitter Startup 10 Source Tilt and Shift Alignment 11 Automatic Source Alignment e 29 Auto Zero detectors e 42 UHR Stigmator Alignments e 43 UHR Image Shift Correction 44 UHR Lens Alignment e 45 HR Image Shift Correction e 100 Vacuum Start IGP s e 210 Ion Column Alignment e 253 Supervisor Ion Beam e 254 Supervisor GIS 4022 262 61641 465 USER INTERFACE Status Status Status Status Module specimen current 9 64 hi lon Beam Current 60 74 n 1 This module can be found at the bottom of the most pages displaying important current system parameters and animated icons These z 0 Jin parameters may change due to the application being monitored at any eA time Specimen Current shows the total current absorbed by a specimen e Ion Beam Current shows the primary Ion Beam current The read out is only meaningful if the ion beam is blanked Chamber Pressure shows pressures in the FEG IGP E Column IGP I Column IGP and specimen chamber The vacuum status 1s also displayed with color icon 1 e Green pumped to the desired vacuum mode Orange transition between two vacuum statuses Grey vented TABLE 4 5 STATUS ICO
76. possibility of doing charge damage 4022 262 61641 E WORKING WITH NOVA NANOLAB Milling a Pattern Scan Beam Patterning Stage Tools Y Pause FE Snapshot Fhoto F2 Vicdeoscope F3 Reduced Area F7 Full Frame Ctrl M P Spot Line External Beam Blank Ctrl B Slow Scan Ctri shife Fast Scan Ctri 5hift Slower Scan Cm Faster Scan ty pee a Mains Lock v Live Average 8 frames Integrate 1 frame Scan Rotation Shift F 12 Preferences Cto Milling in Spot Mode Select SPOT from the Scan menu to place a single spot directly in the center of the screen The cursor becomes an open green cross in the center of the screen If the cursor is not moved the milling process will take place in the center of the screen Click anywhere on the image to move the green cross to another position for spot milling TABLE 6 30 MILLING A SPOT Step Action Move your feature to the center of the screen Select SPOT from the Scan menu A open green cross is displayed in the center of the screen Move the cursor over the spot required for milling oa sor 6 To exit SPOT mode chose FULL FRAME 572 4022 262 61641 WORKING WITH NOVA NANOLAB Creating Cross Sections Creating Cross Sections A Typical Cross Section Cross sections are cut in a stair step fashion to allow the exposed layers to be seen when the stage is tilted to 52 Mill a typical cross se
77. process by setting the stage to eucentric height When you set eucentric height approach the final Z value from the same direction each time Normally the final move should be in a downwards direction with the Z value decreasing and the FWD value increasing This procedure removes any backlash in the Z drive and is particularly important with 50 mm stages When you set eucentric height with the ion beam on a DualBeam system the geometry of the column relative to the sample means that a downwards stage move will cause a feature to move up in the image with scan rotation at 0 When you set eucentric height with the electron beam on a DualBeam system the feature will move down when the stage moves down Running Auto TEM Start RunScript 2 Click OPEN WORKSPACE navigate to the subdirectory containing the TEM scripts and open the workspace file TEM wsp The RunScript interface appears as shown here with the correct check boxes automatically checked Button 6 is used for the AutoTEM M Wizard program Other numbered buttons are used for the data files created by AutoTEM Wizard 3 Select Button 6 and press PLAY to begin the TEM preparation process The balance of this section reviews the AutoTEM M Wizard dialog boxes in sequence with a full explanation of available options Membrane Setup Preliminary Steps After you select Button 6 and click PLAY the system displays a dialog box that prompts you to turn on GIS heati
78. specimen chamber vents but the electron and ion columns remain under vacuum CAUTION A FEI Service Engineer or a Authorized Supervisor must restart the system after an emergency power off The EMO switches are latching Once pushed in they must be rotated in the direction of the arrows to reset FIGURE 1 1 EMO BUTTON EMO switches are located on the back of the E2 Console FIGURE 2 EMO BUTTON LOCATION m 4022 262 52351 SAFETY amp HANDLING Chemicals Chemicals Before using any chemicals obtain and read a Material Safety Data Sheet relating to the substance Be aware of hazards and how to avoid them before using or handling any chemical Solvents Use solvents carefully and in sparing quantities Before using any solvent read the Material Safety Data Sheet Avoid hazards listed on the Material Safety literature and avoid spillage skin contact eye contact and vapour inhalation WARNING VOLATILE AND CORROSIVE SUBSTANCES CAN DIFFUSE THROUGH CONTACT LENSES DESPITE REASONABLY WELL VENTILATED CONDITIONS Moreover contact lenses are difficult to remove when an irritant chemical enters the eye making irrigation ineffective Care must be taken to address the issue of contact lens worn by those coming into contact with such solvent fumes Nitrogen Nitrogen may be used to vent the system Nitrogen is not poisonous but is a potential asphyxiant WARNING SUFFOCATION IS POSSIBLE IF NITROGEN OR LIQUID NITROG
79. step 18 kV to 500 V in mode 2 30 kV only in mode 1 44 UHR Lens Align 42 UHR Stigmator 43 UHR Image Shift 45 HR Image Shift Eliminates image shift when focusing in Mode 2 immersion mode for the whole range of the accelerating voltages and working distances Minimizes image shift during total Stigmator correction of X and Y in the Mode 2 Aligns voltages in Mode 2 so that minimal Image Shift is seen at voltage changes Aligns voltages in Mode 1 so that minimal Image Shift is seen at voltage changes and between Mode 2 and Mode ls The sequence always begins with Instructions No Step and the Start button Some of the alignments have numerous steps in the procedure many are repetitive in content only parameters such as kV or spotsize may have changed n 4022 262 61641 ALIGNMENTS 10 Source Tilt and Shift 10 Source Tilt and Shift Alignments E source Tilt and Shift l l Alignment Function a This procedure adjusts the electron source for the whole range of A voltages and spotsizes It is possible to complete it only for the TL INR CES ie voltages which are going to be used but to correct all it is necessary to electron beam for several i i Spotsizes and High Voltages complete the procedure for all values Before starting this alignment Fress the Start button the Final Lens Strip Aperture Alignment has to be done Instructions Note When each procedure ends save the adjustm
80. sufficient to protect the surface from unwanted milling usually 1 um 2 Click SHOW REFRESH WITH SLICE to preview your selections Auto S amp V displays the patterns for the protective coating and underlying slices in one view so that you can check their alignment to Sli e ol xj File Setup Utilities View Help Run Stop Phase none Processing slice D Current process none Progress Slice Rough cut Coating Application si Width x ha o um Length i B um Depth iz ES um Current ap o E n Show Refresh HARD amp SOFTWARE OPTIONS Using Auto Slice amp View 3 Ifthe protective coating step requires a different ion beam current than the rough cut or slice steps deselect the option Disable Aperture Change on the Utilities menu NOTE If you are using the protective coating option be sure the appropriate GIS is heated before running the application Rough Cut Select the appropriate options in the Rough Cut pre slice group Set the WIDTH and LENGTH parameters such that Y gt 1 3 x Z This proportion will allow imaging of the entire face of the mill at a 52 stage tilt The rough cut should also be wider than the area to be sliced 2 Click SHOW REFRESH to display the pattern to be milled 3 Ifthe rough cut step requires a different ion beam current than the protective coating or slice steps deselect the option Disable Aperture Change on the Utilities menu 4 Using the sam
81. t l lide i lh i Order Action select the Working Distance necessary from the list below Optimize the image with Focus Contrast and Brightness Click on the Next button to move to the next Step or Cancel fat any time to leave the Alignment procedure and return to original settings Mode 2 Instructions Specimen Tin Balls any suitable sample Steps 5 Press the Start button step 1 ofS select a Working Distance 1 0 mm TABLE 9 12 44 STEP 1 OF 5 1 5 mm Order Action 2 0 mm 3 0 mm Select a Working Distance 5 mm for Eucentric jobs Optimize the image with Focus Contrast and Brightness Contrast Brightness Cancel 4022 262 61641 9 13 ALIGNMENTS 44 UHR Lens Alignment Alignments 4 UHR Lens Alignment 4 TABLE 9 13 44 STEP 2 OF 5 Instructions Order Action UM For the chosen WD a start HV will be displayed Focus with the Z Stage mouse movement Click on the 4th Quad with the optical image of the stage With the mouse wheel pressed moving the mouse up will move the Z up and moving the mouse down will move the Z Facus with stage Z movement Optimize the image with Contrast and Brightness Click on the Next button to move to the next Step down These movements are represented by up down arrows Use this to focus the object by observing the response in the Ist Quad step 2 ofS Setting HV 18 0 kV Optimize the image for Contrast and Brightness Actual Hv 18D
82. the Scan system Live With Live selected the image remains unfiltered for collecting direct images mostly in Live Slow scan Average Select Average to continuously average a specified number of frames selected from the list resulting in a better signal to noise ratio This is used mostly in a fast scan mode to reduce noise in fast scanned images During averaging the image is updated continuously and actions such as focusing moving the stage etc can still be performed The number of frames can be selected as a preset from the Tool bar drop down list box associated with the Average function Integrate The Integrate feature allows accumulative noise reduction by true integration over a number of frames selected from the list and freezes the final image During and after image accumulation you cannot change the focus or perform other image influencing actions The number of frames can be selected as a preset from the sub menu or from the Tool bar drop down list box associated with the Integrate function 4022 262 61641 EU USER INTERFACE Scan Menu Scan Rotation Clicking on Scan Rotation activates the onscreen tool to rotate the scan and align the image It has no effect on the stage movements and is Solely a scan coil function but is used to orientate the image relative to mechanical rotation and detector direction It can also be activated by Shift F12 Preferences Clicking on Preferences opens the total pr
83. the automatically generated script match rcg at each recognition location If you know specifically the feature you expect to find you can modify autofib rcg to use a particular bitmap for recognition The script match rcg uses the match template set up during the script definition Resets the template size interval expected drift etc to the original Drift Control default settings Calibrate beam shift after restoring the default settings Determines beam shift sensitivity This establishes the voltage required to move a locating feature back to a desired location and helps in successfully locating those features Using Templates When you define a script that uses Auto locate the system prompts for a locating feature It can be any distinguishable feature near the milling area A movable template marks the feature on the screen image NOTE Never place a template over a milling area When milling changes the feature Auto locate will be unsuccessful The locating feature does not need to be within the initial image area displayed on the screen but the beam shift limit is 100 um away from the milled area The beam shift offset used to locate the feature is stored in the script Position the feature in the field of view using beam shift and reposition the template if necessary Do not change magnification or move the stage During Auto Locate the beam shift offset is automatically applied before the alignment image is acquir
84. the positioning of the specimen by reference to coordinated points otage Buik Flip Tilt Correction Actual Fx m mul Stage The Stage module consists of 3 planes at present BULK FLIP and TILT 13 2735 d DIEM CORRECTION These are accessed by horizontal tabs at the top of the ulis g 4 9599 mm el module ml 52 0 y 39 Bulk tab HE 136 1 gt du The BULK tab displays a LOCATION list box for storing and selecting positions store on the map The stage maximum cover 1s displayed as Last Position Add a large rectangular area known as the MAP with an inscribed circle A Update displaying a center axis cross All positions to be located and stored S will be shown on this large circle In the top right corner there is another smaller circle known as the RADARVIEW and is the true rotational condition of the stage at any time Iv Compucentric Rotation Gird 2 Remove Radarview The small circle in the top right of the stage area relates to the rotation position of the stage at one time By holding the left mouse button down on the black triangle on the perimeter of the circle and moving it round to another angle position the stage will follow the action promoted on release of the mouse button The large circle remains in the same state to represent true X and Y directions All positions that incurred rotation of the stage in their stored locations Maps will display rotation condition in the radar view when resto
85. the DETECTOR module found on most pages or from the MUI Adjust to a suitable magnification via the Tool bar MAGNIFICATION list box or the keyboard plus and minus keys or from the MUI Correct the focus and astigmatism m 4022 262 61641 WORKING WITH NOVA NANOLAB Detectors for Nova NanoLab Detectors for Nova NanoLab Detectors Scan Imaging Detectors general v ETD Ej The Detector menu shows the imaging detector s installed on your TLD BSE system for imaging A tick marks the active detector STEMI A B a CDEM SE The I Beam has one active mode for milling and imaging whereas the E Beam has Mode 1 for low magnification Search conditions Mode B EN 2 for High Resolution imaging and Mode 3 for Analytical work pales Detector selections are tied to the choice of the active beam The system always reverts to the last detector used for that beam TLD S can be used with either Beam in Mode 1 or 2 TLD B TLD C and TLD D are E Beam specific for Mode 2 with magnifications greater than x1000 The SED is only used with either beam in Mode 1 or Mode 3 e CDEM I is used with the I Beam and CDEM E can be used with Detectors Contrast either beam Optional E H The STEM is used with the E Beam in Mode 1 2 or 3 Brightness When you select a detector the contrast and brightness adjusters default to the settings last used for that detector TABLE 6 2 DETECTOR MODES Detector
86. the Login dialog box for Windows 2000 accessed at startup Start the application Click open the Beam Control page Check and set the conditions recommended in the Strata Setup Conditions previous table If a sample is not already in the sample chamber insert one according to the directions for loading samples found later in this chapter Click WAKE UP if the System module indicates it is in SLEEP mode This typically take 5minutes This process will start the High Voltage on both columns and open both isolation valves The Beam that is primary is indicated by the logo in the column module in this case Electron The High Voltage slider can be adjusted to that required for the primary Electron beam By switching beams on the Tool bar the Beam Control page will revert to the other beam in this case Ion for adjustment to be made Focus the cursor on Quad 4 and turn on the CCD camera This 1s to monitor the positioning of the sample relative to other items in the chamber Focus the cursor on Quad 1 and click UNPAUSE on the tool bar to release Quad 1 to the scanning of the E Beam Click on AUTO CONTRAST AND BRIGHTNESS in the Tools menu or control the CONTRAST and BRIGHTNESS from the DETECTOR module found on most pages Focus and stigmate the image using the mouse or MUI Click on the Z FWD icon in the tool bar to calibrate the physical position of the sample 4022 262 61641 EI WORKING WITH NOVA NANOLAB Beginning Your Sessi
87. the best results It is recommended to use 30 kV and spot 3 Mode 1 with the specimen at a 5 mm working distance the Beam Shift Reset eucentric working distance in the xT FIB SEM Zero Beam Shift Define User Units User Units When the aperture is well aligned the image does not rotate at low Home Stage Shift F3 magnification or move at high magnification during focusing The Horne Apertures position of the final aperture should remain constant and should not be Home Stage Without Rotation changed further during the alignment procedures Center Position Ctl o TABLE 6 11 ALIGNING THE FINAL LENS APERTURE Touch Alarm Enabled Unlink 2 to FW Step Action Link 2 to EVI SiS Y Enable 2 Tilt map 1 Go to Mode 1 at 5 mm WD Tit n CHE Select Zero Beam Shift from the Stage menu Tilt 52 Ctrl I Sample Navigation 2 Make an image at a magnification of about 10 000X Select a fast scan rate from the Scan Speed control and Average 4 from the Filter control on the Tool bar Preferences Colo Yacuum 3 Move the stage to find a good area of interest and focus as Vent best one can Eoo a center a feature with the Get function sleep z Click in the Modulator check box in the Tuning module of Calumn p FEES the Beam Control page a cross appears in the center of the screen and the image rotates about a point on the screen Beam On High voltage y 5 00 kv l A
88. the list Clicking on the Custom mode will activate the adjuster s These are to vary the custom mode of the detector When grid bias 1s negative secondary electrons are repelled from the ETD detector and only backscattered electrons are detected The biasing capability is from 150V for only backscattered electrons to 300V for secondary collection FIGURE 6 10 ETD CUSTOM MODE Detector Settings p Detector ETD Mode Custom y Grid Voltage Default Grid Voltage Selecting any ETD mode will set that mode label in the ETD position in the Detector menu All changes made are visualised in live time except while Patterning the detector responds immediately 4022 262 61641 EU WORKING WITH NOVA NANOLAB Standard Imaging Detectors Detectors Scan ETD SE TLD BSE STEMI A B COEM SE CECO pis Detector Settings Detector TLO y A Default suction Tube voltage TLD You can choose up to four defaulted modes and one custom mode from Thru the Lens TLD detector on the Detectors menu The current choice is displayed next to the TLD label in the Detector menu The TLD detector works in Modes 1 2 and 3 Mode 1 and 3 In Mode 1 and 3 the TLD will only show Secondary and Backscatter Electrons as the choice Custom 1s also available to work with a grid voltage between the two conditions of electron collection To vary the grid voltage for this detector first click on c
89. the wobbler modulating depth Click on the Finish button Auto Buttons In some of the pages will be found Auto Buttons that achieve a similar stigmator Y alignment result to the above described adjustments It is possible to just click Pine the Auto button This function utilizes Image Recognition software If this utility does not recognize image features well the procedure is aborted and Warning message appears onscreen In this case change the imaging conditions better focus slower scanning lower magnification or use the normal manual procedure step 2 of 2 1 Ea Cor A Ms Lb Ex Stig Y Wobbler Amplitude H BM m Contrast Brightness Cancel mE 4022 262 61641 ALIGNMENTS 77 Stage Rotation Center 17 Stage Rotation Center User SEM Alignment This alignment sets up the compensation factors for the stage X 0 Instructions and Y 0 positions as well as the stage rotation center The offset of This alignment sets the stage X and Y are calculated in this procedure so that the Compucentric E Rotation will be correct when computed at any later time Th correct use of Compucentric p pa SIG i Rotation procedure should be performed at zero tilt unless you are working at a Click an the Start button specified tilt angle 17 Stage Rotation Center procedure The 17 Stage Rotation Center procedure starts here TABLE 9 40 17 NO STEP Alignments z smgeRottoncene y Order Action 17 S
90. then the Snapshot icon in the graphical area can be dragged to a new value of Dwell Time with the left mouse button Once released the new values update in the property editor FIGURE 6 22 SNAPSHOT SETUP xTm Preferences DROPDOWN LIST Databar Units Presets Scanning General Movie Sensitivity Re 50 0ns 100 0ns CP 300 0ns SCAN SELECTION 1 0us Dwell Time Ene i Resolution 1024x884 Y 7 Line Time j 3ms ps Frame Time 3 0s 30 0ps Refresh Rate 335 82mHz 100 0us e 300 015 500 015 1 ms CHOICES IN THE PROPERTY EDITOR OK Cancel Apply To set up Snapshot Preference for E and beams Make the destination of the to be saved files available to the save routine in the File menu by opening a folder and saving a test file to it Open the Preferences for Scanning Select the Snapshot scan preset from the dropdown list at the top of property editor e Select a suitable dwell time from the Scan Selection in Scan Preferences by dragging the Snapshot camera icon to the required value or by selecting from the DWELL TIME property editor of the Scan Presets e Select a pixel resolution from the RESOLUTION property editor of the Scan Presets Enter the number of frames in the INTEGRATE property editor of the Scan Presets sas 4022 262 61641 WORKING WITH NOVA NANOLAB Taking a Snapshot Select the ACTION property for either Save Save As or None Save Prompts the Save dialog and displays the ne
91. todos siesta dona 5 12 RELATION BETWEEN VIEWED IMAGE AND STAGE 5 13 BEAMINDICATORS 1224221327588 e b Saddle oia SSeS eS 5 16 BID DETECTION CHOICE ia ct esie bete etes 5 17 EIDCUSTOM MODE 5 ted oes tara d trem da a eon ed do 5 17 MODE gt PED CHOICES 255r se bois MESSA bo oh eee tek ee ES 5 18 MODE 2 TED CHOICE Ss amp vat wodine ads ba aio de aso te er nor eo en 5 18 CDEM DETECTION CHOICE css tig cate gape whet heey Sie ey Sees 5 19 THESTEMDETECLOR stas dat 5 20 STEM DETECTOR CHOICES 0er dica ea 5 2 ACB DIALOG BOX siu Yd dei Pewee Id pd SAU TERRE edt a 5 25 AUTO FOCUS DIALOGUE BOX 4 e Bate ete id ete es 5 27 AUTO STIGMATOR DIALOGUE BOX 0004 5 29 HV RELATED BEAM CURRENT VALUES 5 30 THE HEATED APERTURE HOLDER MODULE 5 3 MAGNIFICATION PRINCIPEE 552 23 ener c tern eti anton area ieee 5 35 SNAP SHO RSET WPS utorrent ade m eis 5 38 SAVE AS DIALOG amadas rs eek oe iple da e UR 5 4 THE MOVIE TAB DIALOGUE te e eiue 5 43 EELMOVIE CREATOR TAB FILE osa aia 5 48 BROWSE DIALOGUE coil ale 5 48 MOVIE CREATOR TAB DATABAR eene 5 50 MOVIE CREATOR TAB PREVIEW stare LEE REY T idad 5 5 PRINTER SETUP DIALO errari aeui aie te ee n educ on ees 5 52 IMPORT OPENJDDIXEDOGI in eate Mad e OR SD Dog eis RUE n 5 53 4022 262 52351 4022 262 52351 EXPORT SAVE Ad 4DIALOG serried oe ood phe eee di PATTERN SELECTION 22 6c2veiees heed Gos each oh eke RE EE ERI RESIZING HANDL
92. too large use a word processor to open it If you query the log file while AutoFIB is in AutoRun mode an error may occur if AutoFIB attempts to add data to the file Options Menu The Options menu determines how the microscope behaves during and after running an auto FIB session visual Match Auto lon Hv Off Auto Electron EIN Of TABLE 8 5 OPTIONS MENU OVERVIEW Auto H OF Ion Source Off Menu Item Description Visual An image dialog box is displayed whenever an Match image recognition routine match command is performed in an AutoScript script Selected is the default setting Auto Ion The system turns off the HV of the ion beam at HV Off the end of the AutoRun mode operation or if an error occurs An error occurs e g if the stage does not reach the requested location The default setting is not selected Auto The system turns off the HV of the electron Electron beam at the end of the AutoRun mode operation HV Off or if an error occurs An error occurs e g if the stage does not reach the requested location The default setting 1s not selected Auto HV Off The system turns off the HV of both beams and Ion Source the source of the ion beam at the end of the Off AutoRun mode operation or if an error occurs An error occurs e g if the stage does not reach the requested location The default setting 1s not selected m 4022 262 61641 HARD 8 SOFTWARE OPTIONS AutoFIB Menus Set Up Menu TABLE 8 6 S
93. wed om ins 9 19 Alignment Funciones exten sees a EE PT deena es 9 19 43 UHR Image Shift Correction Procedure 005 9 19 45 HR Image Shift Correction 0 00 ees 9 22 Alignment Function 0 000 0 0 cee ccc cece eee eens 9 22 AS HR Image Shift Correccions soy acs et enue lala 9 22 11 Automated Source Alignment 0 00 00 ccc cee eee 9 24 A Oninent Funcions sisri 2 do qud duc RnB TE En a as 9 24 29 A Uto Zero delecloF scu m Toe Eau o a oe aa ERE 9 26 Alignment Function oos e e Gann des ee De ERRARE ERES 9 26 29 Auto Zero detectors procedure 0 eee 9 26 Si go 6i Red po re bI PE d PNE TRE EU PIE EFIE NS 9 27 5 Emitter Startup Procedures jc ie neds ge pense od wet dee aoe 9 27 13 2 Stromator Alinen 5e be xar oe Marked oe eae oe og we ees 9 29 User SEM Alionment 5 cue ii 9 29 I5 3S emator XD BRI E oar oe ds A ed a 9 29 I Stage Rotauon Center cse eek A ES 9 31 Dser SE NIZADSDnelit creciera dirt 9 3 17 Stage Rotation Center procedure 0 0000 9 3 Ion Column Alignment Overview 0 cee eens 9 33 SUDSEVISOES OBLV rra dardo cado 9 33 100 Vacuum Startup IGP S ooooooooooooooorroo nooo 9 34 Alignment Field FUnCHONS a A AA da 9 34 100 Vacuum Start IGP s procedure 0 0 0 0 eee eee 9 34 210 lon Column AMOO ausum REED oun E EGER VENUES EAS 9 35 Alignment Field Functions 0 0 00000 cc cece eee eens 9 35 Alignment procedure 9 38 I
94. will move the Z down These movements are represented by up down arrows Use this to focus the object Bring a recognisable image feature under the screen Centre Cross with the use of stage movement do not use the beam shift Click on the Next button Contrast Select mode 1 The HT is auto selected starting at 30kV indicated by First HT in the Instructions Correct Contrast and Brightness 1f necessary Brightness Cancel 9 22 4022 262 61641 ALIGNMENTS 45 HR Image Shift Correction TABLE 9 30 45 STEP 1 OF 3 Alignments 45 HR Image chift Correction Order Action Previous Next Instructions 7 Tune Shift CorrAngleX Y to bring the object back to the original position under the annotated shape and reduce the shift in the image a Click on the Next button Optimize the image with Contrast and Brightness Control the 2D adjuster to bring the feature back under the center cross Click on the Next button to move to the next Step step 2 of 3 Hv 30000 s P Hs remaining shift Carr amp nglexy TABLE 9 31 45 STEPS 2 TO 3 Order Action Optimize the image with Contrast and Brightness By using the 2D box labelled ShiftCorrAngleSX Y bring the image feature back under the screen center cross Alignments 45 HA Image Shift Correction Instructions Press the Finish button to save and finish Repeat the procedure as for all offered voltages Press
95. 0 SILICON APPLICATION FILE GAS orice ed xed te addons tao teed 5 61 MATERIAL SPUTTER RATES AT 30 KV 2 0000 5 62 PATTERNING FILE BASIC PROPERTIES 5 63 PATTERNING FILE ADVANCED PROPERTIES 5 63 SETTING UP THE GS nist oars detur Haake dac Ee Etc Sot s VE 5 66 SE PING UPRTE EPM sad dole li Bates Lon 5 68 MILENA PALTEEN stu th aaa ot Bel atu ea eee dt tale Gal LA seus 5 70 BEAM CURRENTS MILLING TIMES BY APPLICATION 5 7 MIELING A SEO age ese gh ia ee hate sist ie 5 72 MAKING THE FIRST CROSS SECTION 200 5 74 MAKING THE SECOND CUT OPTIONAL 5 75 MAKING THE FINAL CUT act wider ean iros ees 5 75 USING MEASUREMENT FUNCTIONS 413 4 E ERR dia 5 8 USING ANNOTATIONS FUNCTIONS 00 0 0 0 0 000005 5 83 STAGES 6 FINDING EUCENTRIC HEIGHT MANUALLY 6 10 ALIGNING BOVE BEAMS 222 ts cerato oit om dae es 6 10 MAP ELEMENT FUNCTIONS enm etre d es 6 14 SETTING ALIGN FEATURE rta caba ne te eh we a eae A eee EST 6 22 DEFINE USER UNES 52525 dt do ers 6 24 ALIGNMENT TYPE DIFFERENCES 42329 42 LR ROUES RS sna 6 27 MAINTENANCE 7 HARD amp SOFTWARE OPTIONS 8 ATUTOEIBMODHS 9 cmheans aco vd guo RU o Rs 8 3 4022 262 52351 4022 262 52351 FLE MIEN ClO VER VIE Wop 2 43 95 890 39 tendre unre hab ern oo a egret aa 8 4 PLAY MENU OVERVIEW sacacasa Ee tees 8 4 LOGGING MENW OVERVIEW 555 oie bee re a et nes 8 5 OPTI
96. 0 0 0 0 ccc ccc ccc cece ees 9 3 Alinen proceda da Aas Wate a dE fe 9 3 Final ens Aperture TP AS a RU wanes 9 3 E Column Alignments for Supervisors 0 0 00 ce eee eens 9 3 Electron Column Alignment Overview 0 0 00 cece eens 9 4 PUPEIVISOTS ONLY A wae id Re eed 9 4 FEI Trained Supervisors FEI Service 0 0 0 00 9 5 Users Call s inse zer are eee ER AEN daa e debes i 9 5 Tips for X and Y Corrective Movement 00000 0 eee 9 6 E Column Aperture Alignment 0 0 000000 ccc ccc eee nee 9 7 Recommended Apertures iaa ii o ee 9 7 Aperture Loading Guidelines 0 0 00 ce nee 9 7 Changing Final Lens Aperture Sizes 0 cece eee 9 8 Strip Aperture Alignment Procedure 0 0 0 0 c ccc oo 9 9 E Column Alignment Procedures 0 0 00 ccc ccc eee 9 10 Supervisor SEM Alignments 00 c ccc ee tenes 9 10 10 Source Dit andis llb suce sadi dan bow ea We e DRE a gw ari a 9 11 Alignment Funchon 2 4 sve x ERA RES AERE RA SERE E a 9 11 I0 Source Tilt and Shift Procedute dies RE ERTS 9 11 44 s UHR Lens Alibnmetnt da a ld bes dde be al 9 13 ia AA tans aS RC eee E ie dd 9 13 4022 262 52351 4022 262 52351 q 44 UHR Lens Alignment Procedure 0 0 00 9 13 42 UHR Stigmator Alignment 00 00 9 16 Io AA A eee ea beat eee 9 16 42 UHR Stigmator Alignment Procedure 0000 9 16 435 UHR Inace mit C OMe CHON 24 6 4 oe ee Gor oy
97. 10pA 30pA SOpA 300pA 20 000pA Action SideWinder Column Select QUAD Turn on the L2 WOBBLE and adjust the Quad Steering to get a reasonable image with a little or no lateral movement while the image goes in and out of focus Click and hold the left mouse button in the two dimensional X Y control The cursor changes to the image of a hand and moves to the center of the screen Move the Hand cursor side to side to minimize image motion Release the left mouse button when you finished Attempt to get the image to swell only Select APERPOS Turn on the L1 WOBBLE and reduce image wobble by adjusting the aperture position Select STIG SIN and turn on the WOBBLESTIGSIN Reduce image wobble Select STIG COS and turn on the WOBBLESTIGCOS Reduce image wobble Select STIG Click and hold the left mouse button in the two dimensional X Y control and adjust the stigmation of the image for equal sharpness in all directions Readjust focus with the L1 L2 Corr adjuster or MUI knobs Alternately adjust stigmation and focus to achieve the best image Click SAVE when finished Repeat step 4 8 for all apertures 1pA 10pA 30pA 50pA 300pA 20 000pA m 4022 262 61641 ALIGNMENTS 270 lon Column Alignment Image shift Correction Alignments Correcting image shift is the final step in the column alignment process This is not the beam shift used in imaging it is a 210 len Column Alignment l preprogramme
98. 2 3 4 6 7 8 or Darkfield contrast mode positions 1D and 5D Operation is fully integrated in the main software The STEM detector uses slowscan rates for normal imaging Materials or hard samples should also be prepared as for the TEM by Ion beam thinning techniques FIGURE 6 14 THE STEM DETECTOR Sample Grid positions for BF DF By loading the Stem holder with a sample tem grid in one of the appropriate positions provided Brightfield and or Darkfield imaging can be achieved The following table refers to the numbering of the positions and their related capabilities m 4022 262 61641 WORKING WITH NOVA NANOLAB Optional Imaging Detectors TABLE 6 4 STEM DETECTOR POSITIONS Grid Position Observation and Diode switching Brightfield observation use A segment switch only Brightfield observation use B segment switch only D1 and DS Darkfield Brightfield observation If the object for observation is left of the segment separator then A switching will give Brightfield and B switching will give Darkfield observation The opposite applies if the object is right of the segment separator User interface Detectors Scan The STEM detector like other detectors is selectable from the Detector menu within the xTUI The mode function can be chosen ETD SE TLD BSE from the Detector Page The A B condition default is used first setup e STEMI A B so that the total detector is working To switch BF DF choose A or B C
99. 2x the value used for Brightfield 1s a good guide level EDX analysis with STEM If the Strata has a EDX system attached operate this in Mode 3 using the TLD detector mode for reference only but back to STEM detector for EDX analysis Set the sample surface to 5 mm FWD Select the area of interest in the STEM mode and perform X ray analysis Mapping or Linescans as appropriate Because the samples are not bulk in nature the beam spread normally associated with SEM samples will be greatly reduced and therefore higher spatial resolution can be obtained in the STEM mode This also provides less background in the spectrum and allows better separation of peaks as well as more accurate lower count rate mapping The kV chosen for analysis will still depend mainly on the composition of the sample 4022 262 61641 EI WORKING WITH NOVA NANOLAB Optimizing the Image Optimizing the Image Improve the image by changing scan speeds contrast brightness focusing stigmating adjusting beam current or magnification Changing Scan Speeds To produce the highest quality image at low beam currents use slow scan rates If an image is noisy with No Averaging selected changing the scan speed to a slower scan improves the image quality by increasing the signal to noise ratio You can also improve image quality by using Averaging Contrast and Brightness Tore This Detector module contains 2 logarithmic and 2 linear adjusters Contrast whi
100. AB Creating Cross Sections TABLE 6 31 MAKING THE FIRST CROSS SECTION A re Action EN sacs Quad by clicking in it and the E Beam icon a Quad by clicking in it and the E Beam icon from the Tool Bar and begin scanning Move the stage to where you want to mill the cross section Find the eucentric position Tilt the stage to 52 Save this position in the LOCATION list in the STAGE module This is as far as the instructions take you in the section Beginning your session Align both beams by correcting the coincidence found in the section Beam Coincidence Optimize the I Beam image Restore the stage position you stored in Step 5 From the Tool Bar Select the I Beam icon Set the I Beam current to 150 5000 pA depending on the size of the cross section Image briefly on the area to set the magnification and position Click SNAPSHOT to grab a I Beam frame Open the Patterning page and do the following Select REGULAR CROSS SECTION from the pattern tools menu on the Patterning page Bring the cursor to the image area and draw a rectangular box about 2 um from the area of interest nN o While still on the Patterning page within the property editor set the APPLICATION to si and enter the value for the DEPTH as needed Press ENTER to update Click SNAPSHOT to grab a I Beam frame Click on the START PATTERNING icon in the Tool Bar Use SNAPSHOT to update your image as desired by grabbing a fram
101. ARD dl 4 LIST CONTROL PATTERN CURRENT Basic Advanced SELECTED PROPERTIES PATTERN Name salue Application Size pum PROPERTIES m Oum LEVEL Z size pum PATTERN DETAILS ENTERED AND DISPLAYED DwellTime Us acanUDirection Bottom Yo Top Rel Int Diam 2 75 Beam Eltron PROGRESS TotalTime Us BARS Progress Total Tre 0 SELECT Overall Progress TA ALL Current Progress D Select All Progress This module displays the overall and current progress over time of the active Patterning Omniprobe The Omniprobe micro manipulator allows you to extract a TEM sample in situ By selecting or deselecting the checkbox the Omniprobe needle can be inserted or retracted Gas Injection The Gas Injection modules provides the capability to select the type of gas deposition or etch FIGURE 4 32 GAS INJECTOR OVERVIEW DETAILS Gas Injection Las Injection Overview Details Overview Details In Gas type Heat Flow selected GIS la Port ODIA Port Cold ODE Part Cold Position Retracted Heater Ot Heat state Cold Gas flow Closed Overview Tab On the OVERVIEW tab the checkbox to the left of the Gas Injector labelled IN is the toggle for in or out activation of the injector The gas type is the gas assigned to the port The HEAT status is a toggle between cold hot and the FLOW status is a toggle between open closed 4022 262 61641 463 USER INTERFACE Sample Preparation Page Details Tab
102. ARE OPTIONS Auto TEM Wizard Software Step 4 Medium Milling In this step the FIB mills trench edges on alternating sides of the membrane at a slightly lower beam current and higher magnification This step takes approximately 2 minutes The sample is reduced from 4 um to 2 um FIGURE 6 135 MEDIUM MILLING Liftout Sample otep 5 Fine Milling During fine milling the FIB continues milling on alternating sides of the membrane The stage tilts to ensure uniform thickness of sample This step lasts 3 minutes The sample is reduced from 2 um to um FIGURE 8 14 FINE MILLING Liftout Sample otep 6 and 7 Fine Polishing During fine polishing the FIB continues milling on alternating sides of the membrane The stage tilts to ensure uniform thickness of sample This step lasts 9 minutes In step 6 the sample 1s reduced from um to 0 5 um In the final step the sample is polished to its final thickness This step takes approximately 3 minutes FIGURE 8 15 FINE POLISHING Liftout Sample 4022 262 61641 837 HARD amp SOFTWARE OPTIONS Auto TEM Wizard Software Image Recognition During sample preparation the DualBeam system uses the crosses milled into the sample to locate the membrane site monitor for drift and correctly place the cuts used to free samples In some cases the system may have difficulty finding these crosses If this occurs the system will first try to find the crosses by Matching the
103. CEL button Step key to highlight items in a dialog box ARROWS Use to select between items in a group when in an edit box ALT Use ALT in combination with a character underlined characters in the menu items to open the pulldown menu in the active application For example pressing ALT and Mat the same time brings up the Magnification pulldown menu Key Function NTER ALT TAB Use these keys to show the last used program simulta Continue to press the TAB key while holding neously down the ALT key and applications that are resident are shown one by one When the application you want is shown release the ALT key and 1t becomes active again ALT F4 Exit Application software and Windows simulta Deletes an item in an edit box neously 4022 262 61641 E USER INTERFACE Entering Commands Function Key Short cuts Function Keys can be found at the top of the Keyboard and work either on their own and with Shift or Ctrl keys TABLE 4 8 FUNCTION KEY SHORTCUTS Key Function p ml 4022 262 61641 USER INTERFACE Entering Commands Specific short cuts on the Keyboard These are Keyboard short cuts for specific functions TABLE 4 9 SPECIFIC KEY SHORTCUTS e NN Key Function Rounds off magnification to nearest whole number Arrows Move one field 80 of view in the direction of the arrow 4022 262 61641 an USER INTERFACE Hardware Interface Elements Hardware Interfa
104. DEM SE from the dropdown list This will switch either side of the detector diode CCD The Left segment represents the positions 6 7 and 8 and therefore to fli activate switch A diode The Right segment represents the positions 2 3 and 4 and therefore to activate switch B diode Dieiecti euin pe Choosing A B from the dropdown list will give a negative image that Detector STEM y although will not be used frequently may highlight features by mode Lara contrast not otherwise easily seen FIGURE 6 15 STEM DETECTOR CHOICES Detector Settings p Detector STEM y Mode Loading samples The STEM holder part of the detector can either be loaded with samples while outside the SEM or when it is mounted and fixed to the stage movement It is more convenient to load the holder before attaching to the stage The central screw on the top of the holder can be loosened and the top removed This exposes the 8 grid positions as recessed round holes 4022 262 61641 EI WORKING WITH NOVA NANOLAB Optional Imaging Detectors with tweezers slots on the base plate Positions 2 3 4 6 7 and 8 will provide only Brightfield imaging whereas positions D1 and D5 will give both Brightfield and Darkfield imaging Load the TEM Grids samples sample face up in the grid holes The holder top has raised rings to press down in the grid holes to hold the TEM grids firmly in place The numbers on the top should overlay the s
105. Deposi protective Dating Protective Coating Deposit Rough cut step rough cut step Slice step Grab image Repeat for consecutive slices Mill slice 4022 262 61641 sn HARD amp SOFTWARE OPTIONS Auto Slice amp View Software Application Selection To include a particular process step in the Auto S amp V operation select an Application file Material file for that step To exclude a particular process step set the application to NONE To include the protective coating step select an application in the Coating option group for example use Pf for Platinum To include the rough cut and slice steps select Si as the application in the appropriate option group Launching Auto S amp V Before launching Auto S amp V you must first start xT if it 1s not already running To launch Auto Slice amp View click START gt Programs gt FEI Company gt Applications gt AutoSliceAndView m 4022 262 61641 HARD amp SOFTWARE OPTIONS User Interface User Interface The Auto S amp V user interface contains five dropdown menus and three main option tabs Menu Commands TABLE 8 11 FILE MENU COMMANDS Menu Command Description Image Save Location Image Save Accesses a dialog box used to specify the Open Recipe Location directory where images produced by Auto sawe Recipe S amp V will be stored Save Recipe as Save as Default Recipe Open Recipe Loads the specified recipe and displays its Lo
106. Details Tab Clicking on the DETAIL tab will display the characteristics of the active Gas Injector The characteristics can be changed by entering the details to configure the injector End Point Monitor EPM The End Point Monitor gives visual feedback to the progress of a milling process This device can be activated to start when patterning starts stop when patterning is paused and restart when patterning 1s continued Graphs The GRAPHS tab illustrates in live time the cutting depth progress monitored by specimen current This means the milling progress can be observed as a colored graphical display showing the specimen current profile over the progressively milled area Options The OPTIONS tab allows selection of any number of milling processes being monitored to be graphically displayed The ACTIVELIVE selected will be active until changed ACTIVELIVE Quad The IC pattern started in Quad 1 ACTIVELIVEI appears 1f set to display 4022 262 61641 USER INTERFACE Patterning Page FIGURE 4 25 EPM Options End point Monitor Graphs Options Scaling Active Lived Activel ive Activel ez ActiveLive3 ActiveLived Add To History Delete Scaling The SCALING tab can be set via X UNITS to Time or Depth This will End point Monitor correspond to how the progress is observed Graphs Options scaling A units Time y Method Auto zoom FIGURE 4 26 EPM SCALING End point M
107. EATURE applies the de skew process across the entire length bringing the long feature either to the chosen horizontal or vertical axis to make it easier to navigate This can be performed at any point within the stage field limits and takes into account the off set for rotation by computer programming of the stage Point 1 1s first located and then point 2 When this occurs point 2 is not fixed but subtends point 1 with an elastic cord until the left mouse button is released At this position point 2 is located The longer distance involved results in greater accuracy FIGURE 6 16 XT ALIGN FEATURE ALIGN FEATURE is designed to work best at the eucentric height of 5mm The Z to FWD should be corrected to the eucentric height as described in the section Setting Eucentric Height Because the stage makes movements by software control care should be taken that there are no significantly higher obstacles on the sample plane set at the eucentric height as these may interfere with equipment under the lens 4022 262 52351 E STAGES How to make Stage Movements TABLE 6 4 SETTING ALIGN FEATURE Click on ALIGN FEATURE from the Stage menu Follow the directions in the dialog box that appears and choose either Horizontal or Vertical that relates to the orientation needed on the sample xT Align Feature Feature Position Align Feature Ehe Horizontal C Vertical p2 x Slick in the active Quad to specify the first point P1 Cancel
108. EN IS RELEASED IN AN ENCLOSED ROOM WITHOUT ADEQUATE VENTILATION Liquid Nitrogen Liquid nitrogen used in the EDX system has the potential to cause frostbite 1f direct contact with skin occurs On standing liquid nitrogen picks up oxygen from the air and forms liquid oxygen in solution Treat any liquid nitrogen that is not fresh as though it had all the hazards of liquid oxygen 4022 262 52351 aT SAFETY amp HANDLING Miscellaneous Precautions Miscellaneous Precautions Electric Fans Some instruments in the system may be air cooled Do not block the air flow to or from the fans Do not operate fans with the protective covers or filters removed Keep fingers loose clothing etc away from fans Periodic filter maintenance may be required to prevent overheating Pump Exhaust Failure to provide proper exhaust filtering may discharge oil mist into the environment Such oil mist may be an environmental hazard as well as a health hazard in an enclosed room Corrosion Components are painted plated or otherwise treated to resist corrosion However the components must be handled and stored properly to prevent corrosion Observe precautions carefully m 4022 262 52351 SYSTEM OVERVIEW The Nova NanoLab integrates ion and electron beams for FIB and SEM functionality in one machine Users can switch between the two beams for quick and accurate navigation and milling Convergence of the SEM and FIB at short working d
109. ERR ds 3 10 Startup from complete System Shutdown lleslsun 3 11 SAUS IS ER A pet tablas AAA 3 11 Em rse ey Power OH EMO Pociones tabs 3 13 What Happens during Power Failures ooooooooo o 3 14 Chapter 4 USER INTERFACE Other Software and Hardware 20 0 cc ccc ene 4 User Access Pry ROES ened ae dene ri ad swe os 4 1 Software Interface ElementS o o oooooooooooororronoo 4 2 WOO c g treet geese aeottit aad itetoatuud atin od ae Se ey chs er dura erae 4 2 Pulldown MEUS otitis is SAA AA Ad 4 2 Dialog BOXES eps a o a 4 2 Radio Buttons dd ds a de e 4 3 Check BOXES yw ASA A RU A 4 3 Command Buttons gc soo egent dier oe Serb pb e eee eetsteubekes 4 3 Cd thse Gees t te ker A A aeons Le ees 4 3 Properties tas dass dodi at ele ere eaten ea fos 4 3 Continuous Control Adjusters 0 0 0 llli 4 4 Preset Continuous Control AdjusterS o o oooooooooooooo o 4 4 Two Dimensional X Y ControlS o ooo oooooooooooo ooo 4 4 4022 262 52351 4022 262 52351 TOXCBOXEOS casa prados au scenes Seb bes ee ae 4 5 Progress didlo Sno seat ad Hkh NA DRE E WR d exe 4 5 Tapped Dalon Suse eoo A addere Us mq 4 5 Help EFunctlonsz ss Ines s Sd Eae RR A S RAE Rem aa 4 6 BS SD D et Ae ee atte ete dhe aw GS ea a eee 4 6 On Line Documentation 4 6 xT Control Interface Elements 0 0 00 000 ccc cee eee 4 7 The Main Wind Wester eri h
110. ES PATTERNING CURSORS REORDERING PATTERNS 4 ia RARI WR GRATA I Se es APPLICATION FILES CHOICE samene nre erario GAS INJECTOR OVERVIEW DETAILS sees BPNVOPTIONDS 85554 A AS SERE Aie caes FPNE SC ALIN EN U Q BEAM COINCIDENCE 2 testers raros ATYPICAL CROSS SECTION 2e ada ee Gs C dees dT oe bee CROSS SECTION VIEWS separa and rl siete eke eae CROSS SECTION VIEWING DURING MILLING CROSS SECTION VIEWING AT 0 TIED trios VIEWING AT 0 TILT ROTATED 180 0 0 CONTROLS FOR MEASUREMENT suis ended ie eons CONTROLS FOR ANNOTATIONS 0 0 00 0 o RESIZING HANDLES GRAPHIC CURSORS FEI ACCOUNT ADMINISTRATORS OVERVIEW STAGES 6 NANOLAB 200 STAGE MANUAL CONTROLS aun 6 2 NANOLAB 200 STAGE MOVEMENT seen 6 3 NANOLAB 200 EUCENTRIC ADJUSTER ooon cocos 6 4 200 STANDARD SAMPLE HOLDERS sees 6 5 NANOLAB 600 STAGE es 6 6 NANOLAB 600 STAGE MOVEMENT ss es 6 7 600 STANDARD SAMPLE HOLDERS sees 6 8 UNDERSTANDING EUCENTRIC HEIGHT esses eese 6 9 IMPORT DIALOG sssseses s rrr re 6 13 EXPORT DIA DO Gee cnt dt inh toe abuts es cota pps ine ui 6 13 MAP ELEMENTS bos EAS 6 14 MAP MAGNIFICATION ZOOM ooo 6 16 TRACK FUNCTION ss seres der ERel eed 6 19 GET FUNCTION da EE Seu E 6 20 ARROW KEYS FOR STAGE FRAME SHIFT ssss esses 6 20 XT ALIGN FEATURE ooo 6 21 COMPUCE
111. ET UP MENU OVERVIEW Menu Item Description Scripting Opens the Scripting dialog box from which you define the AutoFIB milling scripts Drift Control Opens the Drift Control Defaults dialog box from which you set the parameters for Auto Locate Drift Control Drift Control compensates for image drift It can be selected as a preference during scripting setup Drift Control is also available as a standalone program see Dynamic Drift Control This menu item accesses the Drift Control Defaults dialog box where you can specify default information for scripts Default Information Specify Auto locate information in the Drift Control Defaults dialog box which is opened from Set Up gt Drift Control or from the standalone Drift Control program FIGURE 8 2 DRIFT CONTROL DEFAULTS w Drift Control Defaults Interval Correctevery ED seconds for the first i times After that correct every 300 seconds eo Template size of HP 10 Search region around model microns Iw Drift Control while milling only Grab b frames before Auto Locate IY Grab frame after Auto Locate IY Grab frame after Drift Correction Goto next black upon image match failure Use autofib reg as matching script Restore Factory settings Beam Shift Calibration 4022 262 61641 LA HARD amp SOFTWARE OPTIONS AutoFIB Menus TABLE 8 7 DRIFT CONTROL DEFAULTS DIALOG BOX Interface Item Interval group Template siz
112. Eucentric Height and the ion beam shift in the beam control page should set to zero TABLE 9 44 I COLUMN ALIGNMENT ALLOCATION Procedures in order SUPERVISOR 100 Vacuum Start IGP s 210 Source Tilt and Shift 253 Supervisor Ion Beam 254 Supervisor GIS Function This procedure is to start the IGP s for the Electron column and the Ion column related to the system Startup after shutdown or due to a power failure Corrects source tilt and shift for the whole range of the accelerating voltages and spotsizes Eliminates image shift when focusing in Mode 2 immersion mode for the whole range of the accelerating voltages and working distances Alignment Eliminates image shift during normal stigmator correction in Mode 2 immersion mode for the whole range of the accelerating voltages and working distances NOTE lon column electronically alignment is VERY important for the successful performance of automatic scripts for instance AutoTEM and AutoFIB Ion column alignment procedures for the Sidewinder column consist of mechanical and electronic beam manipulations to correct asymmetries These corrections are made to give the best beam performance over a full range of operations The purpose of alignment is to position the beam through the column for maximum beam transmission with minimum beam aberrations minimizing image motion when you change or wobble lens voltage 4022 262 61641 E ALIGNMENTS 100
113. Eucentric jobs Optimize the image with Contrast and Brightness Click on the Next button Contrast Brightness 4022 262 61641 9 19 ALIGNMENTS 43 UHR Image Shift Correction Alignments 43 UHR Image Shift Correction TABLE 9 25 43 STEP 2 OF 5 Previous Next Order Action Instructions Focus with the Z Stage mouse movement Click on the 4th Quad with the optical image of the stage With the mouse wheel pressed moving the mouse up will move the Z up and moving the mouse down will move the Z down These movements are represented by up down Focus with stage movement Optimize the image with Contrast and Brightness Use stage X and Y movement to bring a feature under the center cross Click on the Next button to move to the next Step arrows Use this to focus the object Optimize the image with Contrast and Brightness Use X Y Stage movement to bring an object under the center cross step 2 ofS setting H 16 0 kv Actual Hy 18 0 kv mM Click on the Next button Maximum possible 18 2 kv WD 5 00 mm Alignments 43 UHR Image chift Correction Previous Next Instructions TABLE 9 26 43 STEP 3 TO 5 Do not Focus Control the 2D adjuster to bring the feature back under the center cross Click on the Next button to move to the next Step Order Action By using the 2D box labelled ShiftCorrAngleSX Y bring the image feature back under the screen center C
114. I Beam Currents o o o oo o oo o o oo room ooorrras 5 33 Beam Aperture Alignment 0 0 0 00 ccc ccc eee eee 5 34 Working with magnification 2 0 ees 5 35 PPT MIN 119 LG A she E stab as ose ol Sent o 5 35 Vae ntfi CHO lt 2 sca baud ie a 5 35 Choosing a Final Lens Mode 0 0 00 eee 5 37 Mode 15 3 soto A aeta alae a ee eS 5 37 Mode ud posu ad pero ase ed cde Ee Micro dde ae Seb ace se cae 5 37 MOJE irradian a e a 5 37 Takino aSnapsh0l asedio raoba ias 5 38 SHAPSHOU SCUID A 5 38 How to Use Snapshots Rb oie ee eek We eet a E EE 5 39 Tak 1 a Photo ds ate ta tenes 2 So hers aaa Anal tei A alt ee dte 5 40 dr o A A tele d d ooo ae ee 5 40 Single Images Saving Opening escitas oot i ohne oes 5 4 O ate dead ub Swe en BR Coe pul dite 5 41 DAVE E AN 5 41 O II do de tented 5 42 Movie multiple image capture 2 cee 5 43 Image capture with Movie 22 15a id Ge CORES So as 5 43 The Preferences Dialogue tadas acl Gries a eh MEER 5 43 Movis Procedu 15s nado ot odit eee ad es be ax ENS 5 46 Start Pause and StOD achat ve id PD Ue ie pud 5 46 Recordin a MOVIE 20 alae ate ede ue E d eb E 5 46 DEDNMOUIEGIE IE uad oua ose mada ee Sedo Enea Ee cias 5 48 PE MOViC C EIO resiente che eds Es 5 48 Play mo Mot teat te data iaa 5 51 Mace AA Dire dtr te E er A E 5 52 l aio gel tah Sak Bata E ERI ES IE tae ach ech e nud eris 5 52 Hopon and ESPOR 25 3 den A A e NOR 5 53 poni Sc PET 5 53 EXPOR c r S
115. If astigmatism is present the result is a directional distortion change of 90 between the two out of focus conditions TABLE 6 8 MOUSE CORRECTED ASTIGMATISM Action Focus the image as well as possible using the mouse Bring the image just slightly out of focus in one direction to see any astigmatic distortion Defocus in the other direction to observe a different astigmatic distortion Bring the focus to the midpoint between the two distortions Press shift and the right mouse button down while in the active Quad This will result in a 4 arrowed cross appearing on the screen with the cursor position at its center Still holding the right mouse button down move the center of the cross around the screen to achieve astigmatism correction when the image 1s at its sharpest When you are satisfied with the image release the right mouse button If astigmatism is severe and the cross is close to the edge of the screen when nearing correction release the right mouse button and reposition the cross in the center of the screen Then repeat the procedure above to perform further astigmatism correction 5 28 4022 262 61641 WORKING WITH NOVA NANOLAB Optimizing the Image Stigmating with the MUI The following describes how you can stigmate with the MUI TABLE 6 9 STIGMATING WITH THE MUI Action Using the MUI Focus knobs bring the image just slightly out of focus in one direction to see any astigmatic distortion De
116. L 5 nlapapp1 Comment Orientation Size Ad T Portrait Source Auto Select C Landscape Network Cancel Exit Clicking on Exit with the left mouse button will exit the UI program and leave one in the operating system environment with the Server still running This can also be achieved by pressing the Alt X keys To activate the UI again one would have to click on Start UI in the Server bar n 4022 262 61641 USER INTERFACE Edit Menu Edit Menu Edt Detectors Scan Clicking on the Edit name in the Menu bar with the left mouse Edit Detectors Scan button opens the Edit menu This can also be achieved by pressing pene Ee the AIt E keys select All Circ A The Edit menu is for editing patterns such as deleting or selecting all 4022 262 61641 E USER INTERFACE Edit Menu m 4022 262 61641 Detectors Menu Detectors Scan Y ETT SE TLD BSE STEMI A B CDEM SE CECO wiz USER INTERFACE Detectors Menu Clicking on the Detector name in the Menu bar with the left mouse button opens the Detector menu This can also be achieved by pressing the Alt D keys Detector list This list contains various detectors for E Beam and I Beam operation Depending on the beam mode in operation only the relevant detectors will appear in black All others will be grayed out Only the selected detector will show a tick next to it s label Customizing or choosing preferences for different detect
117. LIGNMENTS 45 HR Image Shift Correction 45 HR Image Shift Correction Alignment Function This alignment allows one to eliminate the image shift during changes eee of HV in Mode 1 Field Free mode Before starting this alignment it is TUUS a die necessary to complete alignments 10 Source Tilt and Shift 44 image shift during change of ki in Field Free Mode HR UHR Lens Alignment 42 UHR Stigmator Alignment and UHR Click on the Start button Image Shift Correction Do Not change the aperture condition Note sa Guadi tortie procedure 45 HR Image Shift Correction The 45 HR Image Shift Correction procedure starts here TABLE 9 29 45 NO STEP Alignments Order Action 45 HR Image chift Correction 1 Mode 2 M Next WD 5 0mm The working distance should be set at Instructions the Eucentric position The sample should be set at the Eucentric working distance and Focusing only performed with stage movement Bring a recognisable feature under the centre cross on the Specimen Tin Balls any suitable sample Steps 3 Press the Start button screen with the Stage movements Click on the Next button to move to the next Step TABLE 9 30 45 STEP 1 OF 3 Order Action Select Mode 1 Focus with the Z Stage mouse movement Click on the 4th Quad with the optical image of the stage With the mouse wheel pressed moving the mouse up will move the Z up and moving the mouse down
118. Milina in Spo MOG od ebur pont abe qup a sudo doeet ea 5 72 Creating Cross Sections can doe dr UR CE erede ne que bes 5 73 Makino the Cross SeCLOD 42 d 3 exu ead dd E 5 73 Viewing the Cross Section uuu edes E CURAR RU a RR ba des 5 76 Using the Measurement functions 0 0 0 0 c ccc eens 5 80 Using the Annotations functions 00 0000 eee eee eens 5 82 Wse 0f Annotations sarido dis ceed oad ida 5 83 Editing Measurements Annotations 0 000 eee eeee 5 84 FEI User Management Software 0 0 0 00 5 85 Control possibilities cistitis tad Re ed es 5 85 FEI Account Administrators 0 0 nnna aeaaaee aeeoea 5 85 TPSF MOT 033a sea USA SAA 5 86 The Account Menu deta ori arcas osas 5 86 The Userdata ment Vil daria an s 5 87 AVG Ee VO AAA bd se IDEE Gut E Guana tte ER 5 87 ACCOMM LOGON tye wey de dia eek eee ee ae 5 87 EL ____ Chapter 6 STAGES NanoLab 200 S tae dd a alae Mine CR ERA A 6 2 Standard Sample Holder 3 ouem TERRAE EA eee eed aes 6 5 NanoLab 600 Stade ii Re Kx UR op Oa ME ale 6 6 Standard Sample HolderS o oooooooooooronnnoo nooo 6 8 Finding the Eucentric Height oooooooooooromooo 6 9 Finding Eucentric Height 2 0 0 0 0000 cee eee 6 10 Aligning Beams at the Eucentric Height oo oooooo 6 10 Software Stage Functions 0 00 ee eee o 6 12 e RR ea ae Ae ae 6 12 Map Elements sica P ire X SORTS ee hey es ae 6 14 Map ANTO o
119. N FUNCTIONS Function Dual column and Chamber vacuum Green columns and dark chamber operating vacuum in columns but chamber is to atmosphere Dual column and Chamber vacuum Green columns and orange chamber operating vacuum in columns and chamber pumping down Dual column and Chamber vacuum Green columns and chamber operating vacuum reached in all sections Stage axes lock Closed lock indicates any or all axes locked Dynamic Focus Displays when Dynamic focus is on Scan rotation Displays when Scan Rotation is not zero External Displays when the External scan mode is operating m 4022 262 61641 USER INTERFACE Status Tool Tips Placing the cursor over the Status area will display the tool tip giving more precise information Column IGP 1 Sbe b Pa 4 Chamber 5 b5e 5 Pa m 4022 262 61641 467 USER INTERFACE Entering Commands Entering Commands Using the Mouse The mouse buttons control imaging correction selecting functions scrolling magnification up down and moving the stage in X and Y with TRACK mode Mouse buttons are activated by a click or double click or in conjuction with a key on the keyboard TABLE 4 6 MOUSE BUTTON FUNCTIONS Button Function Left Control Areas Makes selection in control areas single arrow cursor Left Quad Areas Full Screen Double click activates the GET function and moves the stage position clicked on to the center of the field
120. NTRIC ROTATION ssse ee 6 23 SCAN PODSBION svn ent eet eee EE eae Lu 6 28 SCAN ROTATION FROM THE BEAM PAGE 0 00e00 6 29 Vs MAINTENANCE 7 ELECTRON COLUMN APERTURE MODULE 7 2 HARD amp SOFTWARE OPTIONS 8 AU FORIB WINDOW ur pra aa 8 3 DRIFTCONTROLDEFAUE IS aaa 8 7 BEAM SHIFT CALIBRATION 2g see et IS A AS 8 10 DYNAMIC DRIFT CONTROL MENU BAR 2 8 10 SCRIPTING DEALOG BOX suas dd xa E mene ro 8 11 SORIPTINEPARAMETERS vdd daa 8 12 AUTO SLICE amp VIEW PROCESS STEPS o oooooooommmooo 8 21 AUTO SLICE AND VIEW MOVIE usada ido be OV Eee es 8 32 TEM SAMPLE PREPARATION PROCESS 00040 8 34 PROTECTIVE LAYER ON LIFTOUT SAMPLES 8 36 ROUGE MILENIO oi 2 cu cto Oda Eden ed exes iros 8 36 SBMS Cl re er re eee ae eee nee Sane ee ree eee ee ee are 8 36 MEDIUM MILCING 3 23 35 95132 arta 8 37 INE VII EIN sgte MID a Wrest Cero 8 37 PINE POLISHING 2253 5 22m cit Hew rete ee REE WEES AS 8 37 MEMBRANE DEFINITION PROCESS 20002 8 39 REPRESENTATION OF TEM MEMBRANE AND IMAGE RECOGNITION CROSSES 2004 8 41 AX DADODBEPOSLDEION 100 dci ES ts e y s 8 42 MEMBRANE POSITIONING ig eaa Is RI See ota RS 8 42 GROUNDING LAYERS 1 87093055 3 A qoae s 8 44 MEMBRANE MILLING PROCESS USING RUNSCRIPTS 8 45 DATATINDUBIEE U 5 agus ducer Du d aque e E pr PER EO Da 8 46 LIETOUT SAMPLES VIEWED AT 7 uscar x ee nee
121. OAD BUTTON Click on the Load button to Load Sin and Cos conditions L1 CORR SLIDER Use the L1 correction slider to correct focus L2 CORR SLIDER Use the L2 correction slider to correct focus CONTRAST AND BRIGHTNESS SLIDERS Use the Contrast and Brightness sliders to correct the image Click on Cancel to leave the alignment and return to original settings 4022 262 61641 937 ALIGNMENTS 270 lon Column Alignment ans Alignment procedure 210 len Calumn Alignment 210 Step 0 to 2 Column Adjustment ETE The Ion column alignment procedure for the Magnum or SideWinder Column consists of electronic beam manipulations to correct asymmetries These corrections are made to give the best beam performance over a full range of operations Instructions For each aperture index selected in menu bar Focus alignment Adjust Focus L2 else o if The purpose of alignment is to position the beam through the column Mouse MUl I for maximum beam transmission with minimum beam aberrations atigmiator Alignment Adjust minimizing image motion when you change or wobble lens voltage stigmator with Stigmatar Correction FIB alignments are started by calling the ion column adjustments Aperture Alignment Turn on age L1 wobble with convenient page wobble amplitude Minimize wnhhla hw anartiira rimari ant Beam Motion and Lens Wobbling Wobbling Lens 1 2 voltage minimally changes focal length If the BS beam p
122. ONS MENU OVERVIEW ccc stew eg dd abn ERE eek dla 8 6 SET UP MENU OVER VIEW vsu RE lt 4 errado 8 7 DRIFT CONTROL DEFAULTS DIALOG BOX 0 8 8 SCRIPTING PARAMETER SETTINGS o 8 12 POG MESSAGES ita Jn lt a kA en Serer ee ne a ee eS ae 8 16 ERROR MESSAGES dosis espinas faxs das ies 8 17 FILE MENU COMMANDS bt dis Gee as 8 23 SETUP MENU COMMANDS 00 Des a A ti 8 23 UTILITIES MENU COMMAND iodo ais 8 25 VIEW MENUCOMVAND 65d 8 25 HELP MENU COMMANDS os tr SOR io ds 8 25 AUTOS amp V USER INTERFACE cian ne RSH Ry ened ie pad oes 8 26 AUTO S amp V TROUBLESHOOTING 2 0 05 ces eR Rr RR 8 33 LOCATION PARAMETERS cosida 8 41 LIETOUT PARAMETERS tone 22575 prp arare suo a aita study e sts td ett 8 43 RECIPE FILE PARAMETER cic risa hee eG ee eee 8 51 TROUBEESHOO TNG tana a tora 8 58 ALIGNMENTS 9 E COLUMN ALIGNMENT ALLOCATION 0 0000 9 4 E COLUMN ALIGNMENT ALLOCATION seeesenn Re 9 5 E COLUMN ALIGNMENT ALLOCATION eessenn Re 9 5 COMMON FIELD FUNCTIONS esseeee III 9 6 GUIDELINES FOR APERTURES SIZES AND THEIR USES 9 7 ALIGNING THE FINAL LENS APERTURE 9 9 SUPERVISOR E COLUMN ALIGNMENTS eeeeeeenn 9 10 IONO DTE pcre dede sa erate tas feta aces Tae ap Aoi rbd t did ue un eis 9 11 LOSS DEPO S rai a 9 11 NO DPBS A E O e ea ttem sra seta cee ee eee vitu hg ahi adea 9 12 dO S DEB dct arcs ae ee ee ee din esie apros eee were eee er 9 13 andere
123. P 5 OF 5 Order Action Alignments 15 At the saving of the last WD HV series do not check 44 UHF Lens Alignment hd the Next WD box Press the Next button Step 5 opens and the Finish button appears Press Finish at Step 5 to Save and exit Instructions Press the Finish button to save and mie Auto Buttons In some of the pages will be found Auto Buttons that achieve a similar result to the above described adjustments It is possible to just click the Auto button This function utilizes Image Recognition software If this utility does not recognize image features well the procedure is aborted and Warning message appears onscreen In this case change the imaging conditions better focus slower scanning lower magnification or use the normal manual procedure Step 5 of ______ 4022 262 61641 1s ALIGNMENTS 42 UHR Stigmator Alignment 42 UHR Stigmator Alignment Alignments 42 UHR atigmator Alignment start Alignment Function This procedure eliminates the image shift when stigmating in the Instructions whole range of voltages and working distances in Mode 2 immersion This ga aes mode It is possible to complete it only for the voltages and working ae Ad cdi distances which are going to be used but for complete adjustment it is necessary to complete all values Before starting this alignment it is Note necessary to complete alignments 10 Source Tilt and Shift and 44 Use Qua
124. PS AS E A ee 9 32 I COLUMN ALIGNMENT ALLOCATION 9 33 100 FIELD FUNCTIONS STEP 0 10 I i2 cre rr ra 9 34 LOO NO STEP TO TORT vias ps Ia pd aan pet 9 34 210 FIELD FUNCTIONS STEP O tO Lassie 9 35 210 FIELD FUNC TIONS STEP Zaida 9 36 210 STIG amp FOCUS CORRECTION part l o o ooooomo 9 39 210 STIG amp FOCUS CORRECTION part2 o oooo ooooommmo o 9 40 210 IMAGE SHIFT CORRECTION lis sarao ree 9 41 253 FIELD FUNCTONS STEP OO Liza aa ee SD mat omes 9 42 2539 SE SO IO Veto io dto dinde eet dite Ud pra eee ge beim era aie s 9 42 ZO FIELD FUNG LIONS shits ser ta 9 43 294 NO STER TO TOF I s ck ect Hac ia 9 43 4022 262 52351 PREFACE About this Manual This User Manual for your Nova NanoLab is divided into the following chapters 1 SAFETY HANDLING provides important information required during operation and maintenance for product safety and personal safety 2 SYSTEM OVERVIEW gives the basics about your system s capabilities 3 SYSTEM OPERATION gives procedures for several system on off modes including Startup Overnight Mode and Emergency Shutdown 4 USER INTERFACE describes the interface that controls system operation giving the function of each Tool Menu item and Control Page 5 WORKING WITH NOVA NANOLAB gives procedures of how to use the system 6 STAGES gives a full description of movement for each stage and the software control 7 MAINTENANCE step by step clea
125. R Image Shift Correction San Alignment Function This procedure eliminates the image shift when changing HV in the whole range of voltages and working distances in Mode 2 immersion mode It is possible to complete it only for the voltages and working Instructions This adjustment minimizes the image shift during change of ki in Mode 2 UHR distances which are going to be used but for complete adjustment it is Click on the Start button necessary to complete it for all values Before starting this alignment it is necessary to complete alignments 10 Source Tilt and Shift 44 Use Quad 1 for the procedure UHR Lens Alignment and 42 UHR Stigmator Alignment Do Not change the aperture condition 43 UHR Image Shift Correction Procedure The 43 UHR Image Shift Correction procedure starts here Alignments 43 UHR Image Shift Correction TABLE 9 23 43 NO STEP Net Order Action Instructions Mode 2 select the Working Distance necessary from the list below Optimize the image with Focus Contrast and Brightness Click on the Next button to move to the next Step or Cancel fat any time to leave the Alignment procedure and return to original settings Specimen Tin Balls any suitable sample Steps 5 Press the Start button step 1 ofS select a Working Distance 1 0 mm 1 5 mm TABLE 9 24 43 STEP 1 OF 5 2 0 mm Order Action 3 0 mm 4 0 mm Select a Working Distance 5 mm for
126. RKING WITH NOVA NANOLAB Preparing the Sample Preparing the Sample Needed Tools and Supplies You will need the following tools and supplies Various Allen and Torx wrenches e Class 100 clean room gloves e Sample stubs or wafer holders Prepared sample NOTE Always wear lint free clean room gloves when reaching into the specimen chamber or loadlock to prevent leaving oils dust or other contaminants inside the loadlock Preparing the Sample The sample material must be able to withstand a high vacuum environment without outgassing It must be clean Oil dust or other materials may cause sample charging or contaminate the chamber which could hinder or even prevent evacuation Mounting the Sample on the Holder If you are using a wafer piece or other sample attach it to the sample holder using any suitable SEM vacuum quality adhesive liquid silver carbon or double sided tape The sample must be electrically grounded to the sample holder to minimize sample charging If using double sided tape make sure the sample is attached to the holder in some way for grounding NOTE The sample holder is not directly grounded to the chamber ground because it is connected to the BNC feed through on the chamber door This is to allow measurement of sample current If the sample is nonconductive plastic fiber polymer or other substance with an electrical resistance greater than 10 ohms the sample may be coated with a 200 300
127. Select Set Up gt Scripting The Scripting dialog box displays Select the preferences and parameters for the script EI N Click N to add the new data to the script You may change the label for the position 6 If Auto Locate was selected you are prompted to define an area for a locating feature 7 Repeat steps 4 5 for each milling position 8 After entering milling positions click the top toolbar button on the AutoFIB menu bar the stage moves to the first position The system is now ready to run the script Previewing a Script Preview the milling script before using AutoRun mode by selecting STAGE XY and VIEW ONLY in the Scripting dialog box Click NEXT in the AutoFIB toolbar to step through the stage positions without actually moving the stage or updating the coordinates Make any changes to the script using Edit mode AutoRun Mode During AutoRun mode xT system values display onscreen and can be saved periodically to log files for later review NOTE Do not minimize the xT interface when the AutoRun mode is operating Before milling begins make sure the hard drive has enough space for the image and log files that will be created To set up the operation 1 From the Options menu set the Detector to either low or normal gain Normal Detector Gain is standard 2 Choose whether or not to turn the beam off if an error condition occurs during AutoRun mode Usually Auto Beam Off is not selected 3 Cho
128. The Previous button moves the user to the previous page should a previous setting need to be changed The Finish button completes the procedure and saves the new settings The Save button saves the actual settings at that point The Cancel button at any time returns to the start without having changed the original settings or the settings saved the last time by 4022 262 61641 94 ALIGNMENTS clicking the Save button CAUTION Electron column alignments should always be performed in Quad 1 In other cases it is not possible to ensure correct functionality of the Contrast Brightness and Auto functions used in the Alignments pages 4022 262 61641 ALIGNMENTS Electron Column Alignment Electron Column Alignment Alignment procedures The Alignment of the Electron column can be performed by a 9 Emitter Startup Supervisor using the well defined procedures found in the Alignments Be Soules TUO Uem Page when opened Not all alignments in the list need to be performed Lene On at the same time therefore further explanation below characterizes the procedures for the Supervisor When the necessary column alignments are performed properly the Electron image will stay in focus and will not show a substantial image displacement when changing kV or 13 Stigmator Alignment 17 Stage Rotation Centre 9 Auto Zero detectors 44 LIRA Lens Alignment 42 UHR Stgmator Alignment spotsize 43 UHR Image enn md The greyed o
129. XT Nova NanoLab Users Manual 4022 262 52351 5th Edition 15 02 2006 Copyright 2006 FEI Company All rights reserved 8 FEL COMPANY Trademark Acknowledgments FrameMaker is a trademark of Adobe Systems Incorporated Microsoft is a registered trademark of Microsoft Corporation Windows2000 is a trademark of Microsoft Corporation Production Acknowledgments This manual was produced using FrameMaker document publishing software Technical Author Mike Hayles Martin Dufek 4022 262 52351 Contents J List of Figures List of Tables PREFACE ADOM THIS Manual sti rr eS at deat adv at ea How to Use this Manual 22345 2 ndr d ed RUD Conventions for ControlS oooooo oooooooo ooo Findine Wihat YouwNecd siete Chapter 1 SAFETY amp HANDLING Site RequirciMents pis is a ass Electron Column Precautions 2 00 A eR Trained Service Personnel aii RUE Ee RE CE User MaimtemanCe sara da ds ds a iia FEAS ANA SAMOA Aa Symbols and Messages MOLLIS oes e Seated E EEN n MEO AA A ane alee era Eme Volador SA A A AS Cord C JDIGS rox dica dada Ground Batteries COVer Pate A OT tation ee Emergency BUON rodri S pe ate bd Emergency Off EMO SWitcheS o o o ooooooooooooooooo CIC INC Srs dtd Rot ute uL IM E eI th E M hewn ree cree BOIS NL kis A Mute s Le ee INTO GE Nes visis suos Ed oe s Ed ab p decl tende top uer aS E ui NEUE s E aet laguid Nros sierra Miscella
130. YSTEM OVERVIEW FIB SEM Capabilities FIB SEM Capabilities FIB SEM workstations provide an expanded range of capabilities not possible with separate FIB and SEM tools e Electron beam high resolution images of FIB cross sections without eroding the feature of interest Real time cross section images with the electron beam during FIB milling Focused electron beam charge neutralization during FIB milling Focused ion beam charge neutralization during SEM imaging High resolution elemental microanalysis of defect cross sections mage sample surface with the electron beam during navigation without erosion or gallium implantation from the ion beam TEM sample preparation with in situ conductive coating Control of the Beams FIB SEM workstations ideally position the point of interest for simultaneous ion beam cross sectioning and electron beam viewing Separate scan generators for the two beams permit coupled or independent scan patterns and magnifications Imaging while milling aids in defining milled features Immediate electron beam images of cross sections are possible without stage motion or sample transfer Immediate high resolution SEM imaging after FIB milling also prevents exposure of milled cross sections to atmospheric contaminants Gas Deposition Multiple gas injectors can be installed for material deposition in conjunction with either electron or ion beam pattern definition Electron beam induced deposition offer
131. able as the specimen chamber has to stay at atmospheric pressure for the duration of maintenance 7m 4022 262 52351 MAINTENANCE 7 1 E Column Aperture maintenance 7 1 2 Cleaning the Aperture Module This is only possible if a Fischione Plasma cleaner is available Take the complete rod with module attached and place in the TEM opening on the plasma cleaner The screw at the end of the Aperture rod screws into the TEM opening and seals against the rod o ring Give the rod 5 minutes at 4 5 volts plasma generation This should remove all hydrocarbon base contamination If the contamination 1s stubborn longer times will be necessary this will not damage the aperture as the plasma only removes organic based material 7 1 3 Replacing the Aperture Module The new Aperture Module comes in a fluoroware container has been pre cleaned and 1s ready to be fitted to the rod Firstly release the Titanium screw holding the old module onto the rod Keep the screw in the hole of the rod and let the module fall away Open the new module pack and let the new module sit with the connection end uppermost to the edge of the container base Now pick up the new module with the Titanium screw end and fasten making sure of a good fit 7 1 4 Replacing the Aperture rod Check that there are no fibres on the rod o ring Do not grease the o ring Replace the Aperture rod back into the Aperture Adjuster assembly on the column and turn t
132. achieve a similar result to the above described adjustments It is possible to just click the Auto button This function utilizes Image Recognition software If this utility does not recognize image features well the procedure is aborted and Warning message appears onscreen In this case change the imaging conditions better focus slower scanning lower magnification or use the normal manual procedure NOTE For large spots and low voltages Source Tilt and Source Shift adjustments influence each other Therefore adjustments should be repeated several times to achieve optimal result 4022 262 61641 ALIGNMENTS 44 UHR Lens Alignment 44 UHR Lens Alignment Alignment Function This procedure aligns the beam through the UHR Lens for the whole range of voltages and working distances in Mode 2 immersion mode It is possible to complete it only for the voltages and working distances which are going to be used but for general adjustment it 1s necessary to finish it for all values Working distances select the voltage values automatically Before starting this alignment alignment 10 Source Tilt and Shift has to be completed 44 UHR Lens Alignment Procedure The 44 UHR Lens Alignment procedure starts here Instructions This Alignment centers the beam through the UHR lens aperture to remove image shift Click on the Start button Note Use Quad 1 for the procedure Alignments TABLE 9 11 44 NO STEP 44 UHAL Ali
133. activation of the injector The gas type is the gas assignment to the port The HEAT status 1s a toggle between cold or hot and the FLOW status is a toggle between closed or open Details Tab Clicking on the detail tab will display the characteristics of the active Gas Injector The characteristics can be changed by entering the details to configure the injector FIGURE 6 36 GAS INJECTOR OVERVIEW DETAILS sas Injection sas Injection Overview Details Cyerviaw Details APot In Gas Heat Flow oo MEL Platinum arm Closed Ol JBelineation Etch Cold Closed Position Retracted Heater Cit Heat state Cold Gas flow Closed hd Gas Types Gas types are used to deposit on or etch away material surfaces A gas type will be allocated to each Gas Injector and up to 5 gas injectors can be mounted on the system in total If an OmniProbe is mounted then up to 4 GIS s can be mounted Choosing a Gas Type The Gas Type files are found in the PROPERTIES list under GAS TYPE on the Pattern page Clicking on the right of the entry will promote a dropdown arrow Click on the arrow and a list of allocated gas types for the GIS system will be displayed up to the number of GIS s installed Click on the one required and it will reside in the GAS TYPE slot in the PROPERTIES list This has now allocated the GIS to be used with it s gas type When choosing from the list on the GIS module only the gas type GIS chosen in the Patter
134. am current for the specified operation The list of currents corresponds to the ion beam apertures available on the XT system Show Refresh Previews the milling pattern for the options selected in a process step 4022 262 61641 HARD amp SOFTWARE OPTIONS User Interface TABLE 8 16 AUTO S amp V USER INTERFACE Interface Item Description Slice tab Slices Specifies the number of slices to be made in the slice step The height of each slice is determined by the software dividing the value specified for Length y by the number of slices If the operation calls for more than 100 slices Auto S amp V displays an outline indicating the overall area to be sliced Slices imag Specifies the number of slices to be made between images This option allows several slices to be cut between images Take Ion Image Specifies that an ion beam image is to be Before Start taken before the start of the slice phase Coating tab Thickness z Specifies the thickness of the specified protective coating in um Show Refresh Simultaneously previews the deposition with slice pattern for the protective coating and the milling pattern for the underlying slices 4022 262 61641 HARD amp SOFTWARE OPTIONS Using Auto Slice amp View Using Auto Slice amp View WABNINGIHT Stage not tilted for milling Tilt and realign feature Select Continue to continue with run Quit will exit Look in CxProgram files FEN Images
135. ame function When Record Movie is active the icon changes to a red square Pressed 1t stops the movie function Import Export Access can be made to certain files produced by the FEI xT system This in turn leads to an import export dialog for selection STG files Stage Positions PTF files Patterns EPM files End Point Monitor Graphs and parameters are available to Import Export When opening the file parameters or data saved with it are 4022 262 61641 El USER INTERFACE File Menu restored FIGURE 4 6 FILE IMPORT EXPORT MENU File Edit Detectors Scan Beam Patterning Stage Tool W File Edit Detectors Scan Beam Patterning Stage Tools Cetin ospa Du A N o ae uus i d CM Save As Save As Record Movie Record Movie Im port stage Positions Import Export Patterns Stage Positions End Point Monitor Graphs ee Pattee Print s Parameters End Point Monitor Graphs Log Off supervisor Log Off supervisor Parameters Exit Print Print Clicking on Print with the left mouse button opens the printer dialog so that choice of printer and conditions can be established ready to print an image or any other printable product from the microscope This can also be achieved by pressing the Ctrl P keys Pressing OK in the printer dialog will activate the printer to print the job FIGURE 4 7 PRINTER DIALOG Print Setup E Properties Read HP LaserJet 4000 Senes PL
136. ame numbers on the base plate when replacing the holder top Replace the holder top carefully and tighten down the central screw The detector and sample holder is now primed for use The removal of sample grids is in the reverse order Free Working Distance position When vacuum is obtained in the system switch on the high voltage for the electron column at 20kV spot 3 Using a fast scan focus on the top of the STEM holder surface with the SE detector Click on the Z lt gt FWD button on the Tool bar and bring the focused surface to 5 mm FWD by changing the Z value on the Stage Control Page Move to the appropriate sample position and refocus on the grid bars of the TEM grid The FWD and Z position has now lengthened and re selection of 5 mm in the Z value on the Stage Control Page is necessary This procedure is necessary to prevent inadvertently bringing the detector in contact with the final lens The minimum safe distance to the sample surface for FWD is 3 mm be aware that the holder surface is now closer to the lens than the sample By moving off the grid bars and fine focusing on the sample most correction of image rotation and astigmatism can be performed in the SE or TLD Mode 1 Move to Mode 2 to obtain high resolution imaging perhaps with further correction of astigmatism Obtaining a Brightfield BF image The STEM detector like the BSE detector 1s solid state 1t must be operated at slow scan rates for the best imaging Cho
137. ams gt FEI Company gt Applications gt AutoFIB The AutoFIB interface will appear FIGURE 8 24 RUN AUTOFIB E AutoFIB xT New File Play Logging Options Setup Help gt i ii m gt N U E Position Select File gt Open and load the file data998 sct The AutoFIB Scripting dialog box will appear in a configuration similar to that shown below 4022 262 61641 847 HARD amp SOFTWARE OPTIONS Sample Milling Milling parameters defined by the data Milling positions defined by the data file FIGURE 8 25 AUTOFIB SCRIPTING DIALOG BOX SN Scripting Script Name Parameters v Play All View Only m etage Pattern File xy JU User Unite pretix pattern Drift Control os ses wmf Open AutoScript File lan Beam Settings Mone fon Beam Shift Cy Image Rotation Save Image fe M Auto Locate Fositions of 2 stage y a 1 74 0 366 stage zrt 8 bb 9 867 posit heamtshitt 7 553 1 638 scanratatianz 4 574 sub scripte Ci Program Files feldata Auta TEM scripts data ini poste stage xy 12 155 11 124 stage zrt b 353 9 0649 beamshift 7 530 1 523 scanratatianz 4 574 sub scripte CA Program Files feldata Auto TEM scripts datae ini pose 16 09 12 Script continuing until Cancel 16 09 12 Stop Do not select the options DRIFT CONTROL Or AUTO LOCATE When run under AutoFIB the TEM preparation script automatically takes care of drift control and image re
138. an necessary 4022 262 52351 Ll MAINTENANCE 7 1 E Column Aperture maintenance 7 1 E Column Aperture maintenance E Strip Aperture Module This 1s a improved design of the original E Column aperture using more axial stable materials with a Molybdenum finish The strip has 5 aperture positions now with a 1 mm alignment hole in the frame and not the aperture The strip comes pre aligned in a metal module which 1s connected to the end of the Aperture rod by a Titanium screw The module is considered a consumable and therefore would be normally replaced when heavily contaminated Only if a plasma cleaner is available these aperture modules can be cleaned while still connected to the rod No other cleaning method should be used There is a heater in the rod to assist as a cleaning mechanism for high water vapour or expected high contamination levels while operating in the column All screws are of Titanium so not to have any magnetic effect FIGURE 7 1 ELECTRON COLUMN APERTURE MODULE 7 1 1 Removing the Aperture rod With the high voltage off let the specimen chamber up to atmospheric pressure The E Column Aperture rod is held at the same vacuum as the specimen chamber so no special vacuum need be broken to remove it If connected remove the heater cable from the outer end of the rod Unscrew the end of the Aperture rod and carefully remove it from the microscope Preparation to clean or replace apertures should be immediately avail
139. anged according to the positive tilt of the v Automatic specimen The focus should be sharpest in the middle of the TE 00 image DYNAMIC FOCUS can only be used with scan rotation at uo 5H zero You must enter SPECIMEN PRE TILT for the calculations to be accurate DYNAMIC FOCUS can be used for a strongly tilted spec Fre Til m specimen either by the specimen surface itself or by stage tilt when the depth of focus is not sufficient It results in an image with overall sharpness The DYNAMIC FOCUS is usually used usually at low magnification Tilt Correction Because the image is a two dimensional representation of a three dimensional object certain projection distortions occur The more highly tilted the specimen is the more foreshortened its image will be Applying a tilt correction will compensate for foreshortening in one direction on a flat specimen at a known tilt angle 80 range and when the tilt axis 1s parallel to the scan line TILT CORRECTION can only be used with scan rotation at zero You must enter SPECIMEN PRE TILT for the calculations to be accurate For example a square grid image will appear rectangular when you tilt the specimen Applying TILT CORRECTION will correct the aspect ratio and restore the square appearance Tilt Angle TILT angle gives a choice of selecting Manual or Automatic operation of the DYNAMIC FOCUS and or TILT CORRECTION when ticked Detectors Contrast Use this adjuster to control th
140. angstrom layer of carbon Rough surfaced samples must be evenly coated from every direction This conductive layer minimizes sample charging increases beam stability and improves image quality Maximum Sample Dimensions Maximum Sample Dimensions The xT Nova NanoLab can accommodate up to 6 wafers CAUTION Store samples and sample holders in a dry nitrogen storage cabinet Dust on samples can get drawn into the electron column degrading imaging and requiring an FEI Customer Service call to correct the problem ss 4022 262 61641 WORKING WITH NOVA NANOLAB Exchanging samples Exchanging samples To exchange samples loaded onto the standard holder or Sample Vise proceed with the steps in the following table TABLE 5 5 EXCHANGING A SAMPLE Action Click offthe BEAM ON button on the Beam Control page Go to the Navigation page unlock all stage conditions if necessary Vent the chamber via the VENT button on the Beam Control page The Nova 200 stage remains at the set Z position The Nova 600 stage moves to it s lowest Z position Open the door and exchange the sample On the Nova 200 stage check that the height of the new sample does not exceed that of the previous sample by way of the Sample Height Adjuster Tool If the sample height 1s higher then turn down the mechanical Z to suit the Adjuster Tool On the Nova 600 stage use the CCD live image to check 1f sample height is OK The stage moved to the lowest position wh
141. anned across the sample surface in a regular pattern called a raster Normally this raster consists of a series of lines in the horizontal X axis shifted slightly from one another in the vertical Y axis Simultaneously a spot of controllable brightness is scanned over the display area of a monitor in the same pattern The signal emitted by the sample surface as it is illuminated with the primary beam is collected by the chosen detector amplified and used to adjust the brightness of the spot Relationship Sample to Image The spot must be scanned across the screen very rapidly so that the human eye sees it as a continuous image and not a moving spot Because most beam scanning takes place at rates too slow to provide the illusion the slowly gathered image 1s loaded into computer memory This stored image is displayed at a fast scan rate but updated only at the beam scan rate The raster consists of many typically one million individual locations pixels that the beam visits As the beam is scanned the signal emitted by the sample at each beam position is measured and stored in the appropriate digital memory location At any time after the beam scan the computer can access the data and process it to change its properties or use it to generate a display Because of this direct correspondence the image displayed on the monitor is directly related to the sample surface The sample surface is rotated 180 with respect to the front
142. are Pb aoe bore egre RC os ond SOs 4 8 Interface Flemmen a com ue ee birra 4 9 NA AA A AAA E 4 10 AI A A A 4 10 A A A IR NS 4 11 EJEM DU soraya to rincon baaa 4 13 Detectors MEDI A as as 4 14 can Meer tio lis hare US oe 4 15 Beam Ment 2a ds rasa dida ai aaa 4 18 Paterno Menm cortisol dae 4 20 A A wk wae ee ai Bd Sete a ecl ae 4 2 Tools M Ul 5 ciate phd m doeet A BR ee era 4 24 Window MeNi S qos rm de ee al eee eed Root det oe ota aS 4 26 The Help Wiens 2 ERES n eae PEE eee a AS 4 28 DEMING PreferelCeSi consi aa eee Shs oe Pde ace y Yos a ere A 4 29 The Preferences Dialogs raras eased oh bea boc dda oras 4 29 DitaBar law ect tee oh als bed ae a 4 30 NN A A A ote Doar rol tine A are 4 31 Pres Md rs rr oe SG dl Maida a palo Bee nee 4 32 Scania Taba a de he o UR artis 4 33 The Gencal las a ta in 4 35 NU e AAA O ee ot ees 4 36 Sil AAA se dog deu Satine Wea OR e woke herder ac 4 36 The OOM A Stein on eo renin es hess Gk ee 4 37 Ue Data Dar sa o os ee 4 4 Data al sins ie den yas a su Se A ue uL i ce 4 4 Paces ands Modules tio a d escis 4 42 Beam Control Pace sons hb SPA et da e HARE 4 44 NY CEU METIRI T A da as eee 4 44 SY SCCMIG 22 0 Gahan yews T ede es be eh wee Mien Se os a eae 4 45 COMMIS oe ng 25 hes eee aS tees eee ears hoe eee 4 45 TONDO tana rencia ace eG A ee Wee OS WU RAS ee 4 46 MaemiNCallOliss sum sob aa EU a ara Sd Ce RA 4 47 ISl uuu a be ec in fe cee tee es cat te Sd sate II et te iM NE URN 4 47 EL
143. arge 19018 40 73 162 94 ini x Use xT Settings Button Text Slice Scan Time 8 Resolution Low Med High small gag 158 534 ova 294 17 Dwell 44 566 2263 time 283 1132 45 26 5 66 ee b3 90 52 Large 1918 40 73 162 94 File Setup Utilities View Help Phase none Processing slice D Current process none Progress Slice Rough cut Coating Application pt width xj hn m Length y fem Thickness z ho pm Current ap 0 A show Retresh with slice m 4022 262 61641 7 If you will use Auto S amp V to deposit a protective coating follow the procedure in Coating 8 If you will use Auto S amp V to perform the rough cut follow the procedure in Rough Cut 9 Setthe beam current Select a current high enough to mill the sample in a reasonable time but low enough to guard against sample damage and loss of image resolution For guidance in setting the beam current select Utilities gt Suggest Currents 10 Click SHOW to display the pattern to be milled The Auto S amp V patterns should align with the feature of interest and cover it If they do not recenter the feature with stage moves and repeat steps 6 to 10 1f resizing of the pattern is necessary 11 Select Setup gt EBeam Image Scan Parameters to set the electron beam resolution and scan times The following dialog box appears 12 Select an appropriate setting High resoluti
144. arted after patterns are modified added or deleted patterning starts from the first pattern and all patterning completed clocks are reset to zero Fine Tuning Patterns Use the MUI SHIFT X and Y knobs to fine tune the image Beam shifts are used in many applications such as fine milling of cross sections to give a clean vertical face to the section Use Shift also to adjust for drift or charge effects Grab a frame to monitor the change in mill position Beam Current Milling Times The appropriate beam current value depends on the sample to be milled and your experience with the sample material Lower beam currents are less destructive and take longer to mill The following are guidelines only Specific parameters depend on your sample material and objectives TABLE 6 29 BEAM CURRENTS MILLING TIMES BY APPLICATION Suggested Beam Current Milling Milling Application Time Typical cross sections Try for a total time of 5 15 minutes lt 20 um wide using 2 5 nA of current Larger currents cause more damage around the recess and less vertical walls Large cross sections Raise milling time to 15 20 minutes or very wide or deep more beware of drifts ones Cleaning cross section Use a value no less than one quarter to one half of the main current Drilling vias or A drilling time from 1 4 minutes is cutting tracks adequate The main limitations of short drilling times are difficulty in doing End Point Detection and the
145. asses off center through the lens changing the focal length moves the image laterally Ifthe beam passes through the center of StigSin the lens changing the focal length causes the image to go in and out StigCos of focus but the image does not move Pei Te Off axis aberrations and the final spot size are minimized when the Wob ampi 1000 L1 Wobble m Eg beam passes through the center of the lenses The wobbling technique of varying the lens voltages provides a convenient method of viewing Wob ampl zu an off axis beam as an apparent image motion L2 Wobble WobbleStigSin WobbleStigCos Tips and tricks Save Load The amplitude for electronic wobble adjustment should be high L1 Com 0 enough to see reasonable motion change of the image but not so high L1 4660 V that the image is out of focus L2 Com Periodically click OFF and fine tune the focus since the wobble ES changes the focus voltage Don t try to optimize focus or stigmation Contrast 100 00 with the wobbler turned on For apertures less than 1000 pA it is easiest to adjust wobble in the aperture by focusing on a feature of interest on the sample at a higher magnification Brightness 50 00 Canca The sensitivity of the two dimensional X Y control depends on the magnification level chosen At higher levels you may have to drag and release several times more for the same amount of adjustment than you would at lower magnification levels with a single drag S
146. ated by pressing F9 or the Icon button on the Tool Bar Autofocus Click on Autofocus to activate the automatic focus routine Can also be activated by pressing F11 or the Icon button on the Tool Bar Auto Lens Stigmator Alignment Click on Auto lens Stigmator Alignment to activate the automatic Lens Stigmator correction routine Display Saturation Click on Display Saturation to view the saturation status of the image Oversaturated areas of the image white areas are shown in blue and undersaturated areas black areas are shown in yellow Can also be activated by pressing Shift F11 Lab Notes Opens the Windows NotePad application above Quad 4 for the user to make immediate notes and remarks After entry of a note the file can be stored as a text file TXT Any previous note can also be opened in Lab Notes FEI Movie Creator Provides a tabbed dialogue above Quad 4 for setting up a collection of sequenced TIF images and sequencing them into an AVI movie See Chapter 5 for a detailed description This utility is installed also on the support computer which enables to create a movie without influencing the microscope controller operation Application Status Clicking on Application Status opens a dialog in the 4th Quad displaying a continuously updating status of the system Preferences Clicking on Preferences displays the preferences dialog 4022 262 61641 427 USER INTERFACE Window Menu Window Menu
147. ately Press END to complete the setup process The system confirms completion of the membrane setup When you have defined all membranes the system will create a data file for each defined membrane and an AutoFIB file for the complete set of membrane definitions 4022 262 61641 HARD amp SOFTWARE OPTIONS Sample Milling sample Milling When membrane definition is complete and the crosses have been milled you can begin milling the TEM membrane s Proceed in one of two ways 1 Press RUN NOW in the Membrane Definition Succeeded dialog box 2 Run each data file using RunScript This may be useful if you are milling only one membrane at a time Using RunScript you can fully automate the milling of a single membrane or 3 Run the data998 sct file using AutoFIB This process is completely hands free and is useful for overnight milling or milling multiple membranes without any user intervention Running the Data File from RunScript When you prepare a defined membrane using RunScript you have the option of beginning with the main milling steps or proceeding directly to the polish step This workflow is illustrated in the following figure FIGURE 8 21 MEMBRANE MILLING PROCESS USING RUNSCRIPTS Move stage Terform steps or rethin Cutout dane only All test Edit parameters Perform steps as cutout and polishing steps are defined in Milling optional depending on docutout steps parameter in recip
148. atic Manual Tilt 0 0 Color mi Font Color mi Line Width 1 ES OBJECT ACTIVE MEASUREMENTDETAILS ENTERED AND DISPLAYED Measurement Measurement allows the user to draw various shapes on the Full screen or the active Quad for purposes of displaying measurement of linear distances diameters angles or areas of the image Numerical values are updated while drawing and display alongside or within the finished measured item Selection of individual properties can be made in the property editor some of these operating dropdown choices such as Color 022 262 61641 USER INTERFACE Processing Page Annotation Annotations allow the user to draw on the Full screen or the active Quad for purposes of highlighting features by displaying linear distances circles areas or text Selection of individual properties can be made in the property editor some of these operating dropdown choices such as Color FIGURE 4 28 ANNOTATION FUNCTION ACTIVE Measurement Annotation m 4 Rectangle Circle Line Point Arnal 13 00 The Measurement Annotation module icons have the following functions Select Measurement Annotation type Selects highlighted deselects an measurement annotation shape Text selects highlighted deselects a text annotation If no measurement tool nor any shape or text label is selected the existing objects can be moved resized or rotated using the mouse Delete sele
149. ation Find or mill unique high contrast features and adjust the view so they are centered in the screen at 5000 1000 X magnification Each configured GIS 1s inserted in turn after user confirmation the calibrated values can be written to the registry automatically 3 Tilt Shift Tilt beam shift correction terms bsx45tilt bsy45tilt Press Play then Press Tilt Shift to start the calibration Set the stage to eucentric height with the electronbeam center a feature with the stage at 52 degrees switch to the ion beam select the aperture for 300 pA current and center the same feature Then press Continue The stage will be tilted to 7 degrees With beamshift correct the tilt induced shift The calibrated values can be written to the registry automatically 4 SetdetectorCBvalue psc In this script the contrast and brightness correction factors per detector can be determined 8 56 4022 262 61641 HARD 8 SOFTWARE OPTIONS Initial Use Press Play to start the calibration The script sets a current the current with which the fiducials are milled Optimize the Contrast Brightness settings of the image at this current Then the script sets a higher current the rough mill current Optimize the Contrast Brightness settings again The calibrated values are written to the registry automatically After the calibration press End and run again for another detector e 5 SetMillPositionCalibs psc In this script the final membrane an
150. ator balance STIGCOS BUTTON Click on StigCos and use the 2D control to align the stigmator balance APERPOS BUTTON Click on Aperture Position and use the 2D control to align the aperture position Brightness 50 00 Cancel m 4022 262 61641 ALIGNMENTS 270 lon Column Alignment TABLE 9 48 210 FIELD FUNCTIONS STEP 2 Alignments 210 Ion Column Alignment Field Name Function 2D XY Used in conjuction with any of the buttons Instructions For each aperture index selected in menu bar Focus alignment Adjust Focus with L2 Slider not with hause n Stigmator Alignment Adjust stigmator with Stigmatar Correction Aperture Alignment Turn on L1 wobble with convenient wobble amplitude Minimize wnhhla hw anartiira rimari nt stig Quad otigein stiglos AperPos Wob ampi 1000 Wob ampl zu zwaw e T gt Wobblestigsin WobbleStigCos cave Load L1 Corr O M NM ML L2 Corr O a NM mE Contrast 100 00 Brightness Cancel control Wobbler Area above L1 L2 WOBBLE BUTTONS Click on L1 L2 Wobble to switch on WOB AMPL SLIDERS Use the Wobble Amplitude slider to create a convenient amplitude WOBBLESTIGSIN BUTTON Button to switch on the stigmator Sin balance wobbler SAVE BUTTON Click on the Save button to save Sin and Cos conditions WOBBLESTIGCOS BUTTON Button to switch on the stigmator Cos balance wobbler L
151. attern Progress Omniprobe Gas Injection End Point Monitor Status Processing Measurement Annotation Digital Zoom Enhanced Image Detectors Status Detector Detector Settings Charge Neutralizer 4022 262 61641 USER INTERFACE Pages and Modules TABLE 4 4 PAGES Icon Buttons Page Modules Sample Prep Pattern Progress Omniprobe Gas Injection Scan Rotation Stage Alignments Alignment Instructions Steps Status 4022 262 61641 mI USER INTERFACE Beam Control Page Beam Control Page Vacuum Timp ent system Wake Up sleep Column ay LES Source High oltage y 10 00 kv f Tuning Lens Alignment source Tilt Modulator Crossover Magnification js i Couple Magnifications Magnification 1000 x Bearn Stigmator Beam Shitt NE cel Rotation he Scan Rotation Detectors Contrast Brightness otatus specimen Current 0 34 nay lon Beam Current 2 41 pA The Beam Control Page is divided into modules e Vacuum e System e Column e Tuning e Magnification e Beam e Rotation e Detectors e Status The Beam Control Page is a User level page It contains the essential components such as the vacuum control to pump and vent the system and the beam and column modules to control either the Electron or the Ion columns Column Type The column control type will be dis
152. atterning Click on Reset Patterning to reset patterning to the beginning of the pattern procedure once again Next Pattern Next pattern will be available if multiple patterns have been drawn Click on Next pattern to stop milling the current pattern and continue with the next pattern Next Line When the cleaning cross section is used Next line will be enabled Click on next line to stop milling the current line and continue with the next line Sleep after patterning Applies the Sleep command from Beam Control page when patterning process finishes 4022 262 61641 an USER INTERFACE Stage Menu Stage Menu Stage Tools Window Help Clicking on the Stage name in the Menu bar with the left mouse xT Algn Feature button opens the Stage menu This can also be achieved by pressing compucentric Rotation F12 the Alt S keys p Define User Units xT Align Feature User Units Clicking on xT Align Feature starts a procedure that helps one to Beam Shit Reset orientate a linear feature to either of the stage movement directions X Zero Beam Shift or Y Home Stage shit F3 Compucentric Rotation Home Apertures Home Stage Without Rotation Center Position Cio Touch Alarm Enabled Clicking on Compucentric Rotation in the Stage Menu places a green circle in the active quad By rotating the circle a different viewing orientation of the sample area can be achieved This is compucentric stage rotation It can also accessed by
153. beam High voltage is switched off scanning will be paused Blinking pause icon during pausing the quad No Yes During pause scanning the pause button will blink e Rotation on screen tools time out None 10 seconds 30 seconds 60 seconds The Scanrotation on screen tool will be switched off after time out Movie Tab The Movie tab provides two groups one to choose set up conditions for timing labelled Timer and the other to set up save conditions for the resultant movie labelled File FIGURE 4 17 THE MOVIE TAB DIALOGUE Databar Units Presets Scanning General Movie Sensitivity W Movie Delay a2 z File Name Movie Save in c Numeric Seed 1 Video File Size B50 MB W Record D atabar OF Cancel Apply A wider explanation of the Movie tab is found in the section Movie multiple image capture Sensitivity Tab The Sensitivity tab has the preset sliders for controlling the sensitivity of the Manual User Interface MUI FIGURE 4 18 THE SENSITIVITY TAB DIALOGUE rm preferens Databar Units Presets Scanning General Movie Sensitivity MUI Contrast 0 0 Coarse Focus gt Brightness 0 0 Fine Focus gt Stigmator 0 0 Beam Shift Default Conor All controls of the MUI are represented here except Magnification m 4022 262 61641 USER INTERFACE The Tool Bar The Tool Bar The Tool Bar displayed below the Menu bar and l
154. ble click on it to automatically startup the ion pump This procedure Gun Vacuum Page will take a few minutes If the 10n pump start is not successful call FEI Service 3 If the vacuum in the IGP is OK click on the Next button IGP Upper 1 16e 007 Pa IGP Lower 1 3e 005 Pa Cancel 4022 262 61641 927 ALIGNMENTS 5 Emitter Startup EE TABLE 9 35 5 STEP 2 OF 2 5 Emitter Startup Order Action Previous Finish Instructions Press the Emitter On button to start or the Emitter Off button to stop the emitter Wait until the ramping is finished Press the Finish button Click the Emitter On button The startup will take a few minutes and will indicate Safe Start during run up When Operate is indicated the Emitter Startup is complete nm Click on the Finish button Field Name Functions The pages for Emitter Startup are arranged with many functions and Emitter Startup Page status readouts Here are explanations of the important functions and status readouts step 2 of 2 Operate TABLE 9 36 FIELD NAME AND STATUS Emitter Off Field Name Function Emitter On starts stops the emitter O ff Restart indicates that the emitter runs up after a short emission interrupt Safe Start indicates that the emitter runs up with a slow run up procedure ff Time ta Ga Orin OO s suppressor 500 Extractor 45 70 W Filament 2 460 4 Emission 204 0 ud Shut Down indi
155. ble automatic platinum bridges attaching cutting edit the script manually and the sample to the walls of set docutout to 0 in the recipe file the trench then rerun the data file from RunScript You can also let the system cut one side and the bottom free then cut the last side free under manual control See Table 3 Recipe File Parameters sample is incorrectly Orient TEM samples along the grain oriented axis of the crystal to prevent them from being stressed Otherwise they may buckle or break free Sample is bent or Sample is too thin Increase the final sample thickness damaged by editing targetthickness so that the script leaves a thicker sample Carefully cut the final slices off the sample under manual control so that you can tell when the sample is about to bend or be damaged by the ion beam Stop milling as soon as it appears that the sample may be bending Sample is incorrectly Orient TEM samples along the grain oriented axis of the crystal to prevent them from being stressed Otherwise they may buckle or break free 4022 262 61641 8 59 HARD amp SOFTWARE OPTIONS Selective Etch Software Selective Etch Software File Help Threshold Border Milled Prxels Selective Etch xT Convert 120 FP Invert FT Full Box Selective Etch for XT Software provides precise milling etching and deposition on samples by creating a milling pattern based on the intensity of an i
156. button when clicked on passes from one oo function to the next and so on When the down arrow is clicked on the selection dialog opens so that the Average and Integrate functions can be loaded with frame values an E The functions are as follows v Live Average 4 frames j Integrate 256 frames e The first 3 bricks frames represent Live imaging as one frame follows the other Therefore there is no filtering and this is the raw scanned image Number of Frames The second ascending 6 bricks frames denote an improving image with successive Average of 2 or more frames This process will continue until stopped by change of scanning condition or by freezing the result The third stairway 6 bricks frames shows an increasing number of frames that Integrate to an end value This process will continue until the predefined number of frames is reached and then stop and freeze automatically If you select 1 of these 3 options from a frozen paused image state the imaging will start automatically without the need to unpause it using the selected filter mode Number of Frames The dropdown list box contains the type of filter and the number of frames for each value of Average or Integrate Live is always one v Average 1 frame j Integrate 1 frame 3 Number of Frames frame Clicking on the arrow in the NUMBER OF FRAMES section to the right will drop the list so that all filter values can be seen Clicking E fur
157. cabinet and press Microscope microscope computer power ON OFF button to Start Stop standby switch ON Shart Ul stop Ul Advanced gt gt gt NA Start the software by clicking on the FeiSystemControl icon to display the xT Microscope Server dialog x Lisername supervisor Password Feisystem Control Click on the Start button Click on the Advanced button Wait until the dialogue is fully functional All LEDs needs to be green Select Start Ul Once the microscope server has started the Splash screen appears followed by the xT User Interface dialog Log on is requested Input a user name and password to activate the Microscope User Interface Once logged on leave the stage home dialogue box unselected Click Pump in the Beam control page to pump the Specimen chamber Vacuum Pump ent E 4022 262 61641 SYSTEM OPERATION Startup After Standby TABLE 3 4 STARTUP AFTER STANDBY Action Once the vacuum is ready click Wake Up to start the ion source if needed system Wake Up Select Yes in the Home Stage dialogue to home the stage The stage cannot be moved the Home Stage procedure must be completed first Do you wantto run it now ff Home Stage with the rotation axis Yes Ma If a CDEM is installed in the system go to the Alignment page and select adjustment 29 Auto Zero detectors to autocalibrate the CDEM 8 The system is now ready to use NOTE Wake Up no
158. caling Active Lived w Activel ive ActweLive2 ActweLive3 ActiveLived Add To History Delete Scaling The SCALING tab can be set via X UNITS to Time or Depth This will correspond to how the progress is observed FIGURE 6 38 EPM SCALING End point Monitor Graphs Options Scaling Time End point Monitor Graphs Options scaling Time y Auto zoom y Fixed zoom A units A Units Method Method X axis Min log fo Y axis A axis log Y axis Ing jo 28359 Max 12903 Ing ja 8359 The operating METHOD can be selected from Auto zoom Fixed zoom or Auto pan 4022 262 61641 E WORKING WITH NOVA NANOLAB The End Point Monitor EPM setting up the EPM for monitoring To set up the EPM for use before patterning use the following procedure TABLE 6 27 SETTING UP THE EPM Step Action Select the ACTIVE LIVE option from the dropdown list in the Options tab Select the required conditions in the property editor in the Options tab such as LINE TYPE and LINE COLOR Open the Scaling tab and select either TIME or DEPTH from the X UNITS dropdown list as the progress criteria Select either AUTO ZOOM FIXED ZOOM or AUTO PAN from the method dropdown list as the viewing range AUTO ZOOM will scale the entire progress to the viewing window FIXED ZOOM can be setup by entering threshold max min values for time seconds in the X AXIS and max min values for cur
159. cates that the emitter is being switched off indicates that the emitter is in the operate state indicates that the emitter is off Time to Go indicates the time needed to complete the required action Emitter On Off shows the actual suppressor voltage shows the actual extractor voltage shows the actual filament heating current shows the total emission current of the emitter Emitter Life shows the actual emitter operating life time Time Emitter Life Time 15427 hours 04 min 18 s 9 28 4022 262 61641 ALIGNMENTS 13 Stigmator Alignment 13 Stigmator Alignment Alignments User SEM Alignment 13 Stigmator Alignment corrects fine local changes to astigmatism shift in the Mode 1 2 and 3 This alignment procedure can be used by Instructions nis e dA I s every user at any time to compensate for image shift while adjusting au t minimize Iqmatar i x soa Phe Rs the stigmator Itisa fast method compared to alignment 42 UHR condition of HV and WD Stigmator Align which is only accessible to Supervisors Click on the Start button Before you click on this function make sure you have an image with Note sufficient detail at at least 60 000x Use Quad 1 far the procedure Follow the four step procedure to minimize the image movement in both the X and Y direction using the X Y controls available in the 2D control area Alignments Do Not change the aperture condition 13 Stigmator Alignment 13 S
160. ce Elements LCD Monitors The control software facilities and data are displayed graphically on one of the LCD monitors and are superimposed around and on the image The other LCD monitor is used for optional or related programs The System Computer The system computer activates the Start up conditions of the Strata from a software base Users Log on to Strata from the Windows 2000 base Start up and Shutdown of the Hardware are restricted to the FEI Service Engineer or an Authorized Supervisor with the exception of the EMO buttons See User Manual Chapter 3 System Operation Stage Controls The Nova NanoLab stage 1s software hardware controlled for five axes X Y Z Rotation and Tilt See User Manual Chapter 6 Navigation Manual User Interface The Manual User Interface MUI provides knobs to perform functions that can also be performed with the software Imaging Brightness and Contrast control e Stigmator X and Y control Magnification continuous control of magnification up or down e Shift X and Y Image shift control Focus Coarse and fine control TABLE 4 10 MUI SOFTWARE CONTROL EQUIVALENTS MUI Software Equivalent IMAGE CONTRAST Contrast and brightness adjusters on pages or Auto BRIGHTNESS Contrast and Brightness Icon button on Tool bar STIGMATOR Shift right mouse button MAGNIFICATION keys on numeric keypad Shift Mouse wheel for fine control Ctrl Mouse wheel for coarse control Co
161. ch allow you to change contrast and brightness by clicking and dragging the middle slider on the large bar or the same on the pointer in the small bar The functionality 1s as follows Brightness TABLE 6 5 C amp B OPERATION Function middle For large or small adjustments depending slider where you release 1t The further from the centre that the middle slider is pulled the larger the change This is Logarithmic gray bar For larger adjustments single step increments small slider For Linear adjustment continuous end arrow For finer adjustments single step increments These adjusters always have a label in the upper left and value in the right corner as a readout value m 4022 262 61641 Detectors Contrast Brightness le Tools Window Help Image Registration Ano Contrast Brightness ES Ano Focus F11 Ac Lens x stigmato Alanment Display Saturation Shitt F 11 Lab Hotes FE Movie Creator Application Status atera es Ctl o WORKING WITH NOVA NANOLAB Optimizing the Image Correcting Contrast and Brightness The contrast and brightness settings can be set manually either by using the MUI or by adjusting the CONTRAST and BRIGHTNESS controls in the DETECTOR module found on several pages The following description will work for both methods TABLE 6 6 CORRECTING C amp B Step Action 1 Select a medium speed scan in an active Quad 2 Reduce the contrast to zero and adjust the brightnes
162. change the Working Distance by setting a Z coordinate in the Stage module The function is still enabled to allow further corrections of the Z coordinate Auto Functions This section of the Tool bar contains functions such as Auto contrast p and Brightness and Auto focus Clicking either of these items will start a procedure of automatic correction Scan Speeds This section of the Tool bar contains a number of functions to provide slow or fast scanning capabilities at the click of the tool icon The left Slow icon is the predefined slowscan and the right Fast icon is the predefined fastscan that has been setup via the Preferences dialog labelled Scanning These can be selected for direct access to the preset value O 03h Tu The center spin wheel is for changing to the next preset scan speed position in the list Down Arrow is for increasing the scan speed and the Up Arrow is for decreasing the scan speed When either the two presets are active or chosen the respective icon 1s highlighted Clicking any of these items to operate will invoke a change to the scan speed Pixel Resolution Per Beam 312x442 This section of the Tool bar displays a dropdown list box that contains leds the Pixel Resolutions possible for viewing or recording an image DAE 1768 Clicking on the arrow to the right will drop the list so that all 3584x3094 resolutions can be seen Clicking further on one of these resolutions will invoke the Quad or Ful
163. cimen is at eucentric heic e HV is on Specimen is in focus C PO coupling is an O Standard aperture is selectec e in the case when Shift alignment is selected Z FWD coupling is amp perture centered atthe 3rd E active Cross over mode is off gt If such a condition is not fulfilled a dialog comes up that will ask you to take care of this e g Clicking on Yes will continue the procedure Cancel No will stop the alignment 9 24 4022 262 61641 Select Alignment Range Flease setthe range where the automated alignment will be performed capat 1 4 Y 03 5 kV Y 5 30kV Cancel apot4 b 0 3 5 kV Y 5 30kV ALIGNMENTS 11 Automated Source Alignment These dialogs have a time out of 10 minutes after that time the alignment will automatically abort itself without making any changes to the saved data When the alignment is running the flashing text shows Aligning Run times are in the order of 15 minutes all subranges tilt alignment only to 1 15 hr all subranges shift alignment included You can interrupt the alignment by clicking on Stop This button will start flashing until the alignment procedure has finished restoring previous instrument conditions When the alignment is finished or when it has been interrupted the following dialog comes up If you answer No here the source alignment data in the instrument will be reset to those that were in effect bef
164. cognition The data file data998 sct will automatically select the proper options when loaded into AutoFIB Once you have loaded the data file no further action 1s necessary You may want to enable visual matching within AutoFIB or have the beam shut off automatically at the end of milling These commands are available on the AutoFIB Options menu When scripts are run through AutoFIB no prompts are given during the process If image recognition fails the system will simply proceed to the next membrane or end the script if no other membranes are defined In such a case you must correct the error that caused the image recognition failure then rerun the script on the positions that failed NOTE If prompted to save the data file say NO to avoid overwriting the newly created file 4022 262 61641 HARD amp SOFTWARE OPTIONS Sample Files Sample Files The following data file represents a typical membrane definition produced by AutoTEM Wizard data file created by vbmakeini 10 29 2004 4 04 35 PM targetthickness 0 120 finalcurrent 100 000 finaldepth 4 000 centeroffset 0 000 roughmillcurrent 5000 000 uppery 6 400 lowery 6 400 taperangle 28 000 docutout 1 000 cutoutthickness 0 800 usestagerotn 0 000 depositionz 1 000 dovlowmagalign 0 000 makevlowmagbmp 0 000 if dimsetupreadout 1 goto end finalwidth 15 000 restartthickness 1 000 position 1 000 wizstagetilt 9 867 test 0 000 dooutline 0 000 confirmcutout 0 000 ret
165. contains all values necessary for the main TEM preparation script to run successfully DialogDefaults ini contains the default values for all settings listed in the input data boxes In addition System Values ini contains variables used in the membrane definition process These variables are ordinarily set by FEI Customer Service CAUTION To prevent data loss make copies of all your script files before editing them The variables are listed in their order of appearance in the respective files Do not change parameters other than those mentioned in the tables TABLE 8 20 RECIPE FILE PARAMETERS Variable Name Default Value Purpose test Iftest 1 then the Wizard does not mill or clear patterns If test 2 then will also prompt to clear patterns at end of milling steps This value also appears in each data lt n gt in1 dooutline Determines whether series of full milling patterns are drawn or just an outline box or series of lines the outline mode s are used for testing purposes dooutline 0 normal mill boxes dooutline 1 outline box of dimensions in recipe dooutline 2 outline box adjusted in y for adjustvalues Normally dooutline 0 This value also appears in each data lt n gt in1 nodialog If nodialog 1 the wizard will not prompt at a failed match AND will not prompt to place cuts in step 5 Normally for RunScript nodialog 0 For AutoFIB nodialog 1 This value also appears in each data lt n gt in1
166. cs Checking the condition of the stage should be a weekly exercise as many differing samples may be exchanged in this time period Some samples may be powders or composite materials that inadvertently drop particles on or in the stage If a Silicon wafer breaks in the chamber it can shatter into hundreds of pieces In this case the stage should be thoroughly cleaned before attempting movement again 7 2 2 Cleaning Stage parts NOTE Abrasives and solvents must not be used on the stage moving parts Cleaning should be made by using dry nitrogen gas bursts around the stage mechanics to blow out any foreign materials Make sure the final lens and detectors are protected from the turbulence Do not use sharp metal objects to scrape away debris A fine pair of plastic tweezers can be used to pick up difficult particles Spillages on the stage should be wiped up using a lint free cloth followed by blowing with N gt as 4022 262 52351 MAINTENANCE 7 3 Scroll Pump Check 7 3 Scroll Pump Check 7 3 1 Periodic check This should be planned every 3 months although every month is more realistic if sample loading is at a high frequency It is very important that the pipes to and from the pump are not restricted in any way If the pump exhaust pipe is fitted to an internal company system it is important that the gas flow is unrestricted by the system capability otherwise back pressure can occur which will overheat the dry pump 7 4 List of A
167. cted objects Trash can the objects list box enables to select an existing measurement tool or annotation Parameters of the selected object are displayed and can be modified in the property editor below NOTE The Measurement tools have their physical dimensions which scale with the image when changing magnification the displayed tools change their size accordingly On the contrary the Annotation shapes and texts have their sizes fixed relatively to the Quad Digital oom Digital Zoom The function can be used on live images still images for the electron beam ion beam as well as the CCD Image Using this function it can e ncrease decrease zoom factor Pan zoomed image Undo digital zoom or redo digital zoom whatever is applicable The digital zoom factor can be displayed on the data bar The zoom icon is displayed on the zoomed image m 4022 262 61641 USER INTERFACE Processing Page Enhanced Image Consists of functions for digital image enhancement and mixing Enhanced Image LUT Mi i i igi Mix 3 Mix 4 The digital processing does not influence the original raw image stored in the image memory and therefore can any time be modified or switched off undone completely The digital image enhancement can be applied to any detector image including CCD and also to paused or loaded images In contrary to Detector Contrast and Brightness functions the image enhancement functions are applied
168. cted steps are performed in the following order nthe protective coating step the system deposits a protective coating over the intended slice area This coating is used to protect surface features or to ensure that a potentially mobile feature remains fixed In this step Auto S amp V prompts you to insert the appropriate GIS needle align for image shift retract the GIS needle and realign for image shift Because this step requires user interaction users often choose to perform it directly in xT e In the rough cut step the system mills a standard xT cross section to allow electron beam imaging of the face of the feature of interest While many users perform this step directly in xT it can also be done using Auto S amp V m 4022 262 61641 HARD amp SOFTWARE OPTIONS Auto Slice amp View Software In the slice step the system creates and saves an electron beam image of the face of the mill then removes material with the ion beam repeating these operations until the specified number of slices has been made This step requires no interaction after initial setup and many users utilize Auto S amp V to perform only this step The following flowchart provides an overview of this process Auto S amp V can also be used to view images of the mill process but this step is not included in the flowchart since it can be performed independently at any time FIGURE 8 7 AUTO SLICE amp VIEW PROCESS STEPS Protective coating step
169. ction The Dynamic Drift Control menu bar displays Use this menu bar to run Drift Control from outside AutoFIB FIGURE 8 4 DYNAMIC DRIFT CONTROL MENU BAR Opens the Drift Control Defaults dialog box Status indicator p gt Red inactive Green active Yellow processing a Starts or stops Opens the Drift Control drift correction Status message box from which setting a template is confirmed m 4022 262 61641 HARD amp SOFTWARE OPTIONS Scripts Scripts A script is a set of directions that can be executed without user SUE interaction AutoFIB scripts are stored as text files A single script Drift Control may have multiple milling operations The scripting information is entered in the Scripting dialog box accessed from Set Up gt Scripting FIGURE 8 5 SCRIPTING DIALOG BOX Scripting New Parameters W Play All View Only otage Fattern File E f s f Mxv M UserUnits prefix patter mia ay Wz MR MT Iv Open Autoscript File Iv Ion Beam Settings None Iv Ion Beam Shift p mm PE ES avelmage ey Enter a Positions comment to be Y y Positions included in the script Auto Locate x 1 of 1 BI h post comment comment Script Display stage xy 3 03472 572515 The information stage zrt 11 0145875 47 9498309320739 52 0021315483804 selected in the apenure 11 2771 2 0 Parameters focus 16 61344 group is stiqmation 5 15266 1 64046 displayed he
170. ction in two or three stages 1 The first stage is regular cross section with five superimposed box patterns sharing three common edges 2 Optionally use either filled box or cleaning cross section at a reduced current If the cross section is large a second cleaning may be required at a lower current 3 Finally use cleaning cross section The following figure shows the relationship of these pattern areas and their relative size A typical cross section is 10 20 um wide by 7 15 um tall with the dimensions and depth appropriate to the size of the target area of interest FIGURE 6 40 A TYPICAL CROSS SECTION Cleaning cross Contact Edge section Step 3 Leading edge 0 5 um RUM Closest to Area of Interest Filed box or cleaning adas d cross section step 2 g eag option 1 2 pm Regular cross section step 1 Not to Scale Use caution in positioning boxes if you are sectioning a very specific point Use fine milling to expose the exact area of interest For example a 2 um offset should be more than enough at 3 nA of current Calculate the outline as the height of the box relative to the depth to be milled If you intend to view at 52 and see details 3 um from the surface then the original box should be at least 3 um tall Making the Cross Section Mill a regular cross section with five superimposed box patterns sharing three common edges 4022 262 61641 sm WORKING WITH NOVA NANOL
171. cu Pira il arry Indez dr i14 4 1011 HM 8261101 in pum a i x Ja 2 la 2 H E H2 H 25 E Jq 5D H E je Display controls The On line window can be placed in any quad or any half screen as well as full screen This can be controlled from the listed buttons on the top right of the On line window These are useful if it 1s important to view the application at the same time The On line window can also be dragged to size and placed anywhere on the screen The position of the window is remembered when the On line window 1s recalled m 4022 262 61641 USER INTERFACE xT Control Interface Elements xT Control Interface Elements The xT Control Interface Elements make up some or all of the application windows displayed when the xT Control software is loaded This consists of the following items e Main Window displays all interface elements Title Bar labels the application and the owner user Menu Bar contains all operation menus and submenus Preferences dialogs presetting of operating conditions Tool Bar contains all iconised button functions e Pages contains all pages made up of one or more modules Quad Image Windows 4 image windows providing independent image functionality modes Main Image Window full single image mode Data Bar contains all data information entered by preference for storage printout of the image Control of some or all of these it
172. d 1 far the procedure UHR Lens Alignment Do Not change the aperture condition 42 UHR Stigmator Alignment Procedure The 42 UHR Stigmator Alignment procedure starts here No step TABLE 9 17 42 NO STEP Order Action Mode 2 Specimen Tin Balls any suitable sample Alignments 42 UHR Stigmator Alignment v Steps 6 Next Press the Start button select the Working Distance necessary from the list below Optimize the image with Contrast and Brightness Focus with stage z in next step TABLE 9 18 42 STEP 1 OF 6 Instructions Click on the Next button to move to the next Step or Cancel fat any time to leave the Alignment procedure and return to original settings Proce Po alima All ta initialize Order Action Select a Working Distance 5 mm for Eucentric jobs p If you want to keep values from Step lof the alignment as the starting ones for all the next steps click Re select a Working Distance align all button 1 0 mm 1 5 mm a Optimize the image with Contrast and Brightness sa Click on the Next button 3 0 mm 40 mem 6 0 mm Re align All 9 16 4022 262 61641 ALIGNMENTS 42 UHR Stigmator Alignment Alignments Previous Instructions Order Action 6 For the chosen WD a start HV will be displayed Focus with stage movement Optimize the image with Contrast and Brightness Click on the Next button to move to the nex
173. d circle millpositions with respect to fiducials found by image recognition can be calibrated xoffpix yoffpix yoffpixslow yoffpixcircle Press Play to start the calibration Press Mill Offset to start the membrane offset calibration Select the temliftout 1 5x4um recipe Select Mill The script will mill two crosses The script will find them by matching and it will mill a third cross in the middle of the other two based upon the found crosses The script will then find the third cross by matching and calculate the difference with the mill position The calibrated values are written to the registry automatically For the circle offset press Play to start the calibration Press Circle Offset to start the circle offset calibration The procedure is similar to the Mill Offset calibration procedure e 6 LogAllDefaults psc This script reads the variables in DialogDefaults ini and SystemValues ini and writes them to a file named Autolog 1 in case you ever need to restore these values Press Play to start the script 4022 262 61641 8 57 HARD amp SOFTWARE OPTIONS Troubleshooting Troubleshooting AutoTEM Wizard is designed to avoid many errors that may occur during the TEM sample specification process The FIB system and its operating software are also equipped to resolve errors that may occur during sample milling If you encounter an error that requires user intervention you may be able to resolve it by following the procedu
174. d in preparation step when dovlowmagalign 1 depthcorrection Applies to milling steps For materials other than the selected application a correction factor lt gt 1 may be needed Use gt 1 for samples harder than the application use lt 1 for softer samples This value also appears in each data lt n gt in1 4022 262 61641 HARD amp SOFTWARE OPTIONS Script Variables TABLE 8 20 RECIPE FILE PARAMETERS Variable Name Default Value Purpose dovlowmagalign Lowmag align feature If dovlowmagalign is 1 then a circle is milled next to the left cross for recognition at low magnification Normally dovlowmagalign 0 This value also appears in each data lt n gt in1 makevlowmagbmp if makevlowmagbmp 1 then make a separate bmp for recognition at low magnification 1f makevlowmagbmp 0 then use the standard bmp This value also appears in each data lt n gt ini vlowmagcirclerad Radius of fiducial circle for recognition at low magnification vlowmagcirclez Depth of fiducial circle for recognition at low magnification dorcg l Used during setup If dorcg 1 matching is used to recenter crosses If dorcg 0 matching 1s not used and if dorcg 1 the user is prompted to do matching to recenter crosses dogrounding 1 Used during setup If dogrounding 1 a grounding layer is deposited If dogrounding 0 no grounding layer is deposited and if dogrounding 1 the user is prompted to deposit a grounding layer
175. d module is supplied as a complete unit for ease of mounting The aperture strips come in two types e 5 hole 30 30 50 30 30 um 5 hole 30 30 40 50 100 um factory default FIGURE 6 20 THE HEATED APERTURE HOLDER MODULE TITANIUM SCREWS HEATED ROD FITTING 10001 94 30 50p POSITION 4022 262 61641 EI WORKING WITH NOVA NANOLAB Selecting Beam Conditions a Selecting E Beam Apertures v Electron Beam Users can select a different aperture by turning the mechanical lon Beam aperture control on the SEM column to the preset position number Optical Beam required It has a click stop mechanism This ranges from 1 to 5 for apertures where as positions 6 and 7 are blank This procedure should only be attempted when the system is not being used for milling Couple Magnifications SEM Aperture Whenever a different aperture is selected it is recommended to use SEM Mode Mode 1 30 kV spot 3 with the specimen at a 5 mm working distance After selecting a different aperture mechanically the correct software tables has to be set for the selected aperture This can be done from the menu Beam SEM Aperture Preferences Stage Tools Window Hel f otrip Aperture Alignment Procedure xT Align Feature Compucentric Rotation F1 Before you align the column be sure that the final lens aperture is o correctly aligned If the final lens aperture has to be aligned choose the smallest for
176. d offset to correct for shift between apertures A Previous unique value is saved for each aperture Instructions TABLE 9 51 210 IMAGE SHIFT CORRECTION For each aperture index selected in menu bar Focus alignment Adjust Order Action Focus with L Slider not with Select 100pA aperture Mouse n Click BEAM SHIFT and ZERO Stigmator Alignment Adjust stigmator with Stigmatar Correction Find a distinctive feature of interest on the image and move to the center of the screen using the joystick or double click with the mouse Do not move the feature Aperture Alignment Turn on L1 wobble with convenient to the middle of the screen using a beam shift control wobble amplitude Minimize wnhhla hw anartiira rimari ant Dci BShitt stig i Quad Click SAVE and select the next aperture select either ZEN 3 StigSin SOpA or 300pA stiglas AperPas Select BEAM SHIFT again Wob ampi 1000 uM l EERE BH m m Position the cursor in the two dimensional X Y m control and click and hold the left mouse button mame Drag the hand that appears to shift the feature within 0 5 um of the same place onscreen as it was at the WobbleStigSin YobbleStigCos previous aperture Release the mouse button cava Load L1 Carr D Click SAVE when finished Repeat beam shift correction step 12 and 13 for all apertures M M MEL L2 Corr O Click FINISH When completely finished with the L2 0Y l adjustment process Contras
177. desktop icon for AutoFIB 4 After the xT software 1s running click the AutoFIB icon on the desktop to start the program or select START gt Programs gt FEI Company gt Applications gt AutoFIB The AutoFIB window opens FIGURE 8 1 AUTOFIB WINDOW AutoFib Title Bar Eu AUtOFIB xT New AutoFib Menu Bar 3 File Play Logging Options Set Up Help gt i ii m N u X Indicates current Used in Playing a Script Returns to the stage position location of the first position in the script AutoFIB Tithe Bar The title bar of the AutoFIB window indicates the active AutoFIB mode TABLE 8 1 AUTOFIB MODES Description AutoFIB starts in New mode Entering or making changes to a script puts AutoFIB into Edit mode Stopping a running script returns AutoFIB to Edit mode AutoRun Running a script puts AutoFIB into AutoRun mode The toolbar is outlined in red Pausing a running script puts AutoFIB into Pause mode 4022 262 61641 LI HARD 8 SOFTWARE OPTIONS AutoFIB Menus AutoFIB Menus AutoFIB has five menus File Play Logging Options and Set Up File Menu TABLE 8 2 FILE MENU OVERVIEW Menu Item Description Mew E Specifies a new AutoFIB file SaveAs Default Script ru Opens an existing AutoFIB file EAE SaveAs Saves the AutoFIB file with a new name The file name extension is sct Default Script Not used in current version Eus AuGFIB Play Menu The Play menu contro
178. displayed with the coloured icon This icon represents three vacuum sections schematically each of which may have three possible colours with the following meaning Green pumped to the desired vacuum mode HiVac LowVac or ESEM Orange transition between two vacuum statuses pumping venting or purging Grey vented E 4022 262 61641 SYSTEM OPERATION Log On Log Off Log On Log Off oupervisor and User Log On Log Off First log on under Windows 2000 as SUPERVISOR or USER allow the server and UI to load then start the UI with a password A default password is allocated on installation to the Supervisor for the Windows and UI Log on When the status of the UI 1s waiting for a new USER only the Server state 1s active and the UI state non active Therefore changing the USER does not require Log Off log On at Windows 2000 level but just Log Off Log On at the UI level Launch Server level When starting the Nova NanoLab operating program a progressive dialog for Server and UI is displayed The Server needs to be launched first followed by the UI Press the Start server button FIGURE 3 1 START UP DIALOG XT microscope Server Server state Console devices SERVER STARTING xX O ava MODULE PROGRESS lt OPERATION BAR Es DISPLAY UI UI State PROGRESS STOPPED x BAR Microscope STOP START SERVER Start stop standby SERVER start Ul stop Ul Advanced gt gt gt START UI
179. e distances angles diameters and areas etc Clicking on the appropriate symbol button at the top of the MEASUREMENT module will open a properties list where items such as Tit Correction Color Font line width measurement type and text position etc can Tilt Type Automatic be defined Manual Tilt D D Color El The graphic chosen can then be drawn on screen with that symbol Font Color 1 cursor Once the graphic is drawn the ARROW symbol button can be E EPA l clicked on to change the graphic in size or shape If there are more mata aom graphics on screen the arrow button can also be used to focus on one in particular by clicking on the graphic when using the ARROW symbol FIGURE 6 45 CONTROLS FOR MEASUREMENT MEASUREMENT FUNCTION DELETE Measurement Annotation MEASUREMENTS OR A AS m ANNOTATIONS 1 Line Measurement 1 y Pare salue a Tilt Correction Mone OBJECT Enhanced ems LUT Mix 3 Mix 4 O Contrast Ob D Brght 0 00 um uu m H Gamma 1 0 Tilt Type Automatic Manual Tilt 0 0 Color mi Font Color Line Width 1 ACTIVE MEASUREMENTDETAILS ENTERED AND DISPLAYED Detectors Contrast N os 8 Brightness q S 4022 262 61641 WORKING WITH NOVA NANOLAB Using the Measurement functions Use of Measurement Measurement can be used to gain statistical information about a milled area by overlaying the shape with a measurement graphic to outli
180. e Save button to store the previous centering Press the Next button to to go to the last step or Cancel to quit Order Action At Step 5 a check box for next WD will appear with the Save button If you are going to adjust the next WD sequence then check the Next WD check box before clicking the Save button Click on the Next button to return to Step 1 to select Step 5 af B the next WD Repeat the procedure from Order No 3 Y Next WD Save Alignments 42 UHR Stigmator Alignment Order Action Instructions 15 At the saving of the last WD HV series do not check TABLE 9 22 42 STEP 6 OF 6 Press the Finish button to save and finish the Next WD box Press the Next button Step 6 opens and the Finish button appears Press Finish at Step 6 to Save and exit Auto Buttons In some of the pages will be found Auto Buttons that achieve a similar result to the above described adjustments It is possible to just click the Auto button This function utilizes Image Recognition software If j Step amp of B 3 this utility does not recognize image features well the procedure is aborted and Warning message appears onscreen In this case change the imaging conditions better focus slower scanning lower magnification or use the normal manual procedure 9 18 4022 262 61641 ALIGNMENTS 43 UHR Image Shift Correction 43 UHR Image Shift Correction Alignments 43 UH
181. e a n 8 47 RUIN AUTOBIB s aueh sm aos be ES X quee e ua pes 8 47 AUTOFIB SCRIPTING DIALOG BOX 22044 8 48 POA VISE us iion ite deg e aci a O Es 8 61 ALIGNMENTS 9 THE HEATED APERTURE HOLDER MODULE esse 9 7 FINAL LENS APERTURE CONTROL 0200048 9 8 4022 262 52351 4022 262 52351 q List of Tables SAFETY amp HANDLING 1 DC POWER WIRE CODING sse s 1 5 ACCABLE CODING usaste it tattoo 1 5 SYSTEM OVERVIEW 2 SYSTEM OPERATION 3 LEAVING THE SYSTEM OVERNIGHT 220048 3 5 RETURNING TO OPERATION und aet e a 3 6 GOING INTO STANDBY MODE 452 Ra Rer emen e n 3 7 STARTUP AFTER STANDBY as uu dene p bU eR e RE es 3 8 COMPLETE SHUTDOWN PROCEDURE nnne 3 10 STARTUP FOR OPERATION 455554499 SEU E Vra a E RR RR anre Rar 3 11 USER INTERFACE 4 INNING Sot Sow ee Ri RUE ER Eo T botes aides icd nns 4 10 TABBED PREFERENCES orenat 5 2 REN QUILT E RUE GUMMI I EN RR d 4 29 DATABAR STATUS ausis uum hte ved an RE IADEE Xa RE RA 4 4 PAGE cte oes dro Drain i tas Wesker eee eae arene de ates 4 42 STATUS ICON FUNC TIONS cei oie pida p Sq PURSE Heeb Sr res 4 64 MOUSE BUTTON EUNGJIIONI ox do tab ene et ee aes 4 66 DEDICATED WINDOWS KEYS 0 cece cece eee Rh 4 67 POUNCTION KEY SHORTCUTS cierras posa ke oot 4 68 SPECIFIC KEY SHORTCUTS or tios eridi e 255 E EE E Rr 4 69 MUI SOFTWARE CONTROL EQUIVALENTS 2 4 70 WORKING
182. e actual position of Source Tilt is always shown by the position of the crosshair in the X Y control The Electron beam Icon logo is displayed at the right side of the module 4022 262 61641 acuum ent Column p Lens Alignment source Tilt Modulator Crossover Magnificatio n p Couple Magnificatians Magnification Beam Beam Shift Stigmator Rotation Scan Rotation Re ies oo aia Detectors Contrast otatus specimen Current 0 34 nay lon Beam Current 2 41 pA USER INTERFACE Beam Control Page Crossover The CROSSOVER button is available only when the System and Column modules are in operation Crossover allows imaging of the source and is useful during the alignment procedure Also if the column aperture is severely misaligned the image of the crossover can be very helpful The crossover is visible in a slow scanning mode and as a help the center of the screen is marked with a cross The crossover should be in close vicinity to the cross It can be set to the correct position by manipulation of the aperture If in this condition the crossover mode is switched off an image will appear on the screen Magnification The Magnification module gives access to coupling the magnification of both beams The magnification 1s set with the slider and then locked by ticking the box labelled COUPLE MAGNIFICATIONS The Icon logo for the beam in ac
183. e actual position of lens align is always shown by the position of the crosshair in the X Y control Use this function at a fast scanning rate to view the immediate response of the system with the modulator on If the system is well aligned the rotation center is at the center of the image at low magnification 200X At higher magnification gt 20 000X the image does not move from the rotation center during modulation of the focus or during normal focusing actions If out of center the X Y controls of the Lens Align are use to center the rotating modulation Clicking on the right mouse button while over the 2D box area will show a small dialog to Zero the control or to select it s operating function linear or logarithmic This is the same for all 2D controls on this page Source Tilt The SOURCE TILT X Y control indicates the actual setting of the electronic gun tilt with respect to its extreme settings Source Tilt changes the effective angle of illumination of the beam coming from the source area of the electron column Use it to manually center the illumination maximize beam brightness on the Beam Defining Aperture BDA in the crossover mode This adjuster is a temporary override of the setting predefined in the alignment procedure Click with the left mouse button on the SOURCE TILT area The four way arrow cursor 1s shown on the full screen Move the cursor left right and up down to control the Source Tilt X and Y Th
184. e beam for the rough cut and slice steps is a simple way of running these processes unattended To benefit from this feature however you must select the Disable Aperture Change option on the Utilities menu Milling the Sample Click RUN to initiate the Auto S amp V operation To abort the operation at any time click STOP in Auto S amp V then STOP PATTERNING 1n xT 2 If you run Auto S amp V with the Coating option enabled the system prompts you to insert the GIS needle and recenter the image Insert the needle and follow this procedure While imaging with the ion beam recenter the image using beam shift Keep live imaging to a minimum to avoid unwanted sample damage Grab a second frame to verify the image position relative to the Auto S amp V patterns Repeat this process until the image is correctly centered in the patterns Click CONTINUE to initiate metal deposition 3 When the system has finished depositing the protective metal coating it prompts you to retract the needle and recenter the image Retract the needle and follow this procedure In xT select the Stage menu gt Zero Beam Shift to recenter the image Grab one ion beam frame to confirm that the image is centered If necessary fine tune the image placement using beam shift Grab a second frame to verify the image position relative to the Auto S amp V patterns Repeat this process until the image is correctly centered in the patterns Click CONTINUE to re
185. e can be shrunk to an icon at the bottom of the screen An application shown as an icon 1s running in the background of the computer memory Double click on the icon to restore the program There are also icons in the Tool bar for selecting system functions quickly as seen on the left Clicking on any of these will cause them to press in when deactivated by clicking again they spring out Pulldown Menus The microscope uses menu oriented software you perform functions by choosing items from the Menu bar The Menu bar selections contain pulldown menus that display group listings of available commands or settings Some menu items are shown in gray and cannot be selected You might also get a beeping sound if you try to select unavailable functions selecting with the Mouse To select a pulldown menu click on the menu item in the Menu bar then drag the cursor down to the desired selection and release the left mouse button Pulldown menu selections followed by points indicate a dialog box will display Selections with a right arrow indicate an additional submenu of choices will display If the selected setting 1s a parameter value the new value is updated immediately and a check mark appears in the pulldown menu If the selected setting is a command a new popup menu or dialog box appears Selecting with Keyboard Commands To use keyboard commands for selecting top level menu items press ALT plus the underlined letter for e
186. e contrast of the active detector Brightness Use this adjuster to control the brightness of the active detector The end arrows give a finer control The mini sliders below the main sliders give a linear control while the large slider gives logaritmic control Status The Status area is used for the feedback of parameter conditions as the system 1s being operated These parameters may change due to the application being monitored at any time It is found at the base of all pages m 4022 262 61641 Patterning Page Pattern Ll im HIDE MH Application A SIZE pum Y size pum Z SIZE pum DwellTime Us acanUDirection Bottom To Top Rel Int Diam 2 07 Beam Electran TatalTime Os Progress Total Time O Overall Progress Current Progress Select All Omniprobe Insert Omniprobe sas Injection Overview Details In Gas Type Heat Flow Cold Cold Status specimen Current 6 05 nay lon Beam Current 76 97 nA USER INTERFACE Patterning Page The Patterning Page is divided into modules e Pattern e Progress e Omniprobe e Gas Injection End Point Monitor Status The Patterning Page is a User level page It contains the essential components to perform Patterning Pattern Pattern shapes can be selected and drawn their data entered and displayed with this module A shape can be selected by clicking on the PATTERN SELECTOR and the details filled in the patt
187. e file Script succeeded To begin select the button that corresponds to the membrane definition then press PLAY For example in the figure below Button 1 corresponds to the datal ini file for the first membrane defined in the setup process 4022 262 61641 845 HARD amp SOFTWARE OPTIONS Sample Milling FIGURE 8 22 DATAI INI FILE EH RunScript xT wizard psc File Run Help fal DEAA m n script Settings m Est ipopcount zi 10 Iv Show Results Dialog lon HV Off at End Iv Visual Mate Electron H Off at End Iv Calculate Timings Hv lon Source OffatEnd M vbmonitor Active The system prompts you for permission to move the stage to the location saved for this membrane Move stage to the stored location for this membrane Click yes if it is necessary to move the stage to view the crosses for the membrane Click No if the stage is already at the appropriate location and the crosses are onscreen The system then asks you if it should perform all milling steps or polishing only Click ALL to begin with the protective platinum deposition if specified and proceed to rough milling Click RETHIN to finish a previously milled sample or to cut free a partly milled membrane the system will ask you if the cutout step has been performed already If you select Yes the Adjust Sample Parameters dialog will be shown and you have the option to change some parameters of tables and 2 djust Sam
188. e from the Ion Beam or E Beam Use CLEANING CROSS SECTION from the pattern tools menu at a reduced current for this step 574 4022 262 61641 WORKING WITH NOVA NANOLAB Creating Cross Sections TABLE 6 32 MAKING THE SECOND CUT OPTIONAL Action From the Tool Bar Set the I Beam current to approximately 1 4 of the beam current used for the first cut 2 Click SNAPSHOT to grab a I Beam frame 3 Click CLEANING CROSS SECTION Bring the cursor to the image area and draw a rectangular box Adjust its size so that its leading face is approximately 0 2 um from the target area and the trailing edge extends just beyond the rough cut Remember to fill in the depth of your cross section in the property editor on the Patterning page 4 Snapshot another I Beam frame to check alignment of the pattern to the feature 5 Click on the START PATTERNING icon in the Tool Bar 6 Select a new Quad by clicking in it and the E Beam icon from the Tool Bar and begin scanning Click SNAPSHOT to grab a frame to view the E Beam image Use CLEANING CROSS SECTION from the pattern tools menu for this final cut TABLE 6 33 MAKING THE FINAL CUT Step Action If the cut is too rough change the Ion beam current to 300 1000 pA Adjust focus as needed In the patterning Quad click SNAPSHOT to grab an I Beam frame Click CLEANING CROSS SECTION Bring the cursor to the image area and draw a rectangular box Adjust its size so that it
189. e give the user many capabilities to locate and label items that are of significant interest on the sample area Measurement Annotation L 1 Line Measurement 1 Clicking on the appropriate symbol button at the top of the ANNOTATIONS module will open a properties list where items such as Color Font line width and text position etc can be defined Tilt Correction Mane Tilt Type Automatic Manual Tilt 0 0 Color mi Font Color Line Width 1 Digital Zoom The graphic chosen can then be drawn on screen with that symbol cursor Once the graphic is drawn the ARROW symbol button can be clicked on to change the graphic in size or shape If there are more graphics on screen the arrow button can also be used to focus on one in particular by clicking on the graphic when using the ARROW symbol FIGURE 6 46 CONTROLS FOR ANNOTATIONS ANNOTATION TEXT FUNCTION SHAPES OBJECT Measurement nnatatian ACTIVE DELETE ALL ANNOTATIONS Enhanced Image LUT Mix 3 Mix 4 pollen ES Aral 13 0 0 O Contrast 0 6 0 Bright 0 00 a y uu m H Gamma 1 0 ANNOTATIONS PROPERTIES LIST Detectors Contrast N E 8 Brightness N E 8 4022 262 61641 WORKING WITH NOVA NANOLAB Using the Annotations functions Use of Annotations Annotations can be used to graphically label items of interest Text can also be used to add further information about the points of interest The following
190. e image rotates around the center Sat of the field of view at low magnification and does not move at high magnification during focusing The position of the final aperture Eft sting should remain constant and should not be changed further during the 10 00 kv alignment procedures Tuning Lens m E i TABLE 9 6 ALIGNING THE FINAL LENS APERTURE Choose Mode 1 field free and set HV 30 kV Spot 580819 ESE 3 FWD 5 mm Select Zero Beam Shift from the Stage menu Select Zero Lens Alignment by clicking the right mouse button on the 2D box center square see Chapter 4 for more detailed description Make an image at a magnification of about 10 000X Select a fast scan rate from the Scan Speed control and Average 4 from the Filter control on the Tool bar Move the stage to find a good area of interest and focus as best one can Center a feature with the Get function Click on the objective Lens coil modulation wobbler icon in the tool bar The scanning condition turns into the fastest scan value the lens modulator turns on and the alignment cross appears in the center of all imaging quads The image rotates about a point this maybe different from the image center Adjust the position of the aperture so that the center of the rotation is under the cross Increase the magnification to 20 000X and realign If necessary repeat at 40 000X At higher magnification the image may move very slightly in a certain
191. e ne dis 5 53 An ers te ate ores eae deed re ee nk ae 5 54 Patterns MOONS anges as ernie Sats Gee si ita 5 55 4022 262 52351 4022 262 52351 A Magnification and Patterns o ooooooooooonnono eens 5 57 DElSCliNO a Paita ad Pat ee eee ee etd ee et 5 57 Editing Patterns 2 wh eoo e o uer 5 57 Seral Patterns ld tases wie oe eee ee ERA BE d dts 5 58 Paralle Pate EHI tardor ii ore drat Reh eee a ot hs 5 58 Pattern PrOSIOSS co Asis dee uos 5 58 Milling Order of Patterns 1 0 nee 5 59 JNDDIICatloB 3165s a ads e ect hosp AOE AA Bie eee es 5 60 Choosing an Application File oo o oooooooooooooo 5 60 The non gas assisted application file ooooooo 5 60 The gas assisted application file o o oooooooo o 5 61 Editing Application Files 0 0 0 0 5 62 The Gas Injection System GIS 2 0 0 nananana anaana 5 65 erra 5 65 SU ly e te uaa crc ITE 5 65 Seina Up Ce CIS ars het Ss aXXo BEE ERI ERA RUNE RO RS 5 65 The End Point Monitor EPM 00 0c ccc ccc ee eee 5 67 The BERMEO sees E aed eno bee VH ex SCENE og dee 5 67 Setting up the EPM for monitoring 0 000000 cea 5 68 Beam Colnmcidence 3 a eo e potet nodo edel wd Das we PS pasa 5 69 Beam Coincidence for the Electron and Ion Columns 5 69 MUS A Date tlle eso PR ERIPUIT PVT oboe deer 5 70 tarta Malim Patteri taa pere ERR ii otk e Selb aes 5 70 Stopping and Restarting 0 eee 5 7
192. e text box Search region around model text box Drift Control while milling only Grab X frames before Auto Locate Grab frame after Auto Locate Grab frame after Drift Correction Go to next block upon image match failure Description Specifies the time interval between drift corrections in the Interval group Use more frequent drift correction at first to compensate for recent stage movement Interval Correctewers po seconds forthe first i times After that correct every 300 seconds Each time the specified duration has elapsed patterning pauses while the system checks for drift and makes needed corrections Patterning then continues until the next drift correction time occurs Defines the size of the template in relation to the full screen For example a size of 25 defines a template with 1 4 the width of the system s screen HFW Horizontal Field Relocates the locating feature after image drift caused by milling Enter a positive to limit the search area to a feature near the template Enter 1 0 default value to search the entire field of view Makes drift corrections during milling This selection is available only when using the standalone Drift Control program Selects the number of frames to be grabbed On some samples the image contrast changes markedly after one or two frames are acquired particularly if the area had not been imaged for some time This is because grabbing an image h
193. e the stage The stage cannot be moved the Home stage procedure must be completed first Do you wantto run it now ff Home Stage with the rotation axis If a CDEM is installed in the system go to the Alignment page and select adjustment 29 Auto Zero detectors to autocalibricate the CDEM NOTE When vacuum pressures are too high at point 5 in the procedure for system operation then a bakeout is required If this is the case a trained FEI Service Engineer or a FEI trained Supervisor must restart the system EH 4022 262 61641 SYSTEM OPERATION Emergency Power Off EMO Emergency Power Off EMO In an emergency press one of the large yellow and red EMO switches to turn off all system hazardous voltages The system will be brought into a safe state and turn of completely The EMO switches are latching Once pushed in they must be rotated in the direction of the arrows to reset FIGURE 3 4 EMO BUTTON EMO switches are located on the back of the E2 Console FIGURE 5 EMO BUTTON ON BACK OF THE E2 CONSOLE CAUTION A trained FEI Service Engineer or Authorized Supervisor must restart the system after an emergency power off 4022 262 61641 EJ SYSTEM OPERATION What Happens during Power Failures What Happens during Power Failures The system has protection against power failures in the sense that the different components of the system are not likely to be damaged However a power failure is never good for the
194. ed Calibrating Beam Shift When calibrating beam shift for the first time after installation or after restoring factory settings perform the action twice The first calibration involves only a small beam shift the second calibration uses a larger shift based on the measured values Thereafter beam shift calibration is required infrequently NOTE Make sure the image HFW is 100 um or less otherwise the beam shift may go out of range when performing the calibration 4022 262 61641 LI HARD amp SOFTWARE OPTIONS AutoFIB Menus The calibration process is similar to that used for locating a feature when Auto locate is selected as a preference for the scripts A template is placed in the lower left of the screen for positioning over a locating feature The system grabs a frame electronically shifts the beam in X grabs another frame calibrates the beam shift by determining the distance of movement in pixels then converts the distance into um The process is repeated for Y FIGURE 8 3 BEAM SHIFT CALIBRATION Beam Shift Calibration Please use beam shiftto place a feature inside the pattern displayed on the image The pattern may be resized if necessary butthis is not recommended Click OF when the procedure is complete cc Dynamic Drift Control Access standalone Drift Control by double clicking the Drift Correction icon on the desktop or by selecting START gt Programs gt FEI Company gt Applications gt DriftCorre
195. ed list can be moved up or down due to priority or preference This will in turn change the order of the displayed items in the DataBar Items can be removed from the Selected list singularly or in total back to the Available list The MICRON BAR will scale to the magnification but also will change size to accommodate other items added to the DataBar It can be chosen also from the Available list The LABEL area expands or contracts depending on the other items X on the Databar It can be chosen also from the Available list The label is edited another way By clicking on the LABEL button a v Quad Quad choice dialog appears to edit and copy the label to any of the other Quad 3 7 Quad 4 cues quads Clicking on the BITMAP button will open a dialog to load a bitmap into the databar The limit for entries is displayed in the dialog as it is updated FIGURE 4 11 DATABAR PREFERENCES Databar units Presets Scanning General Movie Sensitivity Available Selected Dwell Time High Voltage Horiz Field Width Working Distance Move Down Magnification Scan Rotation Bottom v Label Label v Micronbar Add Bitmap Databar Preview E bes 006 dwell HV A 2 45 40 PM 300ns 5 00 kv Click on the OK button to bring the new settings into operation or CANCEL to return to the original setting Either of these will close the Preferences dialog
196. ed setting If that setting is not equal to 52 the application will display a warning Click CONTINUE to resume the operation at the current stage tilt Click QUIT to abort the operation Auto S amp V Setup 1 Verify that xT is running and that the system has been prepared for general cross sectioning and imaging 2 Select the 10n beam as the primary beam 3 Launch Auto S amp V 4 Select File gt Image Save Location to choose a directory where the images will be stored With the image prefix you can specify a prefix that identifies the image stack uniquely In the picture shown the first file will be called image000 bmp If you save images to a directory containing bitmaps with the same prefix Auto S amp V prompts for permission to overwrite them 5 Select the application for all process steps to be performed If you have previously made the rough cut or deposited a protective coating in xT set the application for these options to NONE 6 Select options in the Slice group The dimensions including Length or Z should be large enough to mill through the feature of interest The number of slices should be large enough to ensure a good sampling of the volume of interest HARD amp SOFTWARE OPTIONS Using Auto Slice amp View Button Text Slice Scan Time 8 Resolution Low Med High Saul Em 158 6 34 0 74 2 44 11 77 Dwell 141 5 66 22 63 time 283 1132 45 26 5 66 ee b3 90 52 L
197. ed to a GIS With multiple GIS s installed on your system you can select between milling Pt deposition Enhanced Etch etc by selecting a Application file for a given pattern Milling on specific materials without gas can also be done more efficiently with the appropriate scanning conditions using the dedicated Application file for that material Choosing an Application File Application files are found in the PROPERTIES list under APPLICATION on the Pattern page Clicking on the right of the application entry will promote a dropdown arrow Click on the arrow and a list of applications for the GIS system will be displayed Click on the one required and it will reside in the APPLICATION slot in the PROPERTIES list This is now the active application file for the GIS The appropriate application file should be use with the gas type it was written for FIGURE 6 35 APPLICATION FILES CHOICE Regular cross section Position Y Rotation Enabled Total time GasType The non gas assisted application file For the Silicon Application file the following patterning properties are defined TABLE 6 21 SILICON APPLICATION FILE NON GAS Properties Si XML Description Dwell Time The time the beam spends on a single pixel per pass Sets the beam diameter overlap Volume per 0 150 Describes the amount of volume of material removed Dose m s per charge This used to be called sputter rate in previous dualbeam tools mI 4022 262
198. edicated to the electron column The scanning condition changes to a fast scan and the lens modulator turns on a green target cross appears in the center of all SEM image Quads Pressing and holding the left mouse button activates a quad arrow ended cursor and dragging the mouse aligns the beam with respect to the objective lens e Additional Scan Functions This section of the Tool bar contains functions such as a Videoscope for correcting contrast and brightness and a Reduced Area for specific focus and astigmatism correction Clicking any of these items will change the image display to suit the function 4022 262 61641 439 USER INTERFACE The Tool Bar Lens and Scan Functions Z to FWD The Z to FWD button has 4 conditions Greyed icon the function is disabled because either the stage has not been homed or the HV is switched off so there is no SEM image or the Ion Beam is selected Red question mark the function is enabled and the link between Z and FWD is unknown Use the function as soon as possible after properly focusing the image Red circle Z is roughly linked to FWD but it needs correction The function is enabled It happens e g after changing the specimen focusing and linking Z to FWD at a long Working Distance and then moving the stage to a short WD Focus image carefully ata WD around 5 mm and use this function again Green double ended arrow Z is properly linked to FWD Now it should be safe to
199. eferences dialog Scan choices can be found under the tab labelled Scan n 4022 262 61641 Beam Menu Beam Patterning Stage Tools Wind Electron Beam b Ion Beam Optical Beam Couple Magnifications SEM Aperture SEM Made Degauss Electron Beam Lens Alignment Preferences Fo Shift F4 Colo USER INTERFACE Beam Menu Clicking on the Beam name in the Menu bar with the left mouse button opens the Beam menu This can also be achieved by pressing the Alt button and the B key Electron Beam Clicking on Electron Beam will make the Quad or single screen active to the electron beam with respect to source column scanning and detectors lon Beam Clicking on Ion Beam will make the Quad or single screen active to the ion beam with respect to source column milling scanning and detectors Optical Beam Clicking on Optical Beam will make the Quad or single screen active to the optical beam with respect to Source and detector Couple Magnifications Clicking on Couple Magnifications will allow the Electron and Ion columns to be coupled together so that when switching between columns there is no difference in magnification This is particularly useful when milling with the Ion Beam and viewing with the Electron Beam SEM Aperture The SEM column final aperture can be selected by clicking on SEM Aperture in the Beam menu A secondary dropdown menu appears with a selection of aper
200. ekends If you don t plan to use the workstation until the following day or Vacuum weekend use the SLEEP button facility on the Beam Control page vum This switches off the 10n column source but leaves the electron column filament current on Returning to full operation takes only a System few minutes sleep TABLE 3 1 LEAVING THE SYSTEM OVERNIGHT ce ee is Md AAA Action Click on the SLEEP button in the SYSTEM module to switch off both beam simultaneously The lon column source switches off completely This is seen Vi da zd by reduction in the SOURCE progress bar in the Vent column module when the lon beam is selected System system Column e cnurce ix Source High voltage Ee oov ColumnFE The Electron column reduces to filament current on only The Beam Control page will then indicate that the system is ready to wake up via the WAKE UP button in the SYSTEM module Click on STOP UI in the Server bar This action will also act as Log off current user Switch off the monitor Start tl Stop Ul x 4022 262 61641 EJ SYSTEM OPERATION Returning to operation Returning to operation Operation This procedure is almost the previous in reverse TABLE 3 2 RETURNING TO OPERATION Step Action Switch on the monitor Click on the START UI button on the Server bar The UI splash dialog appears on the screen followed by the UI
201. el Instructions Press the Next H button to continue centering with another HS Press the Save button to store the previous centering Press the Next button to to go to the last step or Cancel to quit step 4 of 5 Y Next HY Save TABLE 9 10 10 STEPS 2 TO 5 Order Action Adjust Source Tilt Click on the Cross Over button and with the use of the 2D box set the centre of the image under the Green Cross which indicate the holy point Besides for Spots 5 and higher it is recommended to switch off the Cross over mode and fine tune for the maximum brightness Adjust Source Shift Click on Modulator button and with the use of 2D box set the centre of the image rotation under the Center Cross If the system is correctly aligned the rotation center is in the center of the screen The spot sizes will be selected progressively by clicking on the Next button Repeat the Source Tilt and Shift procedure for all 7 spotsizes through Steps 2 and 3 Click on the Next button At Step 4 check the Next HV box before clicking the Save button to save the adjustments Click on the Next button to return to Step 1 to select the next HV Repeat the procedure order from 3 to 9 At the saving of the last HV spot series do not check the Next HV box Press the Next button Step 5 opens and the Finish button appears Press Finish at Step 5 to Save and exit Auto Buttons In some of the pages will be found Auto Buttons that
202. elps clean up contaminants that may distort the image Updates the image field before milling continues When the system locates a feature during Auto Locate the beam moves over the correct location while the image field continues to display the pre corrected image This discrepancy can be confusing Updates the image field before milling continues When the system finishes drift correction the beam moves over the correct location while the image field continues to display the pre corrected image This discrepancy can be confusing Directs the script to continue running even if a match failure is detected With this feature the system may run unmonitored as a failed image match does not stop the script This could cause the sample to be only partially processed at a failed location 4022 262 61641 HARD 8 SOFTWARE OPTIONS AutoFIB Menus TABLE 8 7 DRIFT CONTROL DEFAULTS DIALOG BOX Interface Item Use autofib rcg as matching script Restore Factory Settings button Beam Shift Calibration button Description AutoFIB uses a standard default matching routine during Drift Control and Auto Locate If the system has difficulty matching samples select this option AutoFIB then uses the script autofib rcg which you can customize Selecting this option offers flexibility for cases in which the simple autocontrast adjustment in the default routine is not sufficient to produce reliable matches The script autofib rcg calls
203. ems 1s made via the mouse keyboard or the Manual User Interface pad 4022 262 61641 47 USER INTERFACE The Main Window The Main Window The Main Window displays status and control features for the Microscope Control including the image window application bar menu bar tool bar data bar and pages FIGURE 4 3 THE MAIN WINDOW W xT microscope Control eL li D zn 3 Vacuum Mon Quad 1 Quad 2 co H ck vcltece o mmu 1 00 kv 4 luning ts 215 4 ignrront Source T It __ __ Sdbidulaltur Cn ssi wer Magn ficatior M Sciple Magnif cztions um Hv curr o HF yf mec es M JE h eagnifuzaliun e ACC 194 7 nm 32 31m eed x790 A E S E xTr A A A _ xj Liatebar lnis Hrzscte scanning Gonoral Move Son traty pram ax wugnator Beam hilt u ad 3 Luis ideas millinl r rnr vw Preecure miliozr mbar w Potation Le 8 3n R alinn ei Melee Carrast n E Biyiness_ 37 Le E E Status Sus men Carrel 163 p lon Baarn Curen 2 13 Cancel ES 3 ES 4022 262 61641 USER INTERFACE The Main Window Interface Elements Some of the xT Control Interface main elements break down into other sub menus or modules These consists of the following items 1 2 3 The Title Bar labels the application and the owner user The Menu Bar contains all operation menus and submenus The File Menu The Detector Menu The
204. en vented adjust stubholder height 1f necessary Close the door and pump the system down by clicking on the PUMP button on the Beam Control page When the vacuum is correct follow the steps referred to in Beginning Your Session 4022 262 61641 EI WORKING WITH NOVA NANOLAB TEM Grid sample handling option TEM Grid sample handling option Loading TEM grids A rowholder containing TEM grids or pre thinned samples mounted on C shaped grids can be mounted in the Sample Vise NOTE Use gloves whenever handling vacuum parts work clean preferably in the laminar flow cabinet To make work easier the mounting base can be placed under an optical microscope in the flow cabinet FIGURE 5 3 REQUIRED MATERIALS 1 Specimen table or Mounting Base 5 Pair of tweezers 1 Pickup the row holder and hold over the slot in the mounting base Line up the location to be loaded the tip of the leaf spring finger with the central loading region on the mounting base When the position 1s lined up the row holder will slide down over the pin in the slot of the mounting base there are holes through the row holder under each leaf spring finger that the pin slides through 2 Clamp the row holder on the mounting base using the thumbwheel screw The spring of the row holder will now open FIGURE 5 4 CLAMP THE ROW HOLDER ON THE TABLE E 4022 262 61641 WORKING WITH NOVA NANOLAB TEM Grid sample handling option CAUTION
205. entric Rotation This page is the combination of a part of Patterning page and a part of Navigation page It 1s a dedicated page to control sample preparation especially for TEM specimen preparations The functions of each item are the same as described in the Patterning and Navigation pages To use this page 1t can reduce numbers of mouse clicks The Sample Preparation Page is divided into modules e Pattern Progress e Omniprobe e Gas Injection e Rotation Stage Pattern Pattern shapes can be selected and drawn their data entered and displayed with this module A shape can be selected by clicking on the PATTERN SELECTOR and the details filled in the pattern details list The pattern is allocated a number relative to that shape and is displayed in the PATTERN LIST When the PATTERN SELECTOR displays a yellow shape that shape can be drawn in the selected quad with the small cross cursor The pattern CONTROL CURSOR allows for selection between the drawn patterns in a quad The pattern displayed via the PATTERN SELECTOR on the Patterning Page responds to the pattern highlighted in the working quad FIGURE 4 30 PATTERN SELECTION CONTROLS DELETE PATTERN SELECTOR CURRENT SELECTED Rectangle Cleaning Cross Section Regular Cross Section Circle Line Polygon Bitmap Stream File m 4022 262 61641 USER INTERFACE Sample Preparation Page FIGURE 4 31 PATTERN PROPERTIES CONTROL BACKWARD PATTERN FORW
206. ents and the alignment petrae EE data will be stored in the computer When the column is correctly aligned the image stays in focus and does not show substantial image displacement when changing kV or spot size 10 Source Tilt and Shift Procedure Alignments The 10 Source Tilt and Shift alignment procedure starts here 10 Source Tilt and Shift Optimize the image with Focus Contrast and Brightness Press the Next button to go forward or the Cancel button to quit TABLE 9 8 10 NO STEP Instructions Order Action Mode 1 Specimen Tin Balls any suitable sample Set FWD 5mm Steps 5 Press the Start button step 1 ofS select a High Voltage TABLE 9 9 10 STEP 1 OF 5 Order Action 3 Select a High Voltage Start with 30kV and work down to 300V A green cross appears at the screen center Optimize the image with Focus Contrast and Brightness Contrast Brightness Cancel 4022 262 61641 ot ALIGNMENTS 10 Source Tilt and Shift Alignments 110 Source Tilt and Shift Instructions Adjust C amp B if necessary Click on Modulator Tune cnurce Shit so the rotation center matches the image center Click off Modulator Press the Next button to go forward Previous to go back or Cancel to quit step 2 ofS spot 2 5 6 Spots remaining Source Shift Source Tilt Cross Over Modulator Mod Amplitude 0 0024 Contrast Brightness Canc
207. ents or the individual contents proceeding each chapter Major headings have been hung in the left column to help you scan for the basics within a chapter That column provides space for your own notes as well Tables and Figures are numbered within each chapter and are listed after the main Contents by chapter for the whole manual E 4022 262 52351 SAFETY amp HANDLING site Requirements Verify that the safety and environmental requirements of the workstation site which are the responsibility of the customer are satisfied In particular the pump exhaust requirements the electrical supply and grounding earthing requirements floor loading and any local codes regarding earthquake safety are important safety issues Electron Column Precautions The Whole system conforms to e EN61010 1 for Safety requirements for electrical equipment for measurement control and laboratory use e X ray emission below 1 uSv h at 10 cm distance from the surface 4022 262 52351 daa SAFETY amp HANDLING Trained Service Personnel Trained Service Personnel Before starting any service task on an FEI Company product such as an electron microscope or ion beam equipment or any related accessories or third party equipment the service engineer concerned must first have read and understood the relevant sections of the FEI Service Safety Manual The FEI Service Safety Manual order code number 4022 190 50058 contains explicit instructi
208. enu for Quad 3 4 It will also activate the function of the Mix 3 or Mix 4 in the Processing page Enhanced Image module The active detector in a Quad can also be selected from the Detector menu located on the Menu Bar Charge Neutralizer The FEI Charge Neutralizer uses a low energy electron beam to control charging induced by the ion beam This allows imaging of nonconductive materials and reduces electrostatic discharge related sample damage The functions are Beam On Turns on filament Unblank Blank and unblank electron beam Filament current from 0 to 1 43 A Grid voltage from 5 v to 5 v Beam energy from 28 eV to 200 eV Beam current Display total beam current changes in response to beam and grid voltages You can adjust the Filament current Grid voltage and Beam energy even while the beam is off 4022 262 61641 E USER INTERFACE Sample Preparation Page sample Preparation Page Pattern Application A SIZE Ourn Y size pum Z SIZE pum DwellTime Us acanUDirection Bottom To Top Rel Int Diam 2 03 Beam Electron TotalTime Us Progress Total Time O Overall Progress Current Progress Select All Omniprobe Insert Omniprobe sas Injection Overview Details In Gas Type OMFt dep Heat Flow Cold Rotation Scan Rotation b s o otage ies 307841 mm A By 1138651 mm A F z HH 51 253 mm a Pr for rz BE 25 4 Compuc
209. equence beginning to end Save in Path Enter here the path where the AVI file should be saved Click on the dotted button to the right of the dialogue box to browse the directories for the path needed File Name Enter here the file name for the AVI file to be saved If this is not filled in the default prefix first image will be used and is filled automatically Databar Preview This displays the databar chosen from settings made in the Databar tag dialogue Changes can be made by clicking on the Databar tab and reorganising the databar components Status This displays the progress of creation of the movie Create Movie Clicking on the CREATE MOVIE button starts the creation process of the TIF files to a single AVI file Stop The STOP button stops the creation process Close The CLOSE button closes down the whole dialogue 4022 262 61641 se WORKING WITH NOVA NANOLAB FEI Movie Creator Databar tab The DataBar Tab contains two lists one labelled Available and the other Selected Items in the Available list can be added individually or as a whole to the Selected list The Selected list when completed contains all items that will be displayed in the DataBar at the base of the movie display The order of the items in the Selected list can be moved up or down due to priority or preference This will in turn change the order of the displayed items in the DataBar Items can be removed from the Selected list sin
210. ern details list The pattern is allocated a number relative to that shape and is displayed in the PATTERN LIST When the PATTERN SELECTOR displays a yellow shape that shape can be drawn in the selected quad with the small cross cursor The pattern CONTROL CURSOR allows for selection between the drawn patterns in a quad FIGURE 4 22 PATTERN SELECTION CONTROLS PATTERN SELECTOR CURRENT SELECTED Rectangle Cleaning Cross Section Regular Cross Section Circle Line Polygon Bitmap Stream File 4022 262 61641 453 USER INTERFACE Patterning Page Pattern Ll mM HIDE MH Application A SIZE pum Y size pum Z SIZE Ourn DwellTime Us acanUDirection Bottom To Top Rel Int Diam 2 7 Beam Electron TotalTime Us Progress Total Time O Overall Progress Current Progress D Select All Omniprobe Insert Omniprobe sas Injection Cie rele Details In Gas Type Heat Flow LIBgFt dep Cold Closed Ob Ins dep Cold Closed LIB dep OD Del etch Sec End Point Monitor Graphs Options Scaling EN nA specimen Current 6 05 nay lon Beam Current 76 97 nA The pattern displayed via the PATTERN SELECTOR on the Patterning Page responds to the pattern highlighted in the working quad FIGURE 4 23 BACKWARD FORWARD CONTROL CURRENT SELECTED PATTERN PROPERTIES LEVEL PROGRESS BARS Progress Basic Advanced Name Application A SIZE Y s
211. ers in this section can be changed when the digital video is inactive for set up purposes but are disabled during the digital video recording The digital video is timed asynchronously with the scanning The recording is controlled by two timers 1 AVI timer After video delay time the acquisition buffer of each unpaused quad is stored as a new frame in the video stream The frame optionally includes image of the databar and a time stamp 2 TIF timer After TIF delay time the system will wait until the running scan in unpaused quads is finished and saves a complete image in the TIF format including the databar data for xT Docu The first image 1s saved immediately when its scanning is completed The Tif delay must be always longer than or equal to the Video delay Check box AVI This is a check box to determine that the movie should be stored Check it to store the movie at the end of a recording session The dropdown combo box lists the choice of delay times for the AVI function These are represented in seconds Click on a delay time value and it will be highlighted below the check box Check box TIF This is a check box to determine that the Tif files should be stored Check it to store the Tif files at the end of a recording session The al dropdown combo box lists the choice of delay times for the Tif function These are represented in seconds Click on a delay time value and it will be highlighted below the check
212. es the number of loops the pattern mills where one loop has the beam visiting each of the 25 pixels one time The third line indicates the total number of X Y coordinates in this case 25 The 96 figure represents dwell time in units of 0 1 microseconds The range of dwell time is 0 1 us to 4 6 ms with 124 values distributed approximately logarithmically within this range 5 56 4022 262 61641 S 40 25 96 1229 2867 96 1639 2867 96 2048 2867 96 2457 2867 WORKING WITH NOVA NANOLAB Patterning Note Stream files are for users who write their own programs for specific applications Stream files cannot be created directly from xT 96 2867 2867 96 1229 2457 96 1639 2457 96 2048 2457 96 2457 2457 96 2867 2457 96 1229 2048 96 1639 2048 96 2048 2048 96 2457 2048 96 2867 2048 96 1229 1639 96 1639 1639 96 2048 1639 96 2457 1639 96 2867 1639 96 1229 1229 96 1639 1229 96 2048 1229 96 2457 1229 96 2867 1229 Magnification and Patterns If your magnification is too high milling certain patterns can use too much memory If it is too low the pattern corners become round and the edges get jaggy A good rule of thumb is to pick a magnification where your pattern fills 35 50 of the screen Selecting a Pattern You must define a pattern before an application file can be selected Select one of the patterns from the Patterning page with the PATTERN SELECTOR CURSOR Once selected the cursor is ready to draw a pattern
213. ets you select system functions by their icons FIGURE 4 19 THE TOOL BAR i O o malos 1 512x442 HW oy Er gt m e Rest the cursor on the icon for two seconds without clicking on it to see its highlighted caption Tool tips Tool tips will display the use of the tool Whenever you select a function the corresponding icon is highlighted Icons that activate an automated procedure are not highlighted The tool bar can be different in content or arrangement depending on the system or user preferences Beams This section of the Tool bar contains the Beams functions These are Electron Beam Ion Beam and Light Beam Only one is active at any time but can be operated independently for each Quad image area When the Light Beam is active all the remainder of the Tool Bar is inactive Column Setting Magnification kV Beam Current Lens Alignment These dropdown list boxes can be active for either Electron or Ion a beam depending on the beam switched The value ranges are different En 3 0 KV E ee for either beam Clicking the text box allows the list to open for selection of the Magnification kV or Beam Current Clicking on the value required will set it in the top window of the dropdown box and at the same time change the column condition to that value Go to Preferences PRESETS tab to change values in any of the lists Lens Alignment Toggles lens alignment mode for the objective fine alignment This is d
214. ever the stage or a conductive specimen touches the Immersion lens or any other equipment conductively connected to the chamber UnLink Z to FWD Clicking on Unlink to FWD will display height z as a value corresponding with the distance from the z home position Link Z to FWD Sets the Z coordinate value to actual Free Working Distance FWD value This allows accurate movement between the known height of the sample and the end of the Immersion lens NOTE The related toolbar icon image changes according to the Z coordinate status FIGURE 4 10 ICONS FOR LINKING Z TO FWD Greyed icon the function 1s disabled because either the stage has not been homed or the HV is switched off so there is no SEM image or the Ion Beam is selected 4022 262 61641 mI USER INTERFACE Stage Menu Stage Tools Window Help p he xT Align Feature Compucentric Rotation Define User Units Liser Units Beam Shift Reset Zero Beam Shift Home Stage Home Apertures Home Stage Without Rotation Center Position Touch Alarm Enabled Unilink z to FWD Link 2 te AWE v Enable z TilE map Tilt 0 Tilt 52 Sample Navigation Preferences Fil Shift F3 Ctl 0 Shalit FS Ctri E Ctrl I Colo Red question mark the function 1s enabled and the link between Z and FWD is unknown Use the function as soon as possible after properly focusing the image Red circle Z is roughly linked to FWD but
215. f Map files Umm peg 30 0 ky 0 25 n Save Crl4 5 Save AS Record Movie Import k Export Print Ctrl F Log OFF Factory Exil Type or Select the Map file name required and click on SAVE The positions in the LOCATION list are then saved as a Map file FIGURE 6 10 EXPORT DIALOG Stage Positians Patterns End Point Monitor Graphs l Ef Annotations cave In T Tmp FE Measurements 257 map_001 stg la ST map_002 stg 8 ST map_003 stg File name H 003 cave as type Positions stg y Cancel p 4022 262 52351 en STAGES Map Elements Map Elements Map Area The MAP area represents the total range of the stage in X and Y In the locatable area representative positions can be specimen positions or just positions on a single specimen They are only numbered by default or intent in the drop down list box LOCATION and not on the MAP area The positions and other elements are shown in the MAP 132735 mm Hess rz g 4 9599 mm FIGURE 6 11 MAP ELEMENTS IE 52 0 y i Ta 136 1 o Iv Compucentric Rotation Last Position Add 200 Bur Gird 2 Remove Update The numbers on the figure above are represented in the list below with association to their function TABLE 6 3 MAP ELEMENT FUNCTIONS Function White cross with red background in black circle A stored location in the LOCATION list Without rotation White vertical cross on a green background indicates that a stored position is h
216. focus in the other direction to observe a different astigmatic distortion Bring the focus to the midpoint between the two distortions Adjust image sharpness with the stigmator x and Y knobs until the best image is achieved The computer beeps when the stigmation limits are reached Repeat steps 1 4 as necessary Auto Lens Stigmator Alignment The Auto Lens Stig Alignment is a combination of an auto lens align and auto stigmator This can be activated by clicking Auto Lens Stigmator Alignment in the Tools menu The system will attempt to correct the stigmator independent of the working distance or focus set When activated the following dialogue appears to show the progress xx ofthe function The function can be interrupted by clicking on the Display Saturation shiftXF11 STOP NOW button This will leave the image at the stage of progress at stopping clicking CANCEL before the function ends will return the image back to it s original status Tools Window Help Image Registration Auno Contrast Brightness Fa Ao Fares rill Aci lens s Stigmator Aliment Lab Motes FE Movie Creator Application Status FIGURE 6 18 AUTO STIGMATOR DIALOGUE BOX Preferences Ctl oa xTm Autofunction Information 3 E x Busy performing Auto Stigmator Cancel 4022 262 61641 E WORKING WITH NOVA NANOLAB Selecting Beam Conditions selecting Beam Conditions High Voltage and Beam Current The choice of High Vol
217. for alignment while cutting the sample free when the stage 1s tilted to 45 Image recognition is less reliable when the stage is tilted and sample topography can also complicate the situation In some cases image recognition may fail If image recognition fails the system will display the Match failed dialog box 4022 262 61641 HARD amp SOFTWARE OPTIONS Sample Milling Try adjusting focus contrast brightness or stage position then press RETRY If failure still occurs manually realign the sample and click CONTINUE to proceed To end the script without milling the sample press END NOTE In RunScript you can suppress these prompts by editing nodialog in the dataN ini file Set this variable to 1 and the script will run without prompts as it would in AutoF IB When AutoTEM Wizard runs successfully it will produce a sample like the one shown below FIGURE 8 23 LIFTOUT SAMPLES VIEWED AT 7 Cuts made around the sample left and right sides and bottom Platinum remainder connecting sample to wafer This remaining platinum can be cut after final polishing or be snapped using the micromanipulator When you have finished preparing a TEM section you can run another data file and RunScript will drive to that stage location Running the Data File from AutoF IB Use AutoTEM Wizard to define multiple membranes then run the data file using AutoFIB To run AutoFIB click start gt Progr
218. from the current xT v Disable aperture change quadrant including those not generated by Auto S amp V Suggest Currents Suggests ion beam currents based on the area of the individual patterns and the Auto S amp V process step No depth information is used Therefore the resulting mill times may be excessive Disable Aperture Uses the beam current selected in xT Change disabling the automatic ion beam aperture changes specified in Auto S amp V This option prevents pattern shifts that sometimes occur with aperture change Select this option only if you plan to use the same aperture for every step of the Auto S amp V operation If you will not use the same aperture for every step select the Pause between Sections option and manually change the ion beam current in xT TABLE 8 14 VIEW MENU COMMAND Help Menu Command Description Animate Shows a movie of images collected during the slice routine TABLE 8 15 HELP MENU COMMANDS Animate Menu Command Description Technical Note Fl About Technical Note Accesses this technical note in Adobe Acrobat PDF format Displays the About dialog box which contains the date and version of the Auto S amp V code 4022 262 61641 sas HARD amp SOFTWARE OPTIONS User Interface Option Groups Option groups each correspond to an optional step in the Auto S amp V operation Auto Slice and View o x File Setup Utili
219. g File ASV log parameters in the user interface Exit Save Recipe Saves the open Auto S amp V recipe Save Recipe as Saves the current parameters into an Auto S amp V recipe using the specified name and location Save as Default Saves the current parameters as the default Recipe recipe These values are loaded automatically whenever you launch Auto S amp V These parameters are stored in default asv Factory default values are hard coded in the application and can be restored by deleting the existing default asv and relaunching the application Log File The name of the log file without path Exit Exits Auto S amp V TABLE 8 12 SETUP MENU COMMANDS Sheet 1 of 2 Half cut to center cross IBeam Image Scan Parameters Menu Command Description EBeam Image Scan Parameters a Beam Shift for Image center Half cut to center Instructs Auto S amp V to mill slices only to Focus Adjust cross the halfway point which is the center Pause between sections cross in the xT interface High Tension off atter mill High Tension and Ion Source off after mill Ibeam Image Opens a dialog box used to set the Scan Parameters resolution and scan time of the ion beam frame grabs in the Image section 4022 262 61641 sm HARD amp SOFTWARE OPTIONS User Interface TABLE 8 12 SETUP MENU COMMANDS Sheet 2 of 2 Menu Command Ebeam Image Scan Parameters Beam Shift for Image center Focus Adjust Pause between sect
220. g Your Session is satisfied then you can start to mill a pattern on the sample material The procedure is as follows TABLE 6 28 MILLING A PATTERN Step Action Select a pattern from the PATTERN SELECTOR on the Patterning Page and draw a pattern in the active Quad Select a beam for patterning from the Tool Bar Enter a value in ums as the DEPTH in the PROPERTY EDITOR a Select the milling aperture 8 Focus and stigmate the beam on the area adjacent to the pattern If necessary use the MUI SHIFT X and Y knobs or resize the pattern to correct positioning Snapshot a single frame to confirm the pattern position Click START PATTERNING on the Patterning menu or click on the START PATTERNING button on the Tool Bar to begin milling The EPM automatically switches on Click PAUSE PATTERNING on the Patterning menu or click on the PAUSE PATTERNING button on the Tool Bar to pause milling Click RESUME PATTERNING on the Patterning menu or click on the RESUME PATTERNING button on the Tool Bar to resume milling Click on the STOP PATTERNING button on the Tool Bar to stop milling sm 4022 262 61641 WORKING WITH NOVA NANOLAB Milling a Pattern stopping and Restarting If at any time during milling or deposition you wish to stop in progress click on the PAUSE PATTERNING icon on the Tool Bar When you stop and restart patterning the software continues the patterning process where it left off If patterning is rest
221. g process 1s stopped ReDo stage move A stage move is attempted again See Move over xy above for more information Milling over Milling of the current pattern s has finished either timed out or stopped by the user in xT Save Image c xT autofib1 pos02 bmp An image is saved in the specified file The system assumes there is sufficient disk space to save the file The AutoFIB script has completed without interruption Error Messages The following table describes errors that may occur while working with the AutoFIB software Milling continuing STOP or PAUSE is clicked and the choice is made to allow the pattern to finish Milling stopped stop or PAUSE is clicked and the choice is made to stop the milling This message also appears after milling halts due to an error 8 16 4022 262 61641 HARD amp SOFTWARE OPTIONS Messages TABLE 8 10 ERROR MESSAGES This Error Unable to initiate xT AutoLIB Press Cancel to run in test mode Messages headed OLE Connection Error Could not find server Could not find xT Stage did not reach requested position Automated processing halted File Handling Error Milling not started Error during Auto Locate Patterning Error pitch too small Increase beam current magnification blur or Decrease overlap There 1s a problem with the link to the xT program These messages occur when the AutoFIB program cannot make contact with xT or the associated
222. gularly or in total back to the Available list This facility does not affect the Quad and Full screen Databar and is only dedicated to the Movie Creator FIGURE 6 27 MOVIE CREATOR TAB DATABAR fi Movie Creator 2 File D atabar Preview Available Selected Label Move Un Add All Move Down lt lt Remove Remove All Databar Preview Status Create Move Sap Available Selected Two lists Available for all the items that can be entered in the Databar and Selected for all items that will be present in the Databar Add Add one item from the Available list to the Selected list Add All Add all items from the Available list to the Selected list Remove Remove one item from the Available list to the Selected list Remove All Remove all items from the Available list to the Selected list Move Up Move Down Move an item up or down in the Selected list 5 50 4022 262 61641 WORKING WITH NOVA NANOLAB FE Movie Creator Preview tab Once the movie is created opening the Preview tab will automatically display the first image of the movie sequence By clicking on the Play button the movie will start to play and the progress slider below the movie will move from left to right at a speed depending on the play timing of the movie FIGURE 6 28 MOVIE CREATOR TAB PREVIEW si Movie Creator 2 Start Pause Stop buttons Click on these buttons to Start Pause or Stop the movie By holding
223. he end screw mechanism until the holder is hand tight Pump the microscope specimen chamber Reconnect the heater cable to the outer end of the rod if necessary Set the aperture at a 30 micron hole so that alignment can be performed 7 1 5 Aperture availability These apertures are at present used and come in two size types FP 6174 33 Mo Strip Aperture 30 30 40 50 100 micron This type can be used for general applications including EDX FP 6174 53 Mo Strip Aperture 30 30 50 30 30 micron This type can be used for high resolution applications such as low voltage 4022 262 52351 E MAINTENANCE 7 2 Stage maintenance 7 2 Stage maintenance Specimen Holders Recommended cleaning procedures are given below for parts which operate in vacuum and that are subject to possible contamination Frequency of cleaning is in most cases determined by necessity image quality or astigmatism level 7 2 1 Cleaning specimen holders 1 Clean these parts using cotton wool and a mild abrasive domestic cleaner CIF see list of preferred cleaners at the end of this chapter 2 Rinse in tap water UY Clean in an ultrasonic cleaner for 5 minutes using a neutral pH cleaning fluid Rinse in distilled water for 5 minutes Clean in an ultrasonic cleaner for 5 minutes using alcohol p a Rinse in alcohol p a ee v oA s Dry thoroughly under an infra red lamp 15 min to 1 hr ata temperature of between 80 C and 100 C Stage mechani
224. he external Z control 5 around the eucentric position and further but for safety not less than 2 mm from the lens 64 4022 262 52351 STAGES NanoLab 200 Stage Standard Sample Holders The NanoLab 200 stage has standard holder and an interface piece for clamp holders such as the UMB Holder option The 200 and 600 stages have eucentricity and therefore need to have a Z prime position at a set height from the stage rotation head surface to bring the sample surface to a eucentric condition The eucentric holder is screwed into the center of the rotation head of the stage When the stub with specimen is fitted by tilting the stage the position of tilt should be at the plane of the specimen The specimen should not be of excessive height as this will not work The specimen should be within 1 to 2 mm thick FIGURE 6 4 200 STANDARD SAMPLE HOLDERS otandard Single Sample Holder otage interface piece for UMB 4022 262 52351 EI STAGES NanoLab 600 Stage NanoLab 600 Stage FIGURE 6 5 NANOLAB 600 STAGE Stage movement The stage can be tilted over 70 The stage movement is motorized and is under software control Software controls for movement include the Shift Get Track and the Navigation Page functionality You can access the Navigation Page by clicking on the appropriate icon above the pages 66 4022 262 52351 STAGES NanoLab 600 Stage FIGURE 6 6 NANOLAB 600 STAGE MOVEMENT Legend Z 10 mm X 150 mm Y 2
225. heel Press 30 Jan 01 Det File Filter HFvv H Mag 15 14 43 xxx xxx xxx 1 02 mm 0 00 101x Test label Stage Frame Shift The stage can be moved approximately 80 of the field of view in any direction by clicking on the appropriate Arrow key on the keyboard The maximum range for successive Frame Shift operations equals the range of the stage movement FIGURE 6 15 ARROW KEYS FOR STAGE FRAME SHIFT m 4022 262 52351 Stage Tools Window Help p xT Align Feature Compucentric Rotation Define User Units User Units Beam Shift Reset Zero Beam Shift Home Stage Home Apertures Home stage Without Rotation Center Position Touch Alarm Enabled Urliek 2 te FWE Link 2 te AWE v Enable z TilE map Tilt 0 Tilt 52 Sample Navigation Preferences File Shift F3 Ctr Sai FS Ctri E Ctrl I Colo STAGES How to make Stage Movements Beam Shift Reset Use this function to begin the BEAM SHIFT RESET procedure to zero beam shift and move the feature to the center of the field of view with the stage Zero Beam Shift When beam shift has reached maximum limits choose ZERO BEAM SHIFT to restore X and Y beam shifts to zero values The computer beeps when maximum limits are reached xT Align Feature Designed specifically for long features or when there is need to navigated along a feature that extends off the screen at the magnification require for observation ALIGN F
226. height for each membrane that is defined File Infarmatian yeu estis cen Specifying the Sample Parameters In the next dialog box you can edit the sample parameters shown in PUB PA the following table CENTER DESIRED LOCATION Then select Continue to create fiducials TABLE 8 1 8 LOCATION PARAM ETE RS select Edit Data to change recipe settings Final width 15 000 Targetthickness 0 120 Final current 1 00 000 Final depth 4 000 D Parameter Description Finalwidth Desired width of TEM section Long sections over 20 um may exhibit some warping or stress depending on the lt Continue gt Grab Frame Edit Data Abort EE pia material and the thickness of the membrane Targetthickness Desired nominal thickness of the membrane in um Finaldepth Approximate final depth of the mill in um The current used in the last milling step 7 FIGURE 8 17 REPRESENTATION OF TEM MEMBRANE AND IMAGE RECOGNITION CROSSES Image recognition crosses Membrane position If you select Edit Data you can edit the parameters of previous table If you select Continue the wizard will start depositing 2 square Pt pads in which the crosses are to be milled 4022 262 61641 sar HARD amp SOFTWARE OPTIONS Sample Definition Process Adjust Sample Paramaters MOVE PATTERN TO SET FINAL MEMBRANE POSITION select Continue ta complete setup select Edit Data to change recipe settings Target thick
227. hin 0 000 startatcutout 0 000 donecutout 0 000 nodialog 0 000 run systemvalues ini recipedefaults 1 run temliftout 15x4um recipe writesampledata 2 run temliftout 15x4um recipe calcvalues 2 run temliftout 15x4um recipe run setprimaryionbeam sps if posnum gt 0 goto aneulorib setbeamrot 14 574 run StageprompLt sps if dres ult 1 Stagemove 3yzt 9 174 8 25060 9 160 9 967 run polrsshprompt sps if dresult 0 goto end goto noautorib inautotib nodialog 1 pun autotibsrni The following script file contains the information AutoFIB requires to move between multiple positions and mill multiple TEM sections It is also produced by AutoTEM Wizard data file created by vbmakeini 10 29 2004 4 04 36 PM pos01 stade XxY 0 L 147 0 360 stage zrt 8 166 92957 beamshift 7 663 1 638 8 49 4022 262 61641 HARD amp SOFTWARE OPTIONS Sample Files scanrotation 14 574 sub script C Program Files fei data AutoTEM scripts datal ini pos02 Spage svecl2 155y LL 1z4 Stages ar rt 0 9555 y 949909 beamshift 7 630 1 623 scanrotation 14 574 sub script C Program Files fei data AutoTEM scripts data2 ini mI 4022 262 61641 HARD amp SOFTWARE OPTIONS Script Variables script Variables This section documents the variables used 1n the TEM preparation scripts As an alternative to the setup process you can edit the scripts directly using a text editor Two files contain variables you can edit e A recipe file
228. ht mouse button Couple Z to FWD Bring the stage to 5 mm WD At 1000x magnification find a distinct feature and center it under the yellow cross by moving the stage Tilt stage to 7 Using Z control bring the feature back under the cross Tilt back to 0 The feature should not shift significantly If the shift is gt 5 10 um repeat steps 8 to Tilt to 52 and verify that the feature stays in the center of the screen Aligning Beams at the Eucentric Height This procedure assumes that your stage is at eucentric height and that both beams are on TABLE 6 2 ALIGNING BOTH BEAMS Action lq henke keena on the Electron Beam icon in the Tool Bar Tilt the stage to 52 magnification find a distinct feature and move it under the red cross by moving the stage LEE Click on the Ion Beam icon in the Tool Bar While imaging with the E Beam and at 1000x 610 4022 262 52351 STAGES Finding the Eucentric Height TABLE 6 2 ALIGNING BOTH BEAMS Step Action 5 Using image shift bring the same feature back under the red cross If you cannot align the two images recheck the eucentric height with the manual procedure NOTE After aligning the two beams avoid using beam shift with the ion and electron beams 4022 262 52351 eu STAGES Software Stage Functions Software Stage Functions The Navigation Page has a number of modules including Stage The Stage module controls movements of the stage to locate
229. icron sized holes Intermediate final milling on cross sections Short Pt strap deposition 4022 262 61641 WORKING WITH NOVA NANOLAB Selecting Beam Conditions TABLE 6 13 SPECIFIC OPTIMAL I BEAM CURRENTS Beam Current Best Use 300 500 pA Milling micron sized holes Medium Pt strap deposition Intermediate milling on cross sections 1000 pA Initial milling for small cross sections Long Pt strap deposition 3000 pA Initial milling for medium cross sections Longer Pt strap deposition 5000 pA 7000 pA Initial milling for medium large cross sections Pt probe pad deposition 40 um x 40 um 11500 pA 20 nA Initial milling for large cross sections Pt bond pad deposition 50 um x 50 OoOo o C I Beam Aperture Alignment For a complete alignment procedure for Ion beam apertures refer to Alignment 210 in the section Ion Beam Alignment of chapter 9 534 4022 262 61641 WORKING WITH NOVA NANOLAB Working with magnification Working with magnification Magnification Couple Magnifications Magnification AK 102 Principle Magnification is the ratio of the viewing area on the monitor screen to the scanned area on the sample FIGURE 6 21 MAGNIFICATION PRINCIPLE MAGNIFICATION Liewed Area Scanned Area If the size of the raster on the sample is made smaller while the raster on the monitor remains constant in size the magnification of the image increases At low magnification you will see a la
230. ighlighted in the LOCATION White cross with red background in black circle A stored location in the LOCATION list With rotation noted by position of the black key Black cross Mechanical stage center Blue cross with red circled cross The blue cross is a new location not stored and the red circled cross 1s the current targeted position m 4022 262 52351 STAGES Map Elements TABLE 6 3 MAP ELEMENT FUNCTIONS Function Black triangle The moveable rotation angle positioner Gray clock hands Denote rotation position as 5 Gray crosses Stored positions as on the map Ix to 100x Magnification factor of the map X slider to move the mapped area in a X stage direction at different zoomed out magnifications Y slider to move the mapped area in a Y stage direction at different zoomed out magnifications Map dialog The MAP dialog can be accessed by clicking with the right mouse button in the map area The different stage sizes will be represented by a different sized shaded circle at default 1x Add current stage position Clicking with the mouse left button anywhere on this circle area will present a blue cross Then clicking on the right mouse button will give a drop down menu overlaying the Stage module to invite the adding of the Blue cross position to the LOCATION list By clicking on ADD CURRENT STAGE POSITION this function is carried out In this way the list can be compiled for particular applicat
231. ight from the stage rotation head surface to bring the sample surface to a eucentric condition The eucentric holder is screwed into the center of the rotation head of the stage When the stub with specimen is fitted by tilting the stage the position of tilt should be at the plane of the specimen The specimen should not be of excessive height as this will not work FIGURE 6 7 600 STANDARD SAMPLE HOLDERS standard Single Sample Holder Stage interface piece for UMB High Resolution Sample Holder c 4022 262 52351 Finding the Eucentric Height STAGES Finding the Eucentric Height Establishing the eucentric height is an important part of setting up a sample for observation or modification Eucentric height should be adjusted after loading any new samples as the load procedure clears all height information When you have a feature of interest at eucentric height you will be able to use the different Nova workstation components such as the GIS and EDX in a safe and optimal way The eucentric point is where the stage tilt axis and the ion and electron beam axes intersect At this point no matter which direction the stage is tilted or rotated the feature of interest remains focused and almost no image displacement occurs Finding eucentric height on the workstation is the process of positioning the sample so it is at the eucentric point The following figure is an overview of this process FIGURE 6 8 UNDERSTANDING EUCENTRIC HEIGHT
232. ignment Aligning to a new set of coordinates directly offset from the existing ones 2 Point Alignment Aligning the stage axes with the sample X Y orientation to correct for any skew and overall scale Scales the axes together Rotates both axes with a fixed 90 angle between axes on the stage can operate in ABSOLUTE or RELATIVE mode with User The following table shows the different uses between alignment 3 Point Alignment Most general alignment Re scaling to nonstandard units on CAD dies or RAM arrays correcting for any skew X can be scaled differently from Y X and Y orientations can be non orthogonal and can be mirror imaged 4022 262 52351 ex STAGES Stage Related Functions Stage Related Functions Stage Tools Window Help xT Align Feature Compucentric Rotation Define User Units User Units Beam Shift Reset Zero Beam Shift Home Stage Home Apertures Home Stage Without Rotation Center Position Touch Alarm Enabled Dlink 2 to FWE Link 2 te AWE v Enable z TilE map Tilt 0 Tilt 52 Sample Navigation Preferences p Shift F3 Ctri Shiites AE Ctrl I Ctm o Scan Rotation This button 1s used activate the onscreen tool to rotate the scan and align the image It has no effect on the stage movements and is solely a scan coil function but is used to orientate the image relative to mechanical rotation and detector direction Using Scan Rotation
233. illing the edges of the two trenches until the area between them becomes a TEM membrane An image recognition system uses the fiducials to align the sample after stage moves and beam current changes and to monitor and correct for drift during the mill 834 4022 262 61641 HARD amp SOFTWARE OPTIONS Auto TEM Wizard Software Successful automated preparation can mill samples to 200 100 nm thickness without user intervention If you want to thin the samples even further continue milling under manual control Samples Two types of samples can be prepared prethinned and liftout A prethinned sample is mechanically polished to about 50 um or less before being mounted on a TEM grid and placed in the FIB The automated routines described below can then be used to thin the sample down to approximately 100 nm A liftout TEM sample is prepared in a bulk sample no prior polishing necessary This sample is created in the DualBeam and then extracted using a glass rod and micromanipulator For additional information see Young R J Carleson P D Da X Hunt T Walker J F High Yield and High Throughput TEM Sample Preparation Using Focused Ion Beams Proc ISTFA 98 329 1998 Auto TEM Interface AutoTEM Wizard is loaded through RunScript using the tem wsp workspace To start RunScript click Start gt Programs gt FEI Company gt Applications gt RunScript In RunScript select File gt Open a Workspace gt
234. image it finds to other examples stored on the hard drive in case of an inexact match Performing an Auto Contrast Brightness routine e Adjusting the magnification 4022 262 61641 HARD amp SOFTWARE OPTIONS Sample Definition Process sample Definition Process AutoTEM Wizard guides you through the process of siting and defining the sample membrane FIGURE 6 16 MEMBRANE DEFINITION PROCESS select Append or Mew autofib file select recipe file Edit membrane width Mill pads and fiducial marks Adapt parameters Next New Neat Same Deposit grounding layer optional depending on parameters in recipe file Write sample settings ext Run Now or End Run Mow l see milling script succeeded procedure 4022 262 61641 sa HARD amp SOFTWARE OPTIONS Sample Definition Process BA RunScript xT wizard psc gl x File Run Help S Gal 1 2 3 4 sfe gt mr lon HY Off at End Iv Visual Match Electron H Off at End Calculate Timings Hv lon Source OffatEnd vbmonitor Active Turn an GIS heating for Deposition Gases before proceeding DR New AutoFIB Script File There is already an AutoFlB scripttile called data388 sct containing 1 sample definitions Append will add the new sample definitions to this file New will overwrite this file Eucentric Height The sample must be at eucentric height for each membrane that is defined Begin the membrane setup
235. in a module that can be attached to the rod by a single screw The aperture strip and module is supplied as a complete unit for ease of mounting The aperture strips come in two types 5 hole 30 30 50 30 30 micron 5 hole 30 30 40 50 100 micron factory default FIGURE 9 1 THE HEATED APERTURE HOLDER MODULE TITANIUM SCREWS HEATED ROD FITTING 30 304 10004 30 so 20k POSITION 1 25331 5 8 F nns 4022 262 61641 T ALIGNMENTS E Column Aperture Alignment FIGURE 9 2 FINAL LENS APERTURE CONTROL Changing Final Lens Aperture Sizes The external control of the final lens aperture is used to change from one aperture to the next one It has a click stop mechanism A left hand turn on the large ring moves the aperture holder inward toward the larger aperture After you change the aperture use the inner knob and the knob on the right side to tune its position The two knobs control the X Y movement in a horizontal plane 98 4022 262 61641 ALIGNMENTS E Column Aperture Alignment strip Aperture Alignment Procedure Before you align the column be sure that the final lens aperture is vsum correctly aligned If the final lens aperture has to be aligned choose Vent the smallest for the best results It is recommended to use 30kV and Imm spot 3 Mode 1 with the specimen at a working distance of 5 mm the eucentric working distance in the Strata and the Nova NanoLab Wake Up sleep Em When the aperture is well aligned th
236. inform the user of the orientation The screen dialog can also be activated by selecting Shift F12 on the keyboard 4022 262 52351 STAGES Stage Related Functions Scan Rotation can be operated from the Beam page using the preset continuous control adjuster in the module labelled ROTATION FIGURE 6 19 SCAN ROTATION FROM THE BEAM PAGE Rotation Scan Rotation T PRESET CONTROL Rotation Scan Rotation CONTINUOUS CONTROL 4022 262 52351 e STAGES Stage Related Functions 630 4022 262 52351 MAINTENANCE This section describes the maintenance necessary for the Nova NanoLab that can be carried out by the supervisor user For the Nova NanoLab User maintenance is at a minimum due to Gun and Column designs and the long up time expected from this class of instrumentation Therefore the more complex maintenance is normally contained in a service contract to be performed by a qualified xT SEM FIB service engineer At the user level items such as the following can be maintained e E Column aperture maintenance e Stage maintenance Dry Pump Check CAUTION Parts that operate in vacuum should be handled carefully using clean gloves Parts not in use should be stored in suitable containers or packed in aluminium foil NOTE Gas back fill Nz should be maintained while the specimen chamber is at ambient pressure However to avoid gas wastage it is recommended that the chamber should be left open no longer th
237. ini Start matcnicrosses cg Leftxy 1 00000000 Lo 00916059 4 0 950990040 0Q 49500000 rrlghtzy 1 00000000 dX4 951070599 01 95902949 0 49000000 MILOPE eEJDXSIOT1305 c0 9590306955 SXcL1909954 57 Matchcrosses successful Beamchecked expected 300 00000000 actual 448 00000000 loops 59 00000000 Step 0 successful Enea Subsecrrpt Result 1 08 30 00 14 46 14 Set up Mill 2 of 8 pos02 08 30 00 14 46 14 beamshift 0 000 0 000 08 30 00 14 46 14 scanrotation 0 000 08 30 00 14 46 14 Sta age zrt 2212 72T1 4 0 002 09 30 00 1446315 stages xy L84 140 16024632 08 30 00 14 46 28 Milling over 08 30 00 14 46 28 Run SubScript C xT AutoFIB tem wizard data2 ini 08 30 00 LV2S eZ Set ups Mrlls S of 2 posts 08 30 00 17 57 21 b eamshatt 0 000 0 000 UoesD cDD dq ew S2 Scan tora ELON 0 000 OS S0 00 872572272 Srege Zz et JZAI 7a 12 Lg e UE 09 30 00 Weta 7s23 Stage xy 3590 844 I15714 294 OS8 S0S00 IT 7235 Milling Over 08 30 00 27257255 Run SubScriputt Ce xT Autoris tem wizard datas 1n7 8 18 4022 262 61641 HARD amp SOFTWARE OPTIONS Messages Bnd SuUubScript Result 1 08 30 00 18 27 24 Finish 08 30 00 18 21 25 lon Column and BV Switched Orr 4022 262 61641 sa HARD amp SOFTWARE OPTIONS Auto Slice amp View Software Auto Slice amp View Software Auto Slice amp View Auto S amp V automatically mills consecutive slices through a three dimensional feature collecti
238. interlocks to minimize high voltage hazards Safety interlock circuitry is provided to protect system users Overriding interlocks is dangerous and should never be done by untrained personnel After completing procedures for which an interlock was disconnected always reset or reconnect and test the interlock before proceeding Cover interlocks reset automatically when the covers are replaced Line Voltage Line voltage 120 to 240 V AC may be present in various locations within the system even when the system or instrument is turned off Completely disconnect the unit from line voltage by disconnecting the AC plug from the AC power source before performing service or maintenance WARNING SERVICE AND TROUBLESHOOTING IN THESE AREAS IS PERFORMED ONLY BY TRAINED FEI SERVICE ENGINEERS Cords Cables Never connect or disconnect any cables or connections while power is applied to the system or components Doing so is potentially hazardous to service personnel and could cause damage to the system or its components DC Cable Colour Coding System Internal DC power wiring in the main console is colour coded according to Table 1 1 m 4022 262 52351 SAFETY amp HANDLING Voltages TABLE 1 1 DC POWER WIRE CODING Color Voltage Gray 15 Lavender 15 AC Cords Plug the unit AC cords only into an approved power source Use only power cords that are in good condition If replaced use AC cords rated to at least the rating
239. ion of icons used in the tree About displays the User Management software version and copyright Account Logging This accounting utility monitors user log on off actions session time filament lifetime and the UI status It works with two log files located in c Program Files FED data accounting accounting tmp is a temporary running file during use of the equipment at each user session updated every 15 seconds so that any power down or windows crash situation can be time logged accounting log is permanent file to which the previous data are sent when a new session 1s started This file is only readable by the FEI Supervisor User or higher level These files can only be deleted at factory or service level each one is a text CSV file so it can be loaded into Microsoft Excel for processing 4022 262 61641 EJ WORKING WITH NOVA NANOLAB FEI User Management Software 4022 262 61641 STAGES This chapter covers the following stages NanoLab 200 50 x 50 mm Motor 5 axes Manual Overrides e NanoLab 600 150 x 150 mm Motor 5 axes The software control for the stage 1s an integrated part of the overall control software The Navigation Page layout remains the same so that it is easily recognised by users of either stage system 4022 262 52351 LI STAGES NanoLab 200 Stage NanoLab 200 Stage FIGURE 6 1 NANOLAB 200 STAGE MANUAL CONTROLS Tilt Control motorized Specimen ON Current Y Control He EE Mo
240. ions High tension off after mill High tension and Ion Source off after mill Description Opens a dialog box used to set the resolution and scan time of the Electron beam frame grabs in the image section Sets the electron beam shift such that the face of the cross section remains centered in the field of view Due to constraints in electron beam shift this option is only available for overall slice heights up to 13 um Instructs Auto S amp V to apply focus correction for each new slice Displays a dialog box illustrated below to allow manual intervention between each step in the Auto S amp V operation protective coating rough cut and slice Auto Slice and View xT Pause Paused after Rough Cut Click OF to continue with Slice or CANCEL to abort coca Click OK to resume processing with the following step Click CANCEL to abort the operation without completing the subsequent options Automatically turns off the electron amp ion beam high tension voltage when the Auto S amp V operation is complete Sources for both beams remain on Automatically turns off the electron amp ion beam high tension voltage and the 10n beam source when the Auto S amp V operation is complete m 4022 262 61641 HARD amp SOFTWARE OPTIONS User Interface TABLE 8 13 UTILITIES MENU COMMAND etup view Help Menu Command Description Clear all patterns AAA Suggest Currents Clear All Patterns Deletes all patterns
241. ions The blue cross turns black and receives a black circle around it The end functionality is the same as the ADD button Update to current stage position Clicking on this stores the edited position under the currently selected name The end functionality is the same as the UPDATE button Remove selected position Clicking on this in the dialog list will remove position from the map and the highlighted label in the location list The end functionality is the same as the REMOVE button Center view In the same menu clicking on the item CENTER VIEW will bring the location center to the center of view rather than the stage axial center Auto center on target When using the MAGNIFICATION Zoom function the location that is the present active location can remains in the center of view relative to the Map area if AUTO CENTER ON TARGET is clicked ON in the fixed drop down menu ON is represented as a tick mark 4022 262 52351 1s STAGES Map Elements otage t Bulk Flip ilt Correction Actual me 0 3417 mm e 13 2735 mm mms 5 4 9599 mm rr 520 gj rg m oc Iv Compucentric Rotation Last Position Add Update Remove Zero radarview Clicking on ZERO RADAR VIEW will bring the radar view circle to zero position 12 o clock and rotate the stage mechanically to the home condition for rotation movement only Magnification Zoom Clicking on the right mouse button when over the Map area
242. istance allows precision slice and view cross sectioning and analysis at high resolution The FIB is a Magnum on column or Sidewinder ion column that provides fast precise milling and high resolution images of the sample surface The SEM column takes advantage of FEI s most advanced Hexalens design for ultimate image resolution at low beam energies It offers non destructive imaging capability at a working distance optimized for ultra high resolution and can produce images magnified over 500 kx in mode 1 and greater than 2500 kx in mode 2 Topographic data allows for monitoring of metal step coverage and etch processes The xT Nova NanoLab 600 chamber stage and wafer holder accommodates wafers up to 6 or other devices in a high vacuum environment The high accuracy five axis stage provides computer control and automation of all axes The NanoLab 200 has a high accuracy five axis stage for smaller sample types but also with manual controls FEI s Gas Injection Systems GIS use Enhanced Etch for fast material removal with minimal redeposition as well as metal deposition and insulator deposition materials 4022 262 52351 E SYSTEM OVERVIEW The xT Nova NanoLab was designed for Data storage Process yield engineering e Etching Lithography Metal and other materials deposition e Fabrication of micro and nanostructures FIGURE 2 1 xT NOVA NANOLAB 200 SYSTEM 22 4022 262 52351 S
243. it needs correction The function 1s enabled It happens e g after changing the specimen focusing and linking Z to FWD at a long Working Distance and then moving the stage to a short WD Focus image carefully at a WD around 5 mm and use this function again Green double ended arrow Z is properly linked to FWD Now it should be safe to change the Working Distance by setting a Z coordinate in the Stage module The function is still enabled to allow further corrections of the Z coordinate Enable Z Tilt map Some movements of the stage are illegal because of possible collision with the end lens In a z tilt map a number of z tilt value pairs indicate the maximum tilt angle for a certain z when coupled A legal move of the tilt axis depends on the position of the z axis The relation between the extreme positions of tilt and z indicate the extreme allowed positions This relation is called the z tilt map and can be used to guarantee safe usage of the stage Tilt 0 Ctrl E Tilt 52 Ctrl I Sets stage tilt to 0 52 perpendicular to Electron Ion Beam respectively Sample Navigation Toggles on off function that enables to navigate live SEM images scan field towards desired places on a specimen using either paused or loaded image of that specimen usually taken at much lower magnification The Sample Navigation can be selected independently for any Quad regardless of its current content and status A tick next to the
244. itmap Qv ox uum A Repeat 3 and 4 until an optimum is reached After Conversion the selected area is saved as a bitmap file that can be found in the following directory as C Program Files FEI Appexe tempimage bmp The milling properties of the bitmap can be edited in the patterning page control of the UI Examples of editable properties are Application File Dwell time Scantype Refreshtime Scantype defines the strategy that is being used for scanning This is either raster or serpentine scan Refresh time is defined as the minimum loop time that must at least elapse before the next pass so that the adsorbed gas can be refreshed The ion beam is blanked while waiting 4022 262 61641 HARD amp SOFTWARE OPTIONS Sample Holders sample Holders Sample Vise On a Nova NanoLab use the Sample Vise to hold the sample mount and dual TEM grid holder simultaneously FIGURE 9 PGA VISE The Vise fits directly on the rotation table of the NanoLab stage 4022 262 61641 sr HARD amp SOFTWARE OPTIONS Sample Holders m 4022 262 61641 ALIGNMENTS Overview This Chapter describes procedures for aligning the Electron and Ion columns for Supervisors FEI trained Supervisors and Users The alignment functions allocated are displayed in the Alignment Page Only FEI Service engineers with password access can enter the Service Alignments page When all necessary alignments are performed properly the image will stay in focu
245. itten procedures here are not space restricted and therefore more explicit All software alignments have the same page form and the common functions for each alignment can be found throughout the pages Here are the most common field functions TABLE 9 4 COMMON FIELD FUNCTIONS Field Name Function Instructions Follow the text to complete the step Step Displays the present control area number and the total number of areas Previous Click on Previous to go to the previous Step Next Click on Next to go to the following Step Cancel Click on Cancel to leave the alignment and return to original settings Click on Finish to save the procedure and exit D 4022 262 61641 ALIGNMENTS E Column Aperture Alignment E Column Aperture Alignment Recommended Apertures Aligning the E Column aperture is a mechanical process The apertures are in a Mo Si strip form so it is a case of choosing the one most applicable to your imaging needs Table 9 2 provides guidelines for the use of aperture sizes TABLE 9 5 GUIDELINES FOR APERTURES SIZES AND THEIR USES Aperture Use 1000um Service Alignment hole in frame 100 High current applications 50 um X ray mapping of low Z elements at low kV 30 um High resolution imaging General imaging or X ray analysis Aperture Loading Guidelines The aperture holder rod is heated while in operation to keep the apertures in a clean state In addition the aperture strip is mounted with
246. ize Z SIZE DwellTime ocanDirection Rel Int Diam 2 Beam TotalTime Progress Total Tiree 0 Overall Progress Current Progress P a PATTERN PROPERTIES CONTROL pum pum pum Us Bottam o Top 1 5 Elpriron Us Select All PATTERN LIST PATTERN PROPERTIES PATTERN DETAILS ENTERED AND DISPLAYED SELECT ALL This module displays the overall and current progress over time of the active Patterning Omniprobe The Omniprobe micro manipulator allows you to extract a TEM sample in situ By selecting or deselecting the checkbox the Omniprobe needle can be inserted or retracted m 4022 262 61641 End Point Monitor Graphs Options Scaling 17 1 nA N ONDE D USER INTERFACE Patterning Page Gas Injection The Gas Injection modules provides the capability to select the type of gas deposition or etch Overview Tab On the OVERVIEW tab the checkbox to the left of the Gas Injector labelled IN is the toggle for in or out activation of the injector The gas type is the gas assignment to the port The HEAT status is a toggle between cold or hot and the FLOW status is a toggle between closed or open FIGURE 4 24 GAS INJECTOR OVERVIEW DETAILS Gas Injection Gas Injection Overview Details Selected GIS la Port y Position Retracted Heater Cit Heat state Cold Gas flow Closed hd Cie pele Details Heat Flow Cold Cold In Gas type
247. justment 210 Ion column alignments Wobblestigsin WobbleStigCos cavae Load L1 Corr L1 4650 L2 Corr Press the Start button Read the Instructions in the pp window 22v Contrast 100 00 Brightness Cancel 4022 262 61641 9 39 ALIGNMENTS 210 lon Column Alignment Order TABLE 9 50 210 STIG amp FOCUS CORRECTION part 2 Action A A A omm ene A e Column 10 Select APERPOS Tum ontheL2 Select QUAD Turn on the L2 WOBBLE APERPOS Turn on the L2 WOBBLE and adjust the Aperture position to get a reasonable image with little or no lateral movement while the image goes in and out of focus Click and hold the left mouse button in the two dimensional X Y control The cursor changes to the image of a hand and moves to the center of the screen Move the Hand cursor side to side to minimize image motion Release the left mouse button when you finished Attempt to get the image to swell only Select STIG SIN and turn on the WOBBLESTIGSIN Reduce image wobble Select STIG COS and turn on the WOBBLESTIGCOS Reduce image wobble Select STIG Click and hold the left mouse button in the two dimensional X Y control and adjust the stigmation of the image for equal sharpness in all directions Readjust focus with the L1 L2 Corr adjuster or MUI knobs Alternately adjust stigmation and focus to achieve the best image Click SAVE when finished Repeat step 4 8 for all apertures 1pA
248. ke note of the instructions ON If the IGP need to be started either press the Electron Column IGP s On button first followed by the Ion Column IGP On button or press the ALL IGP s ON button Feg Source Emitter Off OFF Press the Feg Source Emitter Off button to switch the Electron Source off before switching off any IGP s mau Click on Finish Cancel 934 4022 262 61641 ALIGNMENTS 270 lon Column Alignment 210 lon Column Alignment Alignment Field Functions 210 Field Functions Step O to 1 These alignment pages contain multiple functions and are a Integrated ion column alignment condensed version of previous separate alignment procedures The Fress the Start button Ion Column Alignment control areas shows the following functions Instructions TABLE 9 47 210 FIELD FUNCTIONS STEP 0 to 1 Field Name Function Instructions Follow the text to complete the step TIMERE Step Displays the present control area number and the total number of areas 210 len Column Alignment High Voltage Selected the High Voltage required from the l Buttons buttons available Instructions select the ion beam in quad 2 set the eucentric working distance and stage tilt 52 den Optimize the image with Focus Contrast and Brightness Selected The selected aperture number is shown here aperture Click on Next to go to the following Step Bring a recagnisable feature under the centre
249. kv Press Shift F5 to display the center cross Maximum possible 18 2 k l Y mM Click on the Next button WD 5 00 mm Alignments 44 UHR Lens Alignment TABLE 9 14 44 STEP 3 OF 5 Instructions Order Action Final Lens Centering Minimize the image movement Click on the Next button to move to the next Step Click on the Modulator button and with the use of the 2D box to eliminate shift in the image With the Mod Amplitude slider one can set the modulating depth Press the Next button to move to the next HV Repeat for all offered voltages then click on the Next button step 3 ofS Hv 180 kv BH s remaining Cor ngles aby 0 000005 0 000024 Mod Amplitude 0 0105 BEN 9 14 4022 262 61641 ALIGNMENTS 44 UHR Lens Alignment Alignments 44 UHR Lens Alignment Order Action Instructions Press the Next WD button to continue centering with another WD Press the Save button to store the previous centering Press the Next button to to go TABLE 9 15 44 STEP 4 OF 5 12 At Step 4 a check box for next WD will appear with the Save button If you are going to adjust the next WD sequence then check the Next WD check box before clicking the Save button to the last step or Cancel to quit Click on the Next button to return to Step 1 to select the next WD Repeat the procedure from Order No 3 step 4 of 5 IY Next WD cave TABLE 9 16 44 STE
250. l Screen to update to that resolution Image capture with Snapshot The Snapshot icon button is represented as a camera with a fast time TI disc on the Tool Bar When an image is required at any time one can y click on Snapshot and a single scan preset scan setting will be activated which pauses at the end of the frame The result can be automatically saved on the harddrive to a predetermined file location using the next available label number 1f set in the Scan Preferences m 4022 262 61641 USER INTERFACE The Tool Bar Snapshot can also be activated from the Scan menu Image Capture with Photo Selecting the Photo label in the Scan menu will allow a preset high quality high resolution image to be taken of the milled area This function also relies on preset conditions in the Scan Preferences Pause The Icon button is 2 vertical bars Clicking once on Pause will stop E the scan immediately without continuing to the end of frame The 2 vertical bars stay black with the button pressed in When the scan has stopped the button remains pressed in When Pause is pressed two vertical green bars surrounded by a green box appear in the top left corner of the full screen or quad that is focused on at the time To release Pause click once on the pressed in button the button will pop out and the bars remain black Filtering This section contains 4 items related by conditions of filtering of the m raw scanned image The Icon
251. lecting Preferences at the end of any of the following menus Scan Beam Stage and Tools The exception to this 1s the Preferences attached to the Detector menu which handles individual choices of Detectors with direct dialog The Preferences Dialogs The background settings for day to day operation can be made by changing characteristic in any of the tabbed dialogs found in the Preferences at the end of the above menus It will depend on the opened menu where Preferences is chosen that dictates the tab opened on entry to the Preferences dialog Once the Preferences dialog is opened any of the tabs can be chosen Only one tab can be opened at any time TABLE 4 2 TABBED PREFERENCES Selection of items for entry on the Databar Units Selection of Units for Size Temperature Pressure etc Presets Entry for default lists of Magnification and High Voltage Tab Settings Selection of presets for the scan speed defaults found on the Tool Bar Sensitivity Fine adjustments for the Manual User Interface MUI 4022 262 61641 431 USER INTERFACE Setting Preferences DataBar Tab The DataBar Tab contains two lists one labelled AVAILABLE and the other SELECTED Items in the Available list can be added individually or as a whole to the Selected list The Selected list when completed contains all items that will be displayed in the DataBar at the base of the imaging screen or screens The order of the items in the Select
252. ll Time 30 0 3 0us Resolution 5120442 Line Time 17 Omz Frame Time 7 82 100 Dus Refresh Hate 127 47 mHz S 300 0yus 500 Os 1 ms Default OK Cancel Apply Scan Preset Select from the main dropdown the scan displayed at the top and then change details in the property editor lists below Property editor details update to the current condition in their top box If Details are not relevant to the scan then they show grayed out and cannot be edited Scan Operators The Fast icon Fast Scan in the Scan Preset dropdown list The Slow icon Slow Scan in the Scan Preset dropdown list The Flash Camera Snapshot in the Scan Preset dropdown list The normal Camera Photo in the Scan Preset dropdown list User Preset Can be chosen by the user from the dropdown list Each of these scan operators has it s own list of property editors 4022 262 61641 43s USER INTERFACE Setting Preferences below the main dropdown top box so that changes can be made Property Editors e Dwell Time The full range of dwell times indicated in the Scan Selection module Editable Resolution The range of resolutions indicated on the Tool Bar Non Editable Line Time The full range of line times Non Editable e Frame Time Indicates frame time as a result of dwell and line time selected Non Editable e Filter Displays the choice of Average Integrate and Live All are available to the Fast and Slow Scan conditi
253. ls editing of AutoFIB scripts and AutoFIB milling activity Most of these functions are also accessible from the AutoFIB toolbar TABLE 8 3 PLAY MENU OVERVIEW eap oe Toolbar ee Button Menu Item Description de xt ew Add ipdate Delete Confirmation Before Milling Runs the specified AutoFIB script Li Stop Stops the automatic run of the script The button is gray when the script is not running CO Pauses the running script Next Steps between each position block of data AutoFIB must be in either Edit or Pause mode N Adds a new position and block of data to the script a 4022 262 61641 HARD 8 SOFTWARE OPTIONS AutoFIB Menus TABLE 8 3 PLAY MENU OVERVIEW Toolbar Button Menu ltem Description Add Update Edits or updates the current block of data to reflect the currently selected parameters and preferences in the Scripting dialog box and the corresponding xT system values Delete Deletes the current position and block of data from the script Confirmation Stops the automated run at each Before Milling new position and issues a prompt to confirm continuation of milling Logging Logging Menu 1 min The Logging menu has selections for logging AutoFIB activity and data 5 min 10 min TABLE 8 4 LOGGING MENU OVERVIEW v Verbose Short Menu Item Description File 2 Breen il Chooses a 1 5
254. mage With Selective Etch only pixels of a predetermined brightness or darkness based on the threshold value of the grayscale within a chosen area are scanned And reduced scanning for example at the edge of a metal track 1s also possible by creating a border an unscanned area around each feature How Selective Etch works selective Etch uses an image of a scanned area to develop a milling pattern conforming to specific features on a sample Because metal layers appear much brighter than passivation in the secondary electron mode the software can use a grayscale threshold to exclude the bright areas of metal from the pattern Add Box Select the Add Box Button on the Selective Etch interface to select an area for milling Convert A bitmap of multiple pixels is generated from the selected area nvert Invert Selected area into a negative image Full Box Fill Complete Box without threshold Threshold Any area with pixel intensity higher than the grayscale threshold is excluded from the generated bitmap image e Border The border option adds additional pixels for broadening Milled Pixels Percentage of pixels in viewing window Instruction for milling a selected area Grab a Frame by Pressing the Snapshot Button in the XT UI Press Add Box from XT Selective Etch UI and select the milling area Set a suitable grayscale value in the threshold edit box Press Convert to create a new b
255. mage Shift COMECHON i2 ise dd eR dora ddr 9 4 253 Supervisor Ton Beats 402 0tusses Rad 9 42 Alignment Field Functi0DS oooooooooooooooono os 9 42 253 Supervisor Ion Beam procedure 0 000 ee eee 9 42 2545 SUPERSOL QOIS e tae ed Beek te te Reker ee eee eS eet ba aes 9 43 254 Supervisor IGP procedure 2 22 6 ce ee ee ee ees 9 43 4022 262 52351 4022 262 52351 q List of Figures SAFETY amp HANDLING 1 EMO BUTTON qerrai E Boa ae ae AEEA 1 6 EMO BUTTON LOCATION iiusiu arica dd dee ses 1 6 SYSTEM OVERVIEW 2 xT NOVA NANOLAB 200 SYSTEM 0 IRI 2 2 SYSTEM OPERATION 3 A UP MOGs eae acre ans aca eae dco noy eee RL ans a EES wo eee s 3 3 SPLASH SCREEN FOR NOVA NANOLAB leeren 3 4 MINIMIZED SERVER DIALOG 2 3205 294 dos 3 4 ENO DB TON sata dunas a ida 3 13 EMO BUTTON ON BACK OF THE E2 CONSOLE 3 13 USER INTERFACE 4 PREFERENCES TABS 4 2464 odo84en sos er HUE bi eee ESS 4 5 ON LINE DOCUMENTA TION 5 523 xr ade ddr daa aa 4 6 TAB MAIN WINDOW ibis RR aa 4 8 ANI AA AO 4 10 TEESMEBNU DAR astra io ado SERE 4 10 FILE IMPOR Ty EXPORT MENU 1 ita 4 11 PRINTERDIALOS escisiones 4 12 SEM APERTURE SELECTION 21241 REESE RTR AES de woes ke Sete 4 18 SEM MODE SELECTION ira ea pees Pak ued Cheat 4 19 ICONS FOR LINKING Z TO FWD 2 ee eee 4 22 DATABAR PREFERENCES utero Saree Gps ota equ ea ws 4 30 UNITS PREFERENCES 32d au itia Vb bea SO d E eS edes 4
256. mage of the sample The transformed image could include one taken with the optical microscope that corresponds to the real sample or several taken at various depths of focus This 1s also called image to image registration and image alignment Click on Image Registration and follow the prompts in the dialog box that appears The user first selects the quad with the reference image and then the quad with the target image this is the one that will be transformed After this a single or multipoint alignment can be applied by selecting similar points in both the reference and target image Register will apply the transformation after 1 2 or 3 pairs of points have been selected See TABLE 6 7 Alignment Type Difference for a description of when to apply each time of alignment Register will re apply the registration on any new or restored image in the same or a different quad When Show is selected from the overlay panel a copy of the registered target image will be shown on the reference image which shows the quality of the registration and to allow information from both images to be used in placing patterns The overlay can be shown in red green or blue The Threshold value 0 to 255 determines which gray levels of the target image are shown in the overlay After registration the micron bar and magnification of the target image take on the same values of the reference image Any operation that is applicable to an acquired FIB SEM image can be a
257. milling patterns associated data and operation in an AutoFIB script start the script using AutoFIB Use AutoFIB in two ways e Set up a multiple location task by entering stage coordinates beam settings and patterns for each position in the AutoFIB script For example to mill four cross sections on a chip define the four tasks in the script start AutoFIB in AutoRun mode then let AutoFIB complete the work e Run identical tasks at several locations Write an AutoFIB script for a single cross section without stage coordinates thus allowing the script to be used at any location Using a system with a sample holder that allows for repeatable placement run the AutoFIB script to mill in a partially automated step and repeat fashion The following information can be specified in the AutoFIB script e Stage X Y R T and Z positions Aperture setting Focus voltage e Stigmation values Beam shift e Scan rotation speed and resolution Contrast brightness Pattern information including magnification mode pattern type size and location ptf files can be saved and read e Auto Locate and Drift Control Name of an AutoScript script a 4022 262 61641 HARD 8 SOFTWARE OPTIONS nstalling AutoFIB Installing AutoFIB 1 Close all applications 2 Insert the AutoFIB installation CD 3 The install wizard starts Click Next Install and Finish to install The install program installs the AutoFIB program and a
258. modes in the Detector Page are still available Typical times when changes may need to be made to a detector while patterning is when Snapshot or Grab Frame will be used during a patterning session These facilities can be setup in advance When patterning has stopped the last scan detector and scan conditions will be active EN 4022 262 61641 WORKING WITH NOVA NANOLAB Standard Imaging Detectors Standard Imaging Detectors Detectors Scan EID v ETD SE The Everhart Thornley ETD is a scintillator type detector TLD BSE monitoring secondary electrons generated for collection outside of the STEMI A B lens It is mounted in the chamber above and to one side of the CDEM SE sample It is a photo multiplier detector and only works in Mode 1 cco and Mode 3 The ETD detector can be used by default as a SE or BSE detector The ETD switches off during venting of the specimen chamber The normal secondary electron operating setting for imaging is 300 V and 150V for backscatter electron collection These settings are pis Detector Settings v5 ordinarily preset at the factory but you may need to adjust the Custom metedor ETD condition for optimum imaging on individual specimens Mode SEE E s 3 FIGURE 6 9 ETD DETECTION CHOICE Erid voltage Mode Secondary Electrons y Default Srid voltage Wetault Grid voltage ETD Custom settings Clicking on the dropdown list arrow will reveal the Custom mode at the end of
259. mp V TROUBLESHOOTING oymptom Question Solution or Workaround Movie does not play In the Movie dialog box is Auto S amp V automatically counts the images to the end the END parameter different in a directory but it will stop counting at a from the highest numbered gap in the sequence and omit images with bitmap in the directory higher numbers If you have removed or deleted a bitmap from that particular directory restore it or manually type the correct image number in the END text box Patterns are Are the apertures used inthe First align the lon Beam to all apertures misaligned at recipe aligned to lt 1 um See 110 Ion Aperture Alignment in the different apertures beam shift Alignment chapter of your system User guide If necessary in Auto S amp V select Setup gt Pause Between Sections A dialog box will display between each recipe segment to allow for manual adjustment Adjust beam shift and then click Ok to dismiss the dialog box Too many pointsin Does xT display the too You cannot mill a pattern or combination of pattern error many points in pattern patterns that contains more than 1 000 000 message appears error message points Possible solutions include Decreasing the pattern size Reducing the beam overlap Increasing the beam current Patterning Error The minimum pitch is the horizontal field pitch too small width 4000 You can increase the pitch by error message increa
260. n Magnification Magn menu or MUI Eucentric Height Navigation Page Stage Averaging Toolbar button No Averaging or Average 4 No Averaging or Average 4 Contrast and Detector Adjusters With Contrast at zero value adjust Same as E Beam Brightness or MUI Brightness to just show a change in intensity to the screen Increase the Contrast to produce a reasonable image on screen Increases in Brightness and decreases in Contrast produces softer images The reverse produces sharper images 4022 262 61641 WORKING WITH NOVA NANOLAB Beginning Your Session Beginning Your Session Vacuum system Wake Up High voltage y 10 00 kv f Tuning 8 Lens Alignment source Tilt Modulator Crossover Magnification p Couple Magnifications Magnification 1000 x Beam Stigmator Beam Shitt Rotation Scan Rotation Ls js oo aia Detectors Contrast E BENE J Brightness otatus specimen Current 0 34 nay lon Beam Current 2 41 pA Usually the Strata remains on with the electron column emitter on but with the ion column LMIS off High voltage HV is typically off for both columns Follow the steps in TABLE 5 3 below when beginning the first work session of the day Throughout the day the Strata stays on from session to session TABLE 5 3 BEGINNING YOUR SESSION Action Enter your name and password in
261. n PROPERTY EDITOR will be ready for active use setting up the GIS The GIS to be used should be setup before patterning is started It can be held heated and inserted but not open until it is necessary to use When not in use the GIS should be closed cold and retracted Leaving it closed heated but retracted is also an option if it is to be used over 4022 262 61641 ES WORKING WITH NOVA NANOLAB The Gas Injection System GIS several patterns so that reheating is not necessary TABLE 6 26 SETTING UP THE GIS Action Open the OVERVIEW tab in the Gas Injector module sas Injection Cie rele Details In Gas Heat Flow Platinum arm Closed OQ Delineation Etch Cold Closed Either Double click on the word COLD below the column HEAT for the GIS you need to use or By clicking the right mouse button over the GIS module will open a dialog list where the word HEATER is highlighted Click on HEATER The word COLD is replaced by a progress bar which in turn 1s replace by the word WARM when the GIS is fully heated Tick the IN box at the start of the GIS chosen A dialog appears asking for confirmation of insertion of the GIS Confirm the insertion if you know there 1s nothing obstructing its travel Either Double click on the word CLOSED below the column FLOW for the GIS you need to use That GIS will open or Clicking the right mouse button over the GIS module will open a dialog list where the word FLOW is
262. n can be made using the stage either mechanical or motor driven where appropriate Supervisors should only use the 11 Automated Source Alignment when the full Supervisor Column Alignments has been carried out successfully 4022 262 61641 LE ALIGNMENTS Electron Column Alignment Overview Electron Column Alignment Overview Supervisors only TABLE 9 1 E COLUMN ALIGNMENT ALLOCATION Procedures in order Function 10 Source Tilt and Shift Corrects source tilt and shift for the whole range of the accelerating voltages and spotsizes 44 UHR Lens Alignment Eliminates image shift when focusing in Mode 2 immersion mode for the whole range of the accelerating voltages and working distances 42 UHR Stigmator Alignment Alignment Eliminates image shift during normal stigmator correction in Mode 2 immersion mode for the whole range of the accelerating voltages and working distances 43 UHR Image Shift Correction Eliminates image shift during HV change in Mode 2 immersion mode for the whole range of the accelerating voltages and working distances 45 HR image Shift Correction Eliminates image shift during HV change in Mode 1 for the whole range of the accelerating voltages 11 Automated Source Alignment This performs certain optimizations that improve the imaging conditions of the SEM when those conditions have been lost The optimizations are similar but not as complete as those performed manually in Adjustment 10
263. n the Tool bar AutoFIB moves to the next location and continues 2 To stop the script click stoP This does not interrupt the current pattern milling A dialog box prompts Allow current milling to finish Select YES to allow the current patterns to complete milling Once milling is finished the stage will not move to the next location Select NO to stop milling even if the pattern 1s not finished milling 3 When the operation is complete review the log file and images if selected 4022 262 61641 sas HARD amp SOFTWARE OPTIONS Messages Messages Examples of some of the messages described in this section are shown with values that will be different on your system Log Messages The following table describes the AutoFIB activity messages All messages start with date and time values TABLE 8 9 LOG MESSAGES This Log Message Occurs When Start GO is clicked This is always the first log message Pause PAUSE 1s clicked This can be done by the user or by AutoFIB if an error has occurred Set up 2 of 20 pos02 Emis 2 2u4A Milling parameters are set The number and label of the current position are given with the emission current Move over xy 12 3 14506 4 The stage is moved in x and y The new location is displayed and compared with the target values If the stage is more than 1 um from the target location the move is redone If the stage does not reach the required range after three attempts the millin
264. names of the script variables which are defined in tables 1 and 2 Location Parameters and Liftout Parameters Options shows the Dimension setup options dialog with the options Back Previous Default and Abort m 4022 262 61641 Parameter Membrane offset membraneoffset Rough mill current roughmillcurrent Do cutout docutout Cutout thickness cutoutthickness Use stage rotation usestagerotn HARD amp SOFTWARE OPTIONS Sample Definition Process TABLE 8 19 LIFTOUT PARAMETERS Description Offset between the actual membrane section and the horizontal axis of the X shaped fiducial marks in um Use a positive number to locate the membrane above the crosses a negative number to locate 1t below them Use membraneoffset when the feature of interest is so near the sample edge that 1t prevents proper milling of the crosses In such a case place the crosses at a location suitable for image recognition then use a value for membraneoffset to situate the membrane at the desired location You can also use membraneoffset to adjust the membrane position when the crosses are incorrectly placed in relation to the feature of interest The current used in step 2 If docutout 1 the cutout step will be performed If docutout 0 no cutout step is performed The minimum thickness below which the cutout step 1s performed As long as the sample thickness 1s larger than this value the cutout step 1s skipped
265. ndicates that recording 1s active in this quad It is displayed in the top right hand corner below the timer display A Red ball with the Pause symbol indicates that the record is running but the data from this quad is not stored It is displayed in the top right hand corner below the timer display An estimation of the time remaining till the end of the video is displayed in the upper right corner The time is displayed in the format hh mm ss The time is calculated from the average disk space consumption and the free space on the disk 4022 262 61641 s WORKING WITH NOVA NANOLAB FEI Movie Creator FEI Movie Creator FEI Movie Creator Start the FEI Movie Creator as the separate executable software from the C Program Files fe1 exe Moviecreator2 exe to activate the tabbed dialogues for creating a movie from a sequence of TIF images File tab The File tab contains the set up facilities for creating a movie from a captured sequence of TIF images made while using the Movie facility FIGURE 6 25 FEI MOVIE CREATOR TAB FILE si Movie Creator 2 File Databar Preview potus Mame Prefix mh2 Quad 1 010 E Time Period 1000 ms C TIF Time From 1 Ta 22 Save in CAMovie y m File Mama mhz Quad 1 010 avi Databar Preview b Spo w OU 1 6 0mm 1 0 mm Status Create Movie Stop Clase Name Prefix Enter here the prefix label for the sequence of TIF images Click on the dot
266. ne sizes within the area The following procedure descibes how to use the Measurement functions TABLE 6 34 USING MEASUREMENT FUNCTIONS Action Open the Measurement and Annotations Page Click on the MEASUREMENT graphic symbol suitable for the milled item you need to gain measurements from 1 e rectangle for a standard rectangular patterned milled area Bring the cursor to the quad or screen area and draw the graphic over the milled area to represent the milled shape This can be done by dragging the cursor from the top left corner to the right lower corner of the shape When the graphic is drawn it can be sized and positioned by clicking on the ARROW symbol button and bringing the cursor back to the on screen graphic Click on the graphic to size and position the graphic correctly over the milled area Although there is a value already in the center or alongside the graphic this 1s only one of a number of statistics available These can be found in the PROPERTIES list for that graphic When there are more than one graphic the ARROW cursor can be used to gain information from each in turn The ARROW cursor is only active on screen and changes automatically to the command cursor when over the UI Graphics that can be drawn with MEASUREMENT 4022 262 61641 EI WORKING WITH NOVA NANOLAB Using the Annotations functions Using the Annotations functions The ANNOTATIONS functions found on the Measurement and Annotations pag
267. neous Precautions leen BISCHIC Dal sus usato adeb ds apice a Pump EXMaust asd corse op dort orar meee id COR OSIOBM ere da ders ed idees tM Bs nas bart UE ters Chapter 2 SYSTEM OVERVIEW PIB SBNIE Capabilities c5 9 aa ost IR RE pad ei get emer as ControL of the Bess a u pint tun o Sob Coppe d verd Keane X Ray Analysis Capability o oooooooooooooooooooooo US TCC e ues use ta d a bet d Ata iod ance eae de is COMPULELIZEC SLAC eins dede Eo Sb PR i n oet etos weed Opucal ain Ell os e pb oo oad EE E PU IEEE ir E parido CR bd ua EL Supervisor and User Log 0n llllleeeeee es 2 4 NanoLab ODUoflS 3 24 4 tune deep as 2 5 Chapter 3 SYSTEM OPERATION INOW NATO SAO us rei etd de ate amotis S ec 3 A Wed ea ee A 3 1 SYSTEM OLAS A EA AAA das 3 2 Vacuum Status Tr 3 2 Los On Los UTA td ed Ead 3 3 Supervisor and User Log On Log Off 0 0 0 ce 3 3 Launch WT Devel ttc dl o dade mens 3 4 Leaving the System Overnight cosido vetada aoe Eq 3 5 Overnight and weekends n nonna cen ee 3 5 Returning to operation 45 22 Gs eee ee ho SSE ESR EK REG Es 3 6 UST ADIRI TENERE ps DS ic ESI tL 1 o LL PM TE 3 6 Standby Mode A ed eu eats 3 7 Goin mito Standby Mode seeded ker verbe LEEREN REPRE M RES 3 7 Startup A TIO Sandy s aeui uro e Ue emt at Kon Ree ors 3 8 virgi PP C RD a EE 3 8 Complete System ShutdoWO o ooooooooooooo 3 10 SBULdOWB Suc RP iS O GU Rau vua
268. ness 0 120 Final current 100 000 Final depth 4 000 Membrane offset 0 000 Redraw Edit Data at Script Input Data data1 ini Enter Input Data targetthickness 120 0 finalcurrent ono finaldepth 4 000 5 membraneoffset 0 000 roughrnillcurrent 5000 000 docutout 1 000 cutoutthickness 0 800 usestageratn 0 000 depositionz ono o oe Dimension setup options Back returns to sample setup Previous restores previous sample data Detault restores default sample data Abort leaves sample setup Previous Default FIGURE 8 18 X PAD DEPOSITION X pad Positions TAREA Adjusting Sample Parameters FIGURE 8 19 MEMBRANE POSITIONING A diagram onscreen shows the area to be milled and a dialog box appears You can choose to edit the parameters of TABLE 1 Location Parameters except finalwidth and TABLE 2 Liftout Parameters and you can reposition the membrane interactively by drag and dropping the membrane pattern For prethinned samples you can also drag and drop the outer edges of the rough mill area Choose from the following options Continue proceeds with the sample preparation process e Redraw to display the result of changing the membrane position interactively e Edit Data shows an Input dialog box where you can change sample preparation parameters The parameter names displayed in the dialog box correspond to the
269. ng for the necessary beam chemistries If you have not already done so turn on the heat to the gas injectors If the gas injectors are not properly heated the FIB will mill material instead of depositing material NOTE If you are using tungsten deposition contact FEI Customer Service to configure the AutoTEM Wizard Next AutoTEMTM Wizard prompts you to create a new AutoFIB script file or append data to an existing one The script file called data998 sct contains the information AutoFIB requires to move between multiple positions and mill multiple TEM sections If a file containing data for the TEM sections already exists the system will display a dialog box prompting for confirmation of action Click APPEND to add new positions to an existing file or NEW to create a new file A file open dialog is shown in which you can select a recipe file recipe files are created by FEI 4022 262 61641 HARD amp SOFTWARE OPTIONS Sample Definition Process AutoTEM Wizard then creates a data file for each defined membrane The file name is always dataN ini where N equals the position number of the defined membrane The data file 1s inserted into the directory where AutoTEM Wizard is running temliftaut 1 bxdum recipe temliftaut 1 bxdum rat recipe temliftaut 1 bxSurmverb rat recipe E IM The system then displays a representation of the TEM membrane and the crosses used for image recognition The sample must be at eucentric
270. ng images of the slices When the operation is complete you can review the images individually or in an animated sequence called a movie You can also review images offline using any bitmap editor For most jobs once you set up the system you can leave it unattended Contents of This Document This document describes Use of Auto S amp V Optional automated versus manual steps e Viewing Auto S amp V images in an animated sequence Troubleshooting procedures How Auto S amp V Works You can obtain information about a feature by examining its entire three dimensional profile Auto Slice amp View minimizes the time required to collect this information for any application where a feature is cut and imaged In Auto S amp V you supply the following parameters for the overall area to be sliced e Milling and deposition parameters Number and size of slices or more accurately small boxes to be milled e Scan parameters for electron beam imaging The application then provides this information and other task specific information to xT which uses it for milling and image acquisition Although Auto S amp V checks for input errors inappropriate parameters can lead to undesirable results or error messages from xT Process Steps An Auto Slice amp View operation consists of up to three process steps protective coating rough cut and slice These steps are optional and can be performed in any combination but all sele
271. ng your conditions will display and then the User can proceed to start the sources and operate the Strata sa 4022 262 61641 WORKING WITH NOVA NANOLAB Default Conditions at xT Start up Default Conditions at xT Start up The following system defaults apply upon first startup of the Server not when a new user logs in The system starts up with the E Beam selected TABLE 5 1 XT STARTUP CONDITIONS Sirion Sidewinder Parameter Electron Column lon Column 5 kV accelerating voltage 30 kV beam voltage Filter Slow Integrate 1 Average 4 Average 2 Fast Integrate 64 Average 4 Column Apertures 30um manual change Drives to normal imaging aperture position to protect the sample P aco aco 4022 262 61641 EI WORKING WITH NOVA NANOLAB Guide to System Settings Guide to System Settings Operations Checklist Follow these general guidelines until you become more familiar with system operation Later you can customize these settings to meet your sample needs TABLE 5 2 NOVA NANOLAB SETUP CONDITIONS Adjustment Location E Beam Setting lon Beam Setting Cursor focus Click on Quad Any Quad or Screen E Beam Any Quad or Screen required functions I Beam functions kV Beam Control page Select kV relative to sample type 30 kV for fast low kV for nonconductors milling high kV for conductors 5kV for cleaning Example IC sample 5 kV Scan Toolbar button or Medium resolution Medium resolution Scan menu Fast scan Fast sca
272. nges from 200V to 30kV The Ion column ranges from 2kV to 30kV Source This is a progress indicator for the Electron and Ion source startup from SLEEP 4022 262 61641 447 USER INTERFACE Beam Control Page Vacuum 3 ent system Wake Up sleep Column p Source High voltage y 10 00 kv f Tuning Lens Alignment source Tilt Modulator Crossover Magnificatio n p Couple Magnificatians Magnification Beam Stigmator Beam Shitt Rotation Scan Rotation ae ies oo ai Detectors Contrast Brightness otatus specimen Current 0 34 nay lon Beam Current 2 41 pA Tuning The functions in this module are dedicated to the Electron beam only Lens Alignment The LENS ALIGNMENT X Y control moves the beam relative to the Final Aperture to remove shift during focus This may have to be used during daily operation and can be easily corrected in conjuction with the Lens Modulator Modulator The MODULATOR button switches on an automatic modulation of the focus From the actual focus setting 1t generates a focus range with a minimum and a maximum focus The range is dependent on the applied magnification This is only effective with the E Beam Click with the left mouse button on the LENS ALIGNMENT area The four way arrow cursor is shown on the full screen Move the cursor leftright and updown to control the lens align X and Y Th
273. ning procedures 8 HARD amp SOFTWARE OPTIONS that are relevant options integrated in or accessory to the Nova system 9 ALIGNMENTS for the Electron and Ion columns that can be performed by the Supervisor 4022 262 52351 EN PREFACE How to Use this Manual How to Use this Manual At the beginning 1s a main Contents List of Figures and a List of Tables covering the whole Manual Each chapter has a Contents of the subjects specific to that chapter Included in some chapters are easy to follow tables outlining task oriented procedures High lighted text can also be found in descriptive paragraphs to aid association of items to graphics On line documentation is also available with the software and can be activated from the Help menu or by clicking F1 More explicit information on Safety issues can be found in Chapter 1 Conventions for Controls References to specific knobs buttons labelled functions on the system and in software are labelled in small capitals or highlighted text A sentence such as Click on the MEASUREMENT button to start this function refers to the software button itself Finding What You Need This manual has been organized so you can find information in several ways You can read the manual from beginning to end highly recommended but rarely done Be sure to read the safety section before operation in Chapter 1 Once your system is up and running you can search for information in the main cont
274. nitor X Control m E S e w Z Control Rotation Control Stage movement The motorised movements of the stage can be operated under software control for more advanced mapping and location A live image area can be repositioned with either stage movement manual or software or beam shift NOTE When you move the stage or tilt the specimen you may need to lower the magnification so you do not lose the feature of interest on the screen Software controls for movement include the Shift Get and Track and the Navigation Page functionality You can access the Navigation Page by Clicking on the appropriate icon above the pages The stage can be tilted 90 total The tilt axis always intersects the electron optical axis of the column at the same height 5 mm FWD for eucentric tilt When the specimen is positioned at this height the specimen can be tilted in the eucentric plane D 4022 262 52351 STAGES NanoLab 200 Stage FIGURE 6 2 NANOLAB 200 STAGE MOVEMENT Legend Z 25 mm int 25 mm ext X 50 mm Y 50 mm T 15 to 75 R 360 continuous Stage door NOTE By default negative tilt is disabled by software interlock as this may cause a conflict with insertion of gas injectors To override the software interlock contact your service engineer 4022 262 52351 e STAGES NanoLab 200 Stage Using Z height adjustment With the standard specimen holder it 1s possible to change the specimen height i
275. none milling points and blue for milling points TABLE 6 20 COLOR SETTINGS Colour Result RGB 0 0 90 black Beam is blanked RGB 0 1 0 Beam is on 100ns min dwell RGB 0 1 255 Beam is on Maximum dwell time RGB 255 255 255 white Beam is on Maximum dwell time Milling a bitmap procedure 1 Select patterning page control 2 Select the bitmap shape on the bottom of the pattern selection dropdown menu 3 Drag a square on the screen that represents the area of patterning The position of the square can be changed by dragging 4 Select File in the properties menu and load the bitmap using the open dialog The bitmap should appear in the imaging quad 5 Modify Aspect ratio to Free or Fixed depending if 1t is required to stretch the bitmap 6 Optimize other properties such as applications file depth leading edge etc 7 Start patterning Stream File Pattern A stream file created as an ASCII text or binary file that addresses the patterning DAC directly produces custom pattern files Because a 12 bit DAC is used the patterning field of view is divided into 4096 steps The range in X is 0 4095 but in Y is approximately 280 3816 Y values outside of this range will be off the image area and may not scan correctly The following example scans 25 points in a 5 by 5 array repeating 40 times The dwell time is 9 6 us for each point The file must begin with an s indicating a stream file The second line defin
276. ns In Mode 1 the immersion lens 1s switched off and the default detector is the ETD in Secondary Electron operation Mode 2 Mode 2 is used for most imaging operations at magnifications greater than 2 000 x In this mode the immersion lens is switched on and the default detector is the TLD in Secondary Electron operation This mode is used to form ultra high resolution electron images of the sample If I Beam imaging is selected in Mode 2 the final lens 1s switched off to allow I Beam imaging to take place with the last selected I Beam detector Selecting Mode 2 also has it s own Beam menu presets Mode 3 Mode 3 is used for analytical work such as EDX where the Immersion Lens is not so powerful as Mode 2 but can act as a electron trap to improve X ray collection This mode can be used with the I or E Beam Selecting Mode 3 also has it s own Beam menu presets 4022 262 61641 sa WORKING WITH NOVA NANOLAB Taking a Snapshot Taking a Snapshot Snapshot Setup ES The Snapshot Tool Bar button is provided to take a fast snapshot of the milled position during a milling process The result will depend on the setup in Preferences Scanning This involves selecting several parameters such as Dwell Time and Resolution These can be selected from the property editor once the snapshot icon either from the list above or from the graphical list on the left has been chosen If the properties are not to be changed only dwell time
277. nside the chamber to bring the sample to a eucentric position and have flexibility to then move Z from outside the chamber to another position if required The internal Z range is 25 mm of movement and the external Z range 5 is also 25 mm This allows a flexibility to load large or different height specimens onto the stage by reducing the internal Z but still be able to manipulate the difference in height from outside FIGURE 6 3 NANOLAB 200 EUCENTRIC ADJUSTER To set the specimen height to the eucentric position and at the same time prevent any possibility that the specimen should touch the lens pole if the Z 1s increased can be done as follows Load a specimen onto the specimen holder e With the stage still open adjust the external Z 5 to the highest position Set the Eucentric Height Adjuster on the stage base Bring the highest specimen or point on the specimen to the 2 mm position on the Height Adjuster by turning the internal screw of the specimen holder Lock the position with the locking cone Reduce the Z so that the specimen now coincides to the Eucentric position on the Height Adjuster by use of the external Z control 5 Close the chamber and pump down When the beam is switched on focus the sample and click on the m Z lt gt FWD button icon on the Tool bar The FWD will be recognized by the system as the value of Z in the Coordinates tab of the Navigation page Now the Z can be changed from t
278. ntrol Sensitivity Sensitivity can be adjusted for all controls except Magnification by presetting the various sliders via the Preferences Sensitivity Tab an 4022 262 61641 WORKING WITH NOVA NANOLAB This chapter describes the essential parts of the system from a How to Use oriented point of view for Supervisors and Users These procedures assume you have at least read and are familiar with Chapters 3 System Operation and 4 The xT User Interface It begins with default set up conditions to check before using the system and includes procedures for the following Starting your session Ending your session Preparing the sample Exchanging the sample Obtaining and optimizing images Recording images Printing Save Save As Open Import Export Use of Detectors Use of Beam conditions Use of Preferences Patterning Milling Sections Use of the GIS Use of the EPM Use of Measurements Use of Annotations For Administrators there is a management software for organising Supervisors and Users This is described at the end of this chapter under the title FEI User Management Software 4022 262 61641 EI WORKING WITH NOVA NANOLAB Starting the xT UI Starting the xT UI Click on START UI in the Server Dialog to start the User interface The xT splash screen displays while the software is loading FIGURE 5 1 STARTUP XT SPLASH SCREEN After the UI has loaded Log on as Supervisor or User A dialog for loadi
279. nts with user defined points to set up a mapping between stage and user coordinate system After that the computer uses these specimen coordinates rather than stage coordinates for positioning Stage Tools Window Help xT Align Feature Compucentric Rotation Fiz Define User Units For example a die of an integrated circuit has its own coordinate User Units ie system If you choose a 0 0 position you can drive the stage relative Beam Shift Reset to that position using your own coordinate system These are Zero Beam Shift expressed in User Unit UU coordinates which may be microns Home Stage ames Multiples or fractions of microns etc Coordination of the stage can be Home Apertures anchored to either 1 2 or 3 points depending on the sample Home Stage Without Rotation management or application Center Position col 0 Choose points that are not in a straight line for example at the Touch Alarm Enabled corners of a die or the edges of an area or wafer You can align up to Leje T rey EUT three points when you obtain the greatest accuracy Link 2 to EIS Shi 9 The following procedure sets up the 1 3 Point alignment for any v Enable z TilE map given sample where repeated structures are checked Tit Ctrl E Tit 52 Ctrl I TABLE 6 5 DEFINE USER UNITS Sample Navigation Step Action Preferences Ctl O 1 Select a feature on the sample surface and bring 1t into the field
280. of 1 lon and Electron Calumn ALL IGPs On Electron Calumn IGPs On lon Column IGP On Feg Source Ernitter Off El Feisystem Control Click on the Start button Click on the Advanced button Wait until the dialogue is fully functional All LEDSs needs to be green Select Start Ul Once the microscope server has started the Splash screen appears followed by the xT User Interface dialog Log on is requested Input a user name and password to activate the Microscope User Interface Once logged on leave the stage home dialogue box unselected Once you logon to the user interface you will find that both the E Column IGP and column IGP are turned off and the pressures are unknown To turn on the IGPs Go to the Alignment page select 100 Vacuum Start IGP s then follow the instructions 4022 262 61641 EI SYSTEM OPERATION Startup from complete System Shutdown TABLE 3 6 STARTUP FOR OPERATION Action First press the IGPs on button under Electron Column wait for the Electron column IGP to start then press IGPs On under lon Column to start the ion column IGP Once both the columns have vacuum readings click Finish to exit 100 Vacuum Start IGP s Click Pump in the Beam control page to pump the Specimen chamber r Macuum Pump ent Once the vacuum is ready click Wake Up to start the ion source if needed system Wake Up Select Yes in the Home Stage dialogue to hom
281. of the application This will set the material beam and gas properties X Y Z size Set the dimension of the finished structure Dwell Time The time the beam spends on a single pixel per pass Relative interaction The interaction diameter for an infinitely small beam relative to the beam diameter diameter Beam The beam used for patterning The total time required to pattern this shape TABLE 6 25 PATTERNING FILE ADVANCED PROPERTIES Properties Description Position X Y Position of the pattern relative to the origin Pattern rotation angle Positive direction is counter clockwise Enabled If a shape is disabled then it is not included in patterning Gas Type The name of the gas that must be used to pattern this shape or none if no gas 1s to be used 4022 262 61641 E WORKING WITH NOVA NANOLAB Application Files TABLE 6 25 PATTERNING FILE ADVANCED PROPERTIES Properties Description Overlap X Y Sets the beam diameter overlap Pitch X Y Sets the pitch between two spots Scandirection Determines the final edge the pattern will scan towards when patterning Volume per dose The volume of material that 1s removed per charge Saturation sputter rate The maximum linear sputter rate for a given gas Currently not used Refresh Time The minimum loop time that must at least elapse before the next pass so that the adsorbed gas can be refreshed Time required for a single pass The surface area of the patte
282. of view single arrow cursor Wheel Up 8 Down f Wheel Press Ctrl Left Activates Beam Shift quad ended arrow cursor Right Focuses image double ended arrow cursor Shift Key Activates stigmator control quad ended arrow Right cursor Shift Key Fine Control Moving the wheel up increases Wheel Up the magnification Moving it down decreases Down magnification Crtl Key Coarse Control Moving the wheel up increases Wheel Up the magnification Moving it down decreases Down magnification Wheel Press Pressing the wheel like a button activates the TRACK mode for joystick like movement over the sample surface viewed fullscreen or in Quads 1 3 mode In Quad 4 CCD mode the same function activates the Z movement With the wheel pressed moving the mouse up will move the Z up and moving the mouse down will move the Z down This activity can be seen live in the CCD Quad 4 window To focus with the mouse press the right mouse button and move the mouse to the left or right Release the button to set the focus To Stigmate the image press the Shift key and the right mouse button and move the mouse to the left or right or up or down to correct Release the buttons to finish 4022 262 61641 USER INTERFACE Entering Commands Using the Keyboard Dedicated Windows keys Some keys are dedicated Windows keys TABLE 4 7 DEDICATED WINDOWS kEYS Equivalent of OK in a dialog box Equivalent for the CAN
283. of view at a magnification so that 1t relates to other structures not too high magnification Click on DEFINE USER UNITS in the Stage menu A dialog appears as follows Make Selection f Define New User Units Redefine User Units Redefine User Units with Shift Reset User Units so that they are equal to Stage Units Show how User Units are now defined Details Cancel ext Select from the Start dialog the DEFINE NEW USER UNITS process by clicking on the radio button Click on the NEXT button m 4022 262 52351 STAGES How to make Stage Movements TABLE 6 5 DEFINE USER UNITS User Units Definition Move to user point 0 0 to define then click on feature Details User paint in specimen coordinates a 24614 mm 15865 Details Cancel Previous Pet Finish Follow the instruction in the dialog to move to a point and click on it with the left mouse button The coordinates of that point 0 0 will appear next to the USER X and USER Y readout positions in the Details section of the dialog Choose the next step either Click on the PREVIOUS button to return to the previous dialog Click on FINISH to end the alignment at one Point Click on the NEXT button to continue to two points Click on the CANCEL button to exit the procedure After clicking on the NEXT button the Alignment Point Two 1 0 dialog appears User Units Definition Move to u
284. ome Stage Without Rotation Center Position Touch Alarm Enabled Unlink 2 to EWE Link 2 to FVVp v Enable z TilE map Tilt 0 Tilt 52 Sample Navigation Preferences Fl Shift F3 Ctri Shiti Fs Ctri E Ctrl I Colo USER INTERFACE Stage Menu Home Stage Clicking on Home Stage will open a dialog to define the influential conditions and by pressing YES the Stage will home When the stage 1s homing the Stage Active dialog box flashes onscreen When the stage is homed correctly the end position will be the last Reference position stored Z preset long working distance relative to stage type It can also accessed by Shift F3 keys Home Apertures Home Apertures sends the steppermotors of the FIB Aperture Mechanism back to 1ts home position Home Stage Without Rotation This function is to perform Home Stage function without rotating of the stage When the stage is homed without rotation the stage reference for Rotation is greyed out This is useful when a large specimen is inserted and stage rotation could cause a collision with equipment inside the chamber By default the function 1s enabled and automatically reverts back to the enabled status after every venting pumping cycle Center Position Moves the stage to coordinates X 0 Y 0 which is the central position Touch Alarm Enabled This function automatically stops the stage movement and displays Touch Alarm warning dialogue when
285. on TABLE 5 3 BEGINNING YOUR SESSION Action Go to the Navigation page and set the Z value to 5 mm and click on the GOTO button A fairly flat sample should now be at the eucentric height To check this for more topographical samples rock the tilt control by 3 either way over zero 3 to 3 by entering the values in the T box and clicking on GOTO Adjust the mechanical Z on the stage to correct any small offset due to varying height on the sample surface Focus the cursor on Quad 2 and click UNPAUSE on the tool bar to release Quad 2 to the scanning of the I Beam Control the CONTRAST and BRIGHTNESS from the DETECTOR module found on most pages Focus and stigmate the image via the mouse or the MUI Focus back on Quad 1 and unpause the SEM scanning While observing the electron beam image in quad 1 set the tilt control to 52 by entering the value in the T box STAGE module and clicking on GOTO Save the stage condition in the LOCATION list in the STAGE module At this point you will be able to image the Electron Beam image in Quad 1 and the Ion Beam image in Quad 2 at the eucentric height 52 tilt and ready to search the area of interest necessary for lon Beam milling or patterning Importance of Beam Coincidence The Electron and Ion columns are mounted as illustrated in the following figure which shows the stage tilted to 52 Coincidence of the beams occur at the eucentric tilt axis FIGURE 5 2 RELATIONSHIP OF THE
286. on 1s recommended for the best image 13 Select the electron beam as the primary beam and begin imaging Optimize the image and adjust the magnification to display the entire milling pattern 14 If you intend to make an ion image before the slicing starts select Setup gt Beam Image Scan Parameters to set the ion beam resolution and scan times The following dialog box appears 15 If you select Use xT Settings the current ion beam settings from the xT UI are used Otherwise select an appropriate setting High resolution 1s recommended for the best image 16 Select File gt Save Recipe to save the current parameters to a recipe NOTE Do not attempt to manually reposition milling patterns Repositioning should be done with stage moves as all patterns are milled or deposited in their default positions and manual repositioning of pattern outlines is ignored at runtime Other Patterning Options The following procedures describe the use of the protective coating and rough cut options If you have previously performed these steps manually in xT these procedures are not required Coating Select the appropriate options in the Coating group If platinum is not present on your system substitute another metal such as tungsten If no metal is present do not deposit a protective coating Set the width and length parameters to deposit a pad that is slightly larger than the area to be sliced Set the thickness parameter to a value
287. on Shift F12 Photo Preferences colo Clicking on Photo at any time will activate a preset higher resolution slow scan The result can be stored on the harddrive with the Save command in the File menu by using the next available label number in a predetermined folder Save As can be used if the Folder and label need to be changed prior to saving Photo can also be activated by F2 Videoscope Videoscope toggles the display of the videoscope on or off showing the video intensity along the currently scanned horizontal line It can also be activated by F3 Reduced area When Reduced area is chosen the reduced area appears with the same dimensions and at the last known place on the screen On activation it restores the last used scan condition Scan condition can be changed if necessary Can also be activated by F7 Full Frame Full Frame is the default scanning mode This is the normal scanning mode typical for general navigation Spot Clicking on Spot puts you in Spot mode and allows one to move the beam around the screen with the left mouse button pressed The spot position is represented by a green cross n 4022 262 61641 Scan Beam Patterning Stage Tool v Pause Snapshot Photo Videoscoape Reduced Area v Full Frame Spot Line External Slow Scan m Fast Scan Slower Scan Faster Scan Mans Lock v Live gt Average 32 frames Integrate 1 frame Scan Rotation
288. on shown in the dialog box Click on CANCEL to quit the dialog box without updating the information Click on APPLY to introduce the change immediately but not permanent click on RESET to restore default conditions List Boxes List boxes contain available choices such as Location settings If a list box 1s too small to show all the selections click on the up or down Position 2 arrow in the vertical scroll bar or click and drag the slider to see more Position 3 of the list Mi n 4 Current Position Position 1 Property Editors Application zi These are the same in structure as normal list boxes but text can be a SEN entered in as part of the listing The entry space is white and the rome ITEM prohibited zones are shaded The user should click in the VALUE side DwellTime Dus of the relevant property editor and then either type in the new value or ScanDirection Bottom To Top select from the drop down list Rel Int Diam 2 0 Beam lon TotalTime 0 02 39 4022 262 61641 EI USER INTERFACE Software Interface Elements Continuous Control Adjusters A continuous control adjuster allows you to change parameters such as contrast and brightness in a continuous way by clicking and dragging the middle slider or clicking in the gray bar Detectors Contrast middle slider for large or small adjustments The further from left the middle slider is pulled the larger the change Brightness gray bar
289. onitor End point Monitor X axis Min Max Soak Onti Scaling Graphs Options scaling raphs Options M log jo 19903 A units Time y A units Time Y axis M lag jo 28359 Method E Method Auto zoom y A uto zo0rm X axis Mlin A axis Fixed zoom Max lag jo 12903 log Auto Y axis Y axis log jo 28359 M log fo 28359 The operating METHOD can be selected from Auto zoom Fixed zoom or Auto pan m 4022 262 61641 Processing Page Measurement Annotation Color Line width Digital com 5 Enhanced Image LUT Mix 3 Mix 4 Default O Contrast 1 0 D Bright 0 00 Gamma 1 0 Detectors Contrast USER INTERFACE Processing Page The Processing Page is divided into modules Measurement Annotation Digital Zoom Enhanced Image Detectors Status Measurement Annotation This module combines the functions for measuring and making annotations in all images A measurement tool an annotation shape or a text label can be selected from the first three icons on top of the module and then drawn in a image Quad All objects are sequentially indexed and displayed in list box below the icons FIGURE 4 27 MEASUREMENT FUNCTION ACTIVE ANNOTATION TEXT FUNCTION MEASUREMENT FUNCTION SHAPES DELETE f MEASUREMENTS ll OR ANNOTATIONS Measurement 4nnotatl 1 Line Measurement 1 Value Mone Name Tilt Correction Tilt Type Autom
290. only the active Quad independently from other Quads settings Default O Contrast 1 0 D Bright 0 00 1 0 Gamma Lut Tab Contains tools for monitoring and modifying greylevels distribution histogram of a greyscale image The digital image processing defined in this section is the first one applied to the image possibly after integration averaging Presets List Box Enables to select the Digital Contrast Brightness Gamma values at once using a pre defined or custom preset Digital Contrast Continuous Adjuster enables contrast to be set in range from 10 to 10 negative values lead to an inverse imaging Digital Brightness Continuous Adjuster Enables brightness to be set in range from 2 0 to 2 0 Gamma Continuous Adjuster corrects image brightness non linearly in range from 10 to 10 Graph Window The Histogram Button Switches on off the greylevel histogram corresponding to the active Quad image Left right side of the histogram corresponds to black white pixels in the original image and the height of each red line is proportional to the number of pixels with the corresponding gray value FIGURE 4 29 ENHANCED IMAGE MIX FUNCTIONS Enhanced Image Enhanced Image LUT Mix 3 Mix 4 LUT Mix 3 Mix 4 Gray 8 bit X Source 50 Source 2 eire Source 2 Jen min Hu ln JA Ma me Select source Pr y In JS Bate 4022 262 61641 459 USER INTERFACE P
291. ons but only Integrate and Live are available to the Snapshot and Photo Average in these cases is grayed out Non Editable No Of Frames A list of frames from 1 to 256 in steps 1 2 4 8 16 32 64 128 256 Non Editable FIGURE 4 15 ARCHIVE OPTION FOR SNAPSHOT AND PHOTO Databar Units Presets Scanning General Movie Sensitivity S One Preset m 100 n 300 0ns 1 013 Dwell Time 30 0 3 0us Resolution 512x442 Line Time 17 Omz Frame Time 7 Oz 100 04 Refresh Rate 127 4 mHz S 300 Ons 500 ps 1 0m Default OF Cancel Apply e Archive Option Displays a choice of Save Save As and None Selection here determines the result of either Snapshot or Photo and whether the image is saved with a known label to a pre location Save or the user is prompted for a name and the location Save As With None selected the image only remains on the screen Non Editable e File format A list of useable image formats Selection should be made prior to capturing the image so that it is stored in the correct format Non Editable APPLY should make the chosen conditions work immediately without updating the old conditions They will work until the scan is changed or switched off OK will update the system with changes made in this dialog till the dialog is opened and the conditions are changed again CANCEL returns to the original conditions lon Beam Preferences Ion Scanning Preference
292. ons on safe working methods descriptions of the various warning symbols and labels used on FEI equipment and Material Safety Data Sheets for all toxic gases and materials which may be present A hardcopy of the FEI Service Safety Manual is shipped with every FEI Company electron microscope or ion beam instrument and it is also present in electronic form on the FEI Customer Service CD ROM WARNING ONLY QUALIFIED FEI SERVICE ENGINEERS A SHOULD ATTEMPT TO PERFORM SERVICE MAINTENANCE OR REPAIRS OPENING ACCESS DOORS REMOVING SERVICE PANELS AND OTHER MAINTENANCE ACTIVITY CAN EXPOSE YOU TO ELECTRICAL CHEMICAL OR MECHANICAL HAZARDS COMPRESSED AIR OR X RAYS User Maintenance CAUTION Never attempt maintenance or service of any kind on the electron column other than that described for the Supervisor in this User Manual Allow only trained personnel to perform maintenance procedures Always observe appropriate safety practices in dealing with electronic circuitry Read and understand the safety precautions in this chapter and throughout the manual Observe industry approved safety methods and procedures If you have any doubt regarding approved safety procedures contact safety personnel at your company or representatives of your state territory or province or federal government aa 4022 262 52351 SAFETY amp HANDLING Terms and Symbols Terms and Symbols symbols and messages The following messages are used throughou
293. oordinate will change the mode to TARGET MODE The GOTO button becomes active Boxes become ticked Locks These are software locks to prevent inadvertent movement of any or all axis during particular applications Default is unlocked The edit boxes for axes that are locked are grayed out and cannot be entered or updated Axes that are locked do not move when the GOTO button is activated When any or all of the axes are locked the lock icon in Status displays a closed lock Units of measure The units of measure to the right of the position edit boxes follow the Units setting in the Preferences dialog unless User Units is active Stage menu then UU will be displayed for X and Y Location When expanded it shows the list of positions with a scroll facility The one selected becomes the current active position To move to that position requires clicking on the GOTO button The behaviour is as follows Clicking a non selected item will select it which causes the corresponding position to be displayed in the edit boxes Clicking a position when it is already selected will start in line editing of the item s name renaming it Pressing the Enter key or clicking a different item confirms the new name If the new name is already in the list a warning is given and the editing is resumed with the incorrect name When the user presses the Escape key the old name is restored cancelling the renaming Double clicking an item is
294. operating system until changed m 4022 262 61641 USER INTERFACE Setting Preferences scanning Tab The Scan tab displays the capability to change scan times and make presets to the slow and fast scan buttons on the Tool bar for the beam selected On the left of the dialog box there 1s a SCAN SELECTION list There are two icons which correspond to the Fast and Slow preset button The list of dwell times has a fixed number of entries By selecting a scan icon the dwell time can be changed or edited in the DWELL TIME property editor for that scan function The Fast and Slow icons indicate which value corresponds to the preset Icon buttons on the Tool Bar Scan Selection The Fast or Slow icons in the Scan Selection module can be dragged to a new value to select that value the Tool Bar updates on release of the icon and the Scan Preset module will display the list of Property Editors for that scan icon The Flash Camera and the normal Camera icons in the list indicate the preset for the SNAPSHOT and PHOTO functions These can be moved in the same way as the two scan icons but these are dedicated to capturing images at selected scan conditions where as the Fast or Slow icons are for scan speeds only The DEFAULT button restores the default list and icon positions FIGURE 4 14 SCANNING PREFERENCES Databar Units Presets Scanning General Movie Sensitivity 50 0ns Preset m 100 0ns 5 300 0n 1 013 Dwe
295. ore you started the alignment Yes makes the results of the already performed alignments effective and saves them to machine data Note that the results are always made effective and saved in the end if the alignment is not interrupted It is recommended not to close the Automatic Alignment window when an alignment is still running This may result in an undefined state of the instrument control software When the alignment is stopped you can restart another alignment run or close the window NOTE If the Automatic Alignment is interrupted the High Tension will be switched off after the alignment is finished If the Automatic Alignment has been stopped earlier the beam is blanked but the HT remains on 4022 262 61641 mI ALIGNMENTS 29 Auto Zero detector 29 Auto Zero detector Alignments ed Auto Zero detect 28 Auto Zero detectors zi Alignment Function The Auto Zero STEM and CDEM Detector alignment will execute an Instructions automatic zero procedure for the those detector This alignment has to This alignment allows the user be performed after a power disconnection of the STEM or CDEM to execute an automatic zero amplifier In practice this will happen when the microscope is set to procedure for the STEM and or CDEM detector standby or turned off completely Click on the Start button 29 Auto Zero detectors procedure The 29 Auto Zero detectors procedure starts here TABLE 9 32 29 NO STEP TO 1 OF 1
296. ors can be found on the Detector Page 4022 262 61641 aas USER INTERFACE Scan Menu Scan Menu Clicking with the left mouse button on the Scan name in the menu Scan Beam Patterning Stage Tools s E bar opens the scan menu This can also be achieved by pressing the Y RE i Alt C keys Snapshot j Vid F3 ARRE Click on the Pause function to pause the image Click once and the P Reduced Area P7 scan will stop immediately without finishing the frame When Pause pru SE is active clicking again will release the pause function and return the Spot scanning to the original condition prior to pause The Pause icon gt ii button on the Tool bar has the same functionality It can also be External activated by F6 Y Beam Blank Ctrl B Snapshot slow Scan Cil shift Clicking on Snapshot at any time will activate a preset scan The Fast Scan Ctl shift result can be stored on the harddrive automatically to a predetermined slower Scan Cue directory using the next available label number same as Save Faster scan cm destination If the Save or Save As function is not set in Preferences Mars Lock the image is only retained onscreen by the Pause function Unpause to p start scanning Snapshot can also be activated from the Tool Bar Live Average 8 frames Snapshot for the Electron beam can be activated by function key F4 Integrate 1 frame Snapshot for the Ion beam can be activated by function key Crtl F4 scan Rotati
297. ose the STEM detector from the Detector Menu and select the correct diode operation from the Detector Page depending on the sample position in the holder An image should be visible of the transmission sample at low magnification Change the kV to suit the contrast necessary through the sample For example light element materials such as poly silicon or silicon oxide samples which may work better with 5 10 kV to create contrast whereas dense materials such as metals may require 10 20 kV or higher Finally increase the magnification to that required fine focus and stigmate the image If either lens alignment or aperture adjustment is required temporarily switching to ETD or TLD mode is recommended Adjustment using secondary electron detection is easier because fast scan speeds can be used Obtaining a Darkfield DF image The samples that reside in the D1 and D5 positions can be observed in Darkfield mode The separator line of the two diodes crosses vertically the positions of D1 and DS so that an area of interest on the left side of the line can be observed with the right hand diode for Darkfield and with the left m 4022 262 61641 WORKING WITH NOVA NANOLAB Optional Imaging Detectors hand diode for Brightfield observation The opposite is true for sample on the right side of the line Dark Field observation may require higher kV to create a suitable image as the angle subtended to the detection diode can be wide Choosing
298. ose the logging interval from the Logging menu The standard settings are 5 minutes Verbose and Screen Only 4 Run the AutoFIB script Verify that PLAY ALL is selected in the Scripting dialog box otherwise only selected data is sent to the system m 4022 262 61641 HARD amp SOFTWARE OPTIONS Creating and Running a Script Click GO PLAY CURRENT SCRIPT in the AutoFIB window A dialog box prompts Set parameters for current location 1 Select YES to set the system with the values for the currently selected position first and then begin milling 2 Select NO to begin milling with the pattern and beam current already in use 3 Select CANCEL to abort the automated milling process AutoFIB checks the xT system every 3 seconds to see if milling has stopped When milling is complete an image is grabbed and stored if SAVE IMAGE was Selected The stage then moves to the next location and the beam parameters are updated Milling starts at the next location Mn 1 To suspend operations including logging at the current location click PAUSE A dialog box prompts Allow current milling to finish 2 Select YES to allow the current patterns to complete milling Once milling is finished the script will not proceed to the next position Select NO to stop milling temporarily Click Go to resume AutoRun mode 1 To interrupt milling at the current location stop patterning in the XT interface by clicking on the Stop Icon i
299. ough milling step 2 finaldepth This value also appears in each data lt n gt ini Not used This value also appears in each data lt n gt ini Default target finaldepth see TABLE 1 Location Parameters This value also appears in each data lt n gt ini mindepth Minimum allowed finaldepth in edit dialogs Em 4022 262 61641 HARD amp SOFTWARE OPTIONS Script Variables TABLE 8 20 RECIPE FILE PARAMETERS Variable Name Default Value maxdepth defaultfinalwidth membraneoffset Purpose Maximum allowed finaldepth in edit dialogs Default target finalwidth see TABLE 1 Location Parameters This value also appears in each data lt n gt ini Minimum allowed defaultfinalwidth in edit dialogs Minimum allowed defaultfinalwidth in edit dialogs Default target membraneoffset see TABLE 1 Location Parameters This value also appears in each data lt n gt ini setupioncurrent Current used to interactively set up a TEM prep site in A Current used to mill crosses in A Thickness of Pt deposition layer for protective coating in step 1 If 0 no protective coating will be deposited crossioncurrent This value also appears in each data lt n gt in1 GIS number of grounding GIS Thickness of Pt deposition layer for grounding layer in preparation step Thickness of Pt deposition layer for pads in preparation step Thickness of Pt ground layer for left pa
300. over the following user groups in order of significance e FEI Account Administrator e FEI Supervisor Users e FEI Microscope Users e FEI Non active Users Each of these accounts has its own opportunity to operate the xT microscope Server and Control software The first FEI Account Administrator is created during the system installation FIGURE 6 48 FEI ACCOUNT ADMINISTRATORS OVERVIEW Factory FEI User Management File Account Userdata Help Microscope Administrator E FEI Account Administrators Efi FEI Service Users rs support Customer Support user for adjusting microscope efi FEI Factory Users n factory Factory user for adjusting microscope y User Factory FEI Factory Users y Buffer supervisor FEI Supervisor sers 4022 262 61641 EI WORKING WITH NOVA NANOLAB FEI User Management Software The File Menu EJ contains the following items File Log on Login click to log in active when user is logged out Log Out Logout click to log off active when user is logged on Refresh FS Refresh F5 click to refresh the user tree Exit Exit click to exit the FEI User management program Peer The Account Menu Create Ins contains the following items which are accessible only for FEI E NK NN Account administrators with the exception of set password Set password function Set user group Properties A t Enter Create Ins click to add a new user or supervisor FEI User Management
301. phic on screen These will show a text cursor in the edit area when clicked on Delete buttons The individual DELETE button for either module deletes only the item selected The DELETE ALL button for either module deletes all items on screen made only in either MEASUREMENT or ANNOTATIONS m 4022 262 61641 WORKING WITH NOVA NANOLAB FEI User Management Software FEI User Management Software The FEI User management software allows FEI Account Administrators FEI Supervisors and FEI Microscope Users to organise users and accounts It allows the creation and removal of user accounts the setting of user passwords and group membership as well as the copying and removal of user data You can start the software by clicking the desktop icon Start Programs FEICompany UserTools FEIUsermanagement exe This brings up the Log On dialogue box containing Username and Password text fields for entering the User Management software El FEI UserManagement Control possibilities Context menu You can reach some context options by clicking the right mouse button The use of these options is the same as described below Drag and Drop actions Instead of using menu options you can sometimes simply drag and drop items from one icon to another set user group FEI Account Administrators As the highest account level FEI Account Administrators have rights that allow them to create and delete users and change their properties
302. ping the left mouse button down on the green triangle it can be moved around the circle to chose a new orientation of the sample relative to the detection position On release of the left mouse button the computer software updates the position orientation and offset from the mechanical stage center to deliver the same object center but rotated to the angle selected This creates a different direction of illumination for the sample while keeping the object of interest in the center of the display area With the sample at the eucentric height this can be performed at any position on the sample irrespective of the mechanical stage center Clicking on or close to the numbered angles around the perimeter of the circle will cause the stage to drive to that angle and the green triangle will update on screen FIGURE 6 17 COMPUCENTRIC ROTATION Cornpucentric Rotation Actual Rotator 0 Target Rotator 0 Potation Change 0 The read out positions displayed at the bottom of the Quad provide information on the ACTUAL ROTATION original position in degrees the TARGET ROTATION the selected position in degrees and the ROTATION CHANGE the difference in degrees of rotation The screen dialog can also be activated by selecting F12 on the keyboard Compucentric Rotation can also be activated from the Navigation page 4022 262 52351 en STAGES How to make Stage Movements Define User Units DEFINE USER UNITS associates stage poi
303. played by the icon logo representing either the Electron column or the Ion column These can be switched for operating in individual Quads from the two Icon buttons on the Tool Bar FIGURE 4 21 COLUMN ICON LOGOS ELECTRON BEAM On all pages the Status module is found at the base of the page Vacuum The Vacuum module is used during specimen exchange or to change the instrument status in the and around the final lens pole Pump The PUMP button starts the pumpdown procedure for the specimen chamber For Turbomolecular Pump TMP systems evacuating the specimen chamber is immediately through this pump When the chamber is evacuated the system allows High Voltage to be switched on when the pressure in the chamber and the column are ready for operation m 4022 262 61641 Vacuum Teri ent system Wake Up sleep Column p High voltage 10 00 ky ay Tuning jr Lens Alignment source Tilt Modulator Crossover Magnification p Couple Magnificatians Magnification Do 8 E ut Stigmator Beam Shitt BH Rotation Scan Rotation ce s o Detectors Contrast Brightness otatus specimen Current 0 34 nA lon Beam Current 2 41 pA USER INTERFACE Beam Control Page Vent Pressing the VENT button initiates the following sequences for the respective columns and GIS sys
304. ple Parameters MOVE PATTERN TO SET FINAL MEMBRANE POSITION Location Parameters and Liftout Parameters and two extra select Continue to complete setup Select Edit Data to change recipe settings parameters uppery and lowery Uppery is the distance from the Target thickness 0 120 Final current 100 000 Final depth 4000 Membrane offset 0 0001 membrane to the upper edge of the milling pattern in um This value must overlap the current upper membrane edge Lowery is the distance from the membrane to the lower edge of the milling pattern in um This value must overlap the current lower membrane edge Edit these values if desired or change them interactively by drag and PUEDEN SEES Options dropping the membrane for membrane offset or resizing the box surrounding the membrane for uppery and lowery i If you select no there is an extra parameter you can edit startatcutout Enter Input Data finalwidth 5 000 targetthickness 0 1 20 finalcurrent 100 000 finaldepth 4 000 om If you enter 1 the milling will resume with the cutout step The amount of time required to mill the TEM membrane will vary depending on the dimensions of the cut A typical liftout membrane that is 15 um wide and 6 um deep will take about 30 minutes to mill Throughout the milling process the system will use the crosses to realign the sample The system will also use these marks
305. pplied Cleaners Austria Australia Finland France Germany Italy Japan Netherlands Switzerla De ionised or distilled water Ethanol CH5OH Ethanol p a Pro Analysis 99 8 pure C HsOH Neutral pH cleaning fluid soap solution CIF or SOFT SCRUB household fine abrasive cleaner CIF is found in the following countries nd SOFT SCRUB WARNING AS CLEANING SOLVENT ETHANOL IS HIGHLY FLAMMABLE DO NOT USE OPEN FLAMES AND DO NOT SMOKE WHILE CLEANING VENTILATE THE ROOM PROPERLY 4022 262 52351 EI MAINTENANCE 7 4 List of Applied Cleaners e 4022 262 52351 HARD amp SOFTWARE OPTIONS This chapter covers hardware and software that is an option either integrated in or accessory to the Strata delivered The items covered here are Auto FIB FP3550 00 Auto Slice and View FP3550 20 Auto TEM FP3550 10 Selective Etch XT Software Vise sample holder Other options will be added to this chapter when they become available in future releases For further information on any of these items please contact your local FEI representative 4022 262 61641 94 HARD 8 SOFTWARE OPTIONS AutoFIB Software AutoFIB Software Use AutoFIB to run xT systems without supervision It is a general purpose automation program for samples with milling locations that are not in a regular array Applications include TEM sample preparation and cross sectioning After defining the
306. pplied to a transformed image including creating and milling patterns and saving to a file Tips on Using Image Registration Additional considerations include the following Use images of similar magnification In general magnification needs to be as high as possible with obvious limits for images taken with the optical microscope e Select Quad Image mode before beginning mage alignment particularly 3 pt is error sensitive Use care in selecting the corresponding features as precisely as possible Use the crosshairs to make selections Change to Single Image mode for maximum enlargement while selecting the features for alignment Use alignment points as far apart as possible such as at the outer edges of the image e Ifpossible use points that are equidistant and orthogonal m 4022 262 61641 Tools Window Help Image Registration Aci contrast Brightness AU Focus Aci lens s stigmator Aianment Display Saturation Lab Motes FE Movie Creator Application Status Preferences FS Fil Shift F 11 Cmeao USER INTERFACE Tools Menu e After alignment mill or deposit on the imported image or on the composite overlay image Alternately mill cross patterns briefly to mark the positions of buried structures so they are readily apparent during imaging Auto Contrast Brightness Click on Auto Contrast Brightness to activate the automatic contrast and brightness routine Can also be activ
307. procedure descibes how to use the Annotations functions TABLE 6 35 USING ANNOTATIONS FUNCTIONS Action Open the Measurement and Annotations Page Click on the ANNOTATION symbol required Bring the cursor to the quad or screen area and draw the graphic if it was a annotation graphic symbol you chose This can be done by dragging the cursor from the top left corner to the right lower corner of the shape If you chose the TEXT symbol then just click once where you require text and a text box opens Type the text into the text item in the PROPERTIES list Click on the text with the left mouse button or press enter and the text will appear on the screen in the area of the box When the graphic is drawn it can be sized and positiond by clicking on the ARROW symbol button and bringing the cursor back to the on screen graphic Click on the graphic to size and position the graphic correctly over the sample area Condition in the PROPERTIES list can be changed to effect changes onscreen for text especially but also graphics for color etc The ARROW cursor is only active on screen and changes automatically to the command cursor when over the UI Graphics that can be drawn with ANNOTATIONS x Markers Rectangle 4022 262 61641 WORKING WITH NOVA NANOLAB Using the Annotations functions Editing Measurements Annotations Once a measurement or Annotations symbol has been drawn it can be modified The following tell yo
308. r All Quads can contain live images Quad 1 is top left and Quad 4 1s bottom right with the others running horizontally The Status of the Quad is also defined by the Beam type and whether it is paused or not The active Quad also displays the beam icon with a light square background Only one image window has focus at any time although the others can have live images Quads can contain frozen or restored images Quad 4 is dedicated to various specific uses such as the CCD camera Preferences and Online Help but can contain an active image otherwise NOTE The exception of detector in compatibilities for example BSD being incompatible with CCD will be the only restriction of the system of Beam Detector per Quad 4022 262 61641 429 USER INTERFACE The Help Menu The Help Menu EES Clicking on the Help name in the Menu bar with the left mouse ies f button opens the Help menu This can also be achieved by pressing Pm online Documentation Fl the Alt button and the H key About HUT Online documentation Clicking on Online Documentation displays in the right lower quadrant the paging for the On line function This can also be activated by pressing F1 in the function key area of the keyboard About xTUI When clicked on this item displays the software version and date of release 430 4022 262 61641 USER INTERFACE Setting Preferences Setting Preferences The preferences dialog can be activated by se
309. r da ey ads 8 4 oc cine MG eas db taut enoa Vaio oda 8 5 Options Mentes nr dr bu e Leads requis e 8 6 Des pM 1s d diae dd al laa e RR AI eter 8 7 Dt Control caecos a are tee y OPERE Vd eru BEN Ga ee 8 7 Default Information 2 4 25 9e Es ma a RE tea ek ce dos 8 7 Dynamic Drift Control eus ea VESWa ERE AERE SS 8 10 wu MT 8 11 Parameters des son deles twas eon rosa teta cabrio sp dede des 8 11 A O deut rid dt Cah Bee ae 8 13 Creating and Running a Script 0 0 eens 8 14 Creatinb d SCM A dare ede d aed dena EET n a nad oe cas 8 14 PREVIEWING 3 SCP eaters 2a ooh on ex BRE eaae ui oc doe ERR 8 14 AutoRun Mode A ce Ra rt a rta 8 14 IV SSAC CO corea idos etario ira 8 16 Los MessadeSs tan nia Cad d a REESE ARA Ims 8 16 Enmor M Ssa O ost air cent aide ad lado ira ca tes 8 16 Additional NOLES Wes as 8 17 Eos Pile Examples ssc 5625 ee Meh ti RE RICE ETIN Rakes es 8 17 Patterns in AutoFIB Serlpt oooooomoooooorcrs es 8 17 Using axsabse HDU ose red o ada d do eed 8 18 A to Slice amp View SoftWare s 44664058 deidades 8 20 Contents of This Document 0 0 0 0 0 00 eee 8 20 How Auto S amp V Works 2 0 0 cece ne es 8 20 Launchmo AUO SAV morra obe EDS aqq en a e c ipn 8 22 User Intertace ein cant Pom oe eS deat te adi dba lr 8 23 Menu Commands let sre T dos 8 23 OOM GLOUDS 25 2 2 a Poule s RC SR 6 aed am exon o cath PURA ae RUNS 8 26 Using Auto Slice K amp VIEW eos mre REVERSUS E Ee get 8 29 Preparing the xT Dual Beam System
310. re Irnagewicth HFwW B4 The position brightness cantrast 1 4 7 577 5b4E D 2 53 8933 label precedes scan nto 0 00000005 e each block of beamshift 0 0 data Displays log scanrotation information z Close Parameters Scripts contain two types of information preferences and xT system values parameters These can be different for each position in the script Select the check boxes next to the preferences and parameters to be included in the script Update the script by clicking NEw to add a new position or ADD UPDATE to modify the selected position The appropriate current xT system values are added to the script In the Parameters group the selected preferences and parameters are displayed in black The preferences and parameters not in the current block of data are displayed in red to help you see which settings you may have overlooked Parameters that have y yes and N no option buttons next to them can be set for each position in the script For example select Auto locate as part of the script by selecting its check box Then turn it on for a position by selecting the y option button or turn it off for other positions by selecting the N option button 4022 262 61641 sr HARD amp SOFTWARE OPTIONS Scripts Check Box NOTE If you select the Y option button but fail to select the check box the parameter is not entered into the script FIGURE 8 6 SCRIPTING PARAMETERS Parameters Pla
311. red to the current position Orientation is seen by the update of the small triangle and the clock hand lines in the radar view circle Location When LOCATION is expanded it shows the list of positions with a scroll facility The one selected becomes the current active position When a position 1s selected it highlights in the list and also on the map as a point with a red circle More information on the relationship of MAP and LOCATION is described in the following sections en 4022 262 52351 File Detectors Scan Beam Patterning Stage Tools STAGES Software Stage Functions Import Open the File menu and click on the IMPORT item to import STAGE POSITIONS as a Map file An OPEN dialog appears with the list of Map Open Save Ctr EE E files Select the Map file required and click on OPEN The Map file is Save As Record Movie Export k Print Ctrl F then loaded into the Stage navigation system and the list of positions update in the LOCATION list Stage Positions Patterns End Point Monitor Graphs FIGURE 6 9 IMPORT DIALOG Navigation Image Log OFF Factory mm 21x Exit Look in Tmp e 1 8 57 map_001 stg a ST map_002 stg a ST map_003 stg File name pp 003 Piles oftype Positions stg y Cancel y Export Open the File menu and click on the EXPORT item STAGE POSITIONS to Fie Detectors Scan Beam Patterning Stage Toos save a Map file A SAVE AS dialog appears with the list o
312. release the button The system will now be shut down completely On Gam Stendby Shut down the microscope computer by Windows software E 4022 262 61641 SYSTEM OPERATION Startup from complete System Shutdown Startup from complete System Shutdown xj Startup The Startup procedure has to be followed when ever the system has ix been shutdown for service or due to a power failure After startup has Motion been initiated observe the system for the first 30 minutes to confirm O imagino that the IGPs show sufficient vacuum to continue and complete the procedure e XT microscope Server Serer state STARTING amp pom LJ State STOPPED x Microscope Start stop start Ul TABLE 3 6 STARTUP FOR OPERATION Step Action standby stop Ul Advanced gt gt gt Press the Power ON Standby button on the front control panel of the microscope xIm Log On CJ On Username supervisor Password eee Gam Stencby Sene Alignments 100 Vacuum Start GP s Open the microscope cabinet and press the microscope computer power ON OFF button to ON Start the software by clicking on the FeiSystemControl icon to display the xT Microscope Server dialog Instructions Vacuum start or Stop IGP s stopping ISP s can cause the FEG source to be switched aff otop FEG source before IGP s are stoppped Cancel to exit step 1
313. rent nA in the Y AXIS AUTO PAN will keep the present milling position progressing in the viewing window while the past progress moves off screen Select the Graph tab to view the progress The EPM will continue with a baseline in the Graph display until patterning has started Start patterning mI 4022 262 61641 WORKING WITH NOVA NANOLAB Beam Coincidence Beam Coincidence Beam Coincidence for the Electron and lon Columns The Electron and Ion columns are mounted as illustrated in the following figure which shows the stage tilted to 52 Coincidence of the beams occur at the eucentric tilt axis FIGURE 6 39 BEAM COINCIDENCE lon column e Electron column 16 5 mm Not to Scale Correcting Beam coincidence Having completed the procedure in Beginning your Session focus on a Quad with the Electron beam operating Select an obvious feature on the sample and then switch to the Ion beam from the Tool Bar to see the same feature Use the I beam shift control to correct any offset in the coincidence of the two visualized features The accuracy should be within 5 um Test Pattern A test pattern can be made with a simple pattern using the Ion beam and after observing it with the Electron beam to see that 1t has correct coincidence of beams 4022 262 61641 E WORKING WITH NOVA NANOLAB Milling a Pattern Milling a Pattern Start a Milling Pattern When the procedure in Beginnin
314. res described below TABLE 8 21 TROUBLESHOOTING Error Potential Cause Possible Solutions Match Failed dialog box Stage height is incorrectly Set the stage at eucentric height appears image set recognition failure Crosses are outside the field Move the stage or shift the beam to of view bring the crosses within the field of view Image quality is poor Adjust focus stigmation contrast brightness etc to obtain an image that is easier for the image recognition to match Liftout sample is hard to Sample is still partially or Cut the sample free manually rather pluck completely attached than using image recognition to place the cuts For manual control set polishstep to 0 Cut the sample entirely free from above after running the script In ION BEAM AT 520 this case beware of redeposition on the TEM membrane face Make sure the sample is cut free at the bottom Because the stage 1s tilted at 45 while the sample is cut free the bottom cut must be made at such a height that the 10n beam passes completely through the sample SAMPLE TILTED AT 7 Sample falls into trench The trench is too deep Mill a shallower trench and is difficult to pluck 4022 262 61641 HARD amp SOFTWARE OPTIONS Troubleshooting TABLE 8 21 TROUBLESHOOTING Potential Cause Possible Solutions Sample breaks free too The automatic cuts are too Cut the sample free under manual soon long and damage the control To disa
315. rge field of view At medium magnification you see a portion of the original scanned area At high magnification you are zoomed in on only a small portion of the original total scanned area Changing Magnification Use the Magnification settings from the dropdown list to select from predefined values If the current value is in the list it 1s indicated with a coloured background Click on the text box and the list of magnifications will be available Click on the required magnification and it will appear in the text box The dropdown list will automatically close This can be done while the beam for the column is on in which case the change will be immediate A magnification value can be entered into the text box and this will replace the nearest magnification value in the list by pressing the keyboard ENTER key It will also become the current magnification value Magnification The Magnification module gives access to coupling the magnification of both beams at a particular magnification The magnification is set with the slider and then locked by ticking the box labelled COUPLE MAGNIFICATIONS The Icon logo for the beam in active operation 1s displayed at the right side of the module This feature can also be accessed via the Beam menu as Couple Magnification Keypad keys Magnification can also be changed with the Keypad keys The Plus button increases the magnification 2x and the Minus button decrease the magnification 0
316. rint procedure TABLE 6 18 IMAGE PRINTING PROCEDURE Photo the image or open an existing image from memory into the Quad Click on Print in the File menu or via the keyboard by Ctrl P A print dialog appears The image set in the selected quad now goes to the printer NOTE For higher resolutions the printer may need a larger memory buffer E 4022 262 61641 WORKING WITH NOVA NANOLAB mport and Export Import and Export The Strata can Import and Export vital files for stage positions and EPM graphs Other facilities will become available as the software progresses Import Click on the File menu and IMPORT to display the sub menu choice File Detectors Scan Beam Patterning Stage Tools Choose the subject to import from the sub menu and a OPEN dialog Ru 30 0 lay 0 28 n i i i Fi Share box displays dedicated to the subject chosen Record Movie saa adi FIGURE 6 30 IMPORT OPEN DIALOG m mm End Point Monitor Graphs Navigation Image n Factory POET A My Documents e E xi Sed My Pictures Files af type End Point Monitor Graphs pm y Cancel 4 Choose the file to be imported and click on the OPEN button The file will be imported and all dialogs disappear Export Click on the File menu and EXPORT to display the sub menu choice File Detectors Scan Beam Patterning Stage Tools w Choose the subject to export from the sub menu and a SAVE AS ale 30 0 ky 0 28 n
317. rn Scan Type Scanning strategy used while patterning This is either raster of serpentine scan Fill Style For box and circular patterns one can choose either to mill a solid or only the frame The number of passes that the beam scans over the pattern Defocus The defocus of the beam WD change This influences the Beam diameter and area Like Defocus but specifying the additional diameter of the blurred spot Interaction diameter The interaction diameter for an infinitely small beam Influences the Total diameter Total Diameter The combination of the beam diameter and interaction diameter This influences the Overlap and pitch values Maximum dose per area This describes the adsorbed gas layer allowing a certain dose to be deposited at a higher rate than the saturation current density allowing a temporary higher rate Currently not used Saturation current The current at which 63 of the saturation sputter rate is reached density Currently not used Total Volume The speed at which material is removed or deposited Currently not Sputterrate used m 4022 262 61641 WORKING WITH NOVA NANOLAB The Gas Injection System GIS The Gas Injection System GIS Gas Injection The Gas Injection modules provides the capability to select the type of gas deposition or etch material Overview Tab On the OVERVIEW tab the tick box to the left of the Gas Injector labelled IN is the toggle for in or out
318. rocessing Page Graph Window Save Button Saves the current Digital Contrast Brightness and Gamma settings Mix 3 Mix 4 Tabs Quad 1 is the top left and Quad 4 is bottom right with the others running horizontally All quads can contain live images with Electron Ion or Optical beam The Status of the Quad is also defined by the Beam type displayed by the beam icon and whether it is paused or not displayed by the pause icon Only one image window has focus at any time recognizable by a light blue data bar instead of a grey one although the others can have live images In Mix detectors mode Quad 3 can display a mixed image from quad and 2 images and Quad 4 can display a mixed image from quad 1 2 and 3 images Source 1 3 Linear Continuous Adjusters Enables to tune the mixing ratio of Quad 1 3 images The value of each adjuster 0 100 says how big part of the resulting image composes the corresponding source image Changing one Source value results in automatic change of the other two values so that the sum of all Source values 1s always 100 Invert Check Boxes Inverts the corresponding Source image spectra It has the same effect as exchanging the left and right colours selection Mix 3 1 2 Mix 4 1 2 Buttons are useful for mixing into Mix 3 and Mix 4 respectively They switches between two mixing modes available in Quad 3 Quad 1 Quad 2 or three mixing mode into Quad 4 Quad 1 Quad 2 Quad 3
319. ross step 3 ofS Hv 180 kv 6 As remaining Repeat the procedure as for all offered voltages If you are going to adjust the next WD after finishing all of the steps for the selected WD check the Next WD check button before clicking the Next button WD 5 00 mm shittCorAnglesaly nu Click on the Next button m 4022 262 61641 Alignments 43 UHR Image chift Correction Instructions Press the Next WD button to continue centering with another WD Press the Save button to store the previous centering Press the Next button to to go to the last step or Cancel to quit step 4 of 5 Next WD Save Alignments 43 UHR Image chift Correction Instructions Fress the Finish button to save and finish Step 8 0157 Order 15 ALIGNMENTS 43 UHR Image Shift Correction TABLE 9 27 43 STEP 4 OF 5 Action At Step 4 a check box for next WD will appear with the Save button If you are going to adjust the next WD sequence then check the Next WD check box before clicking the Save button Click on the Next button to return to Step 1 to select the next WD Repeat the procedure from Order No 3 Order 18 TABLE 9 28 43 STEP 5 OF 5 Action At the saving of the last ShiftCorrAngleSX Y do not check the Next WD box Press the Next button Step 5 opens and the Finish button appears Press Finish at Step 5 to Save and exit 4022 262 61641 E A
320. rsor outside of the selected area and make sure Get or Shift are not activated The cursor should be the normal arrow symbol Move the cursor to where you want the left upper corner of the selected area to be Click the left mouse button and drag the cursor until the rectangle onscreen includes the area you want to select Release the left mouse button When the Reduced area frame is being manipulated it turns yellow until released then it reverts to green Auto Focus Auto Focus can be activated by pressing the Auto focus icon button on the Tool bar or the item in the Tools menu The system will attempt to correct the focus independent of the working distance or focus set When activated the following dialogue appears to show the progress of the function The function can be interrupted by clicking on the STOP NOW button This will leave the image at the stage of progress at stopping Clicking CANCEL before the function ends will return the image back to it s original status FIGURE 6 17 AUTO FOCUS DIALOGUE BOX xIm Autofunction Information E x Busy performing Auto Focus Cancel 4022 262 61641 EJ WORKING WITH NOVA NANOLAB Optimizing the Image Correcting Astigmatism Stigmating with the Mouse It is necessary to correct astigmatism of the image also known as stigmate when you change apertures samples or working distance Astigmatism in the image 1s usually only visible at higher magnifications 3000X or more
321. s Redo digital zoom 1x 2x 4x 8x Digital zoom can be set from the Measurement and Annotation Page by increasing or decreasing the magnification for the active image Quad Redo digital zoom retains the last magnification factor set by Digital zoom and when clicked on will set the magnification factor in the active Quad to that stored Undo digital zoom When the Redo digital zoom has been activated the label in the Window menu reverts to Undo digital zoom Clicking in Undo digital zoom brings the image back to normal magnification by negating the factor created by Digital zoom Single Image Quad Image Mode Single Image Quad Image mode toggles the image display area from a single screen to a quad screen and vice versa It can also be activated by pressing F5 In Single image mode the quad list is selectable to be displayed individually in the single image mode When you switch from Quad m 4022 262 61641 Window Help Center Cross Shift F5 Alignment Rectangle Shift F6 CCD 5 mm Marker CCD Axis Marker Crosshair Cursor Reds digital zoom Tx Single Quad Image Mode F5 USER INTERFACE Window Menu Image mode to Single Image mode the active quadrant is the one that becomes full screen Quad Image mode is useful for comparing images of the same sample area setup with different beams detectors or scan properties Quads 1 to 4 A Quad 1 4 can be selected from the Window menu by ticking the respective numbe
322. s its rotation will be corrected and it will not show a substantial image displacement when kV and or beam current are changed Further more the Ion beam and Electron beam should be in coincidence and report the same sample location accurate for milling imaging purposes NOTE It is assumed that the FEI trained Service Engineer s mechanical alignment of the column is correct before the Supervisor can properly perform the software User alignment CAUTION Read this entire chapter before attempting any alignment corrections General description and structure Go to the Alignment pages Open the list box by clicking on the down arrow and then choose the Alignment needed Always follow the instructions given in the Instructions module Click on the Start button and proceed with following pages During alignment procedures it is allowed to change magnification scanning speed to use reduced area and to optimize image brightness and contrast If it 1s not forbidden for a particular alignment it is also possible to stigmate and to focus the image However it is not allowed to manually change Mode Spotsize and High Voltage or to use the beam shift during an alignment procedure Common behaviour buttons The following buttons and behaviors are common for all alignment pages When available they have the following effects The Next button moves the user to the following page after all the necessary settings have been selected
323. s are the same as Electron except perhaps some Scan Preset parameters m 4022 262 61641 USER INTERFACE Setting Preferences The General Tab allows setting user interface various behaviour Clicking on any value field causes combo button to appear which lists available values and allows the user to choose one In the pull down menu it can be divided into e All Ul appearance only mage and Graphics Microscope Operation FIGURE 4 16 GENERAL PREFERENCES Databar Units Presets Scanning General Movie Sensitivity Databar Units Presets Scanning General Movie Sensitivity Category Icon style Nova Toolbar spinner style Left Right Toolbar beam current control Current Frame active quad Ho Enable zooming on mouse click and drag Tes Switch sample tracking on mouse wheel click Yes Restart Average Filter when magnification chan Bath Beam Restart Average Filter when scan rotation chan Both Beam Restart Average Filter when beam shift change Both Beam Display beam icon in databar Tes Pub ee nli miim mi mn m mn nca A A Mz Cancel Apply Category Ul Appearance Image and Graphics Microscope Operation sug LECHE IL Toolbar beam current control Current Frame active quad Mn Enable zooming on mouse click and drag Tes Switch sample tracking on mouse wheel click Yes Restart Average Filter when magnification chan Bath Beam Restart Average Filter when scan rotation chan Both
324. s leading face crosses the target area and the trailing edge extends just beyond the rough cut Remember to fill in the depth of your cross section in the property editor on the Patterning page Click SNAPSHOT to grab a I Beam frame Click on the START PATTERNING icon in the Tool Bar Select a new Quad by clicking in it and the E Beam icon from the Tool Bar and begin scanning Click SNAPSHOT to grab a frame to view the E Beam image 4022 262 61641 ss WORKING WITH NOVA NANOLAB Viewing the Cross Section Viewing the Cross Section After cutting the cross section switch to SEM imaging and acquire an overview image of the cross section without the need to mode the stage The following figure shows examples of some typical milling views of a cross section FIGURE 6 41 CROSS SECTION VIEWS Perspective view of the cross section milled on the edge of a sample Top view of the cross section Cross section view This view was done to show the geometry of the cross section The following figure shows the relationship of the columns and stage to the face of the cross section during milling and how this 1s viewed onscreen depending on whether you image with the electron or ion beam 5 76 4022 262 61641 WORKING WITH NOVA NANOLAB Viewing the Cross Section FIGURE 6 42 CROSS SECTION VIEWING DURING MILLING Electron column lon column 52 stage tilt 2 ET Cross section face Viewing with I Beam Viewing with E
325. s the advantage of not sputtering the deposited material or implanting gallium simultaneously Gas Enhanced Etch The Gas Injection System GIS also provides enhanced etching capability for high aspect ratio drilling with minimal redeposition preferential etching of cross section surfaces prior to SEM imaging and rapid milling of TEM sections Up to five GIS beam chemistries can be installed on the workstation depending on system configuration This self contained apparatus allows the precursor material to be contained entirely within the vacuum system for simple flexible and safe operation 4022 262 52351 E SYSTEM OVERVIEW FIB SEM Capabilities X Ray Analysis Capability Energy Dispersive X ray EDX provides elemental analysis capability for identification of surface and subsurface features Convergence of the SEM FIB and EDX at short working distance allows precision slice and view cross sectioning and chemical analysis at high resolution Various vendor options are compatible with the workstation User Interface The xT software interface integrates SEM and FIB functionality within a Windows 2000 operating environment The user interface consists of a single high level user shell employing applications programs with vector parameter files defining specific instrument settings for particular applications ensuring reproducibility of complex procedures An intermediate software layer acting on instructions from the
326. s to a level so that the last gray level can be seen by eye before the screen goes black Increase the contrast so that the signal level shows an image If necessary adjust the brightness level to improve the image Auto Contrast and Brightness Auto Contrast and Brightness can be activated by pressing the Auto C amp B icon button on the Tool bar or the item in the Tools menu The system will attempt a correcting of the contrast and brightness levels to suit the sample so that the majority of graylevels are displayed When activated the following dialog appears to show the progress of the function It can also be activated by pressing function key F9 FIGURE 6 16 ACB DIALOG BOX Auto Contrast Brightness Busy performing Auto Contrast Brightness Cancel The function can be interrupted by clicking on the STOP NOW button This will leave the image at the stage of progress at stopping clicking CANCEL before the function ends will return the image back to it s original status 4022 262 61641 EI WORKING WITH NOVA NANOLAB Optimizing the Image Correcting Focus The easiest way to focus is to find a feature of interest on a sample with distinct edges Use a combination of contrast brightness magnification and stigmation adjustments to maximize the image quality To avoid scanning too long with the ion beam and milling away the sample before you take the final image move away from the feature of interest wi
327. ser paint 1 0 to define then click on feature Details User paint in specimen coordinates 3311 mm Y 03917 Details Cancel Previous Pet Finish Repeat the procedure selecting and clicking on a new location point The User read out positions will show the coordinates for the new Point Two location Choose the next step from the bottom line of buttons as in Step 3 To continue click on the NEXT button 4022 262 52351 625 STAGES How to make Stage Movements TABLE 6 5 DEFINE USER UNITS After clicking on the NEXT button the Alignment Point Three 0 1 dialog appears User Units Definition Move to user point 0 1 to define then click on feature Details User paint in specimen coordinates 20 424 mm 10 253 Details Cancel Previous Finish Repeat the process as in Step 4 After clicking on the NEXT button a confirmation dialog appears as follows xTm Define User Units Finish Current User Units defined on three points Warning The angle between the X and Y axis of the User Units is b degrees Details Cancel l Finish By clicking on the DETAILS button at any stage either 1 2 or 3 Points will cause a display of the resultant coordinates xTm Define User Units Details Specimen m User X Set 20 208 mm 10 668 mm 0 000 WIL 10 000 Wu Set 21 159 10 708 mm 1 000 WU 0 000 UU Set 20 924 mm 10 253 mm 0 000 DW 1 000 LIL Current position on specimen 0 011 m 0 006
328. set Vise Holder Wafer Holders EDX Software Options Image Analysis 3D Reconstruction Software Contact your FEI sales representative for more up to date information on system options 4022 262 52351 EI SYSTEM OVERVIEW NanoLab Options P 4022 262 52351 SYSTEM OPERATION Nova NanoLab Overview FEI systems are started at the time of installation to obtain an adequate high vacuum for the system and remain on unless there is a power failure or some catastrophic event This chapter describes e System Status Log On Log Off Leaving the system overnight Returning to operation e Standby Mode e Startup after Standby Complete System Shutdown e Startup from Complete System Shutdown Emergency power off EMO NOTE Before starting the workstation check for the presence of Electrical power Compressed air Cooling water Nitrogen for venting With the exception of nitrogen interlocks prevent the vacuum system from operating if the others are not present 4022 262 61641 ES SYSTEM OPERATION System Status System Status Hardware System There are three main vacuum sections E Source Column I source Column and the Specimen Chamber In High Vacuum mode all sections are under high vacuum All valve operations are fully automatic Status Vacuum Status Specimen current 851 n In the Status module at the bottom of any page the actual vacuum lon Beam Current 80 74 nA status 1s
329. sing the beam current magnification appears or blur or decrease the overlap 4022 262 61641 833 HARD amp SOFTWARE OPTIONS Auto TEM Wizard Software Auto TEM Wizard Software Introduction The AutoTEM Wizard software automates the process of preparing samples for further examination in a transmission electron microscope TEM or other instrument This technical note describes Use of AutoTEM Wizard e Preparation of liftout plucked samples Efficient preparation of single or multiple samples e Script variables Troubleshooting procedures AutoTEM Wizard provides a fast and efficient way to prepare TEM samples for analysis AutoTEM Wizard prompts you for the characteristics of one or more TEM membranes such as width and depth It then prepares a data file you can run in RunScript or AutoFIB to mill the sample s FIGURE 8 9 TEM SAMPLE PREPARATION PROCESS Membrane Definition Membrane Milling During membrane definition AutoTEM Wizard prompts you for the sample width It then mills a pair of fiducial marks crosses or circles that define the width and position of the sample After prompting you for further sample characteristics such as depth and thickness AutoTEM Wizard sets parameters for milling and polishing the sample In the milling phase the FIB system mills trenches on both sides of the sample using the parameters defined by AutoTEM Wizard The system continues m
330. start Ul 2 Log on the Ul Click on the WAKE UP button in the SYSTEM module to switch on the lon column sources completely This is seen by an increase in the SOURCE progress bar in the column module when the lon beam is selected The Beam Control page will then indicate that the system is ready and only the SLEEP button in the SYSTEM module is active E 4022 262 61641 SYSTEM OPERATION Standby Mode Standby Mode Pages a ala Going into Standby Mode Vacuum Standby Mode is a system shutdown process used when the system vum will not be used for several weeks or during service eb Standby mode is different from the system being completely turned Wake Up off and is used mostly by service personnel In the standby mode the UU M O electronics racks are powerless except for the E column source E e Source column I column IGP s vacuum pump and computer All IGP s are still running but The TMP Turbomolecular Pump and roughing High oltage pump shut down The chamber is not vented by Nitrogen gas ts TUR EE The system can be left in this state if utilities water air nitrogen other than electrical need to be disconnected x xT microscope Server x TABLE 3 3 GOING INTO STANDBY MODE Serer state Console devices 2 Step Action 5 Imaging M In the Beam Control page click the Sleep button to STOBRED x switch off both beams The Ebeam FEG source is
331. sume processing the sample 4022 262 61641 sar HARD amp SOFTWARE OPTIONS Using Auto Slice amp View Viewing the Cross Sections 1 In Auto S amp V select View gt Animate to view the images for each cross section The Movie window appears FIGURE 8 8 AUTO SLICE AND VIEW MOVIE LE loop Ld 0 e 00 Exit start end frame frame trame time ms 2 Click OPENDIR to navigate to the directory containing the Auto S amp V images 3 To view a subset of the entire movie type integers in START and END corresponding to the first and last bitmaps you want to view in the sequence To run the movie backwards reverse the order of the integers typing the higher number in START and the lower number In END 4 Type an integer in RATE indicating playback speed in ms per image The actual playback time may vary slightly depending on available computer resources Click RUN to begin playing the movie 6 Alternately move the horizontal scroll bar or click the arrows at either end to step through the movie one image at a time 7 7 When you have finished viewing the images click EXIT to close the Movie window Select LooP at any time if you want the movie to run continuously Exiting the Program When you have finished milling the sample and viewing the system images select File gt Exit to stop Auto S amp V 4022 262 61641 HARD amp SOFTWARE OPTIONS Troubleshooting Troubleshooting TABLE 8 17 AUTO S a
332. system It might affect the ultra high vacuum levels of the columns and the overall stability of the system Take sufficient measures to avoid power failures as much as possible If a power failure occurs during normal operation of the workstation the system powers down to a safe status and the following happens e The specimen chamber vents The column valves close so the high vacuum in the columns is not completely lost The momentary adjustments of all the workstation parameters high voltage magnification etc are lost if they have not been saved prior to the failure If the system was down less than 45 minutes it can be recovered according to the Startup procedure by an authorized supervisor If the system has been off for a longer time a FEI trained service engineer may have to bring the workstation back into operation m 4022 262 61641 USER INTERFACE This chapter gives an overview of the xT Control software for the Nova NanoLab and describes the functionality of each part of the user interface It takes you from the first main window and menu bar through each item on the pulldown menus through to the pages Graphics illustrating most of the choices help you locate specific features The software interface controls most system functions including milling patterning detection and analysis scanning and magnification image gathering manipulation and output stage and vacuum For more detailed information abou
333. t 100 00 Brightness Cancel 4022 262 61641 a ALIGNMENTS 253 Supervisor lon Beam 253 Supervisor lon Beam Alignment Field Functions This alignment is used to correct Offset in the positioning of the apertures from the alignment found in 210 Ion Column Alignment Instructions Press Start button TABLE 9 52 253 FIELD FUNCTIONS STEP 0 to 1 Field Name Function Instructions Follow the text to complete the step Step Displays the present control area number and the total number of areas Alignments Zero Offset Click on this button to zero the offset created in the aperture positioning controlled in 210 Ion 253 Supervisor lon Beam Column Alignment lon Beam Service page Press Zero Offset to reset 445 user settings to zero Press Offset Reset to transfer AAD user settings to service settings and reset user settings to zero Press Heat to heat the ion source VVith the Emission Current slider the current can be rh anna step 1 of 1 Offset Reset Click on this button to reset the aperture positioning controlled in 210 Ion Column Alignment back to factory default Useful if aperture position is totally lost Instructions Home AVA Click on this button to move the Automatic Variable Aperture back to the the home position Heat Click on this button to Heat the 10n source New Source Click on this button to reset ion source lifetime Emission Displays the Emission current set by
334. t FEI xT Nova manuals to highlight information NOTE Text of the note A note emphasizes information requiring special attention CAUTION Text of the caution A Caution message appears where special handling is required to prevent product damage WARNING TEXT OF THE WARNING A Warning message appears where special handling is required to prevent personal injury or death DANGER Text of the danger message A Danger message identifies an immediate personal risk of injury or death and gives appropriate precautions The following signs may be visible on the instrumentation avoid contact with these points DANGER High Voltage Protective ground earth terminal D X m 4022 262 52351 E SAFETY amp HANDLING Voltages Voltages According to the American National Standards Institute ANSI guidelines a shock hazard exists when voltage levels are present which are 30 V rms or 42 4 V peak Use extreme caution whenever a shock hazard 1s present As a good safety precaution always expect a hazardous voltage in an unknown circuit before measuring WARNING COMPONENTS MAY HAVE POTENTIALLY HIGH VOLTAGES UP TO 30kV Operators and service personnel must be trained on potential safety hazards and safe techniques and must observe all warnings and cautions encountered on the system and in the manuals No person should perform any operations without prior training Interlocks Components include safety
335. t Step Focus with the Z Stage mouse movement Click on the 4th Quad with the optical image of the stage With the mouse wheel pressed moving the mouse up will move the Z up and moving the mouse down will move the Z down These movements are represented by up down arrows Use this to focus the object by observing the response in the 1st Quad step 2 of 5 Setting Hv 18 0 kv Optimize the image for Contrast and Brightness Actual Hv 18 0 kW Press Shift F5 to display the center cross Maximum possible 18 2 kv DELETION WO 5 00 mm Alignments 42 UHR atigmator Alignment Instructions atigmator A alignment Minimize the image movement Click on the Next button to move to the next Step TABLE 9 20 42 STEPS 3 and 4 OF 6 Order Action 10 Click on the Stig X Y Wobbler and by using the 2D box labelled Stigmator Alignment control eliminate the image shift progressively for all offered voltages Hy 16 0 Kv E Hs remaining Press the Next button to move from Stig X Wobbler to the Stig Y Wobbler step 3 of 5 stigmator Alignment control Auto Click on the Next button to move to the next voltage and repeat the alignment of the Stig X Y Wobblers Amplitude EE E 4022 262 61641 DU ALIGNMENTS 42 UHR Stigmator Alignment Alignments 42 UHR atigmator Alignment TABLE 9 21 42 STEP 5 OF 6 Instructions Press the Next WWD button to continue centering with another WD Press th
336. t Windows 2000 refer to the Microsoft Windows Users Guide shipped with your system Other Software and Hardware Call Customer Service for advice before installing software or hardware that is not required for system operation Other software such as screen savers or hardware network cards may corrupt the system control software under some circumstances and may invalidate warranty User Access Privileges Multiple levels of user access are defined in the software The user has full access to the instrument except for any alignments The supervisor has access to a set of supervisor alignments The pages found in this manual are Supervisor User pages where the users are permitted to control general operation functions and but not advanced technical maintenance Most technical maintenance 1s taken care of by a FEI SEM FIB trained service engineer who has the rights to enter the system via a Service access level similar to the Factory level entry 4022 262 61641 LE USER INTERFACE Software Interface Elements Software Interface Elements DA La 0 e A ES File Edit Detectors Scam E Open Save ctl s Save As Record Movie Import d Export d Print Ctrl P Log Off Factory Exit xTm Vacuum message A Please confirm specimen chamber vent Venting willtake afew minutes Are You sure you wantto continue Y Icon A small symbol indicating a specific software application For example the softwar
337. t be reset by the supervisor GIS Cancel Click on Cancel to leave the alignment and return to original settings Finish Click on Finish to save the new setting Only installed GIS needles are controllable Adjust the temperature of the GIS Press the lifetime button to reset the lifetime Cancel to exit 254 Supervisor IGP procedure step 1 of 1 11 Pt dep 0 20 h TABLE 9 55 254 NO STEP TO 1 OF 1 Order Action 1 Press the Start button Adjust the temperature of the GIS needs reseting PS Click on Finish to save the setting or Cancel to exit Click on the Lifetime Reset GISZ button 1f the lifetime 0 00 h Lifetirne reset Cancel 4022 262 61641 943 ALIGNMENTS 254 Supervisor GIS m 4022 262 61641
338. t choice via the Preferences dialog tabbed Databar This can be a combination of for instance kV Detector X and Y coordinates etc They can be placed in any order and will expand or contract to fit There is also a micron bar above the user s label area FIGURE 4 20 THE DATA BAR date dwell ni HF vy lt lt 00 00 00 oons 0004 oom Data Bar Colour coding The following table defines the status conditions of the DataBar TABLE 4 3 DATABAR STATUS Quad Status Scan Condition Background Colour Text Colour 4022 262 61641 mI USER INTERFACE Pages and Modules Pages and Modules Pages Tank az h m hy4 The control icons above the page area on the right side of the screen Ag et m ES E are organized into Pages Several pages are divided into smaller D modules that hold specific functions The most frequently used controls appear as modules on more than one page Select the page Beam Control ee required by clicking on the Icon Allowing the cursor to dwell for a fell few seconds over the icon will display a Tool Tip giving the name for a the page The page can also be selected from the drop down menu below the word Pages on the Menu Bar sample Prep EISE TABLE 4 4 PAGES Icon Buttons dconButtons Fage Modules Modules Beam CO oon rr Vacuum System Column Tuning Magnification Beam Rotation Detectors Status Navigation Stage Retractable STEM Load Lock Detectors Status Patterning P
339. t only starts the lon source and HT but also switches on the Electron Beam HT if this is not immediately required then it can be switched off in the E Beam page 4022 262 61641 EJ SYSTEM OPERATION Complete System Shutdown Complete System Shutdown Shutdown Complete shutdown should be performed only if absolutely necessary and for the shortest possible time so as to recover the column vacuum without the necessity of a system pump Normally one would only perform a complete shutdown for transportation of the system or for service actions like repair to essential electrical and air supplies The shutdown procedure brings the system to a non powered state where the vacuum in the Electron and Ion column area is no longer supported by running pumps and IGPs All valves are closed and the specimen chamber is vented This procedure should only be carried out by a Supervisor NOTE Do not use this mode unless you are positive that you want to turn off the E Beam source The emission characteristics of the source are dependent on the shape of the tip When the source is turned off it cools Reheating the source during startup changes the shape and emission characteristics dramatically requiring the column to be aligned It also reduces the lifetime of the source TABLE 3 5 COMPLETE SHUTDOWN PROCEDURE Action Set the system to Standby mode as described above then press and hold the front panel On Standby button for 5 second then
340. ta 400 only and 3 Tilt correction Bulk The Bulk stage module allows control of the stage for positioning location store recall and mapping of coordinates Stage coordinates and stage map are the two major functions of the Bulk stage control The stage COORDINATES display numerical information about a particular position Position values can be entered to drive the stage to a set position and a tick indicator occurs in the box to the left of the to be moved parameter to indicate Target position Coordinates can be Actual Target or Relative Any or all movements can be locked The stage lock for any of the axes is graphically displayed in the Status area as an open or closed lock The stage MAP displays the location of positions on the stage in a visual map form and in a list for selection Clicking within the stage map area drives the stage to the position selected Positions can be stored in a file and contribute to a map of locations that can be reintroduced at a later date for re investigation of the same sample 4022 262 61641 451 USER INTERFACE Navigation Page Tilt correction otage Bulk Flip Tit Correction To correct features to the tilted image when these are ticked in the boxes they become active Dynamic Focus Dynamic Focus Tilt Correction Click in the checkbox to switch DYNAMIC FOCUS on or off When it is on the scan slowly proceeds from top to bottom and the focus Tilt Angle point is automatically ch
341. tage Rotation Centre Mode 1 Specimen Tin Balls any suitable sample Steps 3 Press the Start button Instructions Optimize the image with Focus Magnification Contrast and Brightness Select the GET function and double click an a feature to move it under the center cross Click on the Next button to move to the next Step TABLE 9 41 17 STEP 1 OF 3 Order Action 3 Optimize the image with Focus Contrast Brightness and Magnification at 500x to 2000x Position x 0 044976 m Select the Get function and double click on a feature close to the center of the stub mounted in the center of the stage do not use IG stub holder or any other axis holder at this magnification Bring it under the screen Centre Cross by using the mechanical stage movement Position Y 0 008315 m Click on the Next button Cancel 4022 262 61641 931 ALIGNMENTS 77 Stage Rotation Center Alignments 17 Stage Rotation Centre Instructions TABLE 9 42 17 STEP 2 OF 3 Wait for the stage movement to finish The stage has rotated Tolo Select the GET function and double click an the feature to move it back under the center cross Click an the Next button to move to the next Step Order Action 6 Wait for the Stage movement to finish Stage has rotated to 180 Select the Get function and double click on the feature to move it back to the screen center m Click on the Next button step 2 of
342. tage and Beam Current display in the editable 5 0 KV 20 pA dropdown list boxes on the Tool Bar will depend on the type of beam that is active either Electron or Ion The High Voltage and Beam Current are related in that any selected HV will provide an individual set of beam current values for that HV Changing HV will change the beam current values to suit Both the Electron and Ion beam have calculated values of beam current related to the HV values The examples given here show two set conditions of HV selected and the same beam current but the accending values have changed to suit the selected HV in each case FIGURE 6 19 HV RELATED BEAM CURRENT VALUES pow opa For each ascending high voltage the range of beam currents increases in value accordingly When the aperture for the Electron column is changed this also influences the calculated range of beam currents for all HV s Likewise for the Ion column apertures Changing High Voltage Click on the text box and the list of voltages will be available Click on the required voltage and it will appear in the text box The dropdown list will automatically close This can be done while the beam for the column is on in which case the change will be immediate Default values can be set in the list box from the Preferences dialog tab labelled BEAM Any other HV value can be set with the use of the High Voltage slider placed in the Beam page Changing Beam Current Click on the
343. tart at a lower magnification with stronger wobble strength When you eliminate image motion increase magnification and decrease wobble to minimize motion Repeat until magnification is too high to make out features 9 38 4022 262 61641 ALIGNMENTS 270 lon Column Alignment Alignments 210 lon Column Alignment Motion Stig and Focus Correction EUNT The Procedure below is designed for both the Magnum and SideWinder columns following the Instructions in the scrolling window will guide you through the correct alignment for your column Far each aperture index tvpe selected in menu bar y po Focus alignment Adjust Focus with L Slider not with Mouse MUI n etigmatar Alignment Adjust TABLE 9 49 210 STIG amp FOCUS CORRECTION part 1 stigmator with Stigmatar Correction Aperture Alignment Turn on Order Action L1 wobble with convenient wobble amplitude Minimize wnhhla hw anartiira rimari ant Instructions Load test sample FEI part 19011 that came with the instrument Drive to the mapping wafer piece This is the piece with the marks on it a Log into supervisor mode Get to eucentric height Home Ion Beam AVA wvab ampl SU s Zero 1on beam shift and zero scan rotation ESI E mH g t BShift Stig uad otigein stiglos AperPos Wob ampi 1000 Select the 100 pA Aperture and move to one of the features by double clicking Set the magnification to 10kx Select Ad
344. ted button to the right of the dialogue box to browse directories and files for the TIF sequence prefix FIGURE 6 26 BROWSE DIALOGUE Open Look in er mh1 Quad 1 009 00056 tit 4 mh2 Quad 1 010 00006 tif Quad 1 C El mh1 Quad 1 009 00057 tif Es mhz Quad 13 010 00007 tit Bi mhz Quad 1 C El mh1 Quad 1 009 00058 tif Bs mhz Quad 13 010 00008 tif Bi mhz Quad 1 C Boa Emp Quad 1 010 annas tir Bi mh2 Quad 13 El mh Quad 1 010 00002 tif E mhz Quad 13 010 00010tif Bi mhz Quad 1 C y O pE y O ll mh Quad 1 010 00003 tif E mh2 Quad 13 010 00011tif Es mh2 Quad 1 Es mh2 Quad 1 010 00004 tif Ed mh2 Quad 1 010 00012 tif Bil mh2 Quad 1 Ei mh2 Quad 1 010 00005 tif Bi mh2 Quad 1 010 00013 tif E mh2 Quad 1 TF File name mh2 Quad 1 010 00001 tit Files of type TIFF files from Movie tit Cancel E m 4022 262 61641 WORKING WITH NOVA NANOLAB FEI Movie Creator Time Period Either select a custom time for the playback of the movie by clicking on the millisecond radio button or on the TIF time radio button to select real time acquisition playback To find the best custom timing one may need to create the movie a few times Unless the AVI file name is changed the next created AVI file will overwrite the last one made From Frame numbering Enter here the numbers of the starting frame and the ending frame These will represent the s
345. tem Electron column Switches High Voltage off and closes the Column Isolation Valve CIV on column Beam is blanked and closes the Column Isolation Valve CIV The GISs close and retract the GIS heaters are turned off System The System module contains the WAKE UP and the SLEEP buttons Wake Up Both beams can be started by clicking on the WAKE UP button The High voltages and Ion Source including heating if necessary are started with WAKE UP Sleep Both beams can be stopped by clicking on the SLEEP button The High voltages and Ion Source are stopped with SLEEP Column The Column module contains the same controls for the Electron beam or the Ion beam These are Beam On Pressing the BEAM ON button initiates the following sequences for the respective columns e Electron column Switches High Voltage On off and opens closes the Column Isolation Valve CIV Jon column Opens closes the CIV selects the last used aperture selects the highest High Voltage 30 kV and turns the ion source on if it was not running When activated the BEAM ON button changes from gray to yellow If you click the BEAM ON button when it is yellow the button changes back to gray The Icon logo for the beam in active operation is displayed at the right side of the module High Voltage The High voltage slider can be adjusted to give the required voltage Both columns can be adjusted in this way The Electron column ra
346. tem wsp to open this workspace Shortcut to Milling Steps The sample preparation process typically includes the following steps e Protective layer deposition with platinum or other GIS metals optional Rough milling Medium milling Fine milling Partial cutout of membrane Fine polishing These steps are defined in the data file as steps 1 7 For the default parameters the order in which the steps are executed 1s as follows 1 2 4 5 3 5 6 7 They are illustrated in the following figures NOTE The values given below for milling time thickness and beam current are approximations only otep 1 Protective Layer Deposition In this step the dualbeam deposits Pt material to protect the area of interest This step takes approximately 3 minutes 4022 262 61641 sas HARD amp SOFTWARE OPTIONS Auto TEM Wizard Software FIGURE 8 10 PROTECTIVE LAYER ON LIFTOUT SAMPLES Liftout Sample Before protective layer After protective layer Step 2 Rough Milling In rough milling the FIB mills large trenches at maximum beam current It takes lt 4 minutes The sample is reduced to a thickness of 4 um FIGURE 8 11 ROUGH MILLING Crosses milled for image recognition Step 3 Cutout During cutout the sample is rotated from 52 to 7 and a U shaped cut is made to free the sample partially FIGURE 8 12 CUTOUT IA gt Sample U shaped cut 4022 262 61641 HARD amp SOFTW
347. th the X and Y stage controls and focus until the image is sharp on a adjacent area Focusing at 2 X to 3 X the magnification needed for the final result makes the lower magnification sharper For example for high resolution output set the magnification level at 2000 X and focus at 4000 X to 8000 X Focusing with the MUI You can also use the MUI COARSE and FINE focus knobs to focus the image The image immediately responds to the MUI without a cursor on screen Focusing with the Mouse Press CRTL right click simultaneously while moving the mouse from side to side to focus the image then release TABLE 6 7 CORRECTING FOCUS WITH THE MOUSE Action Hold down the right mouse button while the cursor is in the active Quad The focus cursor which is a double ended arrow will appear Move the focus cursor from side to side until the image is sharp When engaged the focus cursor 1s active over the whole screen but will not interfere with other controls Move the specimen to a desired area with the X and Y stage controls and refocus until the image is sharp If this is the first time focusing the new specimen then click on the Z to FWD icon button on the Tool Bar to confirm focal distance to the Z value on the NAVIGATION page m 4022 262 61641 Scan Beam Patterning Stage Tool v Pause F amp Snapshot Photo 2 Vicdeoscope F3 Reduced Area F7 v Full Frame Col h Spot Line External Slow Scan Fast Scan Slower Scan
348. the Next button Step 3 opens and the Finish button appears Press Finish at Step 3 to Save and exit ES Click on the Next button Step 3 of 3 4022 262 61641 923 ALIGNMENTS 11 Automated Source Alignment 11 Automated Source Alignment Alignment Function The Automatic Source Alignment can be started from the Alignment Page Your FEI contact person or service engineer will give you This alignment automatically advice about when it is appropriate to run this alignment optimizes Source tilt and shift Press the Start button The Automated Source Alignment will perform certain optimizations that improve the imaging conditions of the SEM These optimizations are analogous to those performed manually in Adjustment 10 Instructions First you should now indicate whether you want to have only Source Tilt alignment done as shown above or you want to have also the Source Shift Alignment done For the latter check the appropriate check box The list of conditions to check changes in that case sele LG Notes about the conditions p Automated Source Alignment M Apart from videoscope histogram and the cross shown in cross over mode also any graphics created in the frame store by the graphics editor in the ImageManipulation control page must be Instructi i Ua E erased otherwise the alignment will not be able to work correctly Verity the listed conditions and check the boxes when the
349. the same as clicking it and then pressing GOTO it immediately moves the stage to that position 4022 262 52351 CU STAGES Map Elements The list always contains the LAST POSITION Selecting LAST POSITION will display the last stage position moved to and changes to this position can be updated as long as the LAST POSITION item is selected When the stage coordinates are edited manually the selected position will be de selected if it is the LAST POSITION while for any other position the UPDATE button will become enabled and the item will remain selected Golo Pressing the GOTO button will cause the stage to go to the currently displayed position in ACTUAL mode or to move relative to the current position in RELATIVE mode The Goto button is disabled if the LAST POSITION is selected in the LOCATION list it is enabled in all other cases Add Pressing the ADD button will create a new entry in the LOCATION list using the currently displayed position The Add button is disabled in RELATIVE mode you cannot store a relative position and is enabled in ACTUAL mode e The new entry is called POSITION x where x is 1 2 3 etc If an item with the new x already exists the value is incremental until a unique name is obtained The user can rename the new entry see LOCATION list Update The UPDATE button stores the edited position under the currently selected name The Update button is disabled in RELATIVE mode
350. the slider one can run forward or backwards through the movie Create Movie Clicking on the CREATE MOVIE button will bring one back to the File tab dialogue and starts the creation process of the TIF files to a single AVI file Close The CLOSE button closes down the whole dialogue Playing a Movie The AVI file movie can be played on the Windows Multimedia player installed on the system or exported to another Windows PC with more advanced movie editing programs Programs used to play the movie need to recognise the avi file type 4022 262 61641 E WORKING WITH NOVA NANOLAB Image Printing Image Printing Print Clicking on PRINT in the File menu with the left mouse button File Edit Detectors Scan E El opens the printer setup dialog so that choice of printer and conditions cl can be established ready to print an image or any other printable Save Ctl S T product from the microscope The Print word in the menu will only be highlighted when the active Quad is on Pause Pressing OK in the Record Movie printer dialog will activate the printer to print the job Import Export AAA FIGURE 6 29 PRINTER SETUP DIALOG Print Ctrl P Print Setup Log Off Factory ER Printer Name E Properties Status Read Type HP LaserJet 4000 Seres PCL E Where mlapappl Comment Orientation z gt Portrait Source Auto Select C Landscape Network Cancel The following Table explains the p
351. the user Current Start Click on Start to go toStep 1 Cancel Click on Cancel to leave the alignment and return to original settings Finish Click on Finish to save the new setting 253 Supervisor lon Beam procedure Zero Offset Offset Reset Aperture mechanism Home ASA FIB Source Heat Act Emission Current 2 0 vA Emission Current 2 Q000000 pA E E E TABLE 9 53 253 STEP 0 to 1 Order Action lon Source Status Offline Disabled Press the Start button Read the Instructions Idle Acquire Maintain Heat Shutdown Click on Finish to save the setting or Cancel to return to the original setting Cancel Select the Offset button required 942 4022 262 61641 ALIGNMENTS 254 Supervisor GIS 204 Supervisor GIS Alignments 254 Supervisor GIS Alignment Field Functions This page can be used by the supervisor to adjust Gas Injector Instructions temperatures GIS To set the temperature and to reset the lifetime counter per TABLE 9 54 254 FIELD FUNCTIONS GIS The Lifetime is displayed for each Gisport Field Name Function Press Start button Follow the text to complete the step Step Displays the present control area number and the total number of areas eae Numbers Each number represents a GIS number If a GIS 254 supervisar GIs is disabled the scrollbox will be greyed out Lifetim After GIS crucible replacement the lifetime can SHEET Rese
352. ther on one of these values will invoke the display to update to that condition Frame values for average and Integrate are independent of s each other and of scan speeds so values can be preset for particular ee scan beam and Quad conditions A filter should be set per quad per ES beam So live and filtered images of a beam can be seen at the same x time and if the a new beam 1s chosen it reverts to the preferred setting for that beam 4022 262 61641 zl USER INTERFACE The Tool Bar Modes 1 2 or 3 The Mode icon displays one of three modes either Mode 1 Field B Free Mode 2 Immersion or Mode 3 for EDX Mode 1 is a Field Y Mode 1 Field Free Free mode setting of the lenses for the column to allow low Mode 2 Immersion magnification searching of the samples or sample area Mode 1 is also Mode 3 EDX for x ray analysis or magnetic samples selection can be made in the Preferences dialog Tab labelled BEAM Mode 2 Immersion is a higher resolution mode for the viewing of the sample at higher magnification Mode 3 1s used for EDX operation where the lens is used as the magnetic trap for EDX analysis Patterning A 4 in Patterning Icon button is used to Start Pause Resume Patterning When the Start Stop Pause Resume Patterning button 1s active it changes to the Start symbol in black When the Start Stop Pause Resume Patterning button 1s active it changes to the Stop symbol in black When the Start Pause Resume
353. ties View Help Stop Options in the Slice group control the milling of successive slices Options in the Rough Cut pre slice group control the initial Phase none Processing slice 070 milling of a standard xT cross section Current process none l o l Progress e Options in the Coating group control the deposition of a protective coating of the intended slice area slice Rough cut Coating The user interface is shown at left The following table describes the Applica E E options in each group Controls common to each group are listed first width fio pm followed by those unique to a particular group Length s Bo am Depth z o am TABLE 8 16 AUTO S amp V USER INTERFACE Current ap 300 y n Slices fio Slices imag i Take lon Image before Start Show Refresh Slice Rough cut Coating Interface Item Description Show Previews all options selected for the Auto S amp V job and displays the patterns in the xT user interface These patterns cannot be manually repositioned as they are deleted before the job is run and redrawn when needed Begins the Auto S amp V job using the selected options Stop Aborts the Auto S amp V operation following completion of the current step Application si gt Width x ha um Length y EMS um Depth izi EN um Current ap o E hi To interrupt the current process step and exit without completing the job click STOP in Auto S
354. tigmator Alignment The 13 Stigmator Alignment procedure starts here Instructions TABLE 9 37 13 NO STEP atigmator A alignment Adjust focus Contrast and Brightness if needed Adjust the x stigmator correction for minimum image movement Click on the Next button to move to the next Step Order Action Mode 1 2 or 3 Specimen Tin Balls any suitable sample Steps 2 Before you click on Start make sure you have an Step 1 of 2 image with sufficient detail at 60 000x stigmator A alignment Auto TABLE 9 38 13 STEP 1 OF 2 Order Action Amplitude Optimize the image with Focus Contrast and Brightness Click on the Stig X Wobbler and by using the 2D box Contrast labeled Stigmator X Alignment eliminate the image shift The Amplitude slider sets the wobbler modulating depth Click on the Next button Brightness Cancel 4022 262 61641 mI ALIGNMENTS 13 Stigmator Alignment Alignments 13 Stgmator Alignment si TABLE 9 39 13 STEP 2 OF 2 Previous Finish Instructions Order Action atigmator Y alignment Adjust focus Contrast and Brightness if needed Adjust the y stigmator correction for minimum image movement Click on Finish to save the procedure and exit or Cancel to leave the Alignment procedure and return to original settings Click on the Stig Y Wobbler and by using the 2D box labeled Stigmator Y Alignment eliminate the image shift The Amplitude slider sets
355. tion factor for the current detector This value does not have to be edited if calibration 4 has been done maxiap the number of ion beam apertures This value is obtained automatically during first startup and does not have to be edited A list of GIS names and corresponding GIS ports these are obtained automatically during first startup and do not have to be edited for example ptgis the port number of the pt gis yoffpix a correction term for the difference between milling and cross image recognition in y This value is written by calibration 5 xoffpix a correction term for the difference between milling and cross image recognition in x This value is written by calibration 5 yoffpixcircle a correction term for the difference between milling and circle image recognition in y This value is written by calibration 5 yoffpixslow a correction term for the difference between milling and image recognition at slow scan speeds in y This value is written by calibration 5 bscalibx an overall beam shift correction factor in x This value is written by calibration 3 bscaliby an overall beam shift correction factor in y This value is 4022 262 61641 8 55 HARD 8 SOFTWARE OPTIONS nitial Use written by calibration 3 A list of GIS related names and corresponding GIS needle beamshift correction terms for example bsxpt the beam shift correction term for pt GIS in x bsypt the beam shift correction term for pt GIS in
356. tioning of the command cursor which can be at any position on the image Moving away from the Dot with the Arrow increases the stage speed moving toward the Dot decreases stage speed The direction of movement is always toward the central Dot along a straight line You can move the cursor around on the field of view direction and speed change accordingly When you are done release the mouse wheel and the action will stop Dot and Arrow disappear from the image FIGURE 6 13 TRACK FUNCTION 2 1 3 2001 3 10 06 PM 4205x 0 00 S 5 0 Test label In Quad 4 CCD mode the same function activates the Z movement With the wheel pressed moving the mouse up will move the Z up and moving the mouse down will move the Z down This activity can be seen live in the CCD Quad 4 window Representation of direction 1s indicated by a centered yellow arrow either pointing up or down either side of a 10mm bar indication point 4022 262 52351 e STAGES How to make Stage Movements Get When you select an image object with the cursor and double click the left mouse button Get brings that detail to the center of the screen using the stage movement Stage movement will center the object by mechanical movement of the stage and therefore will be limited to a useable range of magnification lower magn The maximum range for successive Get operations equals the range of the stage movement FIGURE 6 14 GET FUNCTION Wheel Up amp Down TJ W
357. tions before AutoFIB stopped at 15 30 An AutoFIB operation could run for hours 4022 262 61641 817 HARD amp SOFTWARE OPTIONS Messages LOSZe 04 4257205 Stare 1032004 Lae 59s 59r ips Mad le X43 Or 3 2 posi 10 28 04 14 59 05 comment comment 1029 042 14739705 aperrtureesl5 207405 DO 28 04 14 59 05 Focus l0 5 10 289 04 14359705 SExgmatron 0 0 10 28 04 14 59 05 imagewidth HFW 250 T0 28 04 42 59 05 brightness contrast 14 0 4 949132m 006 10 28 04 4 59 05 scan into 0 0000003 Ls 9 10 28 04 14 59 05 scanrotation 0 10 28 04 14 59 05 beamshift 8 5 3 666667 10 Z8 04 14259205 Stage zrt l5 81734154 7189898p 2 993005170638453E 04 10 28 04 14 59 05 stage xy 6 0099185155797 4 37424848170415 10 20 04 14 59 08 pattern group pattern 0 Ll ptf 10 29 04 14 59 22 Milling over 10 29 04 14259305 Seu ups MILL 240 3 posUz 10 28 04 14 59 05 Milling over TOSZ9504 45529122 det ups Malls OOF 2 posts 10 28 04 14 59 40 Milling over 10 28 04 14 59 40 Finish Using a Subscript This script calls a subscript for each of the eight milling locations 08 30 00 Ju S227 ted Ug 20 900 121715122 Set ups Mills LL of o Dos 09 30 00 I4 15 22 Deamsurtrt 0 000 03 000 00 3000 Ju TOI SCanroe vat 1on 0 000 US s0H 00 Lael S227 Stage 2tt32912 72 f U200Z2 08 30 00 L4 15 23 Stage xy 162164 1678 354 08 30 00 14 15 42 Milling over 08930500 14 15 42 Run SubSeript Ce xT AUcOFIB tem wizard idatals
358. tionship Sample to Image 0 0 eee 5 13 Se OU On mice tn Medd hye talea ia aes ee 5 14 Detectors for Nova Nano ab session 5 15 Imaging Detectors general o o o oooooooooooooooooooo o 5 15 Changing Detectors or Custom mode 0 0 00 cee eee 5 16 Standard Imaging Detectors llle 5 17 E mp c EIL 5 17 WED A ein bie Anata ee eo ee che dft oe 5 18 Optional Imaging Detectors 0 0 nee 5 19 CDEM OPON ds eue a ara dde oan US Cn a hee Re eae a 5 19 Custom effect on Beam Shift 0 2 00000 5 19 SEEM LOPD hus QE E PERI d 5 20 Opt rnizine Tae Maida ab ote Sg EURO qe PART mr RUN ts 5 24 Changing Scan Speeds iii QR need oa eee UNI NUES 5 24 Contrastand Brightness sou te rd ears ds 5 24 Correcting Contrast and Brightness 0 0 0 0 0 0 cee ooo 5 25 Auto Contrast and Brightness 0 0 00 ees 5 25 COMmecting FOCUS 2 0244 05 PESE dpt ER Ub d HORE ias 5 26 AO FOCUS os atenas ada 5 27 Correcto AStiOmMalsM dia ei 5 28 Auto Lens Stigmator Alignment 0 0 0 0 0000 ccc eee 5 29 4022 262 52351 EL ____ Selecting Beam Conditions oed Aa 5 30 High Voltage and Beam Current 0 0 nananana nananana 5 30 E B am Aperture SUIS tin is S RR ERR Ed e 5 31 Aperture Loading Guidelines 0 0 0 0 nannaa cee 5 31 Selecting E Beam Apertures rusia a ve odd eae dhe weeds 5 32 Strip Aperture Alignment Procedure oooooooooooooooo 5 32 Beam APESTA a A A 5 33 Optimal
359. tive operation is displayed at the right side of the module Beam The Beam module displays controls that are used by both Electron and Ion beams Stigmator The STIGMATOR is a two dimensional X Y control that allows you to change the stigmator setting The crosshair indicates the actual setting of the stigmator Click the left mouse button in the X Y control The hand cursor appears onscreen Move the mouse left to right to modify the X stigmator Move the mouse up and down to change the Y stigmator Note that the stigmator range is coupled with the magnification When the stigmator has been adjusted correctly release the left mouse button The position of the cross in the reserved adjustment area updates You can also use the SHIFT right mouse button for stigmation Beam Shift The BEAM SHIFT is a two dimensional X Y control that allows you to change the Beam Shift setting The crosshair indicates the actual setting of the Beam Shift Click the left mouse button in the X Y control The hand cursor appears onscreen Move the mouse left to right to modify the X direction Move the mouse up and down to change the Y direction The Icon logo for the beam in active operation 1s displayed at the right side of the module 4022 262 61641 mI USER INTERFACE Beam Control Page r Tuning Lens Alignment Modulator Magnification Couple Magnifications Magnification 169 x Beam Stigmator Rotation
360. to YES the software determines auto alignment with Y N after moving the stage but before milling the XY offset options from the selected feature and makes a beam shift to compensate This is a one time only drift correction to compensate for stage moves Save Image When this option is set to YES the image is scanned at save image with Y N current beam settings and saved as a bmp to the default options directory when milling is complete Positions The active position of the script is highlighted on the list Each E ofB position has a block of data in the script and therefore can use different settings Positions The default label for the first position is pos01 You may change it by entering a new label The next position label is based on the previous label For example if the previous label is area05 the next label will be area06 The labels are sorted alphanumerically in the Positions list box and are used in that order during AutoRun mode The maximum length of a label is 8 characters image files are saved using the position labels with the extension bmp 4022 262 61641 813 HARD amp SOFTWARE OPTIONS Creating and Running a Script Creating and Running a Script Creating a Script Start xT 2 Start AutoFIB from the desktop or Start menu The AutoFIB menu bar displays and continues to display on top of any other open program 3
361. tterns Hold the left mouse button and drag the pattern edge until the desired size is reached Also achieved by entering values in dropdown list Cursor Used with Patterns Arrow cursors can be used for selecting moving resizing and rotating patterns Select the ARROW toolbar button after defining a pattern to exit that pattern mode Serial Patterning When you select serial patterning from the Patterning Page all patterns defined on the screen are milled consecutively milling is completed on one pattern before moving to the next Serial patterning is always used with cleaning cross sections Parallel Patterning When you choose parallel patterning from the Patterning Page all patterns defined on the screen are milled concurrently For example if three lines are defined as milling patterns one pass of the beam will be made on one then the next the third back to the first and so on until all three lines are milled to the depth selected for the first line With parallel patterning the mill time is recalculated to include all the patterns that are displayed in the image window Parallel patterning is typically used for regular cross section milling and to avoid redeposition of material on adjacent areas Onscreen information is updated as the milling progresses Remaining Time 5bam Patterning Progress Overall progress WW A patterning progress module on the Patterning Page displays the Curent progress BEST
362. ture sizes FIGURE 4 8 SEM APERTURE SELECTION Beam Patterning Stage Electron Beam Ion Beam Optical Beam Couple Magnifications SEM Aperture SEM Mode Preferences 4022 262 61641 a B SEM Mode egauss Electron Beam FS USER INTERFACE Beam Menu SEM Mode wing By clicking on SEM Mode the following two modes of image Beam Patterning Stage Tools resolution are available for use with the E Beam v Electron Beam Ion Beam Mode 1 Field Free Optical B AE Mode 2 Immersion Mode 3 EDX Couple Magnifications SEM Aperture FIGURE 4 9 SEM MODE SELECTION Beam Patterning Stage Tools Wind Lens Alignment Shift F4 v Electron Beam Ion Beam Optical Beam Preferences Cto Couple Magnifications SEM Aperture SEM Mode d Y Mode 1 Field Free Te el F merian Mode 3 EDX Degauss Electron Beam Fa Lens Alignment Shift F4 Preferences Col a Either mode has its own E Beam and magnification presets and are editable in the Tool Bar dropdown list or the Preferences E BEAM Tab Use the Tool Bar buttons to switch between modes Degauss Electron Beam Degauss triggers the degauss procedure appropriate for the current SEM Mode The procedure puts all currently used electron lenses in a normalized state by removing their hysteresis effects For a few seconds while the procedure is running all live images disappear or turn fuzzy and than returns back
363. tween Time each pattern pass Blur Will defocus the beam to increase deposition for large depositions Relative 150 Adds additional pitch width to increase Interaction deposition rate A 150 rel int diameter results Diameter in a pitch of 2 5 times the spotdiameter 4022 262 61641 EI WORKING WITH NOVA NANOLAB Application Files The dwelltime volume per dose and interaction diameter are material and beam specific Refresh time and blur can be added if required for certain applications Le blur for depositing large area s Refresh time for filling via s The relative interaction diameter induces a pitch between two spots A relative interaction diameter of 0 and 0 overlapx results in a pitch of 1 time the beam diameter A relative interaction diameter of 100 and 0 overlapx results in a pitch of 2 times the beam diameter TABLE 6 23 MATERIAL SPUTTER RATES AT 30 kV Volume per Dose Volume per Dose MEME um nC um nC 0 18 1 50 Editing Application Files If a milling depth of a certain application file is insufficient an additional application file can be created or the current application file can be edited For example when using the Si X ML file for milling a GaAs substrate will result in much deeper Z then defined The following procedure shows how you can edit the application file e XT Application files are located in C Program Files Fei data patterning application files xml extension e
364. u how to control graphics by e Selecting Moving Resizing selecting Graphics A selected measurement graphic is denoted by the addition of resizing handles to the outline FIGURE 6 47 RESIZING HANDLES GRAPHIC CURSORS Arrow Move Resize A m ES Tj cursor cursor cursor Resizing k e u Handles z 1 029um The default Appears over Appears over cursor used an object to object handles for selecting move the object can be horizontal n aep h graphics vertical or diagonal Moving Measurement Graphics Make sure the cursor is inside the boundary of the graphic and hold the left mouse button while dragging the graphic Resizing Graphics Hold the left mouse button and drag the graphic edge until the desired size is reached Also achieved by entering values in the PROPERTIES list Cursors Used with Graphics Arrow cursors can be used for selecting moving and resizing graphics Select the ARROW toolbar button after defining a measurement graphic to exit that graphic mode Using the Properties List Whether to gain statistical information or to change a property of a measurement or annotation you can enter the PROPERTIES list for the graphic or text you have selected Some properties have a dropdown list so a choice can be made which will update on screen for the selected graphic Numerical values can be entered in text editors with some properties to effect the outcome of the gra
365. up or used folder location Save As Prompts the Save As dialog for the user to choose the file name and location How to use Photo Clicking once on the PHOTO item in the Scan menu or pressing F2 on the keyboard will allow a preset high quality high resolution image to be taken TABLE 6 16 USING PHOTO FOR IMAGE CAPTURE Step Action 1 Set the required Magnification 2 Increase the magnification at least 2x Focus and Stigmate using the reduced area Return the magnification and scan to their original settings Set Contrast and Brightness correct Click once on PHOTO in the Scan menu or F2 to take an image The image will now be saved via Save or Save As Click on Pause Start Scanning button on the Tool Bar to start scanning m 4022 262 61641 WORKING WITH NOVA NANOLAB Single Images Saving Opening single Images Saving Opening Save Fie Edit Detectors Scan E The Save function can be used to save and update to the original stored image and therefore is a direct command without confirmation sl o cies if the label remains the same This is usually require for a restored CNN image from the archive Click on Save in the File menu and the file will be saved automatically to it s existing label and the original file Record Movie will be overwritten The function also operates by clicking on the Ctrl Import and the S key Export _ The Save method is also employed in the Snapshot Photo function
366. user units user units Includes aperture focus stigmation rotation brightness aperture contrast and scan information in the script The settings focus are expressed in the xT interface stigmation brightness contrast scan info Includes beam shift information in the script beamshift 4022 262 61641 HARD amp SOFTWARE OPTIONS Scripts TABLE 8 8 SCRIPTING PARAMETER SETTINGS Check Box Description Script Commands Image Rotation Includes scan rotation information for the ion beam in the script Pattern File Includes pattern settings in the script via standard pattern pattern group files ptf files Patterns are saved to a pattern file with name prefix lt position number gt ptf when New or Update 1s clicked The pattern file 1s read when the script is executed With the Open button an existing pattern file can be opened its contents is copied to prefix lt position number gt ptf AutoScript File Specifies an additional Autoscript script that will run sub script after the AutoFIB script for each position Drift Control When this option is set to YES the software determines at drift control data with Y N regular intervals if the sample has drifted If 1t has the drift control options location of the beam is adjusted back to correct the coordinates Drift Control defaults are entered in the Drift Control Defaults dialog box accessed from the Set Up menu Auto Locate When this option is set
367. ustom mode and this will activate a variable control for the detector FIGURE 6 11 MODE I amp 3 TLD CHOICES Mode Secondary Electrons y Grid Yoltagy Backscatter Electrons u Custom ee Default Grid voltage Mode 2 In Mode 2 the TLD shows all four defaulted collection choices including a custom mode FIGURE 6 12 MODE 2 TLD CHOICES Mode Secondary Electrons y Secondary Electrons suction ua Backscatter Electrons Charge Reduction Down hole visibility Custom Default suction Tube voltage TLD Custom settings Clicking on TLD Custom while in either Mode 1 2 or 3 will display an adjuster to vary the custom mode of the detector For Mode 1 and 3 this will be labelled Grid Voltage and for Mode 2 Suction Tube Voltage The TLD detector can have the voltage changed within the lens to give custom variations of electron collection When grid voltage is negative low energy secondary electrons are repelled from the TLD detector and only backscattered electrons are detected When grid voltage is positive low energy secondary electrons are collected by the TLD detector The biasing capability is from 150V for backscattered electrons to 150V for secondary collection E 4022 262 61641 WORKING WITH NOVA NANOLAB Optional Imaging Detectors Optional Imaging Detectors Detectors Scan ETD SE TLD BSE STEMI A B Y COEM SE COD ix Detector Settings Detector CDEM y
368. ut area in the list is not found in the software but is just to Hh C mage Sait erection highlight the alignments with a white background described for the 210 lon Column Alignment Electron column 253 Supervisor lon Beam 264 Supervisor GIS Final Lens Aperture Strip Before any Electron column alignment should be made a Supervisor should align the Final Lens aperture strip by manual mechanical positioning The procedure to do this can be found in this chapter before any of the software alignments are fully described E Column Alignments for Supervisors This list is in procedural order 10 Source Tilt and Shift 44 UHR Lens Alignment 42 UHR Stigmator Alignment 43 UHR Image Shift Correction 45 HR image Shift Correction The above alignments should be carried out in this order only and only when necessary for instance if the column alignment has been disturbed by an event 10 Source Tilt and Shift should be checked on a regular basis of approximately every two weeks and if beam centers are not correct then the above alignments should be made in the respective order Correction of only one procedure may influence others therefore care should be taken to monitor the influence of actions made NOTE Do not use Beam Shift at any time during the adjustment procedures other than where specified as this is set to zero value at each alignment section and extra movement can offset the zero condition All movement of the specime
369. ve when clicked on the stage will drive to that location The ADD UPDATE REMOVE and GOTO buttons are active Relative Mode This mode is used to make repetitive or equal movements in relation to a key point or points The coordinates can be in known units or 616 4022 262 52351 otage Buik Flip Tilt Correction Actual y X 0 3417 mm m 13 2725 mm Im g 4959 mm rr jeo gl rg um c Iv Compucentric Rotation Last Position Add Update Remove STAGES Map Elements more often in user units defined from the setup found in the Stage menu The item DEFINE USER UNITS sets up the coordinates and the item USER UNITS switches between known units and user units When RELATIVE mode is in operation the ADD UPDATE REMOVE and GOTO buttons are active Editing a coordinate When in Actual mode With the LAST POSITION selected will de select the current position so no position is selected at all will change the mode to TARGET MODE and will disable the UPDATE button The GOTO button 1s active Boxes become ticked To update any other POSITION enter new values in any of the edit boxes This will change the mode to TARGET MODE and will enable the UPDATE button the position remains selected Boxes become ticked if no position is selected the edit boxes can be filled and the mode will change to TARGET MODE The GOTO button is active boxes become ticked When in Relative mode Editing a c
370. with the operating system until changed 4022 262 61641 433 USER INTERFACE Setting Preferences Presets Tab The Presets tab displays the capability to change values in the High Voltage and Magnification ranges either the Electron or Ion column Either single or numerous values can be inserted in the lists Changing values can be accomplished by entering values in the edit box just below the respective title FIGURE 4 13 PRESETS PREFERENCES Tm Preferences Databar Units Presets Scanning General Movie Sensitivity Cancel The HIGH VOLTAGE list can be changed to span any values from 200V to 30kV As the values are displayed in Volts the entry value in the edit box can be specific in value The MAGNIFICATION list can be changed to hold regular used values or general values Magnification values that are in the list but do not apply because of the Working distance condition will be grayed out in the Magnification menu on the Menu Bar Magnification range is from 10x to 300 000x Click on the OK button to bring the new settings into operation or Cancel to return to the original setting Either of these will close the Preferences dialog Click on APPLY to suspend the closing of the Preferences dialog but save the settings if one needs to move to other Tabbed dialogs to change further settings When finished click on the OK button The Items chosen from the Preferences Tab dialog Presets will remain with the
371. x oed exact uut ida 4 66 Usmo the MOUS so oue e eR eed wees nets 4 66 Usmo the KevyDOSEQ cesse dte dC E E PA AES NYSE RES 4 67 Hardware Interface Elements 0 000000 4 70 MCD Monier ts REY Rag em eee oe ERG ee Seta que 4 70 The sSysteni Computer dass toe to ecd de duds 4 70 ase Cono esi e oer Cn Coeur e om ek Sb RE SOS S opido ced 4 70 Manual User Inter Idee acu arte br ed PORE WC OH ee hee 4 70 4022 262 52351 A Chapter 5 WORKING WITH NOVA NANOLAB Starting the x FUT 4 li n a a Sih ween gd RE 5 2 Default Conditions at xT Start UP 5 3 Guide to System Settings ce eee nooo ees 5 4 Operations Checklist esse Ree a UAR Ke ACH ERR 5 4 Beginning Your SesSion 2 0 0 0 0 cc eee eee eens 5 5 Importance of Beam Coincidence 0 0 0 00 5 6 Ending Your SESSION iii diae ph nek e aoo Ge e ORAS 5 7 Preparing the Samples cda is 5 8 Needed Tools and Supplies epa diete dehet ete tun 5 8 Preparine the Samples rip tics Eel Et DES SE ER Ped 5 8 Mounting the Sample on the Holder 0 0 0 0 000005 5 8 Maximum Sample Dimensions 0 0 0 c cece eens 5 8 Maximum Sample Dimensions 0 0 00 5 8 Exchanging Samples s vios rem tor datar danita we ba Bad wees 5 9 TEM Grid sample handling option 0 0 0 0c cece eee 5 10 Roading TEM SESS ciar is 5 10 Sample Visas Bit otek cet ears id hee eed da e 5 12 Obtaining an Image o 5 13 How an Image 1s Produced veritas 5 13 Rela
372. xT Services You must start xT or restart xT Services and xT software before running AutoFIB After three attempts the stage did not reach the requested position Ensure that the X Y values are valid and the stage is working correctly AutoFIB cannot write the log file to the disk drive Verify that the file name is valid and there 1s space on the drive The emission current is out of range when the AutoFIB enters AutoRun mode Check dc og or current file that contains log data related to Auto Locate routines to determine the problem Error when AutoFIB tries to start patterning The patterning pitch is too small Check if the pattern can be milled by clicking START PATTERNING on the xT toolbar Additional Notes Cleaning Cross Sections In AutoRun mode each pattern is erased before the next one is loaded Cleaning cross section patterns should be used only in serial pattern order If a cleaning cross section pattern is present when you select the regular cross section pattern an error message may appear during pattern setup because the pattern order is automatically changed to parallel This error does not occur in AutoRun mode NOTE Pattern order is selected on the Patterning Page of the xT user interface Log File Examples Below are two example log files Verbose mode created during the running of AutoFIB scripts Patterns in AutoFIB Script This example script was started at 15 24 Mills occurred at three loca
373. xample ALT D for the Detector menu and then select from the choices with the left mouse button or with the up or down arrow keys Dialog Boxes A dialog box appears when the system needs more information from you before it can carry out a command You can input information using text boxes option buttons and command buttons Some dialog boxes do not let you access other functions until you exit the box Other dialog boxes let you perform other tasks while they remain onscreen and active For example the Preferences dialog boxes can remain open while you do other tasks P 4022 262 61641 USER INTERFACE Software Interface Elements Radio Buttons Use round option buttons to make selections Within a group of related option buttons only one selection can be active at any time Define New User Units Check Boxes Use square check boxes to make selections Single or within a group of check boxes items can be switched on or off by clicking in the individual boxes A tick means ON or active and an empty box means OFF or inactive Couple Magnifications Command Buttons Pump Rectangular command buttons carry out a function They press in when clicked on and some change colour to show activity When reversing the function the button springs out Command buttons have labels that describe the action Examples OK CANCEL APPLY RESET Click on OK to close the dialog box The software updates all informati
374. xt increment with the last set up or used folder location Save As Prompts the Save As dialog for the user to choose the file name and location None No save function just a screen image How to Use Snapshot The Snapshot icon button is represented as a camera with a short time dial on the Tool Bar When an image is required at any time one can click on Snapshot and a single scan preset scan setting will be activated which pauses at the end of the scan time The result can be just for viewing to check against the patterning condition or for saving on the harddrive Saving can be automatic to a predetermined file location using the next available label number or user defined TABLE 6 15 USING SNAPSHOT FOR IMAGE CAPTURE Step Action Select a quad to make a snapshot with the beam which is selected in that quad during fib milling select e quad and then hit snapshot Click on the Snapshot button on the Tool Bar The beam will start to scan the area The scan will make the snapshot scan or scans filtered and pause If Save is the ACTION then the image is saved to a predetermined directory on the hard drive If Save As 1s the ACTION then the Save As dialog will prompt the user for a destination on the hard drive With None selected in ACTION the activity will stop at point 3 After the image is saved the scan can be released by clicking once on the Pause Start Scanning button on the Tool Bar
375. y These values are written by calibration 3 bsx45tilt the beam shift correction term in x for the cutout step at 45 degree tilt with respect to the ion beam This value is written by calibration 3 bsy45tilt the beam shift correction term in y for the cutout step at 45 degree tilt with respect to the ion beam This value is written by calibration 3 Iondethcfactor not used Iondethbfactor not used Depthcorrection a correction factor that takes account of softer lt 1 and harder gt 1 materials then the material in the application file This value has to be entered manually Thicknesscorrection a correction factor that can tune the resulting membrane thickness if it deviates from the user defined value Use a value lt 1 to correct for membrane thicknesses larger than initially defined This value has to be entered manually Press Play to view these parameters e 3 Setbeamshiftalignment psc In this script three calibrations can be performed 1 Calib Overall beam shift correction factors bscalibx bscaliby Press Play then Press Calib to start the calibration Find or mill unique high contrast features and adjust the view so they are centered in the screen at 5000 1000 X magnification The values for bscalibx bscaliby can be written to the registry automatically 2 GIS Shift GIS needle beam shift correction terms bsxpt bsypt in example above Press Play then Press GIS Shift to start the calibr
376. y All View Only e xw T User Units prefix pattern lw z BR iT Open Ato Script File lon Beam Settings Ma dE 4 lon Beam Shift Image Rotation Drit Control n 4 Auto Locate E Open etage gt gt Pattern File em save Image 2 T Seveimane GN The following table describes the preferences and parameters in the scripting dialog box The script commands become part of the block of data for the position TABLE 8 8 SCRIPTING PARAMETER SETTINGS Description Script Commands Play All When selected all data in the script is sent to the system not applicable regardless of the check boxes for each individual item This 1s the normal operational mode for AutoRun When Play All is not selected only the data for the selected parameters is sent to the system All other data in the script is ignored View Only Use this mode to review the parameters saved for each not applicable position The script steps through the stage positions without actually moving the stage or updating the xT system values Also moving to a different script position using NEXT or by double clicking in the Positions list box does not send any commands or data to the system Stage XY Z R T Ion Beam Settings Ion Beam Shift Includes X Y Z stage coordinates rotation and tilt in stage xy the script The coordinates display in um rotation and stage zrt tilt in degrees Defines X Y stage coordinates in
377. y are e If possible select the SED or TLD detector Ok Choose between tilt alignment The shift alignment requires a specimen that shows several well only and tilt shift alignment distinguishable irregular features in the image at a magnification M ae cere eae iat of about 10000x and with slight defocus One can use a tin ball range l Then press Start sample provided that there are no large balls near the selected location Often ideal locations are found in areas where only a few small tin balls are visible Gold on carbon samples with not too fine gold particles are also suitable Before or after checking the conditions you can inspect and change the spot and High Voltage subranges over which the alignment will be performed Note that the upper and lower HV ranges overlap This ensures good performance between 5 and 10 kV ___SelectHV SpotRange In mode 2 the alignment can not be done at 30 kv and on some T systems also not at 20 kV This will be checked by the alignment Flease check before starting when it starts and you will be warned if the selections conflict High tension is on In mode 2 the alignment performance below 10 kV is however Standard imaging detector is considerably better than in mode 1 L Mo detector mounted on the fi You may now click on Start The automatic alignment still checks a lmaging at512 442 resolutio U Specimen for HR imaging e number of essential settings Spe
378. y to switch between quad and full screen while eae the video is recording Movie has the following embedded features Export eS oS Resolution at 512 x 422 or 1024 x 884 Print Ctrl F e Databar image optionally included in the video 2 uie Average or Integration changeable during recording xi e Scan speed changeable during recording Reduced area pauses Quad for focus or C and B change Time remaining indicator e Single frame Tif images recordable during video sequence e File format compressed AVI avi e Start Stop and Pause onscreen indicators Preferences set up dialogue The Preferences Dialogue The Preferences dialogue can be found at the end of some of the menus The Preferences dialogue consists of tabbed sections By clicking on the required tab a section will open to allow changes and presetting of conditions for the function chosen The Movie tab provides two groups one to choose set up conditions for timing labelled Timer and the other to set up save conditions for the resultant movie labelled File FIGURE 6 24 THE MOVIE TAB DIALOGUE xTm Preferences Movie Jv TIF Delay 0 2 5 E y 5 5 still 5 s TIF 25 mowie stills File Mame IREME Save in c Browse Numeric Seed e Video File Size 650 MB File Type Avi video compress ALE avi v Y Record Databar 4022 262 61641 E WORKING WITH NOVA NANOLAB Movie multiple image capture Timer The paramet

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