Park Systems Atomic Force Microscope
Contents
1. Sel Freq H2 327 517 Set Point 1 1260 pm Control Drive 53 7 E Refresh Zoom Ci Show Phase Show Fitting Amplitude Feedback Fig 4 typical frequency spectrum of the non contact cantilever Model ACTA First drag the red cross to set a drive frequency In general it should be set within the typical range as shown in Fig 5 Secondly drag the red horizontal line to set a set point In general the set point should be set below the red cross where the vertical distance between the red cross and the red line is from 400nm to 1000nm Note that the larger the distance the larger the feedback But it may result in larger noise Then click on OK Version 1 0 Page 8 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST Typical working frequency range Fig 5 typical working frequency range 4 5 Sample Loading Warning Beware that the sample is too high to hit the cantilever and the head during XY stage movement Warning Don t move the Focus stage down to and below 1000um 1 Fully lift the Z Stage 2 Unload the XY Stage 3 For 4 to 6 inch wafers place directly on the XY Stage Apply vacuum to fix the wafer 4 For small sample you may try to place directly on the XY Stage without the vacuum However the noise of the topography signal may be very large during scanning If so fix the sample on the sample disk using double sided adhes2. Don t move the Focus stage down to and below 1000um 1 With the help of the CCD vision in the Motors control window adjust the Focus so that the backside of the cantilever can be viewed clearly 2 Then adjust the two laser aligning screws located on the upper part of the XE 150S head to move the laser spot to the tip of the cantilever as shown in Fig 2 Fig 3 shows that the laser spot deviates from the correct position to a up b down c left and d right Version 1 0 Page 6 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST Fig 2 correct laser spot position on the backside of the cantilever Fig 3 some incorrect cases of laser spot position Version 1 0 Page 7 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST 3 Adjust the two screws for the steering mirror located on the front side of the head to maximize the A B signal first In general A B value will be more than 4V To keep maximizing the A B signal at the same time position the laser beam displayed as red dot on the screen to the centre of the PSPD so that both A B and C D signals are within 0 5V 4 Click on the NCM ASetup button The Frequency Sweep window will be displayed Click on the grid area and scroll the mouse to make the scale interval being 500nm The frequency spectrum of the cantilever should look like the one show in Fig 4 500nm reran Start Freq H2 325 033 End Freq Hz 330 033
3. Start or Scan Here to start the measurement Version 1 0 Page 13 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST 4 8 Sample Unloading 2 3 4 5 6 7 Enter the Scan Size to zero Move the Z stage up so that the separation between the cantilever and the sample is about 100um Click on Lift Z Open the door of the acoustic enclosure From the Active Vibration Isolation System s front panel press button E to disable the isolation The red LED of ISOL ON will be off and the small LCD panel will display ISOLATION DISABLED Unload the XY Stage Turn off the vacuum if the vacuum has been applied Remove the sample 4 9 Data Processing The first step is flattening Three examples will be given here Flattening Example 1 Grid patterns 1 2 3 4 5 Double click XEI icon to open the data analysis software Open a data file c spmdata Examples example1 tiff Select Process gt Flatten from the Menu bar Click on _ to select entire region In the parameters setting select Whole for the Scope X Axis for the Orientation 1 for the Regression Order 6 7 Click on Execute Change Orientation from X Axis to Y Axis Version 1 0 Page 14 of 18 8 9 NANOELECTRONICS FABRICATION FACILITY NFF HKUST Click on Execute again Click on OR Example 2
4. Stage down 2 don t adjust the Focus 3 don t move the XY Stage 4 don t click on NCM ASetup 4 7 Measurement 1 Look at the Topography line traces Since the Scan Size is set as zero now it shows the traces of zero scan see Fig 8 Version 1 0 Page 12 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST Tracef1 PAN Topography iv FA J9 T ee A vA i 1 Lo Fig 8 Zero scan traces Check that the zero scan traces are straight enough no matter leveling of the traces and neglect the amplitudes over the straight traces first Then check also the amplitudes are small enough for your application In Fig 8 the amplitude are about o 2A If the traces are not straight or the amplitudes are too large don t perform scan Move the Z stage up so that the separation between the cantilever and the sample is about 100um Click on NCM ASetup Try another drive frequency or and set point Approach again to see if it helps Otherwise the cantilever may need to be replaced 2 Enter the Scan Size It is suggested that start from lum first if you don t know much about the features of your sample 3 Adjust the Z Servo Gain in order to make the two line traces matching each other and repeatable You can increase the gain until there is no oscillation present 4 Adjust the Offset X and Y if necessary 5 Click on the
5. Bare silicon 1 2 3 4 5 6 In the XEI open a data file c spmdata Examples example2 tiff Select Process gt Flatten from the Menu bar R A Click on _ to select entire region In the parameters setting select Line for the Scope X Axis for the Orientation 1 for the Regression Order Note that Orientation must be set the same as the fast scan direction during measurement for Line Scope In this example the fast scan direction is X axis Click on Execute Click on OR Example 3 Surface with large particles 1 2 In the XEI open a data file c spmdata Examples example3 tiff In this example the data was flattened once according to the Step 4 of Example 2 Some dark shadows regions with lower height are seen near some large and tall particles as shown in Fig 9 Version 1 0 Page 15 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST Fig 9 Click on wa to select entire region 3 In the Histogram drag the left cursor and place it at Inm in order to unselect the regions where the height is larger than Inm 4 In the parameters setting select Line for the Scope X Axis for the Orientation 1 for the Regression Order 5 Click on Execute 6 Click on OK The result is shown in Fig 10 Version 1 0 Page 16 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST 4 10
6. Data Analysis Line Analysis 1 Inthe XEI select Analysis gt Line 2 From the toolbar at the right hand side of the image select slanted line or x axis line or y axis line first Click on the graph and a line will be shown on the image Drag the line to the line of interest 3 A corresponding Line Profile is shown on the right of the screen And Statistics such as roughness of the line are shown on the bottom 4 Repeat Step 2 for adding second line if necessary To display profiles for both lines at the same time simply click on any area of the image other than the two lines 5 Right click on the line profile to show a menu of useful items for doing some measurement on the profile Select them if necessary 6 Export the screen by selecting File gt Export Enter the file name and also the file type png or jpg or bmp Click on Save Region Analysis 1 In the XEI select Analysis gt Region 2 From the toolbar at the right hand side of the image you can select Entire Region Or click on the Inclusion icon first and then select Square or the Ellipse or the Polygon click on the graph and adjust the size place it on the area of interest Statistics are shown on the bottom 3 Export the screen by selecting File gt Export Version 1 0 Page 17 of 18 3D 1 2 3 NANOELECTRONICS FABRICATION FACILITY NFF HKUST In the XEI select Analysis gt 3D Drag the 3D im
7. NANOELECTRONICS FABRICATION FACILITY NFF HKUST Standard Operating Manual Park Systems Atomic Force Microscope AFM XE 150S Version 1 0 Page 1 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST Contents 1 Picture and Location 2 Process Capabilities 2 1 Cleanliness Standard 2 2 Features 2 3 Sample size 3 Contact List and How to Become a Qualified User 3 1 Emergency Responses and Communications 3 2 Training to Become a Qualified User 4 Operating Procedures 4 1 System Description 4 2 Important Cautions 4 3 Turn On the system 4 4 Laser Beam Alignment 4 5 Sample Loading 4 6 Cantilever Approaching 4 7 Measurement 4 8 Sample Unloading 4 9 Data Processing 4 10 Data Analysis 4 11 System Shutdown Version 1 0 Page 2 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST 1 Picture and Location Fig 1 XE 150S is located at NFF Phase II Room 2240 2 Process Capabilities 2 1 Cleanliness Standard Prior of any measurement samples should be submitted to NFF for approval 2 2 Features Non Contact Mode AFM Probe size 10nm in diameter 100 um x 100 um XY scan range Up to 12 um Z scan range Motorized XY sample stage travels entire 150 mm x 150 mm Version 1 0 Page 3 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST 2 3 Sample size Up to 6 inch wafer 3 Contact List and How to Become a User 3 1 Emergency Responses and Communications e Safety Officer Mr Win
8. age for adjusting the viewing angle Export the screen by selecting File gt Export 4 11System Shutdown 1 2 3 4 5 6 7 Make sure the sample has been removed If not follow steps of Sample Unloading Shutdown the computer Turn off the XY Stage controller and SPM controller From the Active Vibration Isolation System s front panel press button f for several times until the LCD displays SYSTEM UNLOCKED Then press button lt to lock the system Wait for the locking mechanism finish The LCD panel will display SYSTEM LOCKED Turn off the power of the Active Vibration Isolation System Close the door of the acoustic enclosure Turn off the illuminator Turn off the vacuum pump Reference 1 XE 150 User s Manual by Park Systems Corporation 2 XEP Software Manual by Park Systems Corporation 3 XEI Software Manual by Park Systems Corporation Version 1 0 Page 18 of 18
9. er by the focus distance for the image And dividing the subtracted value by 2 will give the separation between the cantilever and the sample Version 1 0 Page 10 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST E x Fig 6 the real object of the cantilever E x Fig 7 the image of the cantilever of Fig 6 Version 1 0 Page 11 of 18 2 3 4 5 6 7 NANOELECTRONICS FABRICATION FACILITY NFF HKUST Move the Z Stage down so that the separation between the cantilever and the sample is about 100um As it is easy to make collision of the cantilever to the sample carelessly it is suggested that apply several moves in approaching to the sample Says if the initial separation is 2000um it is better to move down 1000um first Then check the separation again If there are patterns in the sample move Focus to the sample surface so that the patterns can be viewed Adjust XY Stage to place the cantilever over the location of interest Move Focus back to the cantilever Enter the Scan Size to zero Scan Rate to 0 5Hz and Z Servo Gain to 1 Adjust the PSPD signal again if it drifted After PSPD signal is adjusted click on NCM ASetup to set the drive frequency and set point again Click on Approach to let the computer automatically bring the cantilever to the sample surface Warning After the cantilever reached the sample surface 1 don t move the Z
10. g Leong CHUNG 2358 7211 amp 64406238 e Deputy Safety Officer Mr Man Wai LEE 2358 7900 amp 9621 7708 e NFF Phase 2 Technicians Mr Li Ho or Mr Chen Yi gong 2358 7896 e Security Control Center 2358 8999 24hr amp 2358 6565 24hr 3 2 Training to Become a Qualified User Please follow the procedure below to become a qualified user 1 Read all materials on the NFF website concerning this ellipsometer 2 Send an e mail to NFF staff requesting operation training Scheduling can take up to several weeks due to the many requests coming in for this tool Version 1 0 Page 4 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST 4 Operating Procedures 4 1 System Description AFM can be used to image the surface topography with resolution down to nanoscale The XE 150 consists of four major components the XE 150 SPM stage with an acoustic enclosure the control electronics the computer and the video monitor In this document a basic operating procedure is given For other operating techniques parameters definitions in the software and other details please refer to the manuals provided by the Park Systems 4 2 Important Cautions 1 If the instrument failure while being used never try to fix the problem by yourself Please contact NFF staff 2 Parts of the instrument can be easily damaged Handle with extreme care 3 It is easy to break the AFM cantilever Pay attention to keeping clear of the cantilever from yo
11. ive tape Fix the magnetic sample holder to the XY Stage first and then place the sample disk on the magnetic sample holder Version 1 0 Page 9 of 18 5 6 7 8 NANOELECTRONICS FABRICATION FACILITY NFF HKUST Move the XY Stage so that the sample is aligned roughly under the cantilever Gradually move the Z Stage down until the distance between the sample and the cantilever is around 1mm to 2mm Noted that during the Z Stage moving down towards the sample you can adjust the XY Stage as well to make sure the sample is just under the cantilever From the Active Vibration Isolation System s front panel press button E enable the isolation The red LED of ISOL ON will be on and the small LCD panel will display ISOLATION ENABLED Close the acoustic enclosure 4 6 Cantilever Approaching Warning Don t move the Focus stage down to and below 1000um 1 This first thing is to get to know the separation between the cantilever and the sample The following suggests one of the methods Method 1 a b Move down the Focus to try to view the image of the cantilever reflected from the sample For example Fig 7 shows an image of the cantilever reflected from a bare Si wafer surface Fig 6 shows its real object for comparison Write down the focus distance F um for the image and the focus distance F um for the real cantilever Subtract the focus distance for the real cantilev
12. ur hands tweezers and sample during laser beam alignment and sample loading unloading 4 Make sure your samples are tidy especially there should be no sticky residue on the bottom surface 4 3 Turn On the System 1 Turn on the XY Stage controller and SPM controller 2 Turn on the computer 3 Turn on the illuminator Version 1 0 Page 5 of 18 NANOELECTRONICS FABRICATION FACILITY NFF HKUST 4 Open the door of the acoustic enclosure switch on the power of the Active Vibration Isolation System 5 Turn on the vacuum pump for sample stage vacuum 6 After the computer boots up double click XEC icon to open the CCD vision window for the optical microscope Wait unit the window is opened The window displays the actual view from the optical microscope Then double click the XEP icon to open data acquisition program for XE 150S 7 The Frequency Sweep window will be displayed Click on OK 8 Click on the icon EB The Session Manager window will be displayed In the field of Location enter c spmdata NFFxxxx where xxxx is your project number Also enter a name for the Session Name 9 Click on the icon The Preferences window will be displayed Click on Filename In the field of Filename Format enter a filename Click on OK 10 Check the icon 11 Find NFF staff to help install your AFM cantilever is pressed down 4 4 Laser Beam Alignment Warning
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