Operational Procedures for the Thin Film Stress Instrument
Contents
1. 2 The surface of the wafer must be reflective for the laser to bounce back into the detecting device Rough surfaces will affect the measurement 3 The film stress measurement is inversely proportional to the square of the wafer thickness Therefore the wafer thickness must be measured before using the FLX 2320 Accuracy of this measurement should be in the hundred micrometer range 4 Measure the wafer both before and after depositing a film Film stress is calculated using by comparing both measurements 5 Proper placement of the wafer in the locator ring is crucial for the instrument to function Verify that the wafer is in the correct position before closing the cabinet door 6 DO NOT open the cabinet door while the wafer is being measured 3 1 Measuring Wafer Thickness The wafer thickness is a required field for operating the FLX 2320 Any tool that can accurately calibrate the thickness of the wafer will work The Ultra Digit Mark IV a stylus micrometer is ideal for this task This tool uses a stylus to take measurements and displays the reading in an LCD face in either inches or millimeters mm will be used for the FLX 2320 Figure 6 Ultra Mark IV micrometer Used to measure wafer thickness Easy to read liquid crystal display face Readings can be taken in inches or millimeters DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 9 of 13 Copyright 2004 The University of Texas at Dallas2. The procedure for creating the 3 D deflection map can be found in the User Manual Section 7 5 1 User Manual is located at the stress machine station DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 12 of 13 Copyright 2004 The University of Texas at Dallas UT D 4 CONCLUSION The FLX 2320 is a thin film stress instrument that uses a laser scanner to measure the changes in the radius of the curvature of the substrate caused by deposition of a thin film on a wafer The procedure for the most common use finding the deflection of a wafer due to a thin film deposition is outlined in this paper Other functions of the thin film stress instrument are the stress temperature mode for which the hot plate is used and time stress mode The details of these functions and the related data collection can be found in the User Manual located at the stress machine station DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 13 of 13 Copyright 2004 The University of Texas at Dallas
3. the film is stretched to fit the substrate and causes the edges of the wafer to curl upward or compressive the film is larger than the substrate and causes the wafer edges to bow downwards The FLX 2320 thin film stress measurement instrument determines the stress on the substrate by comparing the curvature before and after deposition This stress measurement can then be used to make corrections in deposition procedures 2 1 Components The thin film stress machine is a tabletop system consisting of a measurement unit a computer and a computer keyboard with a built in track ball Figure 1 shows the measurement unit components with the door shut and Figure 2 shows the inside of the cabinet DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 4 of 13 Copyright 2004 The University of Texas at Dallas UT D Temperature Heat Fan Laser Power Display Switch Switch Keyswitch Switch Instrument Door Figure 1 Photograph of the measurement unit Shows the instrument panel with the door closed Temperature Display Displays the temperature cooling and heating cycle used in the stress temperature mode Heater Switch Turns heater on for stress temperature measurements Fan Switch Turns the fan on off Must have the fan on for stress temperature measurements Laser Keyswitch Turns the laser on off Must be in the On position when in operation Power Switch Must be in the On position for operating this
4. Ch Operational Procedures for the Thin Film Stress Instrument Emma Dietholm Thin Films April 13 2004 YAA AEO OEA O A O A O A O O 4 al FLX 2320 DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 1 of 13 Copyright 2004 The University of Texas at Dallas THE UNIVERSITY OF TEXAS AT DALLAS ERIK JOHNSON SCHOOL OF ENGINEERING REVISION HISTORY APPROVAL DATE COMMENTS ORIGINATOR AUTHORITY 01 04 13 04 Initial Draft Emma Dietholm DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 2 of 13 Copyright 2004 The University of Texas at Dallas UT D Operational Procedures for the Thin Film Stress Instrument Emma Dietholm April 13 2004 TABLE OF CONTENTS 1 INTRODUCTION srini aa E EAOa aE ERE EEES 4 TP POND OS O e E E EE E E EE E E 4 Te CODO ea nese Error Bookmark not defined To RUG CIC ace ceceecxeneeraceseccaceacuusesiecemeeisos Error Bookmark not defined TA Definitions esient de cccteedeccyncedneiowesces Error Bookmark not defined Te PACH ONY S ernieren nnie eeii AEREA Error Bookmark not defined 2 PRIME Stress MAS UNUM IN sessa n AEn Ian 4 2 1 OND OIS INS oscaterenccanenehireccenakeananctsteaneanedeesacnetwetequmeder eum EEE EEEE EAEE EEEE EEEE 4 22 TROON a A E E E E E EE E 7 2 2 1 Additional CalCulations cccccccscccssececceceeceteneeeeeeseeeteneeteneesaeeeas 8 2 3 Measurements siasrwivinwnuneipavcivieewdausi
5. UT D Figure 7 Operating the micrometer 1 Place the micrometer on a level surface Turn on the device Set the display reading to mm 2 Before taking a measurement of the wafer zero the micrometer This is accomplished by lifting the stylus and releasing it Adjustments are made using the front knob 3 Lift the probe and place the desired wafer on the stage of the micrometer 4 Lift the stylus and gently release The reading will appear on the display 3 2 Operating the Thin Film Stress Instrument The PC for the stress instrument uses WINDOWS 3 1 It controls the measurements data accumulation and calculations To begin using the stress machine the power switch and the laser keyswitch must be in the on position The hot plate will not be used for normal stress measurements Place the wafer flat in the locator ring see Figure 3b and shut the instrument door The following procedure is used for maneuvering within the parameters of the computer program 1 Double click on the Winflx icon 2 Select a user name or create a new user see Figure 8 Login User Name Select User tm 1 s rmnple user v Now Figure 8 User Login Select a user or create a new one DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 10 of 13 Copyright 2004 The University of Texas at Dallas Film Wafer Identification Click on Measure Wafer thickness um Figure 9 F
6. eriaaesiavienesjavrsacriavendecisvinacsieventeadeesneeds 8 3 PROCEDURE aeniccatt eee cores ce ct eesti vesaseveneredemsteratenssvreterstiereserssewetersteneternsersieesin 9 3 1 Measuring Wafer THICKNESS ccccecccececeeeceeeeneeeceeeceeeeneeesaeeeaueeneeeneeesaes 9 3 2 Operating the Thin Film Stress Instrument cccceseeeeeseeeeeeeeeeeeeeees 10 9 9 Deflection Maps swousaansnaranuranannnirnwaronoanavixdvelleyaxeusVewimeusvevereusvaxsvexiveveusxevexer 12 A CONCEUSION serr E E E 13 DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 3 of 13 Copyright 2004 The University of Texas at Dallas 1 INTRODUCTION The FLX 2320 is a thin film stress machine A laser scanner is used to measure the changes in the radius of curvature of the substrate caused by the deposition of a thin film on the wafer This is accomplished by first measuring the wafer curvature before the film is deposited and then re measuring the curvature after the film is deposited A well known mathematical relation is then used to calculate the stress of the thin film 1 1 Purpose This document will cover the basic theory and operation of some of the most routinely used features of the Thin Film Stress Measurement instrument 2 Thin Film Stress Instrument Thin film stress is induced when materials having different coefficients of thermal expansion are bonded together Stress caused from deposition to a wafer can be tensile
7. he wafer using the micrometer Place the wafer on the locator ring and close the cabinet door 10 Follow steps 1 and 2 listed above This time choose Single from the Measure menu Enter the fields in the dialog box A particular wafer can be selected from the ID pull down menu Enter the correct wafer thickness and any relevant comment such as type of film deposit 11 Click Measure and the instrument will start as in step 6 Repeat steps 7 and 8 3 3 Deflection Maps A 3 D view of the deflection over the wafer can be created by taking several measurements at different angles Both before and after deposition of film measurements can be used to create this graph To create this 3 D view the wafer is measured at incrementing angle 0 to 180 with 30 increments works well After each measurement the wafer is removed from the cabinet and the locator ring is rotated see Figure 3 DEFLECTION MAP Filename Dfl3d1 2 00to 250 1 50to 200 1 00to 1 50 E 0 50to 1 0 B 0 00 to 0 50 B 0 50to 0 00 7 1 00 to 0 50 ij 1 50to 1 00 J 2 00 to 1 50 E T 50 R 45 M 1 0 1 06 1 93 Scan Comment 2 49 ID 1 Diameter 75 or Help press F1 5 FLEXUS_ADC_EXE pa scanapp WINFLY Windows Ap lt gt PLOT3D Windows 4p Figure 9 3 D deflection graph of a wafer For this graph 30 increments were used to measure the wafer The different levels of stress are color coded across the wafer
8. instrument Instrument Door Door must be closed for the instrument to operate DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 5 of 13 Copyright 2004 The University of Texas at Dallas UT D Beam Hot Plate Hot Plate Cover Leveling Attenuator with Locator Ring Screw o Figure 2 Inside of the instrument cabinet Beam Attenuator Blocks the laser beams mechanically when the door is opened Hot Plate Used in the stress temperature mode Hot Plate Cover with Locator Ring This is where the wafer is placed see Figure 3a Leveling Screw Used to level the instrument when relocated Locator Ring gt Figure 3a Ring Locator used to position Figure 3b Wafer in Ring the Locator the wafer Notched edges indicate angle of rotation used for creating 3 D deflection graphs DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 6 of 13 Copyright 2004 The University of Texas at Dallas UT D The Locator Ring is used to position the wafer in the instrument Positioning the wafer correctly is crucial the instrument will not make any measurements when the wafer is improperly inserted Place the wafer in the ring with the notch to the front The wafer should sit flat in the locator ring To create a three dimensional view of the wafer stress the locator ring can be repositioned in 30 increments Measurements can be taken from 0 to 180 to prod
9. irst Measurement Double click on the Winflx icon Select a user name or create a new user see Figure 8 Select Measure from the pull down menu click on First The window in Figure 9 will appear This will be the measurement prior to film deposition Select or enter a file name One file name can be used for many wafers or a new file name can be given to each wafer Double click on your selection Enter the information on the remaining fields ID is to identify the wafer Orientation is the orientation of the wafer Comments can be used for additional information and Substrate thickness is the measurement taken using the micrometer Click Measure in the First Measure dialog box The instrument will start and you will hear a series of beeps When the process is complete a graph of the substrate deflection will appear To save a graph to a data file choose Save As form the file menu and enter the name for the graph and click OK Ifthe sample is measured again using the same ID a second record is created and saved without overwriting the first For calculations the last measure will be used Close all windows and exit the program This completes the reference measurement DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 11 of 13 Copyright 2004 The University of Texas at Dallas UT D Measuring the wafer after film deposition 9 Measure the thickness of t
10. rements The FLX 2320 measures the deflection bowing of a wafer using a laser beam The laser makes two complete passes across the wafer An initial measurement reference with no film is required to calculate the deflection resulting from the thin film deposit The collected and calculated data is compiled in a spreadsheet format The visual results can be viewed in graphic form Thin film stress will be either tensile or compressive stress If the film has tensile stress its atoms are farther apart than they would like to be The film will try to contract bowing the substrate resulting in a concave appearance The film is being stretched to fit the substrate Tensile stress may result in microcracking of the thin film If the film has compressive stress the film will try to expand causing the substrate to bow the film in a convex manner The film is compressed to fit the substrate Compressive stress may result in buckling See Figure 5 Compressive Stress Convex curvature Tensile Stress Concave curvature Film Substrate Figure 5 Stress Diagrams Film is in red substrate is in black DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 8 of 13 Copyright 2004 The University of Texas at Dallas UT D 3 PROCEDURE Before taking stress measurements with the FLX 2320 it is important to note a few key details 1 This instrument works only on blank wafers patterned wafers will not work
11. uce the 3 D graph 2 2 Theory The thin film stress instrument measures the changes in the radius of the curvature of the wafer caused by a deposition of thin film The stress of the thin film is calculated from this measurement using the given equation and variable explanation o _ Eh 1 v 6Rt E biaxial elastic modulus of the wafer 1 805E11 PA for 100 silicon wafer 1 v E Young s modulus defined as stress strain vV Poisson s ratio h wafer thickness m t film thickness m R wafer radius of curvature m 0 average film stress Pa 3 x Substrate Film Figure 4 Drawing of substrate deformed to radius R by the film deposition DOCUMENT TITLE Thin Film Stress Measurement DOCUMENT NUMBER EDITION 1 0 PAGE 7 of 13 Copyright 2004 The University of Texas at Dallas UT D The value of R is the effective radius It is obtained from the measurements both before and after thin film deposition R1 is the average radius of the substrate before deposition It 1s calculated by measuring as a function of x and a line regression R2 is the radius after deposition and is proportional to 1 R In equation format 1 gt Le 1 R R Ri which can be rearranged to obtain R the effective radius R 1 _ RiR2 1 1 Ri R Ro Ri 2 2 1 Additional Calculations Calculations and additional details on the diffusion elastic and the expansion coefficients can be found in section 9 3 of the User Manual 2 3 Measu
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