Matdev Lab Dox AET - Oregon State University
Contents
1. Turn off the gas cylinder 11 Leave the air on 12 Turn off the RTA system by pressing the round red STOP button on the front of the system About this document This document was generated using the LaTeX2utTmz1 translator Version 97 1 release July 13th 1997 Copyright 1993 1994 1995 1996 1997 Nikos Drakos Computer Based Learning Unit University of Leeds The command line arguments were latex2html t AET THERMAL RTP User Manual split 0 show _section_ numbers no_ navigation AET RTP tex The translation was initiated by bossman bossman on 7 4 2001 bossman bossman 7 4 2001 OSU College of Engineering webmaster engr orst edu Oregon State University Web Disclaimer Committed to Diversity2. Thursday January 30 2003 Home Matdev Lab Dox AET RTP AET THERMAL RTA SYSTEM OPERATION MANUAL FOR ANNEALING OF THIN FILMS By Paul Keir Sept 26 1996 and revised by Jeff Bender July 4 2001 Reference Persons Jeff Bender Randy Hoffman Department of Electrical and Computer Engineering Oregon State University 1 INTRODUCTION The AET THERMAL RX SERIES Rapid Thermal Annealing RTA system is a modern computer controlled annealing system The RTA system is used to anneal thin films and devices at high temperatures for relatively short periods of time The maximum temperature that this system is capable of annealing at is 1200 C The system is water cooled to quickly bring the system down from elevated temperatures to room temperature Presently the system is set up to run forming gas 10 H2 90 N2 mixture O2 Ar N or an O2 Ar mixture during the annealing cycle Additional non toxic gases may be procured and used with the system if necessary 2 OPERATION 2 1 Preliminaries The RTA system does not allow the user to open the door to the chamber until several preliminary steps have been performed The preliminaries are as follows 1 Turn on the computer monitor e The monitor on off switch is on the rear right hand side of the monitor screen 2 If the computer is not turned on or is at the MS DOS prompt perform the following actions a Turn the computer on by hitting the round blue switch
3. gently lifting the handle and pulling outwards e Itis important to gently open the chamber door because the sample holding wafer is not affixed to the chamber and could easily fall out of place Place the sample on the silicon wafer resting on the RTA sample tray e Itis very important to make sure that the two thermocouples are properly situated The left thermocouple should be in contact with the 4 silicon wafer the right thermocouple should be in contact with the top of the sample you are annealing If this is not the case the system will not be able to properly read the temperature inside the chamber this may even lead to overheating severe enough to melt your sample e It is also important to NEVER RTA SAMPLES WITH ORGANIC MATERIAL e g PHOTORESIST Gently close the door to the chamber remembering to pull up on the handle while closing the door Press the number corresponding to the START button displayed in the lower right hand corner of the screen and hit ENTER to begin the process Press followed by ENTER to cancel the process The screen should display the ideal recipe screen seen previously The process should now begin its cycle e The measured process data will be displayed as the process runs its course e An RTA system guru should be notified if any major deviations 25 from the ideal process occur e RECORD THE TIME USER NAME RECIPE AND GAS USED AND MOST IMPORTANTLY THE MATERIAL BEING RTAed che
4. he selected recipe Press ENTER to proceed 10 A schematic of the RTA system should now be displayed e There should be several options displayed in the lower left corner of the screen e SYSTEM READY should be displayed in the lower right hand corner of the screen e Ifthis recipe is incorrect the 0 key should be pressed to exit to the main menu 11 Turn on the RTA by pressing the large green start button on the front face of the system 12 Turn on the cooling water RETURN valve located behind the RTA system 13 Turn on the cooling water SUPPLY valve located behind the RTA system 14 Check that the compressed air supply valve is open 15 Connect the desired process gas to the gas inlet on the back left of the RTA system e Usea wrench to tighten the Swagelok fittings just slightly past finger tight e Turn on the main valve of the gas tank The pressure on the low pressure side of the regulator should be no more than 30 psi e Note the mass flow controller which should adjust the gas flow rate is not currently operating properly Until the problem is fixed the gas flow needs to be set by adjusting carefully the regulator on the gas tank The flow rate will be displayed on the screen after the process has been started 2 2 Operation Now the system should be ready to operate The procedure for loading the sample and running the experiment are as follows 1 Slowly open the door to the chamber by
5. mical formula INTHE RTA USAGE LOG located on the computer stand 2 3 System Shutdown Following completion of the process it is necessary to shut down the RTA and remove the annealed sample from the RTA chamber 1 When the system has finished with its cycle the system schematic screen should be displayed e The actual temperature inside of the RTA chamber should be displayed inside the bow representing the RTA chamber 2 When the chamber has cooled below 100 C the sample should be removed e Press 0 to stop the compressed air and unlock the chamber door e Remember to GENTLY open and close the RTA door while removing your sample 3 The software will ask if you wish to save your run Normally answer N 4 The software will ask if you want to start again e Ifyou want to run the same recipe again press Y The computer returns to the wafer identification screen Load a new sample and proceed as above e Ifyou want to run a different recipe press N The computer returns to the RUNS menu Load a new sample and proceed as above e Ifyou are done using the tool press N The computer returns to the RUNS menu Proceed with the shutdown procedure below 5 Press 0 to return to the main menu 6 Press X toreturntoDOSor 0 to return to the User ID screen T Turn off the computer monitor leaving the computer on Turn off the cooling water SUPPLY valve 9 Turn off the cooling water RETURN valve 10
6. on the CPU case b Press the CAPS LOCK button on the computer keyboard c Type RTP at the C DOS prompt to activate the system control software Login to the system by entering your user name and password If you do not have a user name and password you are not authorized to use this system To obtain a password inform an RTA system guru that you need to be trained on its use These are currently Randy Hoffman and Jeff Bender Select the RUNS option number 2 from the main menu Select the ADD A NEW RUN option from the submenu The system will ask for a WAFER to identify the process run This can be any text but must be unique Some hints for entry of the data are If 0 or BLANK isentered the system will exit to the main menu If is entered the software will provide a list of all wafer numbers currently on record If you do not plan to store the run to the hard drive you may simply enter a dummy wafer ID The system will now ask for a RECIPE to tell it which process sequence to run Press If 0 or BLANK isentered the system will exit to the main menu If is entered the system will display a list of available recipes If the recipe that you seek is not currently available consult an RTA system guru to create the required recipe ENTER several times to accept the default options The system will now display the ideal temperature and gas cycles versus process time for t
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