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nanospec® 6100 series operator users manual

1. S F Description Transfer 1 0 Abort Transaction S 1 FO H lt gt E 1 Are You There Request R H lt gt E 2 On Line Data D H lt gt E 3 Selected Equipment Status Request SSR H gt E 4 Selected Equipment Status Data SSD H lt E 2 0 Abort Transaction S2 F0 H lt gt E 17 Date and Time Request DTR H gt E 18 Date and Time Data DTD H lt E 25 Loop back Diagnostic Request LDR H lt gt E 26 Loop back Diagnostic Data LDD H lt gt E 31 Date and Time Set Request DTS H gt E 32 Date and Time Set Request Acknowledge DTA H lt E 41 Host Command Send HCS H gt E 42 Host Command Acknowledge HCA H lt E 5 0 Abort Transaction S5 F0 H lt gt E 1 Alarm Report Send ARS H lt E 2 Alarm Report Acknowledge ARA H gt E 6 0 Abort Transaction S6 F0 H lt gt E 3 Discrete Variable Data Send DVS H lt E 4 Discrete Variable Data Acknowledge DVA H gt E 5 Multi block Data Send Inquire MBI H lt E 6 Multi block Grant MBG H gt E 9 0 Abort Transaction S9 F0 H lt gt E 1 Unrecognized Device ID UDN H lt E 3 Unrecognized Stream Type USN H lt E 5 Unrecognized Function Type UFN H lt E 7 Illegal Data IDN H lt E 9 Transaction Timer Timeout TTN H lt E 11 Data Too Long DLN H lt E Stream Function List Continued S F Description Transfer 10 0 Abort Transaction S10 F0 H lt gt E 3 Terminal Display Single
2. Appendice Appendix A Notes on Standard Programs Appendix B Notes on Standard UV Programs SECS II SEMI Equipment Communications Standard Nanometrics Lock out Tag out Procedures 1 Turn off main circuit breaker power switch 2 Turn off main circuit breaker located at the facilities panel and use lockout tag out lock meeting end user guidelines Lock is not provided by Nanometrics 3 Unplug the power supply cord to the Controller from both the Controller unit and the AC power distribution receptacle 4 Unplug power cords connected to the output receptacles on the controller unit 5 Device identification and tags for lock out tag out of this tool is to follow the guidelines of the end user About This Manual This manual provides the information you need to operate and program the NanoSpec 6100 to be known from here on as Model 6100 Automated Film Thickness AFT Measurement System If some points are unclear while operating the software refer to the On line Help How To Use This Manual This manual covers procedures for the Model 6100 in the Production Mode and Process Engineer Mode referred to in this manual as the Operations Mode and Engineering Mode respectively These procedures are divided into four parts under which are further divided into sections System operators are responsible for Part 1 and Part 2 System engineers are responsible for all parts of the Manual Part 1 Perusing
3. The Display Measurement Data window displays numerical data for thickness fit and wafer X and Y position of each measurement point The active 2 14 Nanometrics Part 2 Model 6100 Basics buttons at the bottom of the window are used as a gateway to the different map types The active buttons are w Nanometrics Nanospec AFT x Program SIMON S MAPPING 1998 09 02 User ID SIMON Sample ID Sample No 001 001 Lm JL Figure 2 9 Display Measurement Data Window Search The Search button returns the Search window for another search query definition List The List button opens a display showing a simple list of the measurement thicknesses Numeric The Numeric button opens a map window displaying a wafer map with numeric thicknesses displayed at the each wafer location See Map Type Examples below Line The Line button opens a map window displaying a side view of the wafer thickness This mapping technic is best used with straight line stage patterns 2D 3D The 2D 3D button opens a selection box whick allows selection of 2D Contour Line or 2D Contour Area or 3D Contour Line maps See the Map Type Examples below Print If the printer is configured for the system the Print button sends the measurement data to the printer for a hardcopy of the measurement list Exit The Exit button exits the mapping and returns to the operating screen NanoSpec 6100 Series 2 15
4. 2 Choose the method to be used in creating a program Purpose The user can create a program from the start or by using a previous defined program as a template This procedure will assume a previous defined program is to be used as a template Procedure a Highlight the program number listed in the program list that is going to be used as a template 3 5 NanoSpec 6100 Series User Manual b To the right click on the copy button and follow the instructions This will copy the highlighted program to another numbered location leaving the original program intacted c To the right click on the edit button The Program Editor screen opens Refer to Program Editor Screen on page 3 17 3 Change the Program Name Purpose The program name should be change to discribing the program Procedure a Type in a new descriptive name that will be a source of identification over a period of time b To the left click on the Program Name button This saves the new name 4 Select the lens that will be used in the measurement Purpose Each program needs a lens for measurements This assigns the correct lens for the program Procedure a Click the scroll button on the side of the entry box b Select the a lens magnification c To the left click on the Lens button This save the lens selection 5 Select the measurement program to be used in the measurement Purpose Each program has to have an
5. L 0 Structure L n 1 lt SV1 gt Unsigned Integer 1 n lt SVn gt Unsigned Integer 1 Exception If n 0 no response can be made A zero length return for SVi means the SVIDi does not exist SV1 Measurement Status 0 Ready Idle 1 Busy Measuring 2 Not Ready 3 except for 0 2 SV2 Auto Focus Status 0 w o Hardware 1 not available 2 Available SV3 Stage Status 0 w o Hardware 1 not available 2 Available SV4 Loader Status 0 w o Hardware 1 not available 2 Available Stream 2 Equipment Control and Diagnostics S2 F0 Abort Transaction S H lt gt E Description Used in lieu of an expected reply to abort a transaction Function 0 is defined in every stream and has the same meaning in every stream Structure lt HEADER ONLY gt S2 F17 Date and Time Request S H lt E reply Description Useful to check equipment time base or for equipment to synchronize with host time base Structure HEADER ONLY S2 F18 Date and Time Data S H gt E Description Actual time data Structure lt TIME gt ASCII 12 bytes yymmddhhmmss if yy gt 90 then year 19yy else year 20yy S2 F25 Loopback Diagnostic Request S H lt gt E reply Description A diagnostic message for checkout of protocol and communication circuits The binary string sent is echoed back Structure ABS BINARY S2 F26 Loopback Diagnostic Data S H lt gt E Description The Echoed Binary Str
6. Command Buttons If a graph of the constant over the range click the graph button To print out the constant values click on the Print button To save the values into non voilital memory click onthe Save button To exit the dialog box and return to the Create Material screen click on the Exit button Click the Edit button to modify the contents of the highlighted Material file Click on the Copy button to copy the highlighted Material file to a unused number After clicking the button follow the instruction This button is not implemented for the Model6100 6150 Click on the Delete button to delete the highlighted Material file There is no undelete for the button Exit from the Create Material screen and returns to the Measurement Editor screen Nanometrics Part 3 Mastering The Model 6100 Section 6 Recalibration Editor Introduction The Recalibration function is to create or edit compensation for measurement errors between instruments These compensation graphs are created from known sample thicknesses and actual measurements The graph must have a minimum of two or a maximum of five measurement points Graphs contain minimum of two points or a maximum of five points of measurement Graphs of two points do not create a true representation of the slope so the five point graph will create a more accurate representation of the slope Editing or creating the recalibration file is discussed below Recali
7. Commands or responses to prompts that you should type as indicated in the instructions are shown in quotes For example you type bs in response to the instruction Type y in response to the prompt All screen buttons which you click on with your mouse appears bold Some screen buttons examples are shown as Cancel Enter Exit Trackball Assembly Functions The trackball assembly consists of a ball which is rolled to move the cursor on the screen and a left and right button which are used to access screens and windows and activate commands The left button is used for the following e Selecting a film program or lens in either the Operations Mode or the Engineering Mode If you click once with the left button the window appears requiring you to click on the ENTER command button to load your selection into the program When you double click rapidly you can enter the film type or lens type window without having to click on the ENTER command button Nanometrics Right Button Screen Conventions Terminology Click most engineering and service maintenance functions which are activated with a single click accessing the database in the Engineering Mode which is activated by a single click only Please be patient after clicking once as it takes up to 15 seconds to load all the files from the database before a screen prompt appears The right button is used for the following when you are at
8. Description Acknowledge or error Structure ACKCIO BINARY 1 20
9. explains how to set or change parameters related to a user s access to programs previously created and to the editors used to create a program Section 3 Program Editor explains how to create edit or change the associated measurement programs of the program Section 4 Measurement Program Editor explains how to set or change parameters related to film type and about reference scans Section 5 Recalibration explains how create edit or change a recalibration file Recalibration is the function of the Model 6100 to compensate for differences between instruments Section 6 Stage Program Editor explains how to set or change the pattern of measurement points used to measure your wafer facilitated by stage movement Nanometrics Section 7 Loader Program Editor explains how to set and change the wafer from a cassette in the auto loader Who Should Use This Manual for Operation for Maintenance The operation of the Model 6100 is intended for production personnel process engineers and Nanometrics trained service personnel Production personnel should read Part 1 and Part 2 and then if necessary Part 4 to check on the details of individual programs Process engineers and service engineers should read Part 1 through Part 4 to become thoroughly familiar with the instrument The Model 6100 is a very complex electro mechanical device consisting of a precision microspectrophotometer system Bec
10. located in a cassette are defined to move to the stage From the Program List screen the Loader Editor Program window opens and allows editing or creating loader programs Nanospec AFT Loader Program Editor Program Name 006 Wafer Count 0 Skip Pause All Reset All Set Reset 1 12 Reset 13 25 Set and next Set Reset 2 2 2 2 2 2 1 1 1 1 1 1 1 1 1 1 SMN O Ja I I CO O O PO O Ba 07 Eyes Figure 3 27 Loader Editor Program Window NanoSpec 6100 Series 3 45 NanoSpec 6100 Series User Manual General Outline Function Buttons 3 46 All Reset All Set Reset 1 12 Reset 13 25 Set and next Set Reset Save Print The general outline of creating or editing a loader program is 1 Next to Program Name enter the name of the loader program must consist of more than one character This will be the name under which the program will be listed in the Loader Program List once you have saved the data 2 Select the desired slot number s Using either one of the function buttons described below or double click the respective slot in the cassette graphic 3 Save the loader parameters to a file The selection of wafers can be done two ways double clickingon the slot position number or clicking on one of the right function buttons The number highlighted to the right of the cassette is the slot position currently selected You can select a different s
11. If a graph of the constant over the range click the graph button To print out the constant values click on the Print button To save the values into non voilital memory click onthe Save button To exit the dialog box and return to the Create Material screen click on the Exit button 3 27 NanoSpec 6100 Series User Manual Cauchy with k The Cauchy with k button opens a dialog box to entered polynomials to describe n and k as a function of wavelenght The Cauchy formula is lambda 4 wavelength in nm n a Na 2 E Ka k A K Kb A C Material Name r Cauchy Const with K No r Hisvelength Range nm Graph Print Save Exit Figure 3 12 Cauchy with k Dialog Box Insert the minimum and maximum Wavelength Range in nanometers into the entry boxes Command Buttons Graph If a graph of the constant over the range click the graph button Print To print out the constant values click on the Print button Save To save the values into non voilital memory click onthe Save button Exit To exit the dialog box and return to the Create Material screen click on the Exit button 3 28 Nanometrics Table Part 3 Mastering The Model 6100 NanoSpec 6100 Series The Table button opens a table dialog window The table format is suitable for all
12. NanoSpec 6100 Series Users Manual Map Type Examples Numeric Map te Nanospec AFT Numeric Program loader test STATISTICS ser ID Min Max 3SD 1 2237454 48 235332 48 255935 49 136749 48 376525 47 566768 48 404834 48 156871 48 079994 48 195209 Figure 2 10 Numeric Map Example 2D Contour Map tm Nanospec AFT Contour Map Setup Output STATISTICS No of Data 49 Min Max Figure 2 11 2D contour Map Example 2 16 Nanometrics 3D Map tm Nanospec AFT Setup Qulput Part 2 Model 6100 Basics 3D Contour Map Program loader test User ID Sample 1D Sample No 001 Date 1998 07 17 Time 14 21 Unit A Slot No 01 Rotation 45 Tilt 45 NanoSpec 6100 Series ij x OO Nt COO QU y T 7 7 PSSS A SS SIS Nanospec AFT 3D Contour Map Figure 2 12 3D Map Example x STATISTICS NoofData 9 Min 39307 Max 39391 Range 4 Mean 39388 4 SD 1 2 35D 3 7 39391 gt 39391 lt 39390 lt 39390 lt 39389 lt 39389 39309 lt 39380 lt 39388 39387 39387 2 17 NanoSpec 6100 Series Users Manual 2 18 Nanometrics Mastering The Model 6100 The following topics are covered in this section Second 2 IBEFOQ UCT OD 45 iaa 3 4 a qa RTT b HUE 3 4 Creating Progratas M pci 3 4 General OVINA A a 3 5 General PEC E feci etis 3 5 Maintamiug PTOSTAINS ud ds 3 7 section User Editor ra ii
13. Option References For more information on the standard programs using the UV option see Notes on UV Standard Programs in Appendix B 1 8 Nanometrics Perusing Model 6100 Section 4 Measurement Spot The video display of the viewing area shows light reflected from the instrument s entrance aperture disk a mirror in the optical stack with a hole in it The black measurement spot you see is the actual entrance aperture the hole in the mirror The measurement spot is black because that portion of the light is not being reflected from the disk Instead it travels into the spectrophotometer head to be measured Only the area under the black spot is measured by the instrument because this is the only light that travels into the spectrophotometer head Spot Placement Use the following guidelines to locate the best point for measurement e When measuring small features on patterned wafers use a lower powered objective lens to find the general area of a feature When you find it change to the lens you want to measure with e When measuring on a patterned wafer position the measurement spot or program it to be positioned in the center of the feature you want to measure e When measuring on an unpatterned wafer position the measurement spot or program it to be positioned in the area you want to measure NanoSpec 6100 Series 1 9 NanoSpec 6100 Series User Manual Spot Size Table 2 1 Relationship between l
14. VTN H gt E 4 Terminal Display Single Acknowledge VTA H lt E 5 Terminal Display Multi block VMN H gt E 6 Terminal Display Multi block Acknowledge VMA H lt E 9 Broadcast BCN H gt E 10 Broadcast Acknowledge BCA H E Stream 1 Equipment Status S1 F0 Abort Transaction S H lt gt E Description Used in lieu of an expected reply to abort a transaction Function 0 is defined in every stream and has the same meaning in every stream Structure lt HEADER ONLY gt S1 F1 Are You There Request S H lt gt E reply Description Establish if the Equipment is on line Structure HEADER ONLY S1 F2 On Line Data S H lt gt E Description Data signifying that the equipment is alive Structure for H lt E L 2 1 lt MDEN gt ASCII 6 bytes 2 lt SOFTREV gt ASCII 6 bytes for H gt E L 0 S1 F3 Selected Equipment Status Request SSR S H gt E reply Description A request to the equipment to report selected value of its status Structure L n 1 lt SVID1 gt Unsigned Integer 1 n lt SVIDn gt Unsigned Integer 1 Exception A zero length list means report all SVIDs S1 F4 Selected Equipment Status Data SSD S H lt E Description The equipment reports the value of each SVID requested in order requested by S1F3 The host remembers the name of values requested If any VID specified in S1F3 is invalid the corresponding V in S1F4 has the following error format
15. an instrument designed to measure the thickness of films deposited on various substrates including those used in semiconductor and magnetic head fabrication The Model 6100 provides accurate and repeatable measurements in manufacturing and advanced research development environments The Model 6100 offers these important features and options e Linear array head Small spot size e Fast focus e Fast measurements e Broad thickness ranges e Multipurpose thin and thick film capability e Continuous scanning from 210 800 nanometers Optional UV capabilities for measuring very thin films 25A 500A e Windows 95 based graphical user interface e Standard and customized film programs e 2D and 3D wafer mapping software e Database storage of measurements e Real time sample and model interferogram plotting e Automated focusing e Joystick automated stage e 32 bit Pentium microprocessor Nanometrics Perusing Model 6100 e Joystick keyboard and trackball assembly The measurement range of the Model 6100 extends from 25 200 000 0 0025 20 micrometers The optional UV system allows measurements at 25 500 Turning Off the Instrument To turn off the Model 6100 the user has to be assigned the privilege to exit the Nano system software 1 Click on the LOGON command button on the Operations Mode screen 2 Type in your User ID and Password when the User ID Password window appears 3 Click on the E
16. ass 3 9 o veio A es oi pu educa 3 9 System Ad Ministrator 4a k ie apace Ad 3 9 Process En gihe Sr irienna as 3 9 Service EOI it IA t d di AS AA 3 10 Operatoria 3 10 User Editor Screen AS 3 10 UserDialos BOX asadas 3 11 Acc ss Level Dialog DORA 3 12 OL ar O A 3 12 Meastifremen ts tl ica el bue is amd fet 3 12 Lens Para meters ina a ao Forces tosca 3 12 Reca re ND N Sn ips 3 12 O 3 12 Loader Prostam pr a 3 12 DEUS A apt volvi abt QU ert e bd Du t atu ar Det Ud Muss 3 13 System OM AA R k D 3 13 Data Ma nt nafl c 40 AAA AAA OA A it 3 13 SECS Pera Opa As 3 13 PP EY 3 13 PASSWO DO O e M EUER E 3 14 cui M c aaa ees 3 14 Model LOO Setups enn heit ducts aho at Pat oce tu ER N 3 14 M mtenance Ment deett dak ep tad Ped Re LO RENE GAY REBEL K n d n ake OP Kew W da KA b d 3 14 Section 3 gt Program Editor Axx neatis pue anye isa 3 15 Program Maintenance Screen siririn rt psa Ho enl Ebr re Gib ipa eredi 3 15 NanoSpec 6100 Series 3 1 NanoSpec 6100 Series User Manual Program Editors dei audiat das disti amba vi tad 3 17 Progr m Editor aged ouseesamiquide dde an peak ie Mees E ied cu etia dd 3 19 Section 4 Measurement Program Editor ii 3 21 1a yu Keya l ein 619 BEV CAR AAN RI Seen MA 3 21 Measurement Editor Screen kek ereke reee keke keke k kek kek KRA KAKE KA KA KA KA A HARA 3 23 Material DULL Oe domo BAL o 3 23 Command DBEOHS 4 oce DE eth ane e a Eb aco eae i o a s 3 23 Me
17. gt BINARY 1 bytes HCACK Description 0 Acknowledge command has been performed 1 Command does not exist 2 Cannot perform now 3 At least one parameter invalid 4 Not supported 5 S2 F41 data type error lt HCACK gt 3 L 2 1 lt HCACK gt BINARY byte 2 L 0 lt HCACK gt 3 L 2 1 lt HCACK gt BINARY byte 2 L 1 1 L 2 1 lt CPNAME gt ASCII 9 bytes RECIPE NO 2 lt CPACK gt BINARY byte CPACK Description 1 Invalid parameter CPNAME The CPNAME is not a valid parameter for this command 2 Illegal parameter value CPVAL 3 Illegal format for parameter CPVAL 4 The Recipe does not exist at equipment Stream 5 Exception Reporting S5 F0 Abort Transaction S H lt gt E Description Used in lieu of an expected reply to abort a transaction Function 0 is defined in every stream and has the same meaning in every stream Structure lt HEADER ONLY gt S5 F1 Alarm Report Send ARS S H lt E reply option Description This message report a change in or presence of an alarm condition Structure L 3 BITS 1 lt ALCD gt Alarm Code BINARY 1 byte 2 lt ALID gt 3 lt ALTX gt means alarm set O means alarm clear Alarm Identification BINARY 1 byte duds Alarm Text ASCII Max 40 bytes lt ALCD gt Alarm Code BINARY 1 byte BIT7 1 is alarm category code lt ALID gt Ala
18. index of 3 wave lengths it is filled with blank space 12 XPOS and YPOS A sample coordinate is entered only in a device equipped with Auto Stage in the status of this Auto Stage being functioning If invalid it is filled with blank space Note MEANI MEAN2 MEAN3 may have other type of measurement as shown in examples below Min Q wavelength at minimum reflectance unit nm scan measure Max wavelength at maximum reflectance unit nm scan measure Min 46 minimum reflectance unit scan measure Max 96 maximum reflectance unit scan measure Mean mean reflectance unit scan measure N A not available S6 F4 Discrete Variable Data Acknowledge S H gt E Description Acknowledge response of S6 F3 The specifications ignore the contents of the response Structure lt ACKC6 gt S6 FS Multi block Data Send Inquire S H lt E reply Description Message to obtain the Host s permission prior to do multi block send to the Host in Stream 6 Structure L 2 1 lt DATAID gt BINARY 1 BYTE 2 lt DATALENGTH gt Unsigned Long 4 Bytes BIH 04H S6 F6 Multi block Grant S H gt E Description Permission grant of S6 ES Structure lt GRANT6 gt BINARY 1 BYTE 0 Send grant 1 Busy Retry request 2 Not wanted gt 2 Other errors The specifications treat them as in 1 Stream 9 System Errors lt MHEAD gt BINARY 10 bytes SECS message block header associated with message block i
19. is automatically set to 100 nanometers As the optics in the system are not designed to receive or transmit light at such a short wavelength the stray light entering at 100 nanometers is the baseline used as the absence of light in the head However if you prefer to use an external dark reference the film type program you are using must have the Zero Scan Option activated in the Reference Editor of the Film Edit Program in the Engineering Mode 3 25 NanoSpec 6100 Series User Manual Introduction Section 5 Material Editor The Material Editor is used to edit create or view material files Each material file holds the optical description for a particular material used either as a substrate material or as a thin film material Typically it will only be necessary to create or edit a material file if you wish to measure non standard materials or if your process creates films with other than nominal optical parameters New material files may be created from scratch or by editing an existing material file copied over to an unused material file number Create Material Screen 3 26 Opening the Create Material screen is done from the Measurement Editor screen Clicking on the Material button opens the Create Material screen Material List Create New User gt Sys Cauchy without k Cauchy with k No Type Name 000 CauchyS Air 4 001 nkTable Crystal Silicon Book 002 nkTable Silicon Dioxide Book 003 nkTable Silicon Ni
20. measure silicon dioxide on polysilicon in the range of 150 10KA This program reduces measurement errors caused by polysilicon scattering the UV light by requiring two reference scans The first reference scan is made on a bare silicon reference wafer The second reference scan is made on a sample of bare polysilicon on anything or of silicon dioxide commonly referred to as oxide on polysilicon where the oxide thickness is known Program 20 UV Oxide on Aluminum Program 20 may be used to measure silicon dioxide on aluminum in the range of 500 20K By requiring two reference scans this program reduces measurement errors caused by aluminum scattering the UV light The first reference scan is made on a bare silicon reference wafer The second reference scan is made on a sample of bare aluminum or an oxide on aluminum sample where the oxide thickness is known NanoSpec 6100 Series B 1 NanoSpec 6100 Series Operations Manual B 2 D 6100Series O_manual Appendix B_UVstnd fm Nanometrics NANOMETRICS SEMI EQUIPMENT COMMUNICATIONS STANDARD SECS II Model 3000 5000 6000 Data Specifications Copyright O 1994 by Nanometrics Japan LTD Contents of this publication may not be reproduced in any form without the written permission of the copyright owner Disclaimer NANOMETRICS makes no warranties or representations as to the suitability of the standards set forth herein for any particular application The determination of suitabil
21. 1 lt TID gt Terminal ID BINARY 1 byte Terminal number 0 Single or main terminal 0 Additional terminals at the same equipment not supporte 2 lt TEXT gt A Single line of characters ASCII n max 72 3 lt ACKC10 gt Stream 10 Acknowledge Code BINARY 1 0 Accepted for display 1 Message will not be display 2 Terminal not available 3 63 Reserved S10 F0 Abort Transaction S H 5E Description Used in lieu of an expected reply to abort a transaction Function 0 is defined in every stream and has the same meaning in every stream Structure HEADER ONLY S10 F3 Terminal Display Single S H gt E reply Description Data to be display Structure L 2 1 lt TID gt BINARY 1 0 2 TEXT ASCIL n n 72 S10 F4 Terminal Display Single Acknowledge S H lt E Description Acknowledge or error Structure ACKCIO BINARY 1 S10 F5 Terminal Display Multi block M H gt E reply Description Data to be display on the equipment s terminal Structure L 2 1 TID BINARY 1 0 2 L Ln 1 TEXT ASCII nl nl 72 2 TEXT ASCII n2 n2x 72 Ln lt TEXT gt ASCH nLn nLn lt 72 18 S10 F6 Terminal Display Multi block Acknowledge S H lt E Description Acknowledge or error Structure lt ACKC10 gt BINARY 1 S10 F9 Broadcast S H gt E reply Description Same S10F3 Structure TEXT ASCII n n 72 S10 F10 Broadcast Acknowledge S H lt E
22. 3 Mastering The Model 6100 User Dialog Box 1 In the Menu Bar File drop down menu the User item will open the User Dialog Box Figure 3 2 User Dialog Box From this dialog box the system administrator can add a new user to the access file change the access privileges of an user or delete an user from the access file 2 Click on the Add New User button The User Access Level Dialog Box will appear TT j Access Level I Program IX System Shutdown X Data Maintenance IX Measurement SECS Operation Lens Parameter IX User Ix Recalibration x Password Ix Stage Program x Gain Setup fXiLgader Program x Model6100 Setup SECS Setup Pe Maintenance Menu Figure 3 3 User Access Level Dialog Box 3 Select the items that are going to be assigned to the user See Access Level dialog box below 4 Click on Save button when all selections have been made or Click on the Exit button to cancel the operation NanoSpec 6100 Series 3 11 NanoSpec 6100 Series User Manual Access Level Dialog Box Program In the Access Level dialog box the following check box items are available Measurement Selecting this item gives the user the ability to access the Program Editor From the Program Editor the user can create edit and delete any measurement program This item selection will be assigned to most process engineers and service engineers Lens Parameter Selec
23. 6100 EXcl stom Partatte GPS a a 3 39 Tab PIES A A A AAA A AA AS A da Ne AA 3 39 Manta anti etus id le cres arboles al e 3 40 VIA ia tora pa pod dt AS AAA ia 3 40 Lines tarada taa ita 3 41 A A 3 41 DAO lA A te ode fete prete Hanada irn Bae les 3 42 Rec BOX v uade ded er aub rid a ete rt n upra peau aunt 3 42 Deskew aout ds iut cab xa B daye N ddp es 3 43 Section 8 Loader Program Edition nata EL 3 44 Inteod cola uet od iti 3 44 Loader Program List cenzori inneni e A iy cs Kaban 1s eee e yaad Sivas eas nantes 3 44 Loader Editor ProstamWindOW nba 3 45 E uso e ibo e a vais W ve D sce b e e ke tts 3 46 Function Buttons o agonist dst baa ARA oa RM Rn A 3 46 NanoSpec 6100 Series 3 3 NanoSpec 6100 Series User Manual Section 1 Introduction Introduction Part 2 of this manual dealt with taking measurements with Program selections Part 3 deals with the engineering mode that is used to create programs and maintain programs This section will first discuss the user editor and then discuss the program editor with its other supporting editors Creating Programs Programs are instructions to the instrument about how and where to take a measurement These instructions can be for one measurement at a measurement point or at many measurement points If the instrument has the automatic loader configuration these instructions can be extended onto many wafers Log On Of
24. AHAA KHK ia 2 11 a lane al ET en Tela EYE SAM es 2 11 Kindsof DiISD AY ku A A Kr KA E k k 2 11 Kinds of Ma DS in yk 4 k dekir Re kedeke n MENE eki iate tu s ues Esset dos 2 11 Creating VA raid QE RE Re GO a 2 12 General OVC LOW a dsc 2 12 Search Database etr A ear re k neka eed ey Md Ms 2 12 Search Results WindOW Eu eker nera keke cabida dre eee Ra PP ea Rud 2 14 Display Measurement Data caue ia 2 14 Map Type Examples auae he A e Meta AR 2 16 INumerie MAD uma ia at aa a aiai La A 2 16 ESE Dn ad 2 16 SL Map acacia odia naci n 2 17 NanoSpec 6100 Series 2 1 NanoSpec 6100 Series Users Manual Introduction Logging On and Off 2 2 Section 1 Basic Windows The Model 6100 is capable of performing a variety of tasks in the Production Mode the Operations Mode This section provides an overview of the features available to the production user as well as basic instructions on measurement and data analysis procedures The following flow diagram shows the path the user follows to make measurements display and print data or create an interferogram to analyze sample data Database Log On Off AFT Screen List Graph Map Measurement Figure 2 1 Process Flow Diagram When you initially turn on your Model 6100 you are automatically logged onto the Operations Mode enabling you to perform measurements as well
25. ER or OK button Double click the pointer on an item to both highlight and select it Nanometrics Joystick Optional Printer NanoSpec 6100 Series Perusing Model 6100 The joystick is used to control the stage movement manually when programming a stage pattern or when measuring without an automatic stage pattern An optional color graphics printer can be used to print measurements statistical results interference plots and wafer maps on instruments equipped with the wafer mapping option on clean room compatible paper 1 7 NanoSpec 6100 Series User Manual Section 3 Reference Wafer Using the proper reference sample is important because the instrument functions by scanning your reference typically your substrate material and storing the intensity data in memory The stored reference data is then used to obtain the reflectance for the film s being measured You will need one of the following references to perform measurements with the Model 6100 Standard Reference A clean bare silicon wafer is typically used as the reference for all standard measurement programs For more information on the standard programs see Notes on Standard Programs in Appendix A Heflectance Reference The Reflectance Mode program 12 enables you to measure reflectance relative to silicon When performing absolute reflectance measurements in a user defined program you must also use a bare silicon reference wafer UV
26. ERAN 2 2 o DL 2 2 Los ms Ori dnd OP 2a napi onda Up br ma 2 2 Mai Operating Scorecard ad 2 4 Selecting Programs 10 2 6 Measurement Screen std cdas 2 8 Measuring a Sample spin 2 10 Section 2 Film Thickness Maps untada iia 2 11 O 2 11 Creatine a Map aaa data rta NI 2 12 Nanometrics iii Map Type Examples 4 0 45314 445342 40 14519609 55051465 343142555 Part 3 Mastering The Model 6100 Section I Introduction diana Introducti A deg Hr epp has Creatina LROSUOTUS Guitar dii Ud AND IRE EIS Maintaining Programs russia dan qnoque Section 2 User Editor hs Gu ers e ee eoa A veta e od eU Reha aas User Editor Sereen reta acto Section 3 Program Editor sic ibarra Program Maintenance Screen esrincocsosimesioniicari nssiii nes Program Editor Screen sins Program Editor Page 2 ua neta ente ient Section 4 Measurement Program Edil sala o A dps Measurement Editor Screen sss Measurement Editor Page 2 uisi About Reference Scans 7 eee Section 5 Recalibration Editor Introductio BD dn DD rrr Recalibration File Window ii eke Recalibration Parameter Window Section 6 Stage Program Editors rs ate ias INEA REO iia Stage ISE WINd OW assistant Stage Editor Window i4 5 deci teer edd Section 7 Loader Program Editor Hu nere Hi leji Gila ais Loader Program LiSt 4 lid Loader Editor Program Window
27. Model 6100 Section 4 Measurement Program Editor The Measurement Program is the instructions to the system for measuring a wafer sample The Measurement Program Editor is the tool to create edit and delete measurement program files from the system Below is the main entrance screen to the editor 002 Nitride on Silicon 003 Neg Resist on Silicon 004 Polysilicon on 10004 Oxide 005 Neg Resist on 10004 Oxide 006 Nitride on 10004 Oxide 007 Thin Oxide on Si 008 Thin Nitride on Si 009 Polyimide on Silicon 010 Pos Resist on Silicon 011 Pos Resist on 10004 Oxide 012 Reflectance Mode Absolute 013 Thick Oxide 014 Dyed Resist on Silicon 015 Dyed Resist on 1000A Oxide 016 Polysilicon on 10004 Oxide 017 Polysilicon on 10004 Oxide Figure 3 7 Measurement Maintenance Screen NOTE Nanometrics has supplied standard programs that are optimized for best performance Itis recommended that they are not changed but copied and then changed if desired See Appendix A and B later in this manual Edit To edit or create a Measurement Program the film type substrate type and material type of the sample is needed Select the measurement program you want to NanoSpec 6100 Series 3 21 NanoSpec 6100 Series User Manual Delete Copy Print Help Exit 3 22 edit from the Measurement Program List or select an unused program number to create a program from the beginning If the measurement program is not n
28. NaANOSPEC 6100 SERIES OPERATOR USERS MANUAL Automated Film Thickness Measurement System P N 7500 1092 P3 2 NANO Metrics Nanometrics Incorporated 1550 Buckeye Drive Milpitas California 95035 7418 Telephone 4084359600 Fax 4082325911 Nanometrics NanoSpec 6100 Series Automated Film Thickness Measurement System Operator Users Manual Part Number 7500 1092 P3 Important Notice Copyright Notice Information in this document is subject to change without notice and does not represent a commitment on the part of Nanometrics Incorporated Nanometrics Incorporated makes no warranty of any kind with regard to this material Neither Nanometrics Incorporated nor its employees contractors or consultants shall be liable for errors contained herein or for incidental or consequential damages in connection with the furnishing performance or use of this material O 1998 Nanometrics Incorporated This document contains proprietary information which is protected by copyright All rights are reserved No part of this document may be reproduced transmitted stored in a retrieval system or translated into any human or computer language in any form or by any means electronic mechanical magnetic optical chemical manual or otherwise without the prior written permission of the copyright owner Nanometrics Incorporated 1550 Buckeye Drive Milpitas California 95035 7418 Copyright infringement carries with it serious civil
29. Printing Office Washington DC 20402 Stock No 004 000 00345 4 Nanometrics Perusing the Model 6100 The following topics are covered in this section SECTOR Sin cool ls n en Oei roc e ai 1 2 System disti p A musi 1 2 Turning Off the Instrument a 1 3 Section 2 System CODIDOLDeDBES ioo ci bor orn tu oer me tbi edi eri hy Ira keneke b L edat 1 4 IMeasurermerit OSEA ise ec pi OU ID GHI y da Re Hen ILE He TERI LOO Rs iaa 1 4 Stag Enan asi tubas ba sues neice luta cxt a 1 4 System Controller lOWeE ceti edat aodidet a daunted 1 5 Controller Front Panel Controls x ssid aede reve ue ket tu OE ett nt Odd esta 1 5 Controls Behind the Panel Dodd e oae idi teddy 1 5 Computer Components tuse ERR M erm a es eri o HIPS UE Ep EUN IRR UOI LA 1 6 Computer Mouth dada 1 6 Keyboard A nn tiie nl cy Ed KA ERAN A k n d ak 1 6 Trackball sacos those e Ek ceba KE a n RE MI E NE YE dabe Kan 1 6 TO SUS AAA AAA AAA AAA 1 7 Optional PAN A da 1 7 Section Reference WI ad 1 8 Standard REC A a ds 1 8 Reflectance Reference cui a kek keke keka ada KE A iaa 1 8 V Optio ofi eternas 1 8 BECTON Measurement SOE siria oi ci 1 9 Spot PICA AA AAA AA AA AAA 1 9 war A td a did Swedes 1 10 NanoSpec 6100 Series 1 1 NanoSpec 6100 Series User Manual Section 1 Introduction System Features 1 2 IntroductionThe NanoSpec 6100 Automated Film Thickness AFT Measurement System hereafter referred to as the Model 6100 or M6100 is
30. VVALI gt ASCII 18 2 L 2 1 lt DVNAME2 gt ASCII 9 FILM TYPE 2 lt DVVAL2 gt Signed Integer 1 3 L 2 1 lt DVNAME3 gt ASCII 14 OBJECTIVE LENS 2 lt DVVAL3 gt Signed Integer 1 4 L 2 1 lt DVNAME4 gt ASCII 14 FILM THICKNESS 2 lt DVVAL4 gt Unsigned Integer 2 5 L 2 1 lt DVNAME5 gt ASCII 15 OXIDE THICKNESS 2 lt DVVALS gt Unsigned Integer 2 6 L 2 1 lt DVNAME6 gt ASCII 16 REFRACTIVE INDEX 2 lt DVVAL6 gt ASCII 7 7 L 2 1 lt DVNAME7 gt ASCII 14 DATA INTEGRITY 12 2 lt DVVAL7 gt Signed Integer 1 Description of each data 1 10 lt DATAID gt Signed Integer 1 byte 1 The value is fixed to 1 e g 65H 01H 01H lt CEID gt Signed Integer 1 byte 1 The value is fixed to 1 e g 65H 01H 01H lt DSID gt A model name is entered as value DVNAMEI SAMPLE ID and DV VAL A sample ID inputted is entered as value lt DVNAME2 gt FILM TYPE and DV VAL A program number in measurement is entered What is correspond ing to MODEL 2105s file type in 4000 5000 series is not supported lt DVNAME3 gt OBJECTIVE LENS and DV VAL An objective lens number in measurement is entered The correspondence between the objective lens number and the actual lens is as follows 0 5X 1 10X 2 15X UV 3 50X 4 Fiber lt DVNAME4 gt FILM THICKNESS gt and DV VAL When measuring film thickness the unit is Angstrom and a measured value is enter
31. ame button Otherwise you can only change the name in the display box The Program Name button opens a program maintenance screen See Program Maintenance Screen on page 3 15 To the right of the Program Name is the turn page button This button opens Page 2 See Program Editor Page 2 on page 3 19 The Measurement file defines the properties of the film to be measured and is specific to that film i e Oxide on Poly The Measurement has a scroll list displaying all the defined measurement programs on the system Any defined program is available for the program to use If you want to create copy move or edit a measurement program click on the Measurement button See Measurement Program Editor on page 3 21 3 17 NanoSpec 6100 Series User Manual 3 18 Lens Recalibration Stage Loader The Lens has a scroll list displaying all lenses available to the program Clicking on the Lens button opens Edit Lens Parameter screen See Maintenance Manual for information The Recalibration has three scroll lists displaying all calibration files available to the program Each scroll list is for one layer Clicking on the Recalibration button opens Edit Recalibration screen See Recalibration Editor on page 3 31 The Stage has a scroll list displaying all stage files available to the program Any defined stage file is available for the program to use If you want to create copy or edit a stage file
32. and criminal penalties under the United States and foreign copyright laws This manual describes a product which includes copyrighted software Said software is licensed to the customer for use only in accordance with the license agreement Printed in the United States of America December 1999 Part Number 7500 1092 P3 Nanometrics Table of Contents Frontmatter Lockeout Tag put Procedures eu M NOI MERE I eta v About This Manta O a AE T V How To Use This Mantal 32 A s ode dotum V Who Should Use This Matta isa vii Additional Sources of Information ekere keke keke kek k vii Manual CONVENTOS Es vii Federal Communications Commission Radio Frequency Interference HAM dt A it x Part 1 Perusing the Model 6100 Second TOC A A KK 1 2 System Features MM NS 1 2 Turning Off the Instrument idiota 1 3 Section 2 System Components end di 1 4 Measurement Sy S S idonea uH eda ba bU ed dat ba detta Veios 1 4 jp MAS 1 4 System Controller TOWE iia ida ad 1 5 Computer ComponecfltS spa da SU as 1 6 Section 3 Reference Wafer sans kad n ban tonta 1 8 Stair IROL CLOT A O A 1 8 Reflectance Reference cccccccssscesssecssscecesscecssseecssscecseeecsseeecsseeeesseeeesaeeeesaeeesseeees 1 8 UV Option References sa aca tei dace aides unas Maite te eens 1 8 Section 4 Measurement Spot ti ci 1 9 Ji AA Dm 1 9 SPORE A AR 1 10 Part 2 The Model 6100 Basics Section t BASIC WindO WS lite t eo ER eat bd erai Dp RE v
33. as gather and analyze data However if you subsequently press the Log On button you will need to use a User ID name and password to Log On to the system again Nanometrics Part 2 Model 6100 Basics The User is assigned an User ID name and password by the system administrator with certain privileges This section will assume that the user has only password privileges The engineering privileges are discussed later in Part 3 of this manual Entering a User ID and Password Logging Off NanoSpec 6100 Series When an User presses Log On button the M6100 Log On dialog box appears 1 Qr gm go amp Click the pointer in the User ID name field Type your assigned User ID name Press the Tab key or click in the Password field Type your assigned password Click on the Log On button or press the Enter key The Main Operating Screen appears NOTE If the Log On procedure is not successful type the User name and password in capitals The Log On dialog box is case sensitive If the Log On is still unsuccessful contact the system administrator at your facility To log off the Model 6100 1 Click on the F3 Log On button in the Operations Mode screen or press the F3 key on your keyboard The Log On dialog box appears NOTE At this time the software leaves the user name and password intact A non entity user should have been created for safe guarding the system 2 Type the non entity User ID
34. assigned measurement program The measurement program can be previously defined or can be defined now Procedure a Click on the scroll list button to 3 6 select a previously defined program or b Click on Measurement button on the left side and the Measurement Editor screen opens Refer to Measurement Program Editor on page 3 21 Nanometrics 6 Maintaining Programs Part 3 Mastering The Model 6100 Select the stage program to be used with the measurement Purpose Each program has to have an assigned stage program The stage program can be previously defined or can be defined now Procedure a Click on the scroll list button to select a previously defined stage program or b Click on Stage button on the left side and the Stage Editor screen opens Refer to Stage Program Editor on page 3 35 Select the method of loading a wafer onto the stage Purpose The Front Loading check box is selected if the systemis not configure for the auto loader If the instrument has an Auto Loader configured a loader program is assigned The Loader program can be previously defined or can be defined now Procedure a Click on the scroll list button to select a previously defined loader program or b Click on Loader button on the left side and the Loader Editor screen opens Refer to Loader Program Editor on page 3 44 The NanoSpec 6100 software package does not have a separate utility for managin
35. asurement Editor ape uo saque cdd an deitas es muU daddy du dd ena Mua EE 3 24 Reference Parameters A P Urt ted oat LA HEKA MU HH HK HHR 3 24 Graph Scale l atamelets aiii voe ut been rapi tame ecrit dde 3 25 About Reference SCANS aai due kereke ek vo td rbi De tn ase HAA KH HE Ui e eiui 3 25 Seclion 5 Matera E d OT de boa ea ittis dec Re e de es 3 26 lr A II POTES 3 26 Create Material SePeel aia A A AS a as da 3 26 Create New BUON oda 3 27 Cauchy WOU K5 Sn e elen e ile 3 27 Catchy With esce actenus AS 3 28 MONO TE ak ge sel KA SEN DADA A O DN DE NR 3 29 Edit BUGIS ersinnen en Dai VENE T Ne BONE We E bi k ANA kk c 3 30 o A O tatum Mako A awar Ma Ue tes t ds ria Ua 3 30 Section 6 Recalibration Editor keke enne eene ener KRA KH KA KH 3 31 Infroduc Hon soeben e ae e Ea dise reso b ee s 3 31 Recalibration File Window ciae keke eke keke malt poo estt KAKE KA KAKA KERA KAKA 3 31 Recalibration Parameter WindOW tivas irrita 3 33 Entry TING tad T Nm NE E T 3 33 Command DUO ll wate 3 34 Seclion Z Stage Prostdm Editor AA A A a 3 35 j f lan eye k CHIOT A O melius Eoo Le E ic Ak 3 35 Stage List Wind OW sa a 3 35 JE cm AOS 3 35 GCommand Buttons nessen Sasi iS 3 36 Stage Editor WIAdOW ada AS A A 3 37 Program Names ias 3 37 Xey POSION UR 3 38 Wafer Position Display aon ter ninesini 3 38 Command DUO Sa a A e a A ka a eg 3 38 as A O gerr 3 39 3 2 Nanometrics Part 3 Mastering The Model
36. ause of the machine s complexity it should be installed and serviced only by either service engineers from Nanometrics or others who have completed Nanometrics service training classes These training classes provide a thorough understanding of the operation of the machine and instructs personnel on the use of the system s support tools For information about training contact the Nanometrics Customer Support at 800 955 6266 or 408 746 1600 Additional Sources of Information For any additional questions on installation and maintenance you may contact Nanometrics Customer Support at 800 955 6266 or 408 746 1600 Consult your local library or bookstore for books on concepts in microscopy and spectroscopy Manual Conventions Nanometrics This manual uses the following typographic conventions vii viii Keyboard Conventions Key Cap Names Key Combinations What You Type Left Button The names of key caps on the computer keyboard are spelled out and appears bold in angle brackets Some example key caps are shown as lt Esc gt lt Enter gt lt F1 gt lt Ctrl gt A plus sign between two or more key names means that you must hold down the first key while pressing the next key For example the instruction Press lt Ctrl gt lt F10 gt means Press the lt Ctrl gt key and while holding it down press the lt F10 gt key As soon as you have completed these steps you can release all keys
37. bration File Window NanoSpec 6100 Series From the main operation screen clicking on the File menu item and selecting Recalibration from the drop down menu will open the Recalibration File window NanoSpec 6100 Series User Manual From this window you can select an existing file to edit or delete an existing file or select an unused number file to create a file The command buttons are No Type Name 001 unused 002 unused unused unused unused unused unused unused unused unused unused unused unused unused unused unused unused unused unused unused unused Figure 3 14 Recalibration File Window Edit Selecting a number file and clicking on this button will open the Recalibration dialog box with the files parameter inserted for editing Delete Selecting a number file and clicking on this button will clear the parameters from the highlighted file Graph Selecting a number file and clicking on this button will draw a graph of the parameters of the highlighted file Help Clicking on this button will open a content sensitive Help file Exit Clicking on this button will close the Recalibration file window and return the operation window without saving any changes 3 32 Nanometrics Part 3 Mastering The Model 6100 Recalibration Parameter Window The Recalibration window is where parameters are enter into the file The items to be specified for the recalibration file are file Name Units of Measu
38. cess Measurement Result this item allows the operator to process a measurement just taken without searching the database See Film Thickness Maps on page 11 About This menu item contains the following AFI opens a informational window displaying information about the AFT software Windows opens a informational window displaying information about the Window software Exit Shutdown This menu item contains the following 1 Exit to Windows Shuts down the system software only Exit Windows before turning off the equipment 2 Exit to DOS Shuts down both the system software and Windows However if another windows application is still running only the system software will be shut down proceed as described above Debug This menu item is deactivated for the User assigned no privileges This band is an information area displaying the user name date and system time The program listing area is the main portion of the screen display This area displays the programs available for measurements This area contains direct action buttons The buttons can be activated by clicking on the button with the pointer or by pressing the Fn key displayed in the button 2 5 NanoSpec 6100 Series Users Manual F1 Help The Help button and F1 key opens the M6100 Help file IMPORTANT The Help button in most screens are content sensitive That is in the Measurement Editor the Help button will open the file and dis
39. click on the Stage button See Stage Program Editor on page 3 35 The Loader has a scroll list displaying all loader files available to the program Any defined loader file is available for the program to use If you want to create copy or edit a loader file click on the Loader button See Loader Program Editor on page 3 44 To the right of the scroll list is a Front Loading check box checking this box will override the scroll list selection and allow the stage to be loaded manually from the front Nanometrics Part 3 Mastering The Model 6100 Program Editor Page 2 The browse button on the Program Editor screen opens the Page 2 screen This screen contains options that the program will perform during program execution The return button will return the Program Editor screen Default Displa Focus All Measurement Points List O Only the First Point O Graph C Map Stage Adjustment O None Only the First Point O All Measurement Points Printer Output Measurement Data Statistics Data No relative adjustment Small Printer Output Sample ID Input Measurement Data None Statistics Data C at Sample Exchange C at Program Start Always Measure Reference Save Measurement Result Figure 3 6 Program Options Dialog Box Focus There is two focus options All Measurement Points and Only the First Point This is an instrument instruction of whe
40. d are discussed within the vendor manual On the lower left hand side of the panel is the A C power switch for the UV Lamp Power Supply NanoSpec 6100 Series User Manual Main A C Power To the left of the UV Lamp switch is the Main A C Power switch This switch is also the main circuit breaker for the system Computer Components 1 6 Computer Monitor Keyboard Trackball The primary computer is mount behind the Controller front panel The supporting computer components are A 15 inch SVGA monitor displays menus commands instructions graphs maps and a color video image of the sample The computer monitor discussion is presented in the vendor manual The Model 6100 keyboard is primarily used to perform alphanumeric data entry when programming or running the system However you can use some function keys as alternatives to clicking the pointer on the corresponding user interface buttons The graphic user interface pointer is controlled by the trackball The trackball assembly consists of a large ball and two large buttons that make it easy to operate when wearing gloves The trackball is used to control the computer pointer and the buttons are used to control the user interface The trackball s left button is used to control the Model 6100 system software You can select items from the system s menus in two ways Click the pointer on an item to highlight it and then select it by clicking the pointer on an ENT
41. der Program Editor Introduction There is an optional automatic wafer loader for the Model 6100 When this option is installed and the instrument is configured for the loader the instrument then becomes Model 6150 To operate the loader in automatic mode program is needed to instruct the loader A loader program contains instructions necessary to load wafers from cassettes to the measurement stage To create loading programs an Editor is available for the auto loader Loader Program List 3 44 The Loader Program List window is the gateway to the Loader Editor program A scrollable program list is on the left side of the window the programs are listed by program number 3 digits max 200 programs and program name Select a previous defined loader program or select a unused number Then click on the a function button The function buttons are No Name 001 Loader test Delete Figure 3 26 Loader Program List Dialog Box Nanometrics Part 3 Mastering The Model 6100 Edit Opens the Loader Editor Program with the highlighted program inserted Creates a program from scratch or edits an existing program Ifan unused program number is highlighted a new program is created otherwise the higlighted loader program is edited Delete Deletes the highlighted program Exit Exits the Loader Program Editor and returns the operation screen Loader Editor Program Window The Loader Editor window is the area where wafers
42. ed When measuring reflective index a value magnifying by 100 times the reflective index 26 of the first measurement wave length is entered e g when a measured value of 100 96 is obtained the number 10000 is entered For reason of the format limitation 2 byte length Unsigned Integer the film thickness to be han dled must be within the range of 0 65535 lt DVNAMES5 gt OXIDE THICKNESS and lt DVVAL gt While in MODEL 210 a value of the bedding oxide film thickness value is entered in 4000 5000 series on the other hand the bedding film is not limited to oxide film A value of the bedding oxide film thickness value measured when simultaneously measuring two layer film thickness is entered The limitation on the format is the same as that in 7 lt DVNAME6 gt REFRACTIVE INDEX and DV VAL In 4500 5000 series for reason of considering earnestly absorption k and refractive index n k wave length dispersion wave length dependency and of measuring wave length range also being variable a specific wave length refractive index has basically no meaning Therefore this item is not supported then is filled with blank space lt DVNAME7 DATA INTEGRITY and DV VAL In 4000 5000 series this item is not supported Therefore this value is the fixed value 0 meaning a normal value in MODEL 210 Notes on using When using any data not specifically supported in this device you cannot apply this format and pay atten
43. eed NOTE This change in the measurement operation will result in the instrument producing a different sound during the operation Best results are obtained with the 4X lens however the 10X lens can be used with thinner films that have a lower refractive index Best results are achieved when measuring in the range of 4 through 25 microns in thickness NanoSpec 6100 series A 3 NanoSpec 6100 Users Manual A 4 Nanometrics Appendix B Notes on Standard UV Programs The following programs are supplied with the UV option UV programs may be used by selecting them from the main menu or when creating a user defined measurement test program Itis very important that the deuterium lamp be turned on 15 minutes prior to any measurement including the reference wafer for the signal from the lamp to stabilize properly A reference must be taken every time a UV test is run Program 17 UV Thin Oxide on Silicon Program 17 may be used to measure very thin silicon dioxide SiO on silicon in the range of 25 500A This program requires a SiO on silicon reference sample with a measured native oxide thickness A silicon reference sample is supplied with the UV option Program 18 UV Thin Nitride on Silicon Program 18 may be used to measure very thin nitride on silicon in the range of 25 500A To ensure accurate measurements use a bare silicon reference wafer Program 19 UV Oxide on Polysilicon on Anything Program 19 may be used to
44. eeded anymore highlight the program and click on the delete button Once the program has been deleted there is no way to un delete the program Be sure before deleting any programs If a program is to be used as a template highlight the measurement program and click on the copy button Follow the instructions appearing at the bottom of the screen Click on this button when a hardcopy of measurement program parameters is needed Click on this button to open content sensitive Help Click on this button to return to the Engineering mode screen Nanometrics Part 3 Mastering The Model 6100 Measurement Editor Screen The Measurement Editor screen is used to create and edit measurement program instructions and the browse button opens page two of the Measurement Program Editor Material By Display Styl pal sb Lina U L Meas o 002 Silicon Dioxide Book e Substrate 101 SILICON DATA FROM JELLISON Scanning Wavelength 1 Curve Fitting Gain Integration Time Of Scans HERRERA None Measurement Algorithm O Filter Filter Width 5 Threshold Noise Threshold Opt Filter No Filter Figure 3 8 Measurement Program Editor Screen Material Button Command Buttons NanoSpec 6100 Series Help Test The first page of the editor also serves as a gateway to the Material Editor The Material button to the rig
45. ens power and spot size The measurement spot must be small enough to be placed completely within the area of the feature being measured The objective lens that you select determines the size of the measurement spot If the measurement spot is larger than the feature being measured use a higher powered objective lens The following chart shows the relationship between the objective lens used and measurement spot size Use this chart to change the size of the measurement spot Standard 6100 Visible System Optional 6100 UV System Lens Power Spot Size microns Spot Size microns 4X 62 5 62 5 10X 25 15X 17 8 40X 6 25 6 25 Nanometrics The Model 6100 Basics The following topics are covered in this chapter SecHond Basic NICO WS tada tenido 2 2 a A 2 2 Los ams On and Oreiro 2 2 Entering a User ID and Pass Word e ee qa e unda keke ke despite 2 3 ria AAA 0 eee shat EE AEE s JJ DM E a 2 3 M in Operating SOPeer it AAA A RADA AA 2 4 Selecting Prog tamos ia 2 6 Meastureuent Screen nai 2 8 Tnf rmatonm AIC E ERU ES AI eau ea n keba loe ree a 2 8 Display T c 2 8 Display TypD 5 5545dy yar A uM a vM uaa ida ARA 2 8 PROM PUTOS torta ipta oibus boi aka l MR ut bae uc E be Loo tet etn Ee Rue Lite id 2 10 Measuring a oample di taii ME cud da NA ki Ki k AAA 2 10 Section 2 Film Thickness Maps si ereke keke ka ke Ke
46. equired for the underlayer thickness value call the Nanometrics Applications Engineering Department at 408 746 1600 or 800 955 6266 Program 5 Negative Resist on Silicon Dioxide Accurate measurements of negative resist on silicon dioxide requires accurate entry of the underlying silicon dioxide thickness An error in underlayer thickness could result in an error in the measured negative resist thickness NanoSpec 6100 Series A 1 NanoSpec 6100 Users Manual For assistance in determining the degree of accuracy required for the underlayer thickness value call the Nanometrics Applications Engineering Department at 408 746 1600 or 800 955 6266 Program 6 Silicon Nitride on Silicon Dioxide Use this program to measure chemically deposited silicon nitride on silicon dioxide Program 11 Positive Resist on Silicon Dioxide Accurate measurements of positive resist on silicon dioxide requires accurate entry of the underlying silicon dioxide thickness An error in underlayer thickness could result in an error in the measured positive resist thickness For assistance in determining the degree of accuracy required for the underlayer thickness value call the Nanometrics Applications Engineering Department at 408 746 1600 or 800 955 6266 Program 12 Reflectance Mode Unlike the film thickness programs this program measures the amount of light reflected from a sample at up to three user specified wavelengths This program can be
47. er Manual 3 42 2D Radial Rect Box The 2D Radial tab page locates measurement points in a radial circle around the wafer center The number of X Y measurement points increases for each outward radial circle The locations can be whole wafer any wafer half or any wafer quarter Manual Diameter Line s Rect Box Deskew Left U Half U Right Hat EEE Halt Left L Half L Right _Rad us Div _ __3 gt Figure 3 23 Stage 2D Radial Tab Page The Rect angle Box tab page is used to locate measurement points within a rectangle The information needed to generate these locations are two corner locations of the rectangle and how many X and Y points needed between the two corner points 2D Die Manual Diameter Line s 2D Radial Re ox Deskew Y mm No X mm 2 005 201 009 199 2 ot X Points e of Y Points 2 ap Figure 3 24 Stage Rect Box Tab Page Nanometrics Deskew Part 3 Mastering The Model 6100 NanoSpec 6100 Series The Deskew tab page contains two radio selection buttons The Manual radio button selects the option to wait for the operator to locate the deskew points and the None radio button disables this function Manual Diameter Line s 2D Die None Manual Figure 3 25 Stage Deskew Tab Page 3 43 NanoSpec 6100 Series User Manual Section 8 Loa
48. er through the steps to create a realistic map All maps are drawn using previous measurement results The general procedure is 1 Take your thickness measurements as described in Measuring a Sample on page 3 10 2 In the Data drop down menu select the Process previous measurement result item 3 Search the database for sample measurement data See Search Database on page 3 12 4 Display the measurement data See Display Measurement Data on page 3 14 5 Select map style for the display See Map Type Examples on page 3 16 Wafer measurements are automatically entered into the software database Creating a map uses data that has been entered into the Database When the Process Nanometrics Program User ID Date and Time NanoSpec 6100 Series Part 2 Model 6100 Basics previous measurement data is selected from the Data drop down menu the Search Data utility window opens Nanospec AFT Search Data 025 CLEMENT S TEST End 1998 09 03 l 15 11 Sample ID NONE o9 e Figure 2 6 Search Data Window The measurement data is stored in the database with additional information that can be used in searching the Database The additional information is The Program name that was used to take the measurement is saved with the data The User ID of the person that took the data measurement is saved with the data The Date and Time when the mea
49. ete a stage program that is already used in a main program Otherwise the measurement program will not run Copies the stage program stored under the number you have selected to an unused program number Follow the prompts Moves the highlighted stage program parameters to an unused program number Follow the prompts NOTE Stage programs are used in measurement programs If the program is used in a main program do not move a stage program Otherwise the measurement program will not be able to locate the stage program Prints the current Stage Program List This can take a large amount of time Opens a content sensitive Help file Returns to the Operations window NOTE Any changes to the stage program parameters are first cleared when clicking this button Save the program before using the Exit button Nanometrics Part 3 Mastering The Model 6100 Stage Editor Window E Program Name D X Y Position Wafer Position The Stage Editor window is where the measurement positions are entered into program files The Stage Editor window is entered from the Stage list window when the Edit button is clicked Name ECE EEE Water Size a E 0 wes ee E F 2 Parameters Display Command 010 000 012 000 011 000 000 000 j Buttons sse sv em en Program Name NanoSpec 6100 Series Figure 3 17 Stage Program Editor Screen To aid in the di
50. f Stage Editor Loader Editor File Menu Measurement Program SAR di Editor Editor Reference Material Editor Editor Figure 3 1 Engineer Editor Flow Diagram 3 4 Nanometrics General Overview General Procedure NanoSpec 6100 Series Part 3 Mastering The Model 6100 The Program is a running script of actions the different system parts will be doing and as the above flow diagram shows the File drop down menu allows access to the different editors The Program script does the following 1 ifthe Auto Loader is present instructs the loader to load a wafer 2 instructs the stage to move to a spot fora measurement 3 instructs the microscope how to take the measurement 4 instructs the software what material is being measured and what to compare it against These instructions are pre defined script parts that other editors have created and are being assembled together in the program editor As the flow diagram shows the individual editors can be access from the File menu or from the Program editor This general procedure assumes access to other editors from the program editor 1 From the File drop down menu select the Program menu item Purpose Selecting this item opens the Program Editor screen From this screen the other editors can be open directly and always returning to this screen For Program Editor information refer to Program Editor on page 3 15
51. fixed to 1 e g 65H 01H 01H 2 lt CEID gt Signed Integer 1 byte 1 the value is fixed to 1 e g 65H 01H 01H Description of the value DV VAL corresponding to each DVNAME 3 PROGRAM No Program No in execution A value in the range of 1 to 200 is entered SAMPLE ID Current SAMPLE ID 5 WAFER ID Number indicating the cardinal number of samples in measurement after program start up In the case of a device with loader the number increases per Wafer In the other cases the number increases per NEW TEST 14 6 SLOT NO A value of the slot number of Wafer cassette in a device with loader This value is valid only when the loader is in function When it is invalid 0 is entered 7 USER ID The ID of the user currently logged on or currently operating is entered 8 UNIT Indicates units of measured values of film thickness reflective index 96 reflective index um micron nm nanometer Ang Angstrom 9 MEASI Means an upper layer film thickness value or a reflective index value of the firstmeasurement wavelength 10 MEAS2 Means a lower layer film thickness value when simultaneously measuring two layer film or the second wave length reflective index value when measuring reflective index of two wavelengths or over If no data exists it is filled with blank space 11 MEAS3 If there exists no value of FIT when measuring film thickness or no data effective as data when measur ing reflective
52. g the different program files So maintaining the program files is done through each program editor and Windows file management facilities Use each editor s ability to delete copy and move files individually within the lis ts and then use Windows General file backup is done through the Windows backup utilities The directory needing backed up is Nanospec and its subdirectories NanoSpec 6100 Series 3 7 NanoSpec 6100 Series User Manual 3 8 To export files the windows copy command is used to transfer the file to a diskette To import files is a little more complicated first ensure that the transfer will not overwrite any files already installed on the system Then use the Windows copy command to transfer the diskette file to the Nanospec directory Nanometrics Part 3 Mastering The Model 6100 Section 2 User Editor Introduction System Administrator Process Engineer NanoSpec 6100 Series The Model 6100 is shipped with a special User ID and password This User ID and Password is not changeable and should be known to one person only for security purposes The following discussion is the Nanometrics recommendation for setting up User privileges This recommendation can be modified A System Administrator User is first created and assigned all privileges The system administrator can then create edit and delete programs and the administrator can maintain the system and most importantly assign others
53. he service engineer This selection will be discussed in greater detail in the Maintenance Manual Data Maintenance Selecting this item gives the user the ability to shutdown the system This should be a default selection for the service engineer and on need for the process engineer This selection will be discussed later in this manual SECS Operation Selecting this item gives the user the ability to access the measurement database for maintenance This should be a default selection for the service engineer and on need for the process engineer This selection will be discussed in greater detail later in this manual User Selecting this item is only possible whenever the system configuration has SECS software installed This item gives the user the ability to operate the SECS software This should be selected for any engineer that requires to use the SECS software This selection will be discussed in greater detail later on NanoSpec 6100 Series Selecting this item gives the user the ability to add delete and change the access level of any user Only user with this level of access is allowed access to this screen So this selection should be reserved only for the System Administrator 3 13 NanoSpec 6100 Series User Manual Password Gain Setup Selecting this item gives the user the ability to change their password at any time This should be a default selection for all users The only exception is w
54. hen a dummy user is created Example at the present time an user can not remove their ID and password from the log on without shutting down the system So an user is added such as NANO with no password or access levels selected Then when an user wants to remove their User ID and Password they would log on as NANO Model6100 Setup Selecting this item gives the user the ability to the system gain This should be a default selection for the service engineer This selection will be discussed in greater detail in the Maintenance Manual Maintenance Menu Selecting this item gives the user the ability to access the System Configuration Menu This should be a default selection for the service engineer This selection will be discussed in greater detail in the Maintenance Manual Selecting this item gives the user the ability to access the Maintenance Menu This should be a default selection for the service engineer This selection will be discussed in greater detail in the Maintenance Manual Nanometrics Part 3 Mastering The Model 6100 Section 3 Program Editor Taking measurements is done with a program The Program Editor is the tool that allows process engineers to create edit or delete programs The program is a set of instructions telling the system how to make the measurement what lens to use where and how many measurement spots to measure where the wafers are located and how many wafers to measure The
55. ht of the measurement name launches the Material Editor Refer to Material Editor on page 3 26 At the bottom of the Editor screen are five command buttons These buttons are direct action buttons that do the following Click on this button to open a content sensitive Help file Click on this button to Test the designed program before saving 3 23 NanoSpec 6100 Series User Manual Save Click on this button to Save the designed program parameters Print Click on this button to send the program parameters to the system printer Exit Click on this button to return to the Main Menu screen without saving any program changes Measurement Editor Page 2 The Measurement Program Editor has a page two for more parameters This page will specify the reference file and setup the scaling on the display graph screen CO Warn Reference Lifetime min J Optional Reference Setup no 000 Air Native Film Thickness Native Film 002 Silicon Dioxide Book Default A Subewate 101 SILICON DATA FROM JELLISON Prompt M Of Reflectance O Relative Substrate Relative Reference O Absolute J Graph Scale Maximum 250 pa Minimum 0 10 Division O Interval Figure 3 9 Page Two of Measurement Program Reference Parameters The reference parameters are hard coded into the software The scroll list buttons on the right displays the available choices The Native Film Thic
56. ing Structure ABS BINARY S2 F31 Date and Time Set Request S H gt E reply Description Used to synchronize the equipment time with the host time base The Host Commands the equipment to set its Date and Time base to the specified value Structure lt TIME gt ASCII 12 bytes yymmddhhmmss S2 F32 Date and Time Set Request Acknowledge S H lt E Description Acknowledge the receipt of time and date Structure lt TIACK gt BINARY 1 byte 0 OK 1 Error not done S2 F41 Host Command Send HCS S H gt E reply Description The host request the equipment perform the specified remote command with the associated parameters Structure lt RCMD gt BINARY 1 byte ex 21H 01H xxH NUMBER RCMD Description 2 PP START PROCESS START 6 PP ABORT PROCESS ABORT lt RCMD gt 6 L 2 1 lt RCMD gt BINARY 1 byte ex 21H 01H 06H 2 L 0 lt RCMD gt 2 L 2 1 lt RCMD gt BINARY 1 byte ex 21H 01H 02H 2 L 1 1 L 2 1 lt CPNAME gt ASCII 9 bytes RECIPE_NO 2 lt CPVAL gt Unsigned Integer 2 bytes ex A9H 02H x hi x low S2 F42 Host Command Acknowledge HCA S H E Description Acknowledge Host command or error If command is not accepted due to one or more invalid parameters i e HCACK 3 then a list of invalid parameters will be returned containing the parameter name and reason for being invalid Structure lt HCACK
57. ity must be made by the user in each case NANOMETRICS takes no position with respect to the validity of any patent rights asserted in connection with any item mentioned in these standards Users of these standards are expressly advised that determination of the validity of such patent rights and the risk of infringement of such rights are entirely their own responsibility The standards set forth herein are subject to change without notice 1 Introduction This document describes the SECS interface provided on SEMI E4 91 Communication SECS I RS232C Connector DB25 Female Master Slave Equipment is Master Duplicated block Option Pin No RS 232 C Description 1 AA Shield 2 BA Data from Equipment TX Data 3 BB Data to Equipment RX Data 4 RTS from Equipment 5 CTS to Equipment 6 DSR to Equipment 7 AB Ground Signal 20 DTR from Equipment a This is not required by SECS Parameter E Symbol Name Typical Range Resolution BAUD Baud rate 9600 300 9600 DEVID Device ID 0 32768 1 T1 Inter 10 Sec 0 1 10 0 1 Sec Chaqracter Timeout T2 Protocol 10 Sec 0 2 25 0 2 Sec Timeout T3 Reply Timeout 45 Sec 1 120 1 Sec T4 Inter Block 45 Sec 1 120 1 Sec Timeout RTY Retry Count 3 0 31 1 Stream Function List
58. keyboard can be used to enter X Y coordinates When using the joystick turn on the video camera image The X Y position area is available with this tab page Diameter Line s 010 000 010 000 012 000 012 000 011 000 011 000 017 000 000 000 bal Delete j Clear Figure 3 19 Stage Manual Tab Page Diameter The Diameter tab page is used to generate a line of measurement point across the stage center The two needed entries are angle and line division 2D Radial Rect Box Deskew Manual Diameter Line s Angle 51 4 gt Figure 3 20 Stage Diameter Tab Page 3 40 Nanometrics Part 3 Mastering The Model 6100 Line s The Line s tab page is used a line of measurement points anywhere on the wafer The information needed to locate the measurement point are the two end positions and the number of points between the end points The X Y position area is available to this tab page zo Radial Rect Box Deskew Manual Diameter Line s Figure 3 21 Stage Line Tab Page 2D Die The 2D Die tab page locates measurement points in a grid pattern on the wafer The X and Y pitch is the distance in the horizontal and vertical direction The grid pattern can be offset from the wafer center position 2D Radial Rect Box Manual Diameter Kenn 0 08 Pih 0 05 Figure 3 22 Stage 2D Die Tab Page NanoSpec 6100 Series 3 41 NanoSpec 6100 Series Us
59. kness can be entered into the right entry box and a prompt can be activated for user input if desired 3 24 Nanometrics Graph Scale Parameters Part 3 Mastering The Model 6100 The Y graph scaling is set in percentages The X graph scaling is a selection of division or interval graph settings The number of divisions or intervals over the measurement range is entered in the entry box About Reference Scans Reference Scans Dark Reference Scans NanoSpec 6100 Series The Model 6100 stores standard and dark zero reference scan data that the computer uses to nullify any arbitrary optical effects that might affect the sample measurement Before you can perform a measurement with the instrument valid reference scans must be stored in a disk file For more information on obtaining the correct reference sample for your application refer to Obtaining a Reference Wafer in Part 1 of the manual A reference scan file is stamped with a time and date Before a sample measurement is taken the time and date clock is compared with the time and date stamp and displays a time since last reference scan reminder For optimum measurement accuracy a new reference scan should be taken every eight hours The dark reference scan the zero scan is done using internal mechanisms to account for stray light entering the spectrophotometer head It is done automatically before a standard reference scan The wavelength counter
60. larm occurrence is done only release of the alarm status S5 F2 Acknowledge of Alarm Report Description Acknowledge or error Structure lt ACKCS5 gt Stream 5 Acknowledge Code BINARY 1 byte 0 Accepted 0 Error not Accepted S H gt E Stream 6 Data Collection S6 FO Abort Transaction S H lt gt E Description Used in lieu of an expected reply to abort a transaction Function 0 is defined in every stream and has the same meaning in every stream Structure Header only S6 F3 Discrete Variable Data Send DVS S or M H lt E reply Outline Sends measured data For the format of sending data choice can be made from two types of the Model 5000 6000 series standard and Model 210 Choose a suitable format considering the Host 1 S6 F3 S H E based on MODEL 210 series No response Description Can be used when sending data in the format of our company s MODEL 210 series However since this device as compared with MODEL 210 for reason of a major improvement of measurement capability has some parts in which the specifications are altered apply utmost care when operating it And for reason of limiting the perfor mance of this device it is basically not recommended to use this format continuously Structure L3 1 lt DATAID gt Signed Integer 1 1 2 lt CEID gt Signed Integer 1 1 3 L 1 1 L 2 1 lt DSID gt ASCIL 6 2 L 7 1 L 2 1 lt DVNAME1 gt ASCII 9 SAMPLE ID 2 lt D
61. lot position by clicking the respective number in the figure The function buttons are This function button deselects all slots This function button selects all slots This function button resets sets slots 1 through 12 This function button resets sets slots 13 through 25 This function button selects the highlighted slot position and moves up to the next slot This function button sets resets the highlighted number slot This function button saves the loader data to a file To be able to save the data you must have entered a program name consisting of at least one or more characters and selected at least one wafer for loading This function button prints the current loader parameters displayed on the screen Nanometrics Part 3 Mastering The Model 6100 Exit This function button exits the Loader Program Editor and returns to the Program List window Help This function button displays a content sensitive Help file The Wafer Count shows the number of physical wafers selected NanoSpec 6100 Series 3 47 NanoSpec 6100 Series User Manual 3 48 Nanometrics Appendix A Notes on Standard Programs This appendix lists important information about each of the standard programs Standard programs may be used by selecting them from the main menu or when creating a user defined test program Program 1 Silicon Dioxide on Silicon Use this program to measure silicon dioxide on silicon prepared by thermal oxidation or dep
62. materials but is uniquely suited to materials whose n and k values vary with wavelength in an irregular way Mateiral No 046 Material Name r Relractive Index Table Wavelengih Range Graph Print Save Exit Figure 3 13 Table Dialog Box The table format allows the n and k to be defined at individual wavelengths The wavelengths are arbitrary but close enough to adequately describe the material Substrate material index of refraction n should be known to 0 01 and films to 0 001 if possible All materials extinction coefficient k should be known to 5 or better If a wavelength has been edited the lines in the table will be sorted so that all of the lines in the table are in increasing wavelength order To add a line in the middle of the table click on the wavelength after the last line of the table Enter the desired wavelength and press the TAB key Enter the n value and press the TAB key again Enter the k value and press the TAB or ENTER key The new line will be inserted into the appropriate place in the table To delete a line in the table click on the line in the table to highlight the line Then click on the Delete button The last line that was deleted can be Undeleted 3 29 NanoSpec 6100 Series User Manual Graph Print Save Exit Edit Buttons Edit Copy ADAP Import Delete Exit Button 3 30
63. more measurement points to create a map a map of only two points will be meaningless A minimum of nine points is recommended to create a map that is useful for analysis Ten contours are drawn on the map to represent the intervals or boundaries of the measured thickness These contours can be displayed in a two dimensional map where they are used to emphasize the discrete intervals boundaries of thickness The intervals can also be represented as concentric thickness coded color bands in two dimensional or three dimensional maps The three dimensional color map gives the most realistic view of the thickness variations The user has the option of creating one of four kinds of maps Numeric is a display map showing numeric values at the measurement point on the wafer This map can be used with all stage pattern generation methods NanoSpec 6100 Series Users Manual Creating a Map General Overview Search Database Line is a display map showing a wafer edge view of the film thickness This map is mostly used when the stage pattern generation is a straight line e 2D is a display map showing the film thickness with contour lines between measurement points This map is used with all stage pattern generation methods except line 3D is a display map showing a realistic representation of the film thickness This map is used with all stage pattern generation methods except line This section will guide the us
64. n error lt SHEAD gt BINARY 10 bytes Stored Header S9 F0 Abort Transaction S H lt gt E Description Used in lieu of an expected reply to abort a transaction Function 0 is defined in every stream and has the same meaning in every stream Structure lt HEADER ONLY gt S9 F1 Unrecognized Device ID S H E Description The device ID in the message block header did not correspond to any known device ID in the node detection the error Structure lt MHEAD gt S9 F3 Unrecognized Stream Type S H lt E Description The equipment does not recognize the stream type in the message block header Structure lt MHEAD gt S9 F5 Unrecognized Function Type S H lt E Description This message indicates that the function in the message ID is not recognized by the receiver Structure lt MHEAD gt S9 F7 Illegal Data S H lt E Description This message indicates that the stream and function were recognized but the associated data format could not be interpreted Structure lt MHEAD gt S9 F9 Transaction Timer Timeout S H lt E Description This message indicates that a transaction receive timer has timed out and that the corresponding transaction has been aborted Structure lt SHEAD gt 16 S9 F11 Data Too Long S H lt E Description This message to the host indicates that the equipment has been sent more data than it can handle Structure lt MHEAD gt Stream 10 Terminal Services
65. n the list removes the program from the system IMPORTANT There is no Un delete feature When the button is clicked the highlighted program can not be restored to the list This button will copy the highlighted program to another numbered location When pressing this button just follow the instruction at the bottom of the screen This button is the second main maintenance button Pressing this button with a highlighted program in the list moves it from one numbered location to another numbered location This button will send the numbered list to the system printer for a hardcopy This button will open the content sensitive Help file This button will exit the Maintenance Screen Nanometrics Part 3 Mastering The Model 6100 Program Editor Screen To enter the Program Editor screen either click on the Edit button in the Maintenance screen or click on the Edit Current Program item in the extended menu of the Program selection of File menu The Program Editor screen will appear Nanospec AFT Program No 001 Program Name Oxide on Silicon 001 Oxide on Silicon Recalibration 000 None 000 None Front Loading Figure 3 5 Program Editor Screen Program Name Measurement NanoSpec 6100 Series The Program Name display box shows the program that was highlighted in the program list If you want to create copy move or edit a program click on the Program N
66. n to auto focus the system NOTE This item is only enabled in Auto Stage and Auto Focus modes Stage Adjustment Specifies display of the coordinate correction prompt during measurement This temporarily interrupts measurement and allows you to specify coordinate correction using the joystick NOTE This item is only enabled in Auto Stage and Auto Focus modes Sample ID You can select one of the items listed to designate the use of a Sample ID NanoSpec 6100 Series 3 19 NanoSpec 6100 Series User Manual Default Display Printer Output Small Printer Output Always Measure Reference Save Measure Result 3 20 Specifies the display screen at program start up You can change the display format freely during program start up Select one of the following formats NOTE The Graph is enabled only in Scanning Measurement mode and the Map is enabled in Auto Stage mode Specifies automatic output to a standard printer The Measurement Data check box specifies printing of a measurement data for each sample measured and the Statistical Data check box specifies printing of statistical data for each sample measured Specifies whether or not measurement data etc is to be printed on a mini thermal printer Specifies if the reference wafer is to be measured before measuring the sample wafer Specifies whether or not measurement data is to be saved in a file Nanometrics Introduction Part 3 Mastering The
67. name 3 Press the Tab key or click in the Password field 4 Click on the Log On button or press the Enter key 2 3 NanoSpec 6100 Series Users Manual Main Operating Screen The Operations Mode screen is displayed when you Log On to the system The rest of this chapter describes the options displayed on this screen and how to use the ones that are available to a operator on the Model 6100 All Operation functions available to the operator are present on this screen Any function displayed on the screen that is not assigned to the User privilege level is not activated The Main Operation Screen contains of the following areas title band menu bar User identification band program listing area and action button area Tile Band gt ____________ NanospecAFT Model 100_______________ Menu Bar Edit Maintenance Data About Exit Shutdown User Informationa y Band Oxide on Silicon Nitride on Silicon 10 Neg Resist on Silicon 10X PolySilicon on 1000A Oxide 10X Neg Resist on 10004 Oxide 10X Nitride on 10004 Oxide 10X DEMO Resist Wacker Poly on Oxide Polyimide on Silicon 10X Program Pos Resist on Silicon 4X Listing gt Pos Resist on 1000A Oxide 4X 480nm Absolute Reflectance 10 Thick Oxide 10 Dyed Resist on Silicon 10 Dyed Resist on 1000A Oxide 10 25 Pt UV thin Oxide UY Thin Oxide 15X UY Thin Nitride 15X UY Oxide on Polysilicon 15X UY Oxide on Aluminum 15X UY Gauge St
68. ns to User This equipment generates and uses radio frequency energy If not installed and used in strict accordance with the manufacturer s instructions the equipment may cause interference with radio communications It has been type tested and found to comply with the limits for a Class A computing device in accordance with the specifications in Subpart J of Part 15 of FCC Rules which are designed to provide reasonable protection against such interference when operated in a commercial environment Operation of this equipment in a residential area is likely to cause interference in which case whatever measures required to correct the interference must be taken at the owner s expense FCC Part 15 818a If this equipment does cause interference to radio or television reception the user is encouraged to try to correct the interference by one or more of the following measures e Re orient the receiving antenna e Relocate the equipment with respect to the receiver e Move the equipment away from the receiver e Plug the equipment into an outlet that is on a different circuit branch than the receiver If necessary the user should consult the dealer or an experienced radio television technician for additional suggestions The user may find the following booklet prepared by the Federal Communications Commission helpful How to Identify and Resolve Radio TV Interference Problems This booklet is available from the U S Government
69. nterferogram graph Nanospec A Program 001 Oxide on Silicon est Calib Video Figure 2 4 Example of Graph Display Map Button The Map button displays the measurement points ona wafer graph The statistics are also displayed on the right side Nanospec AFT Program 001 Oxide on Silicon 13362 A 13348 A 588 A 13362 A Print 026 041 008 100 Figure 2 5 Example of Map Display X Position The X position is the left and right stage movement from the center point and is expressed numerically The stage movement is controlled by the joystick or the program NanoSpec 6100 Series 2 9 NanoSpec 6100 Series Users Manual Y Position Action Buttons Help Stat Ref Meas New Test Calib Video The Y position is the forward and backward stage movement from the wafer center point and is expressed numerically The stage movement is controlled by the joystick or the program This screen band contains action buttons use while taking measurements The buttons are The Help button is content sensitive Press to receive additional information on the screen functions The Stat button opens another display box displaying the statistic data A screen opens and displays a bar graph of the measurement data The Ref button is available take reference measurements This button is deactivated when in the operator mode The Meas button starts the measurement process The New Test button saves
70. osition Measuring highly doped silicon dioxide may affect accuracy because heavy doping changes the film s optical properties This program should be used to measure films greater than 500 Program 2 Silicon Nitride on Silicon Use this program to measure silicon nitride that has been chemically deposited on silicon Measuring plasma nitrides may be less accurate than measuring chemically deposited nitrides because the varying stoichiometry of plasma films can cause measurement error Frequently the refractive index if known can be used to scale results obtained from plasma nitride samples However creating a user defined program for a particular nitride to be measured that has the refractive index appropriate for that nitride would be the best way to scale the results of the nitride measurements Program 4 Polysilicon on Oxide Accurate measurements of polysilicon requires accurate entry of the underlying silicon dioxide thickness An error in underlayer thickness could result in an error in the measured polysilicon thickness IMPORTANT The default optical constants the refractive index and the absorption values for Program 4 may not work well for your particular polysilicon sample since different types of polysilicon films exist Therefore you may need to create a user defined test with different values for the refractive index n and absorption k for your particular sample For assistance in determining the degree of accuracy r
71. play the information pertaining to the Measurement Editor F2 Video The Video button and F2 key is a toggle switch to turn on off the video image window F3 Log On The Log On button and F3 key will remove the User ID from the User identification band and open a Log On dialog box F4 Gain The Gain button and F4 key is deactivated on the M6100 The gain is automatic adjusted by software The A F auto focus button and F5 key focuses the lens on the sample Selecting Programs Before a user can take any measurements a program must be selected and loaded The main operating screen displays up to 200 pre defined programs The programs have been defined using the instrument in the engineering mode so the operator can easily measure a sample by selecting and activating a program To load a program 1 Load a reference wafer on the reference platform right platform of the stage 2 6 Nanometrics NanoSpec 6100 Series Part 2 Model 6100 Basics 2 In the Program listing area of the display select a program by clicking on a program to highlight it NOTE Double click or press lt Enter gt mean the same thing From this point on double click will be used without referencing the key board Either method can be used itis your choice 3 Double click on the program The measurement window appears the stage moves for a dark reference measurement and reference reminder box opens NOTE UV program references are
72. red in a file called the stage program The Stage Program Editor is used to edit create or delete stage programs Stage List Window A stage program contains the position information necessary for measurements A total of up to 200 stage programs can be defined in the Stage Program List The areas of the Stage List window are 001 TEST 002 NANOSTANDARD 003 unused 004 dons test 005 unused 006 unused 007 unused 008 unused 009 unused 010 unused 011 unused 012 unused 013 unused 014 unused 015 unused 016 unused 017 unused 018 unused 019 unused 020 unused Figure 3 16 Stage List Window List Area The List window is the gateway to the Stage Program Editor and the list area has a scrollable list for the 200 programs The unused labels are reserved filing locations for new programs Each stage program must have a name assigned for identification NanoSpec 6100 Series 3 35 NanoSpec 6100 Series User Manual Command Buttons 3 36 Edit Delete Copy Move Print List Help Exit Edits the highlighted program number or if an unused program number is highlighted creates a program from scratch If you have selected an unused program number you must first enter the program name before defining parameters See Stage Editor Window section below After prompting deletes the stage program stored under that number NOTE Stage programs are used in measurement programs Do not del
73. rement and actual and measured film thicknesses N The Recalibration program performs linear interpolation between adjacent data points Itis recommended to interpolate within a wide film thickness range Entry Items The entry items are No 002 Recalibration Figure 3 15 Recalibration Window Name Enter a name for the file This name is usually used to identify what material or substance is being recalibrated Ensure there is a name entry Unit Enter the units of measurement to be used in the measurement The units are e A for Angstrom NanoSpec 6100 Series 3 33 NanoSpec 6100 Series User Manual e nm for nanometer e um for micrometer Actual Thickness Enter the Actual known thickness in these entry boxes Measured Thickness Enter the measured thickness in these entry boxes Two entries are needed but five entries give better accuracy Command Buttons The command buttons are Save Saves the recalibration parameters Graph Draws and displays the actual and measured parameter points in a graph Exit Returns the Recalibration List window Print Prints the parameters displayed on the screen Help Opens a content sensitive Help file 3 34 Nanometrics Part 3 Mastering The Model 6100 Section 7 Stage Program Editor Introduction The NanoSpec 6100 has the ability to automatically measure many pre define measurement points on a sample wafer The measurement points are defined and sto
74. rm Identification BINARY 1 byte lt ALTX gt Alarm Text Alarm list 0 notused Personal safety Equipment safety Parameter control warning Parameter control error Equipment status warning Attention flags Data Integrity 63 Reserved 1 2 3 4 5 Irrecoverable error 6 7 8 9 ASCII max 40 bytes ALCD ALID ALTX Description 06H 01H CALIBRATED Reported when the measurement of the Recipe is terminated 06H 02H NEW TEST Reported between the measurement termination of Sample and the next measurement 86H 06H 03H AUTOFOCUS ERROR Reported when an error occurs in Auto Focus 86H 06H 04H AUTO FOCUS Reported when Auto Focus is aborted ABORTED 86H 06H 05H STAGE ERROR Reported when an error occurs in Auto Stage 10 Alarm list Continued ALCD ALID ALTX Description 86H 06H 06H LOADER ERROR Reported when an error occurs in Auto Loader 86H 06H 07H TURRET ERROR Reported when an error occurs in Auto Turret Notes e In each item the setting of Do Do not of communication in the setting of the SECS message is available However ALID 3 4 is regarded as one item The error release report of ALID 3 to 7 is communicated when a certain measure is taken on the display screen showing the error when clicking Release or Acknowledge In ALID 1 2 no communication of a
75. rument to print the stage parameters on the system printer This button instructs the instrument to return to the Stage list window screen NOTE The Exit button clears all the parameters before returning to the Stage list screen The parameters should be save before activating this button Nanometrics Wafer Size Exclusion Parameters Tab Pages NanoSpec 6100 Series Part 3 Mastering The Model 6100 This screen area displays the wafer size This display information can not be edited The wafer size is set in the Create New Stage Program when unused list number is selected Plesase Enter Program Name and Select a Sample Shape Program Name Herbs Sample Shape 2 Inch Wafer o Cancel Figure 3 18 Create New Stage Program Dialog Box The Exclusion area contains two sliding scale selectors The first selector is used to set the radius exclusion from the wafer edge This is the area that not measurement points can be defined in The unit of measurement is mm The second selector is used to set the offset from the wafer center In the tab page area there is seven pages containing different methods of locating measurement points Some pages use the X Y position entry area but some pages do not The page that do will be so noted 3 39 NanoSpec 6100 Series User Manual Manual The Manual tab page is used to enter X Y positions manually The joystick mouse or
76. scussion the Stage Editor window has been divided into the following areas program name X Y position wafer position display command buttons wafer size exclusion parameters and tab pages The Program Name is the main identification for the program and must be present If the name is not present insert a name immediately The name should be a short description of the program characteristics Example Left 25 points or Standard first deposit etc 3 37 NanoSpec 6100 Series User Manual X Y Position Wafer Position Display Command Buttons Load Video A F Save Print Exit 3 38 The X Y position area is an area that measurement position can be entered manually by X and Y numerical positions The position can be entered with the joystick mouse or keyboard The X Y position is expressed in millimeters mm The wafer position display is a graphical display of the wafer showing defined measurement points There are six command buttons This button instructs the instrument to load a wafer The instrument moves forwards to allow loading with a wafer wand If the Auto Loader is present Model 6150 the instrument will automatically load a wafer from the wafer cassette This button turns On Off the video camera image This button instructs the instrument to auto focus A E on the wafer This button instructs the instrument to save the defined stage parameters This button instructs the inst
77. se items are the elements of a program Program Maintenance Screen NanoSpec 6100 Series This screen is called the maintenance screen because of the ability to delete copy and move program files To enter the Maintenance screen 1 Click on the File item in the Menu Bar 2 Click on the Program item in the drop down menu 3 Click on the Edit item in the extended menu The Maintenance screen will open Oxide on Silicon Nitride on Silicon 10X Edit Neg Resist on Silicon 10 PolySilicon on 10004 Oxide 10 Neg Resist on 1000A Oxide 10X Delete Nitride on 1000A Oxide 10X DEMO Resist 008 Wacker Poly on Oxide Copy Polyimide on Silicon 10 Pos Resist on Silicon 4X Pos Resist on 1000A Oxide 4X 480nm Absolute Reflectance 10 Thick Oxide 10 TET Dyed Resist on Silicon 10X Print List Dyed Resist on 1000A Oxide 10 25 Pt UY thin Oxide Help UY Thin Oxide 15X UY Thin Nitride 15X UY Oxide on Polysilicon 15X Exit UY Oxide on Aluminum 15X Move Figure 3 4 Maintenance Screen On the right side of the screen the following buttons are located 3 15 NanoSpec 6100 Series User Manual 3 16 Edit Delete Copy Move Print List Help Exit This button loads the highlighted program into the program editor and opens the Program Editor screen See Program Editor Screen section below This button is the main maintenance button Pressing this button with a highlighted program i
78. surement was taken is saved with the data When the Date and Time button is clicked an additional dialog box opens Search for Data by Date and Time IX Search for Data by Date and Time Ix Specify Time MD n GEC ca e Figure 2 7 Date and Time Dialog Box Use the spin dials in the Start and End boxes to narrow the range Check the Specify Time box if time is to be used The check box in the upper left corner is used to enable the Date and Time search criteria NanoSpec 6100 Series Users Manual Sample ID The Sample ID if there is a wafer identification code is saved with the data The above items allow the database to be searched and narrows the search to specific criteria Search Button The Search button starts the search with the selected criteria At completion the Search Results window opens Exit Button The Exit button cancels the search operation and returns to the operation screen Search Results Window After search completion the Search Results Window opens This window displays a list of all wafer measurement data found in the database fitting the search criteria Find Results View Edit A EA 1998 09 02 1998 09 02 1998 09 02 1998 09 02 Figure 2 8 Search Results Window Select highlight a measurement set and click on the Simple Data button The Display Measurement Data window opens Display Measurement Data
79. taken every two hours VIS program references are taken every four hours 4 If the reference time is within your limit click on No 5 If the reference is out of your limit click on Yes The stage moves to allow you to load wafer 6 With wand load a sample wafer 7 Click OK The stage moves and takes the measurement and displays the measurement in the Measurement Screen 2 7 NanoSpec 6100 Series Users Manual Measurement Screen The Measurement screen is the work area that is used to display measurement data To aid in the discussion the display is divided into four areas The display areas are Information Band Thickness 0 02275 000 000 Z een Display Area Minimum Maximum Range Display Type x 000 000 Y 000 000 Action Buttons Figure 2 3 Defining the Measurement Screen Information Band Display Area Display Type List Button 2 8 The Information Band displays Program and Sample ID The Display Area sets up the data into a visual presentation There are three display methods List Graph and Map The Display Type has three buttons and two stage numerical position displays The List button is the default display in the above display area The list is numerical measurement data Nanometrics Part 2 Model 6100 Basics Graph Button The Graph button displays the measurement data list in an i
80. tem Controller Tower The System Controller Tower is the main electronic control center for the M6100 instrument The controller tower houses four D C power supplies X Y Z stage axis electronics electronic focusing control board and system A C power distribution bus Controller Front Panel Controls Emergency Power Off Button Power On Button Power Off Button The three main front panel controls are available The first front panel control is the Emergency Power Off Button This button is a large red button on the upper right hand corner of the front panel This button is over size and set within edge cup This is to ensure that the button is not depressed by accident The button is depressed to remove all equipment A C power When the Emergency button is pressed the main A C power circuit breaker switch has to be cycled to restore the equipment A C power The main Power On Button of the Model 6100 system is a round button located on the upper right section and under the Emergency Button The power on indicator is a amber lamp luminating the Power On Button The main Power Off Button of the Model 6100 system is a round button located on under the Power On Button The power off indicator is a amber lamp luminating the Power Off Button Controls Behind the Panel Door Computer Controls and Indicators UV Lamp Power NanoSpec 6100 Series The computer indicators and controls are present on the computer front panel an
81. the Model 6100 Features consists of the following This section is a general overview of the Model 6100 its capabilities system components and controls and indicators The section covers precautions pre operation procedures power up and initialization procedures and power down procedures Nanometrics V vi Part 2 Learning the Model 6100 Process Basics con sists of the following Section 1 Basic Windows explains everything operators need to know to operate the Model 6100 logging on and off selecting measurement programs taking reference scans taking measurements of the sample wafers displaying and printing raw measurement lists and interferograms of these measurements and creating maps of film thickness uniformity from current measurements Section 2 Maps of Film Thickness explains how to view lists and statistics associated with saved measurements and how to create maps of film thickness uniformity from current measurements The measurements stored here can be used in the creation of maps of the uniformity of film thickness on wafers or in statistical analysis Part 3 Mastering the Model 6100 Features consists of the following The information contained in this section is important to process engineers who must design custom measurement programs Section 1 Introduction gives a general overview of the process of creating or editing measurement programs for the Model 6100 Section 2 User Editor
82. the measurement data in a database and clears the data from the screen The screen is ready to start another measurement The Calib button saves the measurement data and closes the measurement window and returns the Main Operation Screen The Video button is a toggle button This button turns the video image window on off The video image is a overlayed on the screen Measuring a Sample 2 10 After you have selected a program and performed the reference scans the instrument is ready to take measurements The general procedure to measuring a sample is the following 1 Place a sample wafer onto the stage 2 Using the A F button focus on the wafer 3 Position the stage so that the lens is over the desired measurement spot 4 Select the appropriate program 5 Using the Meas button measure the sample Nanometrics Part 2 Model 6100 Basics Section 2 Film Thickness Maps Introduction Kinds of Display Kinds of Maps NanoSpec 6100 Series A special feature of the Model 6100 is the drawing of contour thickness maps These contour maps are only drawn after the sample measurements are stored in the database This section will describe how to create and display a contour map The Map program uses film thickness measurement data to extrapolate an image called a map which gives you a graphic representation of the uniformity of film thickness on a sample wafer The measurement data must contain three or
83. the most detailed level of the screen displaying the database in the Engineering Mode With a single click of the right button a pop up menu appears on this screen This menu gives you the choice of all the menu options at the top of the screen when the left button is already engaged in selecting highlighting multiple measurements when the cursor is in the User ID field of the Logon window A single click of the right button shuts down the system Names given to unlabeled screens or windows for convenience of reference are capitalized and appear in quotes such as GRAPH DISPLAY SCREEN Program names not displayed as the name of a window screen field or menu option are initial capitalized such as the Engineering Mode or Operations Mode Screen prompts or messages which are not part of the above mentioned screens or windows are shown bold and in quotes An example is Measuring In this manual the following terms are defined below The left side switch on the track ball press and release quickly Double Click Two successive clicks in a short interval Nanometrics Drop down Menu Log on Log off An appearing menu when clicking on a menu item Entering User ID and Password to enter the software program with operator or engineer privileges Removes the previous User ID and prepares for the next Log on Federal Communications Commission Radio Frequency Interference Statement Instructio
84. ting this item gives the user the ability to access the Measurement Program Editor From the Measurement Program Editor the user can create edit and delete any measurement program This item selection will be assigned to most process engineers and service engineers Recalibration Selecting this item gives the user the ability to access the Lens Parameter dialog box This item selection will be assigned to most service engineers Stage Program Selecting this item gives the user the ability to access the Recalibration Dialog Box This item selection will be assigned to most service engineers and selected process engineers Loader Program Selecting this item gives the user the ability to access the Stage Program From the Loader Program the user can create edit and delete any stage program This item selection will be assigned to most process engineers and service engineers If the system contains a loader and system is configured for the loader this item becomes active and selecting this item gives the user the ability to Nanometrics Secs Setup Part 3 Mastering The Model 6100 access the Loader Program From the Loader Program the user can create edit and delete any loader program System Shutdown Selecting this item is only possible whenever the system configuration has installed SECS This item gives the user the ability to access the SECS Setup menu This should be a default selection for t
85. tion to the differ ence of the values of FILM TYPE 2 Standard style S6 F3 M H E reply Description Sends data per sample Structure L 3 1 lt DATAID gt Signed Integer 1 1 2 lt CEID gt Signed Integer 1 1 3 L n 1 n number of measuring points 1 L 2 1 lt DSID1 gt Unsigned Integer 2 0 2 L 6 1 L 2 1 lt DVNAME1 gt ASCII 10 PROGRAM NO 2 lt DVVALI gt Unsigned Integer 1 2 L 2 1 lt DVNAME2 gt ASCII 9 SAMPLE ID 2 lt DVVAL2 gt ASCII 18 3 L 2 1 lt DVNAME3 gt ASCII 8 WAFER ID 2 lt DVVAL3 gt Unsigned Integer 1 4 L 2 1 lt DVNAME4 gt ASCII 7 SLOT NO 2 lt DVVAL4 gt Unsigned Integer 1 5 L 2 1 lt DVNAMES5 gt ASCH 7 USER ID 2 DVVALS5 ASCII 16 6 L 2 1 lt DVNAME6 gt ASCII 4 UNIT 2 lt DVVAL6 gt ASCII 3 kk 2 L 2 1 lt DSID2 gt Unsigned Integer 2 1 n 2 L 5 1 L 2 1 lt DVNAMEm gt ASCII 5 MEAS1 2 lt DVVALm gt ASCII 10 2 L 2 1 lt DVNAMEm 1 gt ASCII 5 MEAS2 2 lt DVVALm 1 gt ASCII 10 3 L 2 1 lt DVNAMEm 2 gt ASCII 5 MEAS3 2 lt DVVALm 2 gt ASCII 10 4 L 2 1 lt DVNAMEm 3 gt ASCII 4 XPOS 2 lt DVVALm 3 gt ASCII 8 5 L 2 1 lt DVNAMEm 4 gt ASCII 4 YPOS 2 lt DVVALm 4 gt ASCII 8 kk 2 L 5 Limited only to the number of measuring points the contents between and are repeated Description of lt DATAID gt and lt CEID gt 1 lt DATAID gt Signed Integer 1 byte 1 the value is
86. to help create programs and maintain the system The System Administrator should be the only person having access to the User Editor screen and assign selective privileges to other users All users should have password privileges that way they can change their own password Refer to User Editor Screen on page 3 10 The Process engineer is a user that needs the privileges to create edit and delete programs The possible privileges assign to the process engineer are e Program e Measurement e Stage Program Loader Program e Password And possibly the following optional privileges e System Shutdown e Data Maintenance 3 9 NanoSpec 6100 Series User Manual Service Engineer Operator User Editor Screen 3 10 Recalibration e SECS Operation e SECS Setup The Service engineer is a user that needs the privileges assigned to the process engineer and the following additional privileges e Password Lens Parameter Gain Setup Model6100 Setup Maintenance Menu The Operator is a user that needs minimal assigned privileges The minimal are e Password e SECS Operation optional The User Editor screen should only be available to the System Administrator This allows the system administrator have people trained before allowing access to certain system functions To enter the User Editor click on the File item in the Main Menu Then click on the User item in the drop down menu Nanometrics Part
87. tride Book 004 CauchyS Negative Resist 005 CauchyS Positive Resist 006 nkTable a Si 007 CauchyS Polyimide 008 nkTable Polysilicon Table i EDIT Edit 009 nkTable Silicon 480 900nm 010 CauchyC Silicon Visible 011 nkTable Cr 012 nkTable Cr203 013 nkTable Poly Silicon 014 nkTable UV Oxide Copy ADAP Import 015 nkTable UV Nitride 016 nkTable NiFe Delete Operate Buttons After Select the List Item Exit kp Figure 3 10 Create Material Screen From this screen the user can create a refractive constant file copy a predefined file and edit it to create a modified file or edit a predefined material file to adjust the refractive constants Nanometrics Create New Buttons Cauchy without k Part 3 Mastering The Model 6100 When the user wants to create a new material file click on one of the three buttons Graph Print Save Exit NanoSpec 6100 Series The Cauchy without k button opens a dialog box to entered polynomials to describe n as a function of wavelenght The Cauchy formula is lambda 4 wavelength in nm Nb Nc Material Name r Cauchy Const Ns Mb Ne r Mavelengit Range nm Graph Print Save Exit Figure 3 11 Cauchy without k Dialog Box Insert the minimum and maximum Wavelength Range in nanometers into the entry boxes Command Buttons
88. udy DEBUG UY THIN OX MAP 4 Tegal Resist on Poly on quartz Candescent Tegal Poly on Quartz GAUGE STUDY OXIDE VISIBLE 4X GAUGE STUDY OXIDE VISIBLE 10X GAUGE STUDY OXIDE VISIBLE 15X GAUGE STUDY OXIDE VISIBLE 40X GAUGE STUDY UV Thin Oxide GAUGE STUDY Nitride on Oxide 4X GAUGE STUDY Nitride on Oxide 10X GAUGE STUDY Nitride on Oxide 15X GAUGE STUDY Nitride on Oxide 40X GAUGE STUDY Poly on Oxide 4X GAUGE STUDY Poly on Oxide 10X GAUGE STUDY Poly on Oxide 15X 49 points 8 inch 40X JAMES TEST DEMO 6100 BCB on Si 49pts Oxide on Si 25pts Figure 2 2 Basic Operator Screen Title Band The title band displays the screen title Menu Bar The menu bar displays the available option items The options are Edit All functions in this menu item are deactivated for the User assigned with no privileges Maintenance This menu item has drop down menu items Reference Info selecting this item opens an information window showing the Date and time when the last Nanometrics User Identification Band Program Listing Area Action Button Area NanoSpec 6100 Series Part 2 Model 6100 Basics reference was taken Delete Reference selection this item deletes the reference measurement stored in memory Data This menu item contains the following Process Last Saved Measurement Result measurements are automatically saved to a database This item allows the operator to process data after all measurements are completed Pro
89. used to learn the characteristics of a material when defining custom test programs or to monitor before and after effects of a process Use Program 12 with any lens However measurements under 380nm requires the UV option with the 15X reflecting lens In a process using mercury vapor lamps to expose photolithographic resist wavelengths of 405 436 and 546nm should be specified Mercury vapor produces strong emissions at these wavelengths and the reflectance of the resist is low since it absorbs light rather than reflecting it For incandescent lights wavelengths of 410 530 and 650nm might be suitable Incandescent light emits a continuous spectrum with representative wavelengths in the violet yellow green and red portions of the spectrum Measurement time may be varied between 0 1 and 32 7 seconds in steps of 0 1 seconds Longer times can be used at any wavelength but are particularly recommended when measuring wavelengths below 400nm Repeatability is substantially improved when measurement times are longer than 3 seconds If reflectance measurements are questionable for any reason try increasing the standard measurement time of 2 5 seconds For example if one or more wavelengths is 400nm or less the accuracy of the measurement may be reduced due to the low signal to noise ratio at short wavelengths A 2 Nanometrics Appendix A Program 13 Thick Films This program scans the sample from 720 to 760nm at a slower than standard sp
90. xit Shutdown item and select e Exit to Windows if you want to shutdown the Nano system software Shutdown Windows if you want to shutdown the complete system NanoSpec 6100 Series 1 3 NanoSpec 6100 Series User Manual Section 2 System Components The following simplified drawing of the Model 6100 gives you a visual reference for a discussion of the system s hardware components Measurement System otage In the Model 6100 the spectrophotometer head is mounted on a customized microscope that uses a regulated tungsten halogen lamp to provide vertical reflected light illumination The standard microscope is equipped with a four position turret The lenses are 4X 10X and 40X An optional 15X ultraviolet UV lens is available The 40X lens is the system parfocal and parcenter lens Optional Scanning UV System Systems equipped with the optional UV scanning includes a deuterium UV light source an accompanying power supply an UV light shutter an UV optimized beamsplitter an automatic variable exit aperture and a 15X reflecting UV objective lens The Model 6100 stage is capable of accommodating 100mm 150mm wafers or 150mm 200mm wafers The stage is automatically driven to predefined measurement points These points are defined in the stage editor The standard Model 6100 stage is the manual loader model and Model 6150 stage accommodates an optional automatic loader Nanometrics Perusing Model 6100 Sys

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